JP2003162973A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003162973A5 JP2003162973A5 JP2002239396A JP2002239396A JP2003162973A5 JP 2003162973 A5 JP2003162973 A5 JP 2003162973A5 JP 2002239396 A JP2002239396 A JP 2002239396A JP 2002239396 A JP2002239396 A JP 2002239396A JP 2003162973 A5 JP2003162973 A5 JP 2003162973A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- ion beam
- focused ion
- processing
- angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 claims 15
- 238000000034 method Methods 0.000 claims 5
- 230000001678 irradiating effect Effects 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002239396A JP3820427B2 (ja) | 2002-08-20 | 2002-08-20 | 集束イオンビーム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002239396A JP3820427B2 (ja) | 2002-08-20 | 2002-08-20 | 集束イオンビーム装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9334657A Division JPH11167894A (ja) | 1997-12-04 | 1997-12-04 | 集束イオンビーム加工方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003162973A JP2003162973A (ja) | 2003-06-06 |
| JP2003162973A5 true JP2003162973A5 (enExample) | 2005-07-14 |
| JP3820427B2 JP3820427B2 (ja) | 2006-09-13 |
Family
ID=19196439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002239396A Expired - Fee Related JP3820427B2 (ja) | 2002-08-20 | 2002-08-20 | 集束イオンビーム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3820427B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11532454B2 (en) | 2018-11-12 | 2022-12-20 | Hitachi High-Tech Corporation | Imaging method and imaging system |
-
2002
- 2002-08-20 JP JP2002239396A patent/JP3820427B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101249134B1 (ko) | 하전 입자빔 장치 | |
| JP4932117B2 (ja) | 基板の断面の画像化装置 | |
| CN105388173A (zh) | 获取ebsp图样的方法 | |
| US8309920B2 (en) | Sample milling/observing apparatus and method of observing sample | |
| CN1565042A (zh) | 信息获取装置、截面评估装置、以及截面评估方法 | |
| JP5981744B2 (ja) | 試料観察方法、試料作製方法及び荷電粒子ビーム装置 | |
| JP2005114578A (ja) | 試料作製方法および試料作製装置ならびに試料観察装置 | |
| JP5851318B2 (ja) | 試料保持装置および試料解析装置 | |
| WO2016027895A1 (ja) | 3次元像構築方法、画像処理装置、および電子顕微鏡 | |
| WO2019240011A1 (ja) | 放射線検出装置、コンピュータプログラム及び位置決め方法 | |
| JP7030210B2 (ja) | 荷電粒子線装置および試料観察方法 | |
| JP2003162973A5 (enExample) | ||
| US12261013B2 (en) | Charged particle beam system and control method therefor | |
| KR102798397B1 (ko) | 하전 입자 빔 장치 및 제어 방법 | |
| TW202412045A (zh) | 電子顯微鏡和樣品的定向方法 | |
| JP2002150984A (ja) | 試料ホルダー | |
| JP2020518117A (ja) | 超高速信号ウォッシュアウトのための調整可能なサンプルフロア | |
| JP6775003B2 (ja) | 荷電粒子線装置 | |
| JP4845452B2 (ja) | 試料観察方法、及び荷電粒子線装置 | |
| JP2001077058A5 (enExample) | ||
| JP2019204780A (ja) | 電子顕微鏡 | |
| JP3820427B2 (ja) | 集束イオンビーム装置 | |
| JP4851365B2 (ja) | イオンミーリング試料作製装置用マスクおよび試料作製装置 | |
| JP2004301851A5 (enExample) | ||
| JP2012112770A (ja) | 試料保持方法及び試料保持体 |