JP2003229259A - 有機電場発光表示装置の製造方法 - Google Patents
有機電場発光表示装置の製造方法Info
- Publication number
- JP2003229259A JP2003229259A JP2003020705A JP2003020705A JP2003229259A JP 2003229259 A JP2003229259 A JP 2003229259A JP 2003020705 A JP2003020705 A JP 2003020705A JP 2003020705 A JP2003020705 A JP 2003020705A JP 2003229259 A JP2003229259 A JP 2003229259A
- Authority
- JP
- Japan
- Prior art keywords
- display substrate
- donor element
- organic
- electrode
- donor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
- H10K85/342—Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising iridium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/351—Metal complexes comprising lanthanides or actinides, e.g. comprising europium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/060670 | 2002-01-30 | ||
US10/060,670 US6610455B1 (en) | 2002-01-30 | 2002-01-30 | Making electroluminscent display devices |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003229259A true JP2003229259A (ja) | 2003-08-15 |
Family
ID=27610065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003020705A Pending JP2003229259A (ja) | 2002-01-30 | 2003-01-29 | 有機電場発光表示装置の製造方法 |
Country Status (6)
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006148045A (ja) * | 2004-11-17 | 2006-06-08 | Samsung Sdi Co Ltd | 低分子有機電界発光素子及びその製造方法 |
JP2006309955A (ja) * | 2005-04-26 | 2006-11-09 | Sony Corp | 有機電界発光素子の製造方法および有機電界発光素子 |
KR100699993B1 (ko) * | 2004-08-30 | 2007-03-26 | 삼성에스디아이 주식회사 | 레이저 열전사 방법 |
JP2008500730A (ja) * | 2004-05-27 | 2008-01-10 | イーストマン コダック カンパニー | 複数の金属層を備えるoledのドナー |
JP2009238740A (ja) * | 2008-03-07 | 2009-10-15 | Semiconductor Energy Lab Co Ltd | 成膜方法及び発光装置の作製方法 |
US7632714B2 (en) | 2006-07-31 | 2009-12-15 | Sony Corporation | Method for manufacturing a display device |
US7993806B2 (en) | 2007-04-02 | 2011-08-09 | Sony Corporation | Transfer substrate, and fabrication process of organic electroluminescent devices |
WO2011114873A1 (ja) * | 2010-03-18 | 2011-09-22 | 株式会社半導体エネルギー研究所 | 成膜方法及び成膜用基板の作製方法 |
US8207088B2 (en) | 2007-08-16 | 2012-06-26 | Sony Corporation | Transfer substrate and method for fabricating organic electroluminescent element |
US8900675B2 (en) | 2010-03-18 | 2014-12-02 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and method for manufacturing deposition substrate |
US8951816B2 (en) | 2010-03-18 | 2015-02-10 | Semiconductor Energy Laboratory Co., Ltd. | Film forming method |
Families Citing this family (39)
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---|---|---|---|---|
US6970490B2 (en) * | 2002-05-10 | 2005-11-29 | The Trustees Of Princeton University | Organic light emitting devices based on the formation of an electron-hole plasma |
US6890627B2 (en) * | 2002-08-02 | 2005-05-10 | Eastman Kodak Company | Laser thermal transfer from a donor element containing a hole-transporting layer |
US6939660B2 (en) * | 2002-08-02 | 2005-09-06 | Eastman Kodak Company | Laser thermal transfer donor including a separate dopant layer |
US6855636B2 (en) * | 2002-10-31 | 2005-02-15 | 3M Innovative Properties Company | Electrode fabrication methods for organic electroluminscent devices |
JP2004184797A (ja) * | 2002-12-05 | 2004-07-02 | Seiko Epson Corp | 電子装置及びその製造方法並びに電子機器 |
KR20060017414A (ko) * | 2004-08-20 | 2006-02-23 | 삼성에스디아이 주식회사 | 유기 전계 발광 소자의 제조 방법 |
KR20060020045A (ko) * | 2004-08-30 | 2006-03-06 | 삼성에스디아이 주식회사 | 유기전계발광표시장치의 제조방법 |
KR20060020044A (ko) * | 2004-08-30 | 2006-03-06 | 삼성에스디아이 주식회사 | 유기전계발광표시장치 및 도너 기판의 제조방법 |
KR20060020031A (ko) * | 2004-08-30 | 2006-03-06 | 삼성에스디아이 주식회사 | 레이저 열전사 장치 |
KR100860005B1 (ko) * | 2004-09-21 | 2008-09-25 | 삼성에스디아이 주식회사 | 유기 전계 발광 소자의 제조 방법 |
KR20060027750A (ko) * | 2004-09-23 | 2006-03-28 | 삼성에스디아이 주식회사 | 유기 전계 발광 소자의 제조 방법 |
KR100700641B1 (ko) * | 2004-12-03 | 2007-03-27 | 삼성에스디아이 주식회사 | 레이저 조사 장치, 패터닝 방법 및 그를 이용한 레이저열전사 패터닝 방법과 이를 이용한 유기 전계 발광 소자의제조 방법 |
KR100635579B1 (ko) | 2004-12-20 | 2006-10-17 | 삼성에스디아이 주식회사 | 레이저 열 전사장치, 상기 장치를 사용하는 레이저 열전사법 및 상기 장치를 사용하는 유기전계발광표시장치제조방법 |
US7630029B2 (en) * | 2005-02-16 | 2009-12-08 | Industrial Technology Research Institute | Conductive absorption layer for flexible displays |
KR100712289B1 (ko) | 2005-04-07 | 2007-04-27 | 삼성에스디아이 주식회사 | 평판표시장치 및 그의 제조방법 |
JP2006309994A (ja) * | 2005-04-27 | 2006-11-09 | Sony Corp | 転写用基板および転写方法ならびに表示装置の製造方法 |
US8268657B2 (en) | 2005-08-30 | 2012-09-18 | Samsung Mobile Display Co., Ltd. | Laser induced thermal imaging apparatus |
GB2436893A (en) * | 2006-03-31 | 2007-10-10 | Seiko Epson Corp | Inkjet printing of cross point passive matrix devices |
JP4420065B2 (ja) * | 2007-05-21 | 2010-02-24 | ソニー株式会社 | 転写方法および転写装置ならびに有機発光素子の製造方法 |
KR100884253B1 (ko) * | 2007-07-04 | 2009-02-17 | 주식회사 아이엠티 | 건식세정장치 및 방법 |
US8425974B2 (en) * | 2007-11-29 | 2013-04-23 | Semiconductor Energy Laboratory Co., Ltd. | Evaporation donor substrate and method for manufacturing light-emitting device |
US8080811B2 (en) | 2007-12-28 | 2011-12-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing evaporation donor substrate and light-emitting device |
WO2009099002A1 (en) * | 2008-02-04 | 2009-08-13 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and method for manufacturing light-emitting device |
WO2009107548A1 (en) * | 2008-02-29 | 2009-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
JP5416987B2 (ja) | 2008-02-29 | 2014-02-12 | 株式会社半導体エネルギー研究所 | 成膜方法及び発光装置の作製方法 |
US20090218219A1 (en) * | 2008-02-29 | 2009-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing Apparatus |
JP5079722B2 (ja) | 2008-03-07 | 2012-11-21 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
US8182863B2 (en) | 2008-03-17 | 2012-05-22 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
US7932112B2 (en) * | 2008-04-14 | 2011-04-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
US8409672B2 (en) * | 2008-04-24 | 2013-04-02 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device |
CN102131950B (zh) * | 2008-06-19 | 2014-05-28 | 实用光有限公司 | 光感应图案 |
WO2010041262A2 (en) * | 2008-10-12 | 2010-04-15 | Utilight Ltd. | Solar cells and method of manufacturing thereof |
US8486736B2 (en) * | 2008-10-20 | 2013-07-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
KR20150109013A (ko) * | 2014-03-18 | 2015-10-01 | 삼성디스플레이 주식회사 | 유기막 패턴 형성용 마스크, 이를 이용한 유기막 패턴 형성 방법 및 유기 발광 표시 장치의 제조 방법 |
KR102181239B1 (ko) * | 2014-09-03 | 2020-11-23 | 삼성디스플레이 주식회사 | 박막 형성 장치 및 그를 이용한 박막 형성 방법 |
KR102352406B1 (ko) | 2015-03-02 | 2022-01-19 | 삼성디스플레이 주식회사 | 표시 장치의 제조 방법 및 표시 장치 |
WO2018015850A2 (en) * | 2016-07-17 | 2018-01-25 | Io Tech Group Ltd. | Kit and system for laser-induced material dispensing |
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TWI637481B (zh) | 2017-11-29 | 2018-10-01 | 財團法人工業技術研究院 | 半導體結構、發光裝置及其製造方法 |
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WO2000014174A1 (fr) | 1998-09-09 | 2000-03-16 | Idemitsu Kosan Co., Ltd. | Dispositif organique electroluminescent et derive de phenylenediamine |
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-
2002
- 2002-01-30 US US10/060,670 patent/US6610455B1/en not_active Expired - Lifetime
- 2002-12-31 TW TW91138026A patent/TWI259738B/zh not_active IP Right Cessation
-
2003
- 2003-01-20 EP EP03075187.9A patent/EP1335637B1/en not_active Expired - Lifetime
- 2003-01-28 KR KR20030005517A patent/KR100910438B1/ko active IP Right Grant
- 2003-01-29 JP JP2003020705A patent/JP2003229259A/ja active Pending
- 2003-01-30 CN CNB031019927A patent/CN100416849C/zh not_active Expired - Lifetime
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4782779B2 (ja) * | 2004-05-27 | 2011-09-28 | グローバル オーエルイーディー テクノロジー リミティド ライアビリティ カンパニー | 複数の金属層を備えるoledのドナー |
JP2008500730A (ja) * | 2004-05-27 | 2008-01-10 | イーストマン コダック カンパニー | 複数の金属層を備えるoledのドナー |
KR101101864B1 (ko) * | 2004-05-27 | 2012-01-05 | 글로벌 오엘이디 테크놀러지 엘엘씨 | 유기 물질을 전사하여 oled 디바이스를 형성하기 위한 도너 소자 |
KR100699993B1 (ko) * | 2004-08-30 | 2007-03-26 | 삼성에스디아이 주식회사 | 레이저 열전사 방법 |
US7579772B2 (en) | 2004-11-17 | 2009-08-25 | Samsung Mobile Display Co., Ltd. | Small molecular organic electroluminescent display device and method of fabricating the same |
JP2006148045A (ja) * | 2004-11-17 | 2006-06-08 | Samsung Sdi Co Ltd | 低分子有機電界発光素子及びその製造方法 |
US7959993B2 (en) | 2004-11-17 | 2011-06-14 | Samsung Mobile Display Co., Ltd. | Small molecular organic electroluminescent display device and method of fabricating the same |
JP2006309955A (ja) * | 2005-04-26 | 2006-11-09 | Sony Corp | 有機電界発光素子の製造方法および有機電界発光素子 |
US7632714B2 (en) | 2006-07-31 | 2009-12-15 | Sony Corporation | Method for manufacturing a display device |
KR101361017B1 (ko) * | 2006-07-31 | 2014-02-10 | 소니 주식회사 | 표시 장치의 제조 방법 |
US7993806B2 (en) | 2007-04-02 | 2011-08-09 | Sony Corporation | Transfer substrate, and fabrication process of organic electroluminescent devices |
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TW200302679A (en) | 2003-08-01 |
KR100910438B1 (ko) | 2009-08-04 |
KR20030065371A (ko) | 2003-08-06 |
EP1335637B1 (en) | 2017-08-23 |
CN1436025A (zh) | 2003-08-13 |
CN100416849C (zh) | 2008-09-03 |
US6610455B1 (en) | 2003-08-26 |
TWI259738B (en) | 2006-08-01 |
EP1335637A1 (en) | 2003-08-13 |
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