JP2003147337A5 - - Google Patents
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- Publication number
- JP2003147337A5 JP2003147337A5 JP2002132738A JP2002132738A JP2003147337A5 JP 2003147337 A5 JP2003147337 A5 JP 2003147337A5 JP 2002132738 A JP2002132738 A JP 2002132738A JP 2002132738 A JP2002132738 A JP 2002132738A JP 2003147337 A5 JP2003147337 A5 JP 2003147337A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing composition
- composition according
- acid
- abrasive grains
- inorganic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims 18
- 239000006061 abrasive grain Substances 0.000 claims 5
- 150000007522 mineralic acids Chemical class 0.000 claims 5
- 239000007800 oxidant agent Substances 0.000 claims 3
- 150000003839 salts Chemical class 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical group OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 150000002978 peroxides Chemical class 0.000 claims 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 2
- 239000011574 phosphorus Substances 0.000 claims 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 239000012736 aqueous medium Substances 0.000 claims 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims 1
- 239000004327 boric acid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 150000002823 nitrates Chemical class 0.000 claims 1
- 229910017604 nitric acid Inorganic materials 0.000 claims 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 229960001922 sodium perborate Drugs 0.000 claims 1
- YKLJGMBLPUQQOI-UHFFFAOYSA-M sodium;oxidooxy(oxo)borane Chemical group [Na+].[O-]OB=O YKLJGMBLPUQQOI-UHFFFAOYSA-M 0.000 claims 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002132738A JP4074126B2 (ja) | 2001-09-03 | 2002-05-08 | 研磨用組成物 |
| AU2002334406A AU2002334406A1 (en) | 2001-09-03 | 2002-09-03 | Polishing composition |
| EP02797709A EP1425357A1 (en) | 2001-09-03 | 2002-09-03 | Polishing composition |
| US10/488,296 US20050028449A1 (en) | 2001-09-03 | 2002-09-03 | Polishing composition |
| PCT/JP2002/008925 WO2003020839A1 (en) | 2001-09-03 | 2002-09-03 | Polishing composition |
| CN 02819416 CN1561376A (zh) | 2001-09-03 | 2002-09-03 | 抛光组合物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-266315 | 2001-09-03 | ||
| JP2001266315 | 2001-09-03 | ||
| JP2002132738A JP4074126B2 (ja) | 2001-09-03 | 2002-05-08 | 研磨用組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003147337A JP2003147337A (ja) | 2003-05-21 |
| JP2003147337A5 true JP2003147337A5 (enExample) | 2005-09-22 |
| JP4074126B2 JP4074126B2 (ja) | 2008-04-09 |
Family
ID=26621559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002132738A Expired - Lifetime JP4074126B2 (ja) | 2001-09-03 | 2002-05-08 | 研磨用組成物 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4074126B2 (enExample) |
| CN (1) | CN1561376A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005001018A (ja) * | 2003-06-09 | 2005-01-06 | Kao Corp | 基板の製造方法 |
| JP4986099B2 (ja) * | 2003-06-09 | 2012-07-25 | 花王株式会社 | 基板の製造方法 |
| JP4202201B2 (ja) * | 2003-07-03 | 2008-12-24 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
| DE102006007888A1 (de) * | 2006-02-21 | 2007-08-23 | Degussa Gmbh | Aluminiumoxid enthaltende Dispersion, Zubereitung enthaltend diese Dispersion und ein Melaminharz und mittels dieser Zubereitung hergestelles gehärtetes Produkt |
| JP2008080486A (ja) * | 2007-10-04 | 2008-04-10 | Kao Corp | 磁気ディスク用研磨用キット |
| JP7061859B2 (ja) * | 2017-09-29 | 2022-05-02 | 株式会社フジミインコーポレーテッド | 研磨用組成物および磁気ディスク基板の製造方法 |
-
2002
- 2002-05-08 JP JP2002132738A patent/JP4074126B2/ja not_active Expired - Lifetime
- 2002-09-03 CN CN 02819416 patent/CN1561376A/zh active Pending
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