JP2002520872A5 - - Google Patents

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Publication number
JP2002520872A5
JP2002520872A5 JP2000560302A JP2000560302A JP2002520872A5 JP 2002520872 A5 JP2002520872 A5 JP 2002520872A5 JP 2000560302 A JP2000560302 A JP 2000560302A JP 2000560302 A JP2000560302 A JP 2000560302A JP 2002520872 A5 JP2002520872 A5 JP 2002520872A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000560302A
Other languages
Japanese (ja)
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JP2002520872A (ja
Filing date
Publication date
Priority claimed from US09/116,621 external-priority patent/US6322714B1/en
Application filed filed Critical
Publication of JP2002520872A publication Critical patent/JP2002520872A/ja
Publication of JP2002520872A5 publication Critical patent/JP2002520872A5/ja
Pending legal-status Critical Current

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JP2000560302A 1998-07-16 1999-06-30 ポリシリコン用ドーピング無依存式自己清浄エッチング処理 Pending JP2002520872A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/116,621 US6322714B1 (en) 1997-11-12 1998-07-16 Process for etching silicon-containing material on substrates
US09/116,621 1998-07-16
PCT/US1999/014922 WO2000004213A1 (en) 1998-07-16 1999-06-30 Doping-independent self-cleaning etch process for polysilicon

Publications (2)

Publication Number Publication Date
JP2002520872A JP2002520872A (ja) 2002-07-09
JP2002520872A5 true JP2002520872A5 (enExample) 2006-08-10

Family

ID=22368266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000560302A Pending JP2002520872A (ja) 1998-07-16 1999-06-30 ポリシリコン用ドーピング無依存式自己清浄エッチング処理

Country Status (6)

Country Link
US (1) US6322714B1 (enExample)
EP (1) EP1109955A1 (enExample)
JP (1) JP2002520872A (enExample)
KR (1) KR100738699B1 (enExample)
TW (1) TW449822B (enExample)
WO (1) WO2000004213A1 (enExample)

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