JP2003188302A - Composite electronic component - Google Patents

Composite electronic component

Info

Publication number
JP2003188302A
JP2003188302A JP2001388424A JP2001388424A JP2003188302A JP 2003188302 A JP2003188302 A JP 2003188302A JP 2001388424 A JP2001388424 A JP 2001388424A JP 2001388424 A JP2001388424 A JP 2001388424A JP 2003188302 A JP2003188302 A JP 2003188302A
Authority
JP
Japan
Prior art keywords
electronic component
wiring conductor
cavity
internal wiring
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001388424A
Other languages
Japanese (ja)
Inventor
Masafumi Hisataka
将文 久高
Hiroshi Suenaga
弘 末永
Mitsutaka Touden
光隆 嶌田
Hironobu Kuroyama
浩信 黒山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001388424A priority Critical patent/JP2003188302A/en
Publication of JP2003188302A publication Critical patent/JP2003188302A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate

Landscapes

  • Parts Printed On Printed Circuit Boards (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a composite electronic component that is not deteriorated in electrical characteristic by holding the airtightness of cavities even when mechanical stresses, such as impacts, etc., are applied during its manufacturing process. <P>SOLUTION: External wiring conductors formed on outer peripheral surface of a laminate contain 0.1-1 wt.% V<SB>2</SB>O<SB>5</SB>per 100 wt.% one kind of metallic component selected from among Au, Cu, and Ag. In addition, internal wiring conductors formed in the laminate contain an Ag metallic component as their main component and are formed by baking conductive paste containing 0.1-2 wt.% organic metal selected out of organic magnesium and organic calcium per 100 wt.% the Ag metallic component. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は高周波通信機器の送
受信制御回路に使用される複合電子部品に関し、特に、
弾性表面波素子などの電子部品素子を積層体の主面に形
成したキャビティに収容し気密封止した複合電子部品に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite electronic component used in a transmission / reception control circuit of a high frequency communication device, and more particularly,
The present invention relates to a composite electronic component in which an electronic component element such as a surface acoustic wave element is housed in a cavity formed on the main surface of a laminated body and hermetically sealed.

【0002】[0002]

【従来の技術】従来、高周波通信機器の送受信制御回路
に使われる複合電子部品においては、電子部品素子とし
て、例えば、LiTaO3、LiNbO3、Li2Nb4
7等の圧電基板の表面に櫛歯状のAl電極を被着形成し
て成る弾性表面波素子を収容し、安定した電気特性を維
持するために気密封止していた。
2. Description of the Related Art Conventionally, in a composite electronic component used in a transmission / reception control circuit of a high frequency communication device, as an electronic component element, for example, LiTaO 3 , LiNbO 3 , Li 2 Nb 4 O is used.
A surface acoustic wave element formed by depositing a comb-teeth shaped Al electrode on the surface of a piezoelectric substrate such as 7 was housed and hermetically sealed in order to maintain stable electrical characteristics.

【0003】従来のこのような複合電子部品30を図3
に示す。図3において、 積層体31の主面にはキャビ
ティ32が形成されており、 キャビティ32の内部に
は電極パッド34が形成されており、この電極パッド3
4に弾性表面波素子などの電子部品素子33aがバンプ
35を介してフリップチップ実装されている。また、前
記 キャビティ32の開口部は封止部材を介して封止用
金属蓋体36が接合され気密封止されている。
FIG. 3 shows such a conventional composite electronic component 30.
Shown in. In FIG. 3, a cavity 32 is formed on the main surface of the laminate 31, and an electrode pad 34 is formed inside the cavity 32.
4, an electronic component element 33a such as a surface acoustic wave element is flip-chip mounted via bumps 35. The opening of the cavity 32 is hermetically sealed with a sealing metal lid 36 joined via a sealing member.

【0004】内部配線導体40a、40bは、一方がキ
ャビティ32内部において電極パッド34に接続し、他
方が積層体31の積層面方向や積層面厚み方向に沿って
積層体31の外周に延出されている。
One of the internal wiring conductors 40a and 40b is connected to the electrode pad 34 inside the cavity 32, and the other is extended to the outer periphery of the laminated body 31 along the laminating surface direction and the laminating surface thickness direction of the laminated body 31. ing.

【0005】また、積層体31の外周には、抵抗やコン
デンサ素子等の電子部品素子33bが半田付け等によっ
て実装されるための表面電極41aや、マザーボード
(不図示)上の電極に接続固定されるための裏面電極4
1bや、積層体31端面の厚み方向に形成されている端
面電極41cなど外部配線導体41が形成されている。
これら外部配線導体41は 、積層体31の外周に延出
された内部配線導体40(内部配線層40a、ビアホー
ル導体40b)の露出端を覆うようにして内部配線導体
40の内部配線層40a、ビアホール導体40bのいず
れかと接続している。
On the outer periphery of the laminate 31, electronic component elements 33b such as resistors and capacitor elements are connected and fixed to surface electrodes 41a for mounting by soldering or electrodes on a mother board (not shown). Back electrode 4 for
External wiring conductors 41 such as 1b and end surface electrodes 41c formed in the thickness direction of the end surface of the laminated body 31 are formed.
These external wiring conductors 41 cover the exposed ends of the internal wiring conductors 40 (internal wiring layers 40a, via hole conductors 40b) extended to the outer periphery of the laminated body 31 so as to cover the internal wiring layers 40a and via holes of the internal wiring conductors 40. It is connected to one of the conductors 40b.

【0006】上述の複合電子部品30において、積層体
31の材料として従来より、積層体基板の焼成温度を8
00〜1050℃と比較的低い温度で焼成可能な材料の
検討がなされてきた。これは、回路の高速化を図るため
配線材料としてAg系、Cu系、Au系などの融点の低
い低抵抗材料を使用するため、低い温度で配線材料と一
括同時焼成可能な 基板材料が望まれているためであ
る。従って、このような基板材料として、セラミック材
料が10〜60wt%、低融点ガラス成分が90〜40
wt%の比率で混合されたガラスセラミック材料が用い
られている。
In the composite electronic component 30 described above, as a material for the laminate 31, the laminate substrate has conventionally been fired at a firing temperature of 8%.
Materials that can be fired at a relatively low temperature of 00 to 1050 ° C. have been studied. This is because a low-resistance material having a low melting point such as Ag-based, Cu-based, or Au-based is used as a wiring material for the purpose of speeding up the circuit. Therefore, a substrate material that can be co-fired with the wiring material at a low temperature is desired. This is because Therefore, as such a substrate material, a ceramic material is 10 to 60 wt% and a low melting point glass component is 90 to 40%.
A glass-ceramic material mixed in a wt% ratio is used.

【0007】また、内部配線導体40や外部配線導体4
1は、例えば、金属成分中約99wt%Ag系金属粉
末、金属成分中約1wt%Pt系金属粉末、ホウケイ酸
系低融点ガラス、有機バインダー、および有機溶剤を均
質に混合した導電ペーストを用いて、未焼成状態のセラ
ミックグリーンシート上に導体を形成し、積層体基板と
一括同時焼成することにより形成されていた。
The internal wiring conductor 40 and the external wiring conductor 4 are also included.
1 uses, for example, a conductive paste in which about 99 wt% Ag-based metal powder in the metal component, about 1 wt% Pt-based metal powder in the metal component, borosilicate low-melting glass, an organic binder, and an organic solvent are homogeneously mixed. It was formed by forming a conductor on an unfired ceramic green sheet and firing it simultaneously with the laminate substrate.

【0008】また、上述の複合電子部品30は、製造工
程において生産性の向上のため積層体31多数個取りさ
れる集合積層体基板の状態で一括焼成され、電子部品素
子33a、33bの実装やキャビティ32の封止が行わ
れた後、ブレイクやカッティングの工程を経て個々の複
合電子部品30に分割されていた。
Further, the composite electronic component 30 described above is collectively fired in the state of a collective laminate substrate in which a large number of laminates 31 are taken in order to improve the productivity in the manufacturing process, and the electronic component elements 33a and 33b are mounted and mounted. After the cavity 32 was sealed, it was divided into individual composite electronic components 30 through break and cutting steps.

【0009】[0009]

【発明が解決しようとする課題】複合電子部品30を携
帯電話等に使用する場合、落下衝撃や振動等の外部から
の機械的応力に対し高い信頼性が要求される。また、複
合電子部品30は、積層体31が多数個取りされる集合
積層体基板の状態で一括焼成され、その後、ブレイクや
カッティングの工程を経て個々の複合電子部品30に分
割されるため、その製造工程において機械的応力が加わ
ることは避けられない。
When the composite electronic component 30 is used in a mobile phone or the like, high reliability is required with respect to external mechanical stress such as drop impact or vibration. Further, the composite electronic component 30 is collectively fired in the state of an aggregated laminate substrate from which a large number of laminates 31 are taken, and then divided and divided into individual composite electronic components 30 through the steps of breaking and cutting. It is inevitable that mechanical stress is applied in the manufacturing process.

【0010】一方、電子部品素子33aとして弾性表面
波素子等を収納する場合、周波数精度を保ち安定した電
気特性を得るために、キャビティ32内はN2等の不活
性ガスにて気密封止を施しており、キャビティ32内の
気密性を保つことが重要となる。
On the other hand, when accommodating a surface acoustic wave element or the like as the electronic component element 33a, the cavity 32 is hermetically sealed with an inert gas such as N 2 in order to maintain frequency accuracy and obtain stable electric characteristics. It is important to keep the airtightness inside the cavity 32.

【0011】しかしながら、上述の複合電子部品30で
は、一括焼成時において、内部配線導体40と積層体3
1の誘電体層との焼結挙動の差により、両者の焼結持に
おける収縮状態が異なるため、両者の接合界面に応力が
発生し、基板のそりが生じるとともに微少なクラックが
形成されていた。また、外部配線導体41と積層体31
の誘電体層表面との接合面においては、Ag粒子の基板
材料のガラス成分によるアンカー効果が弱く、その結果
接合強度が弱いため、落下衝撃や振動等の外部からの機
械的応力によって外部配線導体41が誘電体層表面から
剥離し、両者の接合界面に微少なクラックが生じる場合
があった。従って、内部配線導体40と積層体31の接
合界面でのクラック、および、外部配線導体41と積層
体31の接合界面でのクラックが接続されることによ
り、キャビティ32内と積層体31外部との間にスルー
パスが形成されることになり、その結果、キャビティ3
2内にリークが生じ気密性を保つことができず、特性不
良や信頼性性能の低下を招いていた。
However, in the above-mentioned composite electronic component 30, the internal wiring conductor 40 and the laminated body 3 are formed at the time of collective firing.
Due to the difference in the sintering behavior with the dielectric layer of No. 1, the contraction state during sintering of both of them was different, so that stress was generated at the bonding interface between the two, warpage of the substrate occurred and minute cracks were formed. . In addition, the external wiring conductor 41 and the laminated body 31
At the joint surface with the surface of the dielectric layer, the anchor effect due to the glass component of the substrate material of Ag particles is weak, and as a result, the joint strength is weak. Therefore, mechanical stress from the outside such as drop impact or vibration causes external wiring conductor There was a case where 41 was peeled from the surface of the dielectric layer and a minute crack was generated at the bonding interface between the two. Therefore, by connecting the crack at the joint interface between the internal wiring conductor 40 and the laminated body 31 and the crack at the joint interface between the external wiring conductor 41 and the laminated body 31, the inside of the cavity 32 and the outside of the laminated body 31 are connected. A through path will be formed between them, and as a result, the cavity 3
Leakage occurred in the inside of No. 2 and the airtightness could not be maintained, resulting in poor characteristics and reduced reliability performance.

【0012】本発明は、上述の問題点に鑑みて案出され
たものであり、その目的は、内部配線導体と誘電体層と
の接合界面でのクラックの発生を防止するとともに、外
部配線導体と誘電体層との接合強度を高めることによ
り、製造工程中の衝撃や、落下衝撃、振動等の機械的応
力が加わっても、キャビティの気密性を保持し、電気特
性が劣化することなく、信頼性性能に優れた複合電子部
品を提供することにある。
The present invention has been devised in view of the above-mentioned problems, and an object thereof is to prevent the occurrence of cracks at the bonding interface between the internal wiring conductor and the dielectric layer and to provide the external wiring conductor. By increasing the bonding strength between the dielectric layer and the dielectric layer, even if a mechanical stress such as impact, drop impact, or vibration is applied during the manufacturing process, the airtightness of the cavity is maintained and the electrical characteristics are not deteriorated. It is to provide a composite electronic component having excellent reliability performance.

【0013】[0013]

【課題を解決するための手段】本発明の第一の発明は、
ガラス成分とセラミック成分を含む誘電体層を複数積層
した積層体と、前記積層体の主面に形成したキャビティ
と、前記キャビティ内部に形成した電極パッドと、前記
キャビティの開口を封止する蓋体と、前記積層体の外周
面に形成した外部配線導体と、前記積層体内に形成した
内部配線導体と、前記キャビティ内の電極パッドに接続
するように該キャビティ内に収容される電子部品素子と
を有し、前記内部配線導体の一方が前記キャビティ内の
前記電極パッドに接続するとともに、他方が前記積層体
の外周面に露出し、該露出部を前記外部配線導体で被覆
して成る複合電子部品において、前記外部配線導体は、
Au、Cu、Agから選ばれる一種の金属成分100w
t%に対して0.1〜1wt%のV25を含有している
ことを特徴とする複合電子部品である。
The first invention of the present invention is as follows:
A laminated body in which a plurality of dielectric layers containing a glass component and a ceramic component are laminated, a cavity formed on the main surface of the laminated body, an electrode pad formed inside the cavity, and a lid body that seals the opening of the cavity. An external wiring conductor formed on the outer peripheral surface of the laminated body, an internal wiring conductor formed in the laminated body, and an electronic component element housed in the cavity so as to be connected to an electrode pad in the cavity. A composite electronic component having one of the internal wiring conductors connected to the electrode pad in the cavity, the other being exposed on the outer peripheral surface of the laminate, and the exposed portion being covered with the external wiring conductor. In, the external wiring conductor,
100w, a kind of metal component selected from Au, Cu, Ag
The composite electronic component is characterized by containing 0.1 to 1 wt% of V 2 O 5 with respect to t%.

【0014】また、本発明の第二の発明は、前記内部配
線導体はAg金属成分を主成分とし、該Ag金属成分1
00wt%に対して、有機マグネシウムと有機カルシウ
ムから選ばれる少なくとも一種類の有機金属を0.1〜
2wt%含有した導電性ペーストを焼成することにより
形成していることを特徴とする第一の発明の複合電子部
品である。
According to a second aspect of the present invention, the internal wiring conductor contains an Ag metal component as a main component, and the Ag metal component 1
0.1 wt% of at least one organic metal selected from organomagnesium and organocalcium per 100 wt%
The composite electronic component of the first invention is characterized by being formed by firing a conductive paste containing 2 wt%.

【作用】本発明の第一の発明によれば、積層体の外周面
に形成した外部配線導体は、Au、Cu、Agから選ば
れる一種の金属成分100wt%に対して0.1〜1w
t%のV25を含有している。
According to the first aspect of the present invention, the external wiring conductor formed on the outer peripheral surface of the laminated body is 0.1 to 1 w for 100 wt% of one kind of metal component selected from Au, Cu and Ag.
It contains t% V 2 O 5 .

【0015】これにより、一括同時焼成時において、V
25がAg系導電性ペーストを構成するAg粒子と誘電
体層のガラス成分とのアンカー効果を助長し、Ag粒子
とガラス成分とのスパイク構造をより強固なものとする
ため、外部配線導体と積層体の誘電体層との接合強度が
向上し、製造工程中における集合 積層体の分割による
衝撃や、落下衝撃や振動等の外部からの機械的応力が加
わっても両者の界面での剥離現象を防止することができ
る。その結果、積層体の外周面に形成され、かつ、キャ
ビティ内部から延出され積層体外周面に露出する内部配
線導体を被覆してなる外部配線導体において、誘電体層
との接合界面でクラックやスルーパスが生じることがな
く、キャビティ内部の気密性は保たれる。
As a result, during simultaneous batch firing, V
2 O 5 promotes the anchoring effect between the Ag particles forming the Ag-based conductive paste and the glass component of the dielectric layer, and strengthens the spike structure between the Ag particles and the glass component. The bond strength between the laminate and the dielectric layer of the laminate is improved, and even if external mechanical stress such as impact due to division of the laminated laminate during the manufacturing process or drop impact or vibration is applied, peeling occurs at the interface between the two. The phenomenon can be prevented. As a result, in the external wiring conductor that is formed on the outer peripheral surface of the laminated body and covers the internal wiring conductor that extends from the inside of the cavity and is exposed on the outer peripheral surface of the laminated body, cracks or cracks occur at the bonding interface with the dielectric layer. The through-pass is not generated and the airtightness inside the cavity is maintained.

【0016】なお、V25の含有量が0.1wt%より
少なくなると外部配線導体と積層体の誘電体層との接合
強度の向上の効果が小さく、キャビティ内部の気密性の
確保が不十分となり、また、V25の含有量が1wt%
よりも多く含有すると、導体の半田濡れ性が劣化する。
そのため、含有量を0.1〜1wt%とすることにより
外部配線導体と誘電体層との接合界面で、クラックやス
ルーパスが生じることがなくキャビティ内部の気密性は
保たれる、と同時に、外部配線導体の半田濡れ性を阻害
することがなく、電子部品素子の半田による実装におい
ても問題をなくすることができる。よって、周波数変動
等の特性劣化が発生することがなく、信頼性性能が優
れ、かつ、電子部品素子の実装性に優れた複合電子部品
が得られる。
If the content of V 2 O 5 is less than 0.1 wt%, the effect of improving the bonding strength between the external wiring conductor and the dielectric layer of the laminate is small, and it is difficult to secure the airtightness inside the cavity. Is sufficient, and the content of V 2 O 5 is 1 wt%
If it is contained in a larger amount, the solder wettability of the conductor deteriorates.
Therefore, by setting the content to 0.1 to 1 wt%, the airtightness inside the cavity is maintained without the generation of cracks or through paths at the joint interface between the external wiring conductor and the dielectric layer. The solder wettability of the wiring conductor is not hindered, and problems can be eliminated even when the electronic component element is mounted by soldering. Therefore, it is possible to obtain a composite electronic component that does not cause characteristic deterioration such as frequency fluctuation, has excellent reliability performance, and has excellent mountability of electronic component elements.

【0017】また、本発明の第二の発明によれば、内部
配線導体がAg金属成分100wt%に対して有機マグ
ネシウムと有機カルシウムから選ばれる少なくとも一種
類の有機金属を0.1〜2wt%含有した導電性ペース
トを焼成することにより形成している。
According to the second aspect of the present invention, the internal wiring conductor contains 0.1 to 2 wt% of at least one organic metal selected from organomagnesium and organocalcium with respect to 100 wt% of Ag metal component. The conductive paste is formed by firing.

【0018】これにより、一括同時焼成時において、A
g粒子間に有機マグネシウムや有機カルシウムが拡散し
Ag粒子同士の接触を妨げるため、Agの焼結が抑制さ
れ焼結温度が高くなる。従って、Agと誘電体との焼結
温度差が小さくなり、従来両者の焼結収縮挙動差によっ
て発生していた内部配線導体と積層体の誘電体層との接
合界面でのクラックの発生が抑制される。
As a result, during simultaneous co-firing, A
Since organomagnesium or organocalcium diffuses between the g particles to prevent the Ag particles from contacting each other, the sintering of Ag is suppressed and the sintering temperature becomes high. Therefore, the difference in the sintering temperature between Ag and the dielectric becomes small, and the generation of cracks at the joint interface between the internal wiring conductor and the dielectric layer of the laminate, which has been conventionally caused by the difference in the sintering shrinkage behavior between the two, is suppressed. To be done.

【0019】なお、有機マグネシウムや有機カルシウム
の含有量が0.1wt%よりも少なすぎるとAgの焼結
抑制効果が少なく、内部配線導体と積層体の誘電体層と
の接合界面でのクラックの発生、および気密性の低下に
つながり、また含有量が2wt%よりも多くなると、導
体抵抗が増加し電気特性が劣化してしまう。従って、含
有量を0.1〜2wt%とすることで、内部配線導体と
積層体の誘電体層との接合界面でのクラックの発生が抑
制することで気密性の低下を防ぎ、また電気特性の劣化
も招くことがない。よって、積層体の主面に形成された
キャビティ内部から延出され積層体外周面に露出する内
部配線導体において内部配線導体と積層体の誘電体層と
の接合界面で第一の発明と同様、気密性は保たれる。よ
って、周波数変動等の特性劣化が発生することがなく、
信頼性性能、電気特性の優れた複合電子部品が得られ
る。
If the content of organomagnesium or organocalcium is less than 0.1 wt%, the effect of suppressing the sintering of Ag is small, and cracks occur at the joint interface between the internal wiring conductor and the dielectric layer of the laminate. If the content exceeds 2 wt%, the conductor resistance increases and the electrical characteristics deteriorate. Therefore, by setting the content to 0.1 to 2 wt%, the occurrence of cracks at the joint interface between the internal wiring conductor and the dielectric layer of the laminated body is suppressed, thereby preventing the deterioration of the airtightness, and preventing the electrical characteristics. Will not be deteriorated. Therefore, in the internal wiring conductor that extends from the inside of the cavity formed in the main surface of the laminate and is exposed at the outer peripheral surface of the laminate, at the bonding interface between the internal wiring conductor and the dielectric layer of the laminate, as in the first invention, Airtightness is maintained. Therefore, characteristic deterioration such as frequency fluctuation does not occur,
A composite electronic component with excellent reliability performance and electrical characteristics can be obtained.

【0020】[0020]

【発明の実施の形態】本発明の複合電子部品を図面に
基づいて詳説する。
BEST MODE FOR CARRYING OUT THE INVENTION The composite electronic component of the present invention is shown in the drawings.
It will be explained in detail based on this.

【0021】図1に本発明の複合電子部品である弾性表
面波装置1の外観斜視図を、図2に図1の略断面図を示
す。
FIG. 1 is an external perspective view of a surface acoustic wave device 1 which is a composite electronic component of the present invention, and FIG. 2 is a schematic sectional view of FIG.

【0022】弾性表面波装置1は、主に、積層体2と電
子部品素子3a、3bからなる。
The surface acoustic wave device 1 is mainly composed of a laminated body 2 and electronic component elements 3a and 3b.

【0023】積層体2は誘電体基板を複数積層した誘電
体層2aの任意の層間に形成した内部配線導体12と、
積層体2の主面に形成した電子部品素子3aを収納する
キャビティ4と、積層体2の主面、側面、端面からなる
外周面に形成する外部配線導体11からなる。
The laminated body 2 includes an internal wiring conductor 12 formed between arbitrary layers of a dielectric layer 2a formed by laminating a plurality of dielectric substrates,
The laminated body 2 includes a cavity 4 formed on the main surface of the laminated body 2 for accommodating the electronic component element 3a, and an external wiring conductor 11 formed on the outer peripheral surface of the laminated body 2 including the main surface, side surfaces, and end surfaces.

【0024】誘電体層2aは、材質として誘電率が低
く、高周波モジュールとして適した性質をもつガラスセ
ラミックが用いられ、内部配線としてAgなどの低イン
ピーダンンス材料からなる内部配線導体12が形成され
ている。
The dielectric layer 2a is made of a glass ceramic having a low permittivity as a material and a property suitable for a high frequency module, and an internal wiring conductor 12 made of a low impedance material such as Ag is formed as an internal wiring. There is.

【0025】電子部品素子3aは、例えば、弾性表面波
素子が用いられ、LiTaO3等の圧電基板の表面に櫛
歯状のAl電極が形成されている。また、電子部品素子
3aの圧電基板の表面には接続パッド30aが形成され
ており、接続パッド30a上にAu線ワイヤボンディン
グによるAuバンプ6を形成し、そのAuバンプ6を介
して 積層体2のキャビティ4底面に形成された電極パ
ッド7に接続されている。
As the electronic component element 3a, for example, a surface acoustic wave element is used, and a comb-teeth shaped Al electrode is formed on the surface of a piezoelectric substrate such as LiTaO 3 . Further, the connection pad 30a is formed on the surface of the piezoelectric substrate of the electronic component element 3a, the Au bump 6 is formed by Au wire wire bonding on the connection pad 30a, and the laminated body 2 of the laminated body 2 is formed through the Au bump 6. It is connected to the electrode pad 7 formed on the bottom surface of the cavity 4.

【0026】また、電子部品素子3bは、例えば抵抗や
コンデンサ素子であり、後述する外部配線導体11の表
面電極11aに例えば、半田付けによって実装される。
The electronic component element 3b is, for example, a resistor or a capacitor element, and is mounted on the surface electrode 11a of the external wiring conductor 11 described later by, for example, soldering.

【0027】内部配線導体12は、例えば、内部配線層
12a、ビアホール導体12b、端面接続導体12cを
有しており、材料としてはAg金属成分を主成分とし、
そのAg金属成分100wt%に対して有機マグネシウ
ムと有機カルシウムから選ばれる少なくとも一種類の有
機金属を、0.1〜2wt%含有した導電性ペーストを
焼成することにより形成されている。
The internal wiring conductor 12 has, for example, an internal wiring layer 12a, a via-hole conductor 12b, and an end-face connecting conductor 12c.
It is formed by firing a conductive paste containing 0.1 to 2 wt% of at least one kind of organic metal selected from organomagnesium and organocalcium with respect to 100 wt% of the Ag metal component.

【0028】そして、その構成は、内部配線層12aの
一方がキャビティ4内底面において電極パッド7に接続
し、他方が積層体2の積層面に沿って延出するとともに
端面接続導体12cの一方に接続し、かつ端面接続導体
12cの他方で積層体2の外周面に露出して端面端子電
極11cに接続する。この端面接続電極12cは内部配
線層12aよりも厚みが大きく成っており、端面端子電
極11cの接続性を良くしている。
The structure is such that one of the internal wiring layers 12a is connected to the electrode pad 7 on the inner bottom surface of the cavity 4 and the other is extended along the laminating surface of the laminated body 2 and is connected to one of the end face connecting conductors 12c. The connection is made and the other end face connecting conductor 12c is exposed on the outer peripheral surface of the laminated body 2 to be connected to the end face terminal electrode 11c. The end-face connecting electrode 12c is thicker than the internal wiring layer 12a, and improves the connectivity of the end-face terminal electrode 11c.

【0029】また、他の内部配線層12aの一方はキャ
ビティ4内底面において電極パッド7に接続し、他方が
積層体2の積層面に沿って延出するとともに積層体2の
積層面厚み方向に形成されたビアホール導体12bの一
方に接続し、かつビアホール導体12bの他方で積層体
2の外周面に露出して表面電極11aに接続されてい
る。
Further, one of the other internal wiring layers 12a is connected to the electrode pad 7 on the inner bottom surface of the cavity 4, the other extends along the stacking surface of the stack 2 and in the stacking surface thickness direction of the stack 2. It is connected to one of the formed via-hole conductors 12b, and is exposed to the outer peripheral surface of the laminated body 2 and connected to the surface electrode 11a on the other side of the via-hole conductors 12b.

【0030】キャビティ4は積層体2の主面に形成さ
れ、キャビティ4の内部の底面には電極パッド7が形成
されており、この電極パッド7に電子部品素子3aがA
uバンプ6を介してフリップチップ実装される。このキ
ャビティ4の開口部はキャビティ4を密閉すべく金属製
の蓋体5で封止している。蓋体5は、例えば、Au−S
n合金等が用いられ、キャビティ4に電子部品素子3a
を収容した後、N2ガス等の不活性ガスを充填した状態
でろう付けにより気密封止が行われる。
The cavity 4 is formed on the main surface of the laminated body 2, and an electrode pad 7 is formed on the bottom surface inside the cavity 4, and the electronic component element 3 a is formed on the electrode pad 7.
Flip chip mounting is performed via the u bump 6. The opening of the cavity 4 is sealed with a metallic lid 5 to seal the cavity 4. The lid 5 is, for example, Au-S.
n alloy or the like is used, and the electronic component element 3a
After housing, the airtight sealing is performed by brazing in a state of being filled with an inert gas such as N 2 gas.

【0031】外部配線導体11は、積層体2の主面にて
抵抗やコンデンサ素子等の電子部品素子3bが実装され
る表面電極11a、マザーボード(不図示)上の電極に
接続固定されるための裏面端子電極11b及び積層体2
端面の厚み方向に形成されている端面端子電極11cな
どからなる。
The external wiring conductor 11 is connected and fixed to the surface electrode 11a on the main surface of the laminate 2 on which the electronic component element 3b such as a resistor or capacitor element is mounted, or an electrode on a motherboard (not shown). Back surface terminal electrode 11b and laminated body 2
The end face terminal electrode 11c and the like are formed in the thickness direction of the end face.

【0032】これら外部配線導体11は 、その材質と
してAu、Cu、Agから選ばれる一種の金属成分10
0wt%に対して0.1〜1wt%のV25を含有して
おり、積層体2の外周に延出された内部配線導体12の
露出端を覆うようにして内部配線導体12と接続してい
る。
These external wiring conductors 11 are made of Au, Cu, or Ag, which is a kind of metal component 10.
It contains 0.1 to 1 wt% of V 2 O 5 with respect to 0 wt%, and is connected to the internal wiring conductor 12 so as to cover the exposed end of the internal wiring conductor 12 extended to the outer periphery of the laminate 2. is doing.

【0033】本発明の複合電子部品は以下のようにして
製造される。
The composite electronic component of the present invention is manufactured as follows.

【0034】即ち、誘電性セラミックグリーンシートを
用意し、各グリーンシートにキャビティ4の形状を規定
する貫通穴やビアホール導体12bが形成されるビアホ
ールとなる貫通穴をパンチング法により形成する。その
後、グリーンシート上に内部配線層12a、ビアホール
導体12b、端面接続導体12c、表面電極11a、裏
面端子電極11b、端面端子電極11cなどをスクリー
ン印刷法により形成する。そして、複数のグリーンシー
トを積層して積層体を形成し、一括同時焼成をおこなう
ことで集合積層体が形成される。その後、予めAuバン
プ6が形成された電子宇品素子3aをキャビティ4に収
容するとともに、N2ガス等の不活性ガスを充填した
後、蓋体5をろう付けにより接合される。そして、集合
積層体をブレイクやカッティング等の工法にて個々の積
層体2毎に分割することにより複合電子部品1が形成さ
れる。
That is, a dielectric ceramic green sheet is prepared, and a through hole that defines the shape of the cavity 4 and a through hole that becomes a via hole in which the via hole conductor 12b is formed is formed in each green sheet by a punching method. After that, the internal wiring layer 12a, the via-hole conductor 12b, the end face connecting conductor 12c, the front surface electrode 11a, the back surface terminal electrode 11b, the end surface terminal electrode 11c, etc. are formed on the green sheet by the screen printing method. Then, a plurality of green sheets are laminated to form a laminated body, and simultaneous co-firing is performed to form a collective laminated body. After that, the electronic component 3a having the Au bumps 6 formed in advance is housed in the cavity 4, filled with an inert gas such as N 2 gas, and then the lid 5 is joined by brazing. Then, the composite electronic component 1 is formed by dividing the collective laminated body into individual laminated bodies 2 by a method such as breaking or cutting.

【0035】このブレイクやカッティング工程において
積層体2に機械的応力が加わることは避けられない。
It is unavoidable that mechanical stress is applied to the laminate 2 during the breaking and cutting steps.

【0036】一方、電子部品素子3aとして弾性表面波
素子等を収納する場合、周波数精度を保ち安定した電気
特性を得るために、キャビティ4内はN2等の不活性ガ
スにて気密封止を施しており、キャビティ4内の気密性
を保つことが重要となる。
On the other hand, when accommodating a surface acoustic wave element or the like as the electronic component element 3a, the inside of the cavity 4 is hermetically sealed with an inert gas such as N 2 in order to maintain frequency accuracy and obtain stable electric characteristics. It is important to maintain the airtightness inside the cavity 4.

【0037】従って、本発明の第一の特徴は、積層体2
の外周面に形成した外部配線導体11は、Au、Cu、
Agから選ばれる一種の金属成分100wt%に対して
0.1〜1wt%、好ましくは0.3〜0.8wt%の
25を含有していることが必要である。即ち、この範
囲のV25の金属酸化物の粉末は、Au、Cu、Agな
どの金属粉末とガラスセラミック材料のガラス成分との
アンカー効果のスパイク構造をより強固にすることがで
きる。これは、Au、Cu、Agなどの金属粒子の凹凸
表面に、ガラスセラミック材料のガラス成分を安定に付
着させることができ、これにより、強固なアンカー効果
を長期にわたり維持し、積層体2と外部配線導体11と
の接合強度を向上させるものである。
Therefore, the first feature of the present invention is to provide the laminated body 2
The external wiring conductor 11 formed on the outer peripheral surface of Au, Cu,
It is necessary to contain 0.1 to 1 wt%, preferably 0.3 to 0.8 wt% of V 2 O 5 with respect to 100 wt% of one kind of metal component selected from Ag. That is, the powder of V 2 O 5 metal oxide in this range can further strengthen the spike structure of the anchor effect between the metal powder such as Au, Cu, and Ag and the glass component of the glass ceramic material. This allows the glass component of the glass-ceramic material to be stably adhered to the uneven surface of metal particles such as Au, Cu, Ag, etc., whereby a strong anchoring effect can be maintained for a long period of time and the laminate 2 and the outside The joint strength with the wiring conductor 11 is improved.

【0038】さらに、上述の含有量であれば、V2
5は、主に積層体2と外部配線導体11との界面部分に
作用するため、外部配線導体11の表面に析出すること
が少なく、外部配線導体11の表面において半田の濡れ
性を阻害することがない。
Further, if the content is the above, V 2 O
Since 5 acts mainly on the interface between the laminate 2 and the external wiring conductor 11, it is less likely to deposit on the surface of the external wiring conductor 11 and hinders the solder wettability on the surface of the external wiring conductor 11. There is no.

【0039】次に、本発明の第二の特徴は、積層体2内
部に形成した内部配線導体12はAg金属成分を主成分
とし、Ag金属成分100wt%に対して有機マグネシ
ウムと有機カルシウムから選ばれる少なくとも一種類の
有機金属を、0.1〜2wt%、好ましくは、0.5〜
1.5wt%含有した導電性ペーストを焼成することに
より形成していることである。
Next, the second feature of the present invention is that the internal wiring conductor 12 formed inside the laminated body 2 contains an Ag metal component as a main component, and is selected from organic magnesium and organic calcium with respect to 100 wt% of the Ag metal component. 0.1-2 wt%, preferably 0.5-
That is, it is formed by firing a conductive paste containing 1.5 wt%.

【0040】即ち、このような範囲の導電性ペーストが
用いられる内部配線導体12を積層体2と一括同時焼成
する場合において、Ag粒子間に有機マグネシウムや有
機カルシウムが拡散しAg粒子同士の接触を妨げる働き
をもつ。その結果、Agの焼結が抑制され焼結温度が高
くなり、Agとガラスセラミックとの焼結温度差が小さ
くなる。これにより、従来、両者の焼結収縮挙動差によ
って発生していた内部配線導体12と誘電体層との接合
界面でのクラックの発生を防止することができる。ま
た、有機マグネシウムまたは有機カルシウムの含有量が
0.1〜2wt%であれば、内部配線導体12の導体抵
抗も大きく増加することもない。
That is, when the internal wiring conductor 12 using the conductive paste in such a range is co-fired together with the laminate 2, organomagnesium or organocalcium diffuses between Ag particles and the Ag particles come into contact with each other. Has a function of hindering. As a result, the sintering of Ag is suppressed, the sintering temperature becomes high, and the difference in the sintering temperature between Ag and glass ceramic becomes small. As a result, it is possible to prevent the occurrence of cracks at the bonding interface between the internal wiring conductor 12 and the dielectric layer, which has been conventionally caused by the difference in sintering shrinkage behavior between the two. Further, if the content of the organic magnesium or the organic calcium is 0.1 to 2 wt%, the conductor resistance of the internal wiring conductor 12 will not be significantly increased.

【0041】[0041]

【実施例】〔実験例1〕本発明者は、外部配線導体11
にV25を含有することについて、その影響を調査し
た。まず、外部配線導体用ペーストにAgを金属成分と
するペーストを作成し、そのペーストにV25を表1に
示す量で含有させた。そして、基板材料であるガラスセ
ラミックからなる厚み200μmのグリーンシートに所
定の工法で印刷、積層、焼成、電子部品素子搭載、封
止、各積層体へのブレイクを行い8種類の試料を作成し
た。
[Experimental Example 1] The present inventor
The effect of containing V 2 O 5 in was investigated. First, a paste containing Ag as a metal component was prepared as the external wiring conductor paste, and V 2 O 5 was contained in the paste in the amounts shown in Table 1. Then, eight kinds of samples were prepared by printing, laminating, firing, mounting electronic component elements, encapsulating, and breaking each laminated body on a green sheet having a thickness of 200 μm made of glass ceramic as a substrate material by a predetermined method.

【0042】このようにして得られた試料をロジン系フ
ラックス溶液に浸漬した後、230℃の2%Ag入りS
n−Pb共晶半田浴中に浸漬し、外部配線導体11の表
面の半田濡れ性を調べた。半田濡れ性は、全表面面積に
対して90%以上の半田が付着しているものを「優良」
として、それ以下を「不可」とした。
The sample thus obtained was immersed in a rosin-based flux solution, and then S containing 2% Ag at 230 ° C.
It was dipped in an n-Pb eutectic solder bath, and the solder wettability of the surface of the external wiring conductor 11 was examined. Solder wettability is "excellent" when 90% or more of the solder is attached to the entire surface area.
As a result, the value below that was determined to be “impossible”.

【0043】また、接合強度については、2mm□の外
部配線導体11に0.6mmφの半田メッキ導線を半田
接合し、ピール法にて接合強度を測定した。また、気密
性の評価としてHeリーク試験機によるHeリークテス
トを行った。以上の半田濡れ性、接合強度、Heリーク
テストの結果を表1に示す。なお、判定としては、半田
濡れ性が優良でHeリークテストで不良の発生のないも
のを○とし、そのうち特に臨界点の試料を除いた試料を
◎とした。また、半田濡れ性が不可もしくはHeリーク
テストで不良の発生した試料を×とした。
Regarding the joint strength, a solder-plated conductor wire of 0.6 mmφ was soldered to the external wiring conductor 11 of 2 mm □, and the joint strength was measured by the peel method. A He leak test was conducted using a He leak tester as an evaluation of airtightness. Table 1 shows the results of the solder wettability, the bonding strength, and the He leak test. In addition, as a judgment, a sample having good solder wettability and no defect in the He leak test was evaluated as ◯, and a sample excluding the sample at the critical point was evaluated as ⊚. In addition, a sample in which the solder wettability was impossible or a defect occurred in the He leak test was marked with x.

【0044】[0044]

【表1】 [Table 1]

【0045】上述の表1から明らかなように、V25
含有量が0.05wt%以下であると、強固な接合強度
が得られず機械的な応力が加わったとき積層体2と外部
配線導体11の界面での剥離現象を防止することができ
ず、キャビティ4の気密性を維持することが困難にな
る。また、V25粉末の含有量が金属成分に対して1.
5wt%となると外部配線導体11の表面にV25が析
出し半田濡れ性を大きく阻害してしまうため外部配線導
体11として使用できなくなる。
As is clear from Table 1 above, when the content of V 2 O 5 is 0.05 wt% or less, a strong bonding strength cannot be obtained and a layered body 2 is formed when mechanical stress is applied. The peeling phenomenon at the interface of the external wiring conductor 11 cannot be prevented, and it becomes difficult to maintain the airtightness of the cavity 4. Further, the content of the V 2 O 5 powder is 1.
When it is 5 wt%, V 2 O 5 is deposited on the surface of the external wiring conductor 11 and greatly impairs the solder wettability, so that it cannot be used as the external wiring conductor 11.

【0046】従って、V25の含有量が0.1〜1wt
%の範囲、望ましくは0.3〜0.8wt%の範囲であ
れば、安定して積層体2と外部配線導体11との接合強
度を向上することができ、キャビティ4の気密性を保持
することができる。同時に、外部配線導体11の表面に
おいて半田の濡れ性を阻害することがないため電子部品
素子3bの実装性においても問題無く使用できる。な
お、上述の実験例は外部配線導体11の金属成分として
Agを使用したもので評価しているが、金属成分がCu
やAuであっても同様の結果が得られたことを付け加え
ておく。
Therefore, the content of V 2 O 5 is 0.1 to 1 wt.
%, Preferably 0.3 to 0.8 wt%, the bonding strength between the laminated body 2 and the external wiring conductor 11 can be stably improved, and the airtightness of the cavity 4 is maintained. be able to. At the same time, since the wettability of the solder is not hindered on the surface of the external wiring conductor 11, the electronic component element 3b can be used without any problem in mountability. In addition, although the above-mentioned experimental example evaluated using Ag as a metal component of the external wiring conductor 11, the metal component was Cu.
It should be added that similar results were obtained with Au and Au.

【0047】〔実験例2〕さらに本発明者は、内部配線
導体12に有機マグネシウムを含有する導電性ペースト
を使用することについて、その影響を調査した。まず、
内部配線導体用ペーストにAgを金属成分とするペース
トを作成し、そのペーストに有機マグネシウムを表2に
示す量で含有させた。そして、基板材料であるガラスセ
ラミックからなる厚み200μmのグリーンシートに所
定の工法で印刷、積層、焼成、電子部品素子搭載、封
止、各積層体へのブレイクを行い8種類の試料を作成し
た。
[Experimental Example 2] Further, the present inventor investigated the effect of using a conductive paste containing organic magnesium for the internal wiring conductor 12. First,
A paste containing Ag as a metal component was prepared as the internal wiring conductor paste, and organomagnesium was contained in the paste in an amount shown in Table 2. Then, eight kinds of samples were prepared by printing, laminating, firing, mounting electronic component elements, encapsulating, and breaking each laminated body on a green sheet having a thickness of 200 μm made of glass ceramic as a substrate material by a predetermined method.

【0048】上述のように作成した8種類の試料につい
て、内部配線導体12の導体抵抗の測定、及びHeリー
ク試験機にてHeリーク試験を行なうとともに内部配線
導体12と積層体2接合界面のクラックの有無を調べ
た。その結果を表2に示す。なお、判定としては、導体
抵抗5mΩ/□以下の低い値を示し、かつ、クラックの
発生およびHeリークテストにて不良の発生がないもの
を○とし、そのうち臨界点の試料を除いた試料を◎とし
た。また、導体抵抗が5mΩ/□を越えるか、もしくは
クラックの発生またはHeリークテストにて不良の発生
のある試料を×とした。
With respect to the eight kinds of samples prepared as described above, the conductor resistance of the internal wiring conductor 12 was measured, and the He leak test was carried out with a He leak tester, and cracks were observed at the interface between the internal wiring conductor 12 and the laminate 2. Was checked for. The results are shown in Table 2. In addition, as a judgment, a conductor showing a low value of 5 mΩ / □ or less and having no cracks and no defects in the He leak test was marked with ◯, and the sample excluding the sample at the critical point was evaluated as ◎. And A sample having a conductor resistance of more than 5 mΩ / □, or having a crack or a He leak test having a defect was designated as x.

【0049】[0049]

【表2】 [Table 2]

【0050】上述の表2から明らかなように、有機マグ
ネシウムの含有量が0.05wt%以下ではHeリーク
不良が発生しているが、有機マグネシウムの含有量が
0.1〜2wt%であればHeリーク不良の発生はなく
クラックの発生もない。また、有機マグネシウムの含有
量が3wt%になると導体抵抗が増加し複合電子部品と
しての電気特性が劣化してしまう。従って有機マグネシ
ウムの含有量が0.1〜2wt%において電気特性の劣
化を招くことなく気密性が保たれていることが確認さ
れ、好ましくは、有機マグネシウムの含有量が0.5〜
1.5wt%において安定した効果が期待できる。
As is clear from Table 2 above, when the content of organomagnesium is 0.05 wt% or less, the He leak defect occurs, but when the content of organomagnesium is 0.1 to 2 wt%. No He-leak defects and no cracks. Further, when the content of organomagnesium is 3 wt%, the conductor resistance increases and the electrical characteristics of the composite electronic component deteriorate. Therefore, it was confirmed that when the organomagnesium content is 0.1 to 2 wt%, the airtightness is maintained without causing the deterioration of the electrical characteristics, and the organomagnesium content is preferably 0.5 to
A stable effect can be expected at 1.5 wt%.

【0051】なお、上述の実験例は内部配線導体12と
して有機マグネシウムを含有した導電ペーストにて評価
しているが、有機マグネシウムの代わりに有機カルシウ
ムを含有した導電ペーストにおいても同様の結果が得ら
れたことを付け加えておく。
In the above experimental example, the conductive paste containing organomagnesium was used as the internal wiring conductor 12, but similar results were obtained with the conductive paste containing organocalcium instead of organomagnesium. I will add that.

【0052】[0052]

【発明の効果】以上のように本発明の複合電子部品によ
れば、積層体の外周面に形成した外部配線導体は、A
u、Cu、Agから選ばれる一種の金属成分100wt
%に対して0.1〜1wt%のV25を含有している。
これにより外部配線導体と積層体の誘電体層との接合強
度が向上し、キャビティの気密性が保たれる。その結
果、電気特性が劣化することなく、信頼性性能が優れ、
かつ、電子部品素子の実装性に優れた複合電子部品が得
られる。
As described above, according to the composite electronic component of the present invention, the external wiring conductor formed on the outer peripheral surface of the laminate is A
100wt of one kind of metal component selected from u, Cu and Ag
% Of V 2 O 5 is contained.
As a result, the bonding strength between the external wiring conductor and the dielectric layer of the laminate is improved, and the airtightness of the cavity is maintained. As a result, the electrical characteristics are not deteriorated, the reliability performance is excellent,
In addition, a composite electronic component having excellent mountability of the electronic component element can be obtained.

【0053】また、積層体内部に形成した内部配線導体
はAg金属成分を主成分とし、該Ag金属成分100w
t%に対して有機マグネシウムと有機カルシウムから選
ばれる少なくとも一種類の有機金属を0.1〜2wt%
含有した導電性ペーストを焼成することにより形成して
いる。これにより内部配線導体と積層体の誘電体層との
接合界面でのクラックの発生が無くなりキャビティの気
密性が保たれる。従って、電気特性が劣化することな
く、信頼性性能が優れた複合電子部品が得られる。
Further, the internal wiring conductor formed inside the laminated body contains the Ag metal component as the main component, and the Ag metal component 100 w
0.1 to 2 wt% of at least one kind of organometal selected from organomagnesium and organocalcium with respect to t%
It is formed by firing the contained conductive paste. As a result, cracks are not generated at the joint interface between the internal wiring conductor and the dielectric layer of the laminated body, and the airtightness of the cavity is maintained. Therefore, it is possible to obtain a composite electronic component having excellent reliability performance without deteriorating the electrical characteristics.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の複合電子部品の外観斜視図である。FIG. 1 is an external perspective view of a composite electronic component of the present invention.

【図2】本発明の複合電子部品の略断面図である。FIG. 2 is a schematic sectional view of a composite electronic component of the present invention.

【図3】従来の複合電子部品の略断面図である。FIG. 3 is a schematic cross-sectional view of a conventional composite electronic component.

【符号の説明】[Explanation of symbols]

1・・・・・弾性表面波装置 2・・・・・積層体 3a、3b・・・・・電子部品素子 4・・・・・キャビティ 5・・・・・金属蓋体 6・・・・・Auバンプ 7・・・・・電極パッド 11・・・・・外部配線導体 11a・・・・・表面電極 11b・・・・・裏面端子電極 11c・・・・・端面端子電極 12・・・・・内部配線導体 12a・・・・・内部配線層 12b・・・・・ビアホール導体 12c・・・・・端面接続導体 1 ... Surface acoustic wave device 2 ... Laminated body 3a, 3b ... Electronic component element 4 ... Cavity 5 ... Metal lid 6 ... Au bump 7: Electrode pad 11 ... External wiring conductor 11a: Surface electrode 11b: Rear surface terminal electrode 11c ... End face terminal electrode 12-Internal wiring conductor 12a ... Internal wiring layer 12b ... via-hole conductor 12c ... End face connecting conductor

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/46 H05K 3/46 S // H01L 23/04 H01L 23/04 E (72)発明者 黒山 浩信 鹿児島県国分市山下町1番1号 京セラ株 式会社鹿児島国分工場内 Fターム(参考) 4E351 AA07 AA19 BB01 BB24 BB26 BB31 CC12 CC22 DD04 DD05 DD06 DD28 DD31 EE03 EE27 GG01 5E336 AA08 AA13 BB03 BB18 BC26 BC32 BC34 CC32 CC44 CC51 DD28 EE05 GG14 5E346 AA12 AA15 AA35 AA60 BB01 CC18 CC32 CC38 CC39 DD02 DD34 EE24 EE28 FF45 GG03 GG06 GG40 HH11 HH21 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 3/46 H05K 3/46 S // H01L 23/04 H01L 23/04 E (72) Inventor Hironobu Kuroyama 1-1-1 Yamashita-cho, Kokubun-shi, Kagoshima F-term in Kyocera Kokubun Factory (reference) 4E351 AA07 AA19 BB01 BB24 BB26 BB31 CC12 CC22 DD04 DD05 DD06 DD28 DD31 EE03 EE27 GG01 5E336 AA08 AA13 BB03 BB34 CC32 BC32 BC32 BC32 CC51 DD28 EE05 GG14 5E346 AA12 AA15 AA35 AA60 BB01 CC18 CC32 CC38 CC39 DD02 DD34 EE24 EE28 FF45 GG03 GG06 GG40 HH11 HH21

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ガラス成分とセラミック成分を含む誘電体
層を複数積層した積層体と、 前記積層体の主面に形成したキャビティと、 前記キャビティ内部に形成した電極パッドと、 前記キャビティの開口を封止する蓋体と、 前記積層体の外周面に形成した外部配線導体と、 前記積層体内に形成した内部配線導体と、 前記キャビティ内の電極パッドに接続するように該キャ
ビティ内に収容される電子部品素子とを有し、 前記内部配線導体の一方が前記キャビティ内の前記電極
パッドに接続するとともに、他方が前記積層体の外周面
に露出し、該露出部を前記外部配線導体で被覆して成る
複合電子部品において、 前記外部配線導体は、Au、Cu、Agから選ばれる一
種の金属成分100wt%に対して0.1〜1wt%の
25を含有していることを特徴とする複合電子部品。
1. A laminated body in which a plurality of dielectric layers containing a glass component and a ceramic component are laminated, a cavity formed on the main surface of the laminated body, an electrode pad formed inside the cavity, and an opening of the cavity. A lid for sealing, an external wiring conductor formed on the outer peripheral surface of the laminate, an internal wiring conductor formed in the laminate, and an internal wiring conductor housed in the cavity so as to be connected to the electrode pad in the cavity. An electronic component element, one of the internal wiring conductors is connected to the electrode pad in the cavity, the other is exposed on the outer peripheral surface of the laminate, and the exposed portion is covered with the external wiring conductor. In the composite electronic component, the external wiring conductor contains 0.1 to 1 wt% of V 2 O 5 with respect to 100 wt% of one kind of metal component selected from Au, Cu, and Ag. A composite electronic component characterized by the following.
【請求項2】前記内部配線導体はAg金属成分を主成分
とし、該Ag金属成分100wt%に対して、有機マグ
ネシウムと有機カルシウムから選ばれる少なくとも一種
類の有機金属を0.1〜2wt%含有した導電性ペース
トを焼成することにより形成していることを特徴とする
請求項1記載の複合電子部品。
2. The internal wiring conductor contains an Ag metal component as a main component, and contains 0.1 to 2 wt% of at least one kind of organic metal selected from organic magnesium and organic calcium with respect to 100 wt% of the Ag metal component. The composite electronic component according to claim 1, wherein the composite electronic component is formed by firing the conductive paste.
JP2001388424A 2001-12-20 2001-12-20 Composite electronic component Pending JP2003188302A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001388424A JP2003188302A (en) 2001-12-20 2001-12-20 Composite electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001388424A JP2003188302A (en) 2001-12-20 2001-12-20 Composite electronic component

Publications (1)

Publication Number Publication Date
JP2003188302A true JP2003188302A (en) 2003-07-04

Family

ID=27596945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001388424A Pending JP2003188302A (en) 2001-12-20 2001-12-20 Composite electronic component

Country Status (1)

Country Link
JP (1) JP2003188302A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006059669A (en) * 2004-08-20 2006-03-02 Kyoto Elex Kk Conductive paste
JP2009212420A (en) * 2008-03-06 2009-09-17 Kyocera Corp Wiring board
JP2011138812A (en) * 2009-12-25 2011-07-14 Tdk Corp Power supply module

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006059669A (en) * 2004-08-20 2006-03-02 Kyoto Elex Kk Conductive paste
JP2009212420A (en) * 2008-03-06 2009-09-17 Kyocera Corp Wiring board
JP2011138812A (en) * 2009-12-25 2011-07-14 Tdk Corp Power supply module

Similar Documents

Publication Publication Date Title
CN107993985A (en) Electro part carrying substrate, electronic device and electronic module
JP5537119B2 (en) Lid, lid manufacturing method and electronic device manufacturing method
JP2003188302A (en) Composite electronic component
JP2009224651A (en) Wiring board and manufacturing process therefor
JP2627509B2 (en) Electronic component having conductive layer
CN218450784U (en) Ceramic packaging base and signal transmission terminal equipment
JP3464138B2 (en) Electronic component storage package
JP2942424B2 (en) Package for storing semiconductor elements
JPH11126797A (en) Connecting structure of wiring board
JP3464137B2 (en) Electronic component storage package
JP3359536B2 (en) Electronic component storage container
JP3792612B2 (en) Piezoelectric vibrator container and piezoelectric vibrator
JPH07202356A (en) Circuit board
JPH11111766A (en) Wiring board and its manufacture
JPH10139559A (en) Glass-ceramic substrate and its manufacture
JP3464136B2 (en) Electronic component storage package
KR100393592B1 (en) A conductive paste and intergarated circuit device using conductive paste
JP3464143B2 (en) Electronic component storage package
JP3318452B2 (en) Electronic component storage package
JPH07240655A (en) Surface mount crystal oscillator and manufacture therefor
JP2004179361A (en) Covering member and container for housing electronic components using the same
JP2842707B2 (en) Circuit board
JP3495247B2 (en) Electronic component storage container
JPH05222472A (en) Electronic parts with lead
JPH08204047A (en) Package for housing of electronic component

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040607

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050523

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050531

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050801

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050823