JP2003055408A5 - - Google Patents
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- Publication number
- JP2003055408A5 JP2003055408A5 JP2002164543A JP2002164543A JP2003055408A5 JP 2003055408 A5 JP2003055408 A5 JP 2003055408A5 JP 2002164543 A JP2002164543 A JP 2002164543A JP 2002164543 A JP2002164543 A JP 2002164543A JP 2003055408 A5 JP2003055408 A5 JP 2003055408A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- group
- substituted
- alkyl
- following formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 48
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 229910052799 carbon Inorganic materials 0.000 claims description 15
- -1 poly (2,6-difluoro-α-methyl benzyl Chemical group 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 229910052794 bromium Inorganic materials 0.000 claims description 12
- 229910052801 chlorine Inorganic materials 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 229910052740 iodine Inorganic materials 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- XFAXEAOMMYLTOW-UHFFFAOYSA-N 1-(2,6-difluorophenyl)ethyl prop-2-enoate Chemical group C(C=C)(=O)OC(C1=C(C=CC=C1F)F)C XFAXEAOMMYLTOW-UHFFFAOYSA-N 0.000 claims description 11
- 229910052736 halogen Inorganic materials 0.000 claims description 11
- 150000002367 halogens Chemical class 0.000 claims description 11
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000006116 polymerization reaction Methods 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- NTVRUFJMQBEYGP-UHFFFAOYSA-N 1,1,2,4,4,4-hexafluorobutyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC(F)(F)C(CC(F)(F)F)F)CC1C=C2 NTVRUFJMQBEYGP-UHFFFAOYSA-N 0.000 claims description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 6
- 125000001033 ether group Chemical group 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 6
- 239000000178 monomer Substances 0.000 claims description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 4
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 claims description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims description 4
- 239000003505 polymerization initiator Substances 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 2
- WTQHTDIBYAAFEX-UHFFFAOYSA-N 1-decylsulfonylsulfonyldecane Chemical compound CCCCCCCCCCS(=O)(=O)S(=O)(=O)CCCCCCCCCC WTQHTDIBYAAFEX-UHFFFAOYSA-N 0.000 claims description 2
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 claims description 2
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 claims description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims description 2
- VUBUXALTYMBEQO-UHFFFAOYSA-N 2,2,3,3,3-pentafluoro-1-phenylpropan-1-one Chemical compound FC(F)(F)C(F)(F)C(=O)C1=CC=CC=C1 VUBUXALTYMBEQO-UHFFFAOYSA-N 0.000 claims description 2
- 239000004342 Benzoyl peroxide Substances 0.000 claims description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 claims description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 claims description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 claims description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 2
- 229940116333 ethyl lactate Drugs 0.000 claims description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 2
- 239000012046 mixed solvent Substances 0.000 claims description 2
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- 235000010290 biphenyl Nutrition 0.000 claims 3
- 239000004305 biphenyl Substances 0.000 claims 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 3
- 125000006267 biphenyl group Chemical group 0.000 claims 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 1
- HQJRFZRQOSPHPC-UHFFFAOYSA-N 1-[(2-methylpropan-2-yl)oxy]pyrrole-2,5-dione Chemical compound CC(C)(C)ON1C(=O)C=CC1=O HQJRFZRQOSPHPC-UHFFFAOYSA-N 0.000 claims 1
- XQBQVMYWVQLMHW-UHFFFAOYSA-N [dinitro(phenyl)methyl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC([N+]([O-])=O)([N+]([O-])=O)C1=CC=CC=C1 XQBQVMYWVQLMHW-UHFFFAOYSA-N 0.000 claims 1
- XWEVKPKISJJUAH-UHFFFAOYSA-N benzenethiol;trifluoromethanesulfonic acid Chemical compound [SH2+]C1=CC=CC=C1.[O-]S(=O)(=O)C(F)(F)F XWEVKPKISJJUAH-UHFFFAOYSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- QTBFPMKWQKYFLR-UHFFFAOYSA-N isobutyl chloride Chemical compound CC(C)CCl QTBFPMKWQKYFLR-UHFFFAOYSA-N 0.000 claims 1
- RUVINXPYWBROJD-UHFFFAOYSA-N para-methoxyphenyl Natural products COC1=CC=C(C=CC)C=C1 RUVINXPYWBROJD-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- LXAWHMFHGHNIHC-UHFFFAOYSA-N sulfanyl trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)OS LXAWHMFHGHNIHC-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 description 2
- WBUSZOLVSDXDOC-UHFFFAOYSA-M (4-methoxyphenyl)-diphenylsulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(OC)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WBUSZOLVSDXDOC-UHFFFAOYSA-M 0.000 description 1
- AWOATHYNVXCSGP-UHFFFAOYSA-M (4-methylphenyl)-diphenylsulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 AWOATHYNVXCSGP-UHFFFAOYSA-M 0.000 description 1
- LOZJPUXMNANKIQ-UHFFFAOYSA-N 2-benzyl-3-nitro-4-(nitromethyl)benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C[N+]([O-])=O)C([N+]([O-])=O)=C1CC1=CC=CC=C1 LOZJPUXMNANKIQ-UHFFFAOYSA-N 0.000 description 1
- DRMAIBPBPJNFDH-UHFFFAOYSA-M [4-(2-methylpropyl)phenyl]-diphenylsulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(CC(C)C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 DRMAIBPBPJNFDH-UHFFFAOYSA-M 0.000 description 1
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 1
- KMMGGCMJVDNKBP-UHFFFAOYSA-N isoindole-1,3-dione;trifluoromethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)F.C1=CC=C2C(=O)NC(=O)C2=C1 KMMGGCMJVDNKBP-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2001-35469 | 2001-06-21 | ||
| KR1020010035469A KR100557554B1 (ko) | 2001-06-21 | 2001-06-21 | 불소가 치환된 벤질 카르복실레이트 그룹을 포함하는단량체 및 이를 함유한 포토레지스트 중합체 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003055408A JP2003055408A (ja) | 2003-02-26 |
| JP2003055408A5 true JP2003055408A5 (enExample) | 2005-04-07 |
| JP3943445B2 JP3943445B2 (ja) | 2007-07-11 |
Family
ID=19711184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002164543A Expired - Fee Related JP3943445B2 (ja) | 2001-06-21 | 2002-06-05 | フォトレジスト重合体及びフォトレジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6737217B2 (enExample) |
| JP (1) | JP3943445B2 (enExample) |
| KR (1) | KR100557554B1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7225440B2 (en) * | 2003-08-14 | 2007-05-29 | International Business Machines Corporation | System and method for manufacturing and updating insertable portable operating system module |
| US7078816B2 (en) | 2004-03-31 | 2006-07-18 | Endicott Interconnect Technologies, Inc. | Circuitized substrate |
| US7499739B2 (en) * | 2005-10-27 | 2009-03-03 | Smiths Medical Pm, Inc. | Single use pulse oximeter |
| JP4909768B2 (ja) * | 2006-03-14 | 2012-04-04 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| TWI475323B (zh) | 2006-03-14 | 2015-03-01 | Fujifilm Corp | 正型光阻組成物及使用它之圖案形成方法 |
| TW200736855A (en) * | 2006-03-22 | 2007-10-01 | Quanta Display Inc | Method of fabricating photoresist thinner |
| EP1906247A1 (en) * | 2006-09-29 | 2008-04-02 | FUJIFILM Corporation | Resist composition and pattern forming method using the same |
| US8609319B2 (en) * | 2010-10-01 | 2013-12-17 | Jsr Corporation | Radiation-sensitive resin composition and resist film formed using the same |
| KR101301464B1 (ko) * | 2011-04-26 | 2013-08-29 | 금호석유화학 주식회사 | 유기반사방지막용 공중합체, 단량체 및 그 공중합체를 포함하는 조성물 |
| JP6809540B2 (ja) * | 2017-01-17 | 2021-01-06 | 株式会社ニコン | （メタ）アクリレート化合物、光学用樹脂添加剤、光学素子、及び光学装置 |
| KR102458068B1 (ko) * | 2020-11-02 | 2022-10-24 | 인하대학교 산학협력단 | 레지스트 조성물 및 이를 사용한 패턴 형성 방법 |
| CN119028277A (zh) * | 2023-05-26 | 2024-11-26 | 京东方科技集团股份有限公司 | 显示面板及显示装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0230656B1 (en) * | 1985-12-25 | 1991-03-13 | Tosoh Corporation | Halogen-containing polyacrylate derivatives |
| US4990582A (en) * | 1986-07-18 | 1991-02-05 | Salamone Joseph C | Fluorine containing soft contact lens hydrogels |
| JPS6374054A (ja) * | 1986-09-18 | 1988-04-04 | Tosoh Corp | ポジ型レジストの現像方法 |
| JPH0245509A (ja) * | 1988-08-05 | 1990-02-15 | Tosoh Corp | フッ素含有ポリアクリル酸誘導体 |
| JPH05105878A (ja) * | 1991-03-13 | 1993-04-27 | Merck Patent Gmbh | 電気光学的系 |
| JP4207261B2 (ja) * | 1998-09-04 | 2009-01-14 | Ｊｓｒ株式会社 | カラーフィルタ用感放射線性組成物 |
-
2001
- 2001-06-21 KR KR1020010035469A patent/KR100557554B1/ko not_active Expired - Fee Related
-
2002
- 2002-03-27 US US10/107,646 patent/US6737217B2/en not_active Expired - Fee Related
- 2002-06-05 JP JP2002164543A patent/JP3943445B2/ja not_active Expired - Fee Related
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