JP2003129239A5 - - Google Patents
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- Publication number
- JP2003129239A5 JP2003129239A5 JP2001328980A JP2001328980A JP2003129239A5 JP 2003129239 A5 JP2003129239 A5 JP 2003129239A5 JP 2001328980 A JP2001328980 A JP 2001328980A JP 2001328980 A JP2001328980 A JP 2001328980A JP 2003129239 A5 JP2003129239 A5 JP 2003129239A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- shape
- antenna cover
- antenna
- height difference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- 238000003672 processing method Methods 0.000 claims description 8
- 239000010453 quartz Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 5
- 238000003754 machining Methods 0.000 claims description 3
- 238000005422 blasting Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000000428 dust Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 238000000926 separation method Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001328980A JP3897566B2 (ja) | 2001-10-26 | 2001-10-26 | プラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001328980A JP3897566B2 (ja) | 2001-10-26 | 2001-10-26 | プラズマ処理方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006238705A Division JP2006339673A (ja) | 2006-09-04 | 2006-09-04 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003129239A JP2003129239A (ja) | 2003-05-08 |
| JP2003129239A5 true JP2003129239A5 (enrdf_load_html_response) | 2005-01-27 |
| JP3897566B2 JP3897566B2 (ja) | 2007-03-28 |
Family
ID=19144954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001328980A Expired - Fee Related JP3897566B2 (ja) | 2001-10-26 | 2001-10-26 | プラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3897566B2 (enrdf_load_html_response) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050233477A1 (en) | 2004-03-05 | 2005-10-20 | Tokyo Electron Limited | Substrate processing apparatus, substrate processing method, and program for implementing the method |
| JP5080724B2 (ja) * | 2004-03-05 | 2012-11-21 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及びプログラム |
| US7755561B2 (en) * | 2006-03-17 | 2010-07-13 | ConcealFab Corporation | Antenna concealment assembly |
| JP7275927B2 (ja) * | 2019-06-28 | 2023-05-18 | 日新電機株式会社 | スパッタ装置の使用方法 |
-
2001
- 2001-10-26 JP JP2001328980A patent/JP3897566B2/ja not_active Expired - Fee Related
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