JP2003156684A - 投影露光設備 - Google Patents

投影露光設備

Info

Publication number
JP2003156684A
JP2003156684A JP2002259725A JP2002259725A JP2003156684A JP 2003156684 A JP2003156684 A JP 2003156684A JP 2002259725 A JP2002259725 A JP 2002259725A JP 2002259725 A JP2002259725 A JP 2002259725A JP 2003156684 A JP2003156684 A JP 2003156684A
Authority
JP
Japan
Prior art keywords
optical
projection
group
components
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002259725A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003156684A5 (enExample
Inventor
Bernhard Kneer
ベルンハルト・ニール
Gerald Richter
ゲラルト・リヒター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of JP2003156684A publication Critical patent/JP2003156684A/ja
Publication of JP2003156684A5 publication Critical patent/JP2003156684A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002259725A 2001-09-05 2002-09-05 投影露光設備 Pending JP2003156684A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10143385A DE10143385C2 (de) 2001-09-05 2001-09-05 Projektionsbelichtungsanlage
DE10143385.9 2001-09-05

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008243032A Division JP2009037251A (ja) 2001-09-05 2008-09-22 投影露光設備

Publications (2)

Publication Number Publication Date
JP2003156684A true JP2003156684A (ja) 2003-05-30
JP2003156684A5 JP2003156684A5 (enExample) 2005-10-27

Family

ID=7697717

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2002259725A Pending JP2003156684A (ja) 2001-09-05 2002-09-05 投影露光設備
JP2008243032A Pending JP2009037251A (ja) 2001-09-05 2008-09-22 投影露光設備

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008243032A Pending JP2009037251A (ja) 2001-09-05 2008-09-22 投影露光設備

Country Status (6)

Country Link
US (3) US20030063268A1 (enExample)
EP (1) EP1291719B1 (enExample)
JP (2) JP2003156684A (enExample)
KR (1) KR100939423B1 (enExample)
DE (2) DE10143385C2 (enExample)
TW (1) TW569038B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007529762A (ja) * 2003-12-19 2007-10-25 カール ツァイス エスエムテー アクチエンゲゼルシャフト 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
JP2015526755A (ja) * 2012-06-29 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための投影露光装置

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002287023A (ja) * 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE102004035595B4 (de) 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
TWI454731B (zh) * 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
KR101408483B1 (ko) * 2006-11-30 2014-06-17 칼 짜이스 에스엠티 게엠베하 투영 대물렌즈를 제조하는 방법 및 상기 방법으로 제조된 투영 대물렌즈
EP1927890A1 (en) * 2006-11-30 2008-06-04 Carl Zeiss SMT AG Method of manufacturing a projection objective and projection objective manufactured by that method
JP5329520B2 (ja) * 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
DE102008001497A1 (de) 2007-05-07 2008-11-13 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage
DE102009029673A1 (de) 2009-09-22 2010-11-25 Carl Zeiss Smt Ag Manipulator zur Positionierung eines optischen Elementes in mehreren räumlichen Freiheitsgraden
DE102010029651A1 (de) 2010-06-02 2011-12-08 Carl Zeiss Smt Gmbh Verfahren zum Betrieb einer Projektionsbelichtungsanlage für die Mikrolithographie mit Korrektur von durch rigorose Effekte der Maske induzierten Abbildungsfehlern
JP5661172B2 (ja) 2010-04-23 2015-01-28 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ系の光学要素の操作を含むリソグラフィ系を作動させる方法
JP2011237588A (ja) * 2010-05-10 2011-11-24 Sony Corp ズームレンズ及び撮像装置
DE102011080437A1 (de) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
CN102486569B (zh) * 2010-12-01 2014-06-18 上海微电子装备有限公司 一种投影物镜系统
WO2012163643A1 (de) 2011-05-30 2012-12-06 Carl Zeiss Smt Gmbh Bewegung eines optischen elements in einer mikrolithografischen projektionsbelichtungsanlage
TWI476442B (zh) * 2013-02-26 2015-03-11 Sintai Optical Shenzhen Co Ltd 變焦鏡頭
DE102015206448B4 (de) 2015-04-10 2018-06-21 Carl Zeiss Smt Gmbh Steuerungsvorrichtung zur Steuerung mindestens eines Manipulators eines Projektionsobjektives, Justieranlage und Verfahren zum Steuern mindestens eines Manipulators
CN114415351B (zh) * 2022-01-17 2022-08-19 东莞市融光光学有限公司 一种玻塑混合镜头
CN120949423A (zh) * 2025-10-16 2025-11-14 沈阳中一光学科技有限公司 一种小型化大光圈无反镜头

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4065722A (en) * 1976-12-27 1977-12-27 Glenayre Electronics, Ltd. Demodulation method and circuit for discretely modulated ac signals
WO1986000427A1 (en) * 1984-06-21 1986-01-16 American Telephone & Telegraph Company Deep-uv lithography
JPH0690361B2 (ja) * 1984-10-18 1994-11-14 オリンパス光学工業株式会社 ズ−ムレンズ
JPH0820599B2 (ja) * 1985-05-11 1996-03-04 株式会社ニコン ズームレンズ
JPS62235916A (ja) * 1986-04-07 1987-10-16 Fuji Photo Film Co Ltd ズ−ムレンズ
JP2897345B2 (ja) * 1990-05-25 1999-05-31 キヤノン株式会社 投影露光装置
JP3243818B2 (ja) * 1992-02-14 2002-01-07 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
US5226186A (en) * 1992-07-06 1993-07-13 Dennis Boyd Waterbed mattress with draining system
JPH06349703A (ja) * 1993-06-11 1994-12-22 Nikon Corp 投影露光装置
JPH07270685A (ja) * 1994-03-29 1995-10-20 Nikon Corp ズームレンズ
JPH0817719A (ja) * 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
US5930032A (en) * 1994-12-22 1999-07-27 Asahi Kogaku Kogyo Kabushiki Kaisha UV image forming optical system and lens for UV radiation
JP3445045B2 (ja) * 1994-12-29 2003-09-08 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3893626B2 (ja) * 1995-01-25 2007-03-14 株式会社ニコン 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法
US5831700A (en) * 1995-05-19 1998-11-03 Kent State University Polymer stabilized four domain twisted nematic liquid crystal display
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
US6061180A (en) * 1996-10-29 2000-05-09 Canon Kabushiki Kaisha Zoom lens
JP3365606B2 (ja) * 1997-01-30 2003-01-14 富士写真光機株式会社 赤外線ズームレンズ
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11307415A (ja) * 1998-04-16 1999-11-05 Nikon Corp 露光方法および露光装置
US7112772B2 (en) * 1998-05-29 2006-09-26 Carl Zeiss Smt Ag Catadioptric projection objective with adaptive mirror and projection exposure method
US6256086B1 (en) * 1998-10-06 2001-07-03 Canon Kabushiki Kaisha Projection exposure apparatus, and device manufacturing method
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
JP3862497B2 (ja) * 2000-11-10 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
JP2002287023A (ja) * 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007529762A (ja) * 2003-12-19 2007-10-25 カール ツァイス エスエムテー アクチエンゲゼルシャフト 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
JP2015526755A (ja) * 2012-06-29 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための投影露光装置

Also Published As

Publication number Publication date
KR20030021127A (ko) 2003-03-12
DE10143385A1 (de) 2003-04-03
US20070171539A1 (en) 2007-07-26
DE50211190D1 (de) 2007-12-27
US20060170897A1 (en) 2006-08-03
EP1291719A1 (de) 2003-03-12
JP2009037251A (ja) 2009-02-19
US7457043B2 (en) 2008-11-25
KR100939423B1 (ko) 2010-01-28
US7408621B2 (en) 2008-08-05
EP1291719B1 (de) 2007-11-14
US20030063268A1 (en) 2003-04-03
TW569038B (en) 2004-01-01
DE10143385C2 (de) 2003-07-17

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