JP2003151263A - 磁気的に軟らかい基準層を有する磁気抵抗素子のための読出し方法 - Google Patents
磁気的に軟らかい基準層を有する磁気抵抗素子のための読出し方法Info
- Publication number
- JP2003151263A JP2003151263A JP2002273429A JP2002273429A JP2003151263A JP 2003151263 A JP2003151263 A JP 2003151263A JP 2002273429 A JP2002273429 A JP 2002273429A JP 2002273429 A JP2002273429 A JP 2002273429A JP 2003151263 A JP2003151263 A JP 2003151263A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- line
- read
- magnetic
- magnetization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 230000005415 magnetization Effects 0.000 claims abstract description 52
- 230000015654 memory Effects 0.000 abstract description 23
- 239000010410 layer Substances 0.000 description 152
- 230000005291 magnetic effect Effects 0.000 description 105
- 239000004020 conductor Substances 0.000 description 39
- 238000010586 diagram Methods 0.000 description 23
- 230000004888 barrier function Effects 0.000 description 20
- 239000013598 vector Substances 0.000 description 19
- 230000005294 ferromagnetic effect Effects 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- 230000007704 transition Effects 0.000 description 11
- 239000003302 ferromagnetic material Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000003071 parasitic effect Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000005293 ferrimagnetic effect Effects 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 230000005641 tunneling Effects 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910018404 Al2 O3 Inorganic materials 0.000 description 1
- 241001676573 Minium Species 0.000 description 1
- KGWWEXORQXHJJQ-UHFFFAOYSA-N [Fe].[Co].[Ni] Chemical compound [Fe].[Co].[Ni] KGWWEXORQXHJJQ-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- FQMNUIZEFUVPNU-UHFFFAOYSA-N cobalt iron Chemical compound [Fe].[Co].[Co] FQMNUIZEFUVPNU-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000006880 cross-coupling reaction Methods 0.000 description 1
- 230000009089 cytolysis Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000002902 ferrimagnetic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000009813 interlayer exchange coupling reaction Methods 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006403 short-term memory Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
- G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/963,851 US6538917B1 (en) | 2001-09-25 | 2001-09-25 | Read methods for magneto-resistive device having soft reference layer |
| US09/963851 | 2001-09-25 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007233234A Division JP4658102B2 (ja) | 2001-09-25 | 2007-09-07 | 磁気的に軟らかい基準層を有する磁気抵抗素子のための読出し方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003151263A true JP2003151263A (ja) | 2003-05-23 |
| JP2003151263A5 JP2003151263A5 (enExample) | 2005-04-28 |
Family
ID=25507809
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002273429A Withdrawn JP2003151263A (ja) | 2001-09-25 | 2002-09-19 | 磁気的に軟らかい基準層を有する磁気抵抗素子のための読出し方法 |
| JP2007233234A Expired - Fee Related JP4658102B2 (ja) | 2001-09-25 | 2007-09-07 | 磁気的に軟らかい基準層を有する磁気抵抗素子のための読出し方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007233234A Expired - Fee Related JP4658102B2 (ja) | 2001-09-25 | 2007-09-07 | 磁気的に軟らかい基準層を有する磁気抵抗素子のための読出し方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6538917B1 (enExample) |
| EP (1) | EP1296331A3 (enExample) |
| JP (2) | JP2003151263A (enExample) |
| KR (1) | KR20030027689A (enExample) |
| CN (1) | CN1307643C (enExample) |
| TW (1) | TWI263216B (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004179192A (ja) * | 2002-11-22 | 2004-06-24 | Toshiba Corp | 磁気ランダムアクセスメモリ |
| JP2005129956A (ja) * | 2003-10-24 | 2005-05-19 | Hewlett-Packard Development Co Lp | 軟らかい基準層を有する磁気メモリセル |
| JP2008091015A (ja) * | 2003-07-07 | 2008-04-17 | Samsung Electronics Co Ltd | メモリセルの読み出し動作を実行する方法 |
| JP2011023100A (ja) * | 2009-07-13 | 2011-02-03 | Crocus Technology Sa | 自己参照磁気ランダムアクセスメモリセル |
| JP2012510729A (ja) * | 2008-12-02 | 2012-05-10 | シーゲイト テクノロジー エルエルシー | 固定されていない基準層および一方向書込電流を有するスピントルクビットセル |
| JP2013093558A (ja) * | 2011-09-28 | 2013-05-16 | Crocus Technology Sa | 自己参照読み出し操作を使用してmramセルに書き込み及びmramセルを読み出すための磁気ランダムアクセスメモリ(mram)セル及び方法 |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6795281B2 (en) * | 2001-09-25 | 2004-09-21 | Hewlett-Packard Development Company, L.P. | Magneto-resistive device including soft synthetic ferrimagnet reference layer |
| JP2003151262A (ja) * | 2001-11-15 | 2003-05-23 | Toshiba Corp | 磁気ランダムアクセスメモリ |
| DE10158795B4 (de) * | 2001-11-30 | 2005-12-22 | Infineon Technologies Ag | Magnetoresistive Speicherzelle mit dynamischer Referenzschicht |
| JP3866567B2 (ja) * | 2001-12-13 | 2007-01-10 | 株式会社東芝 | 半導体記憶装置及びその製造方法 |
| KR100408421B1 (ko) * | 2002-01-16 | 2003-12-03 | 삼성전자주식회사 | 서브-어레이의 개수에 관계없이 계층형 입출력 라인구조를 가지는 반도체 메모리 장치 |
| US6683806B2 (en) * | 2002-03-26 | 2004-01-27 | Micron Technology, Inc. | Methods of operating MRAM devices |
| US6687179B2 (en) * | 2002-04-10 | 2004-02-03 | Micron Technology, Inc. | Method and system for writing data in an MRAM memory device |
| US6724652B2 (en) * | 2002-05-02 | 2004-04-20 | Micron Technology, Inc. | Low remanence flux concentrator for MRAM devices |
| US6780653B2 (en) * | 2002-06-06 | 2004-08-24 | Micron Technology, Inc. | Methods of forming magnetoresistive memory device assemblies |
| US6683815B1 (en) * | 2002-06-26 | 2004-01-27 | Silicon Magnetic Systems | Magnetic memory cell and method for assigning tunable writing currents |
| US20050195673A1 (en) * | 2002-07-15 | 2005-09-08 | Yoshiaki Asao | Magnetic random access memory having memory cells configured by use of tunneling magnetoresistive elements |
| US6850433B2 (en) * | 2002-07-15 | 2005-02-01 | Hewlett-Packard Development Company, Lp. | Magnetic memory device and method |
| US6914805B2 (en) * | 2002-08-21 | 2005-07-05 | Micron Technology, Inc. | Method for building a magnetic keeper or flux concentrator used for writing magnetic bits on a MRAM device |
| US6577529B1 (en) * | 2002-09-03 | 2003-06-10 | Hewlett-Packard Development Company, L.P. | Multi-bit magnetic memory device |
| JP3788964B2 (ja) | 2002-09-10 | 2006-06-21 | 株式会社東芝 | 磁気ランダムアクセスメモリ |
| US7002228B2 (en) * | 2003-02-18 | 2006-02-21 | Micron Technology, Inc. | Diffusion barrier for improving the thermal stability of MRAM devices |
| JP2004296000A (ja) * | 2003-03-27 | 2004-10-21 | Hitachi Ltd | 磁気抵抗効果型ヘッド、及びその製造方法 |
| US7161875B2 (en) * | 2003-06-12 | 2007-01-09 | Hewlett-Packard Development Company, L.P. | Thermal-assisted magnetic memory storage device |
| US6819587B1 (en) * | 2003-06-12 | 2004-11-16 | Hewlett-Packard Development Company, L.P. | Thermal-assisted nanotip magnetic memory storage device |
| US6885582B2 (en) * | 2003-06-12 | 2005-04-26 | Hewlett-Packard Development Company, L.P. | Magnetic memory storage device |
| US6836422B1 (en) * | 2003-07-07 | 2004-12-28 | Hewlett-Packard Development Company, L.P. | System and method for reading a memory cell |
| US7598555B1 (en) | 2003-08-22 | 2009-10-06 | International Business Machines Corporation | MgO tunnel barriers and method of formation |
| US7274080B1 (en) | 2003-08-22 | 2007-09-25 | International Business Machines Corporation | MgO-based tunnel spin injectors |
| US7027320B2 (en) * | 2003-10-21 | 2006-04-11 | Hewlett-Packard Development Company, L.P. | Soft-reference magnetic memory digitized device and method of operation |
| US7286378B2 (en) * | 2003-11-04 | 2007-10-23 | Micron Technology, Inc. | Serial transistor-cell array architecture |
| US7064970B2 (en) * | 2003-11-04 | 2006-06-20 | Micron Technology, Inc. | Serial transistor-cell array architecture |
| US7026673B2 (en) * | 2003-12-11 | 2006-04-11 | International Business Machines Corporation | Low magnetization materials for high performance magnetic memory devices |
| US7252852B1 (en) | 2003-12-12 | 2007-08-07 | International Business Machines Corporation | Mg-Zn oxide tunnel barriers and method of formation |
| US6980466B2 (en) * | 2004-01-15 | 2005-12-27 | Hewlett-Packard Development Company, L.P. | Soft-reference four conductor magnetic memory storage device |
| US7102920B2 (en) * | 2004-03-23 | 2006-09-05 | Hewlett-Packard Development Company, L.P. | Soft-reference three conductor magnetic memory storage device |
| US7339813B2 (en) * | 2004-09-30 | 2008-03-04 | Sharp Laboratories Of America, Inc. | Complementary output resistive memory cell |
| US20090218559A1 (en) * | 2008-02-29 | 2009-09-03 | Ulrich Klostermann | Integrated Circuit, Memory Cell Array, Memory Module, and Method of Manufacturing an Integrated Circuit |
| US7760542B2 (en) | 2008-04-21 | 2010-07-20 | Seagate Technology Llc | Spin-torque memory with unidirectional write scheme |
| US7751231B2 (en) * | 2008-05-05 | 2010-07-06 | Qimonda Ag | Method and integrated circuit for determining the state of a resistivity changing memory cell |
| US8233319B2 (en) | 2008-07-18 | 2012-07-31 | Seagate Technology Llc | Unipolar spin-transfer switching memory unit |
| US7933137B2 (en) | 2008-10-08 | 2011-04-26 | Seagate Teachnology Llc | Magnetic random access memory (MRAM) utilizing magnetic flip-flop structures |
| US7933146B2 (en) | 2008-10-08 | 2011-04-26 | Seagate Technology Llc | Electronic devices utilizing spin torque transfer to flip magnetic orientation |
| US9047945B2 (en) * | 2012-10-15 | 2015-06-02 | Marvell World Trade Ltd. | Systems and methods for reading resistive random access memory (RRAM) cells |
| KR20140052676A (ko) | 2012-10-25 | 2014-05-07 | 삼성디스플레이 주식회사 | 터치 센싱 패널의 제조 방법 |
| US10170162B2 (en) * | 2017-05-23 | 2019-01-01 | Sandisk Technologies Llc | Sense amplifier calibration |
| US11605409B2 (en) | 2020-10-27 | 2023-03-14 | International Business Machines Corporation | MTJ-based analog memory device |
| US11664059B2 (en) | 2021-06-02 | 2023-05-30 | International Business Machines Corporation | Low power MTJ-based analog memory device |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4455626A (en) * | 1983-03-21 | 1984-06-19 | Honeywell Inc. | Thin film memory with magnetoresistive read-out |
| JP2774243B2 (ja) * | 1994-05-27 | 1998-07-09 | 富士通株式会社 | 記憶装置 |
| US5587943A (en) * | 1995-02-13 | 1996-12-24 | Integrated Microtransducer Electronics Corporation | Nonvolatile magnetoresistive memory with fully closed flux operation |
| JPH09306160A (ja) * | 1996-05-09 | 1997-11-28 | Oki Electric Ind Co Ltd | 磁気メモリ素子および情報記憶装置 |
| US6169686B1 (en) * | 1997-11-20 | 2001-01-02 | Hewlett-Packard Company | Solid-state memory with magnetic storage cells |
| US6262625B1 (en) * | 1999-10-29 | 2001-07-17 | Hewlett-Packard Co | Operational amplifier with digital offset calibration |
| US6259644B1 (en) * | 1997-11-20 | 2001-07-10 | Hewlett-Packard Co | Equipotential sense methods for resistive cross point memory cell arrays |
| US5946227A (en) * | 1998-07-20 | 1999-08-31 | Motorola, Inc. | Magnetoresistive random access memory with shared word and digit lines |
| US6034887A (en) * | 1998-08-05 | 2000-03-07 | International Business Machines Corporation | Non-volatile magnetic memory cell and devices |
| US6072717A (en) * | 1998-09-04 | 2000-06-06 | Hewlett Packard | Stabilized magnetic memory cell |
| US6436526B1 (en) * | 1999-06-17 | 2002-08-20 | Matsushita Electric Industrial Co., Ltd. | Magneto-resistance effect element, magneto-resistance effect memory cell, MRAM and method for performing information write to or read from the magneto-resistance effect memory cell |
| US6134138A (en) * | 1999-07-30 | 2000-10-17 | Honeywell Inc. | Method and apparatus for reading a magnetoresistive memory |
| JP2001067862A (ja) * | 1999-09-01 | 2001-03-16 | Sanyo Electric Co Ltd | 磁気メモリ素子 |
| US6611405B1 (en) * | 1999-09-16 | 2003-08-26 | Kabushiki Kaisha Toshiba | Magnetoresistive element and magnetic memory device |
| US6404674B1 (en) * | 2001-04-02 | 2002-06-11 | Hewlett Packard Company Intellectual Property Administrator | Cladded read-write conductor for a pinned-on-the-fly soft reference layer |
| US6466471B1 (en) * | 2001-05-29 | 2002-10-15 | Hewlett-Packard Company | Low power MRAM memory array |
-
2001
- 2001-09-25 US US09/963,851 patent/US6538917B1/en not_active Expired - Lifetime
-
2002
- 2002-08-07 TW TW091117781A patent/TWI263216B/zh not_active IP Right Cessation
- 2002-09-02 EP EP02256084A patent/EP1296331A3/en not_active Withdrawn
- 2002-09-19 JP JP2002273429A patent/JP2003151263A/ja not_active Withdrawn
- 2002-09-24 KR KR1020020057725A patent/KR20030027689A/ko not_active Ceased
- 2002-09-24 CN CNB021323445A patent/CN1307643C/zh not_active Expired - Lifetime
-
2007
- 2007-09-07 JP JP2007233234A patent/JP4658102B2/ja not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004179192A (ja) * | 2002-11-22 | 2004-06-24 | Toshiba Corp | 磁気ランダムアクセスメモリ |
| JP2008091015A (ja) * | 2003-07-07 | 2008-04-17 | Samsung Electronics Co Ltd | メモリセルの読み出し動作を実行する方法 |
| JP2005129956A (ja) * | 2003-10-24 | 2005-05-19 | Hewlett-Packard Development Co Lp | 軟らかい基準層を有する磁気メモリセル |
| JP2012510729A (ja) * | 2008-12-02 | 2012-05-10 | シーゲイト テクノロジー エルエルシー | 固定されていない基準層および一方向書込電流を有するスピントルクビットセル |
| JP2011023100A (ja) * | 2009-07-13 | 2011-02-03 | Crocus Technology Sa | 自己参照磁気ランダムアクセスメモリセル |
| JP2013093558A (ja) * | 2011-09-28 | 2013-05-16 | Crocus Technology Sa | 自己参照読み出し操作を使用してmramセルに書き込み及びmramセルを読み出すための磁気ランダムアクセスメモリ(mram)セル及び方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20030027689A (ko) | 2003-04-07 |
| US6538917B1 (en) | 2003-03-25 |
| EP1296331A2 (en) | 2003-03-26 |
| US20030058685A1 (en) | 2003-03-27 |
| JP4658102B2 (ja) | 2011-03-23 |
| EP1296331A3 (en) | 2003-12-03 |
| CN1409321A (zh) | 2003-04-09 |
| TWI263216B (en) | 2006-10-01 |
| CN1307643C (zh) | 2007-03-28 |
| JP2008059746A (ja) | 2008-03-13 |
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