JP2003188078A - 基板乾燥装置 - Google Patents

基板乾燥装置

Info

Publication number
JP2003188078A
JP2003188078A JP2001386425A JP2001386425A JP2003188078A JP 2003188078 A JP2003188078 A JP 2003188078A JP 2001386425 A JP2001386425 A JP 2001386425A JP 2001386425 A JP2001386425 A JP 2001386425A JP 2003188078 A JP2003188078 A JP 2003188078A
Authority
JP
Japan
Prior art keywords
substrate
hot plate
supplied
drying apparatus
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001386425A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003188078A5 (enrdf_load_stackoverflow
Inventor
Takahiro Yamazaki
貴弘 山崎
Akihiro Shigeyama
昭宏 重山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP2001386425A priority Critical patent/JP2003188078A/ja
Publication of JP2003188078A publication Critical patent/JP2003188078A/ja
Publication of JP2003188078A5 publication Critical patent/JP2003188078A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001386425A 2001-12-19 2001-12-19 基板乾燥装置 Pending JP2003188078A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001386425A JP2003188078A (ja) 2001-12-19 2001-12-19 基板乾燥装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001386425A JP2003188078A (ja) 2001-12-19 2001-12-19 基板乾燥装置

Publications (2)

Publication Number Publication Date
JP2003188078A true JP2003188078A (ja) 2003-07-04
JP2003188078A5 JP2003188078A5 (enrdf_load_stackoverflow) 2005-07-28

Family

ID=27595581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001386425A Pending JP2003188078A (ja) 2001-12-19 2001-12-19 基板乾燥装置

Country Status (1)

Country Link
JP (1) JP2003188078A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009302139A (ja) * 2008-06-10 2009-12-24 Tokyo Electron Ltd 基板加熱装置
JP2010021396A (ja) * 2008-07-11 2010-01-28 Tokyo Electron Ltd 基板処理装置
JP2011124342A (ja) * 2009-12-09 2011-06-23 Tokyo Electron Ltd 基板処理装置、基板処理方法及びこの基板処理方法を実行させるためのプログラムを記録した記録媒体
WO2012114850A1 (ja) * 2011-02-24 2012-08-30 シャープ株式会社 塗布膜乾燥方法及び塗布膜乾燥装置
CN104110942A (zh) * 2013-04-16 2014-10-22 三星显示有限公司 膜干燥装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009302139A (ja) * 2008-06-10 2009-12-24 Tokyo Electron Ltd 基板加熱装置
JP2010021396A (ja) * 2008-07-11 2010-01-28 Tokyo Electron Ltd 基板処理装置
JP2011124342A (ja) * 2009-12-09 2011-06-23 Tokyo Electron Ltd 基板処理装置、基板処理方法及びこの基板処理方法を実行させるためのプログラムを記録した記録媒体
WO2012114850A1 (ja) * 2011-02-24 2012-08-30 シャープ株式会社 塗布膜乾燥方法及び塗布膜乾燥装置
CN104110942A (zh) * 2013-04-16 2014-10-22 三星显示有限公司 膜干燥装置
CN104110942B (zh) * 2013-04-16 2018-07-20 三星显示有限公司 膜干燥装置

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