JP2003218024A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003218024A5 JP2003218024A5 JP2002058118A JP2002058118A JP2003218024A5 JP 2003218024 A5 JP2003218024 A5 JP 2003218024A5 JP 2002058118 A JP2002058118 A JP 2002058118A JP 2002058118 A JP2002058118 A JP 2002058118A JP 2003218024 A5 JP2003218024 A5 JP 2003218024A5
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- optical system
- projection optical
- state
- aerial image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 35
- 238000005259 measurement Methods 0.000 claims 31
- 238000003384 imaging method Methods 0.000 claims 14
- 238000000034 method Methods 0.000 claims 10
- 238000000691 measurement method Methods 0.000 claims 8
- 238000005286 illumination Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 206010010071 Coma Diseases 0.000 claims 1
- 230000004075 alteration Effects 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 230000007613 environmental effect Effects 0.000 claims 1
- 238000011084 recovery Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002058118A JP2003218024A (ja) | 2001-11-16 | 2002-03-05 | 計測方法、結像特性調整方法、露光方法及び露光装置の製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001350970 | 2001-11-16 | ||
| JP2001-350970 | 2001-11-16 | ||
| JP2002058118A JP2003218024A (ja) | 2001-11-16 | 2002-03-05 | 計測方法、結像特性調整方法、露光方法及び露光装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003218024A JP2003218024A (ja) | 2003-07-31 |
| JP2003218024A5 true JP2003218024A5 (enExample) | 2005-09-08 |
Family
ID=27667272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002058118A Pending JP2003218024A (ja) | 2001-11-16 | 2002-03-05 | 計測方法、結像特性調整方法、露光方法及び露光装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003218024A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004059710A1 (ja) * | 2002-12-24 | 2004-07-15 | Nikon Corporation | 収差計測方法、露光方法及び露光装置 |
| JP3880589B2 (ja) | 2004-03-31 | 2007-02-14 | キヤノン株式会社 | 位置計測装置、露光装置及びデバイス製造方法 |
| US7566893B2 (en) | 2004-06-22 | 2009-07-28 | Nikon Corporation | Best focus detection method, exposure method, and exposure apparatus |
| US8547522B2 (en) | 2005-03-03 | 2013-10-01 | Asml Netherlands B.V. | Dedicated metrology stage for lithography applications |
| US20060219947A1 (en) * | 2005-03-03 | 2006-10-05 | Asml Netherlands B.V. | Dedicated metrology stage for lithography applications |
| JP4798353B2 (ja) * | 2005-12-27 | 2011-10-19 | 株式会社ニコン | 光学特性計測方法及びパターン誤差計測方法 |
| JP4793683B2 (ja) * | 2006-01-23 | 2011-10-12 | 株式会社ニコン | 算出方法、調整方法及び露光方法、並びに像形成状態調整システム及び露光装置 |
| US20090002656A1 (en) * | 2007-06-29 | 2009-01-01 | Asml Netherlands B.V. | Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus |
| JP5508734B2 (ja) * | 2009-02-09 | 2014-06-04 | 大日本スクリーン製造株式会社 | パターン描画装置およびパターン描画方法 |
| NL2007477A (en) | 2010-10-22 | 2012-04-24 | Asml Netherlands Bv | Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus. |
| JP5518124B2 (ja) * | 2012-04-26 | 2014-06-11 | キヤノン株式会社 | 収差計測方法、露光装置及びデバイス製造方法 |
| KR102271053B1 (ko) * | 2019-10-31 | 2021-06-30 | 고려대학교 산학협력단 | 수차를 야기하는 샘플 내의 타겟 오브젝트를 이미징하기 위한 초점 스캔 방식의 이미징 장치 |
| CN116577075B (zh) * | 2023-07-10 | 2023-10-03 | 睿励科学仪器（上海）有限公司 | 一种物镜远心度的测量系统、方法及存储介质 |
-
2002
- 2002-03-05 JP JP2002058118A patent/JP2003218024A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI618977B (zh) | Mask inspection method and mask inspection device | |
| US6613483B2 (en) | Mask for measuring optical aberration and method of measuring optical aberration | |
| JP2006303498A5 (enExample) | ||
| JP2003218024A5 (enExample) | ||
| CN101169595A (zh) | 一种用于步进光刻机对准系统的标定装置及其标定方法 | |
| TW200905157A (en) | Measuring method, exposure method, and device fabricating method | |
| US20110242520A1 (en) | Optical properties measurement method, exposure method and device manufacturing method | |
| JP2001505366A (ja) | フォトリソグラフィックシステムにおけるレンズ誤差を補正するレチクル | |
| US6048651A (en) | Fresnel zone mask for pupilgram | |
| WO2021072792A1 (zh) | 一种基于机器学习确定光刻系统焦面位置的方法 | |
| CN102878958B (zh) | 一种平版印刷的印版网点面积的测量方法 | |
| JP2004012779A (ja) | マスクの検査方法およびマスク欠陥検査装置 | |
| CN106919004B (zh) | 评价方法、曝光方法以及物品的制造方法 | |
| JP2009104024A (ja) | 露光マスク、フォーカス測定方法及びパターン形成方法 | |
| KR100689816B1 (ko) | 노광장치 및 레티클 정렬상태 측정방법 | |
| JP2021047331A (ja) | マーク位置決定方法、リソグラフィー方法、物品製造方法、プログラムおよびリソグラフィー装置 | |
| JP2008147258A (ja) | 計測装置及びこれを備える投影露光装置並びにデバイス製造方法 | |
| CN109307980A (zh) | 光掩模检查方法、光掩模制造方法及光掩模检查装置 | |
| JP2934726B2 (ja) | 投影露光方法 | |
| JP2008140911A (ja) | フォーカスモニタ方法 | |
| KR100945924B1 (ko) | 노광 렌즈의 디스토션 수차 보정 방법 | |
| TWI494702B (zh) | Processing method of pattern data and manufacturing method of electronic device | |
| CN105388699A (zh) | 评价用掩模、评价方法、曝光装置以及物品的制造方法 | |
| CN113050394B (zh) | 曝光装置以及物品制造方法 | |
| JP2001255118A (ja) | 中心位置計測用のターゲット、中心位置計測装置及び方法 |