JP2002520651A - 有限空間干渉性補正を備えた回折均質化装置 - Google Patents
有限空間干渉性補正を備えた回折均質化装置Info
- Publication number
- JP2002520651A JP2002520651A JP2000559466A JP2000559466A JP2002520651A JP 2002520651 A JP2002520651 A JP 2002520651A JP 2000559466 A JP2000559466 A JP 2000559466A JP 2000559466 A JP2000559466 A JP 2000559466A JP 2002520651 A JP2002520651 A JP 2002520651A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction
- homogenizer
- radiation
- pixel
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000012937 correction Methods 0.000 title description 30
- 238000000034 method Methods 0.000 claims abstract description 53
- 230000005855 radiation Effects 0.000 claims abstract description 33
- 238000005286 illumination Methods 0.000 claims abstract description 25
- 238000012545 processing Methods 0.000 claims abstract description 11
- 230000001427 coherent effect Effects 0.000 claims description 41
- 230000010363 phase shift Effects 0.000 claims description 14
- 238000000265 homogenisation Methods 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000005350 fused silica glass Substances 0.000 claims description 4
- 230000004044 response Effects 0.000 claims description 4
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- 230000006335 response to radiation Effects 0.000 claims 1
- 238000009826 distribution Methods 0.000 abstract description 50
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- 229910052751 metal Inorganic materials 0.000 description 2
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0988—Diaphragms, spatial filters, masks for removing or filtering a part of the beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
- G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/112,664 | 1998-07-09 | ||
| US09/112,664 US6072631A (en) | 1998-07-09 | 1998-07-09 | Diffractive homogenizer with compensation for spatial coherence |
| PCT/US1998/022925 WO2000003286A1 (en) | 1998-07-09 | 1998-10-28 | Diffractive homogenizer with compensation for finite spatial coherence |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002520651A true JP2002520651A (ja) | 2002-07-09 |
| JP2002520651A5 JP2002520651A5 (https=) | 2006-01-05 |
Family
ID=22345196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000559466A Withdrawn JP2002520651A (ja) | 1998-07-09 | 1998-10-28 | 有限空間干渉性補正を備えた回折均質化装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6072631A (https=) |
| EP (1) | EP1093595A1 (https=) |
| JP (1) | JP2002520651A (https=) |
| CN (1) | CN1301358A (https=) |
| AU (1) | AU1285899A (https=) |
| WO (1) | WO2000003286A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019092833A1 (ja) | 2017-11-09 | 2019-05-16 | 株式会社彩世 | 光学素子及びレーザ照射装置 |
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| US6555449B1 (en) | 1996-05-28 | 2003-04-29 | Trustees Of Columbia University In The City Of New York | Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication |
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| JP2000293508A (ja) * | 1999-04-01 | 2000-10-20 | Takayuki Aoki | 非等間隔格子において空間微係数を用いたポアソン方程式、拡散方程式および類似の偏微分方程式の高精度計算プログラム |
| JP2001174615A (ja) * | 1999-04-15 | 2001-06-29 | Nikon Corp | 回折光学素子、該素子の製造方法、該素子を備える照明装置、投影露光装置、露光方法、及び光ホモジナイザー、該光ホモジナイザーの製造方法 |
| JP2001023918A (ja) * | 1999-07-08 | 2001-01-26 | Nec Corp | 半導体薄膜形成装置 |
| US6618106B1 (en) * | 1999-07-23 | 2003-09-09 | Bae Systems Information And Electronics Systems Integration, Inc | Sunlight viewable color liquid crystal display using diffractive color separation microlenses |
| US6313948B1 (en) * | 1999-08-02 | 2001-11-06 | James I. Hanna | Optical beam shaper |
| US6934038B2 (en) * | 2000-02-15 | 2005-08-23 | Asml Holding N.V. | Method for optical system coherence testing |
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| KR100854834B1 (ko) | 2000-10-10 | 2008-08-27 | 더 트러스티스 오브 컬럼비아 유니버시티 인 더 시티 오브 뉴욕 | 얇은 금속층을 가공하는 방법 및 장치 |
| CN1200320C (zh) * | 2000-11-27 | 2005-05-04 | 纽约市哥伦比亚大学托管会 | 用激光结晶化法加工衬底上半导体薄膜区域的方法和掩模投影系统 |
| JP2004536350A (ja) * | 2001-07-16 | 2004-12-02 | オイ アイシーエス インテリジェント コントロール システムズ リミテッド | 空間的に部分的にコヒーレントな光ビームの強度分布の回折成形 |
| US7160763B2 (en) * | 2001-08-27 | 2007-01-09 | The Trustees Of Columbia University In The City Of New York | Polycrystalline TFT uniformity through microstructure mis-alignment |
| SE0103006D0 (sv) * | 2001-09-10 | 2001-09-10 | Micronic Lasersystems Ab | Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece |
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| WO2003084688A2 (en) * | 2002-04-01 | 2003-10-16 | The Trustees Of Columbia University In The City Of New York | Method and system for providing a thin film |
| US6815638B2 (en) * | 2002-07-25 | 2004-11-09 | Matsushita Electric Industrial Co., Ltd. | Method of determining a minimum pulse width for a short pulse laser system |
| TWI331803B (en) | 2002-08-19 | 2010-10-11 | Univ Columbia | A single-shot semiconductor processing system and method having various irradiation patterns |
| WO2004017379A2 (en) * | 2002-08-19 | 2004-02-26 | The Trustees Of Columbia University In The City Of New York | Process and system for processing a thin film sample and thin film structure |
| AU2003272222A1 (en) | 2002-08-19 | 2004-03-03 | The Trustees Of Columbia University In The City Of New York | Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions |
| AU2003265498A1 (en) * | 2002-08-19 | 2004-03-03 | The Trustees Of Columbia University In The City Of New York | Process and system for laser crystallization processing of film regions on a substrate to provide substantial uniformity within areas in such regions and edge areas thereof, and a structure of such film regions |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4547037A (en) * | 1980-10-16 | 1985-10-15 | Regents Of The University Of Minnesota | Holographic method for producing desired wavefront transformations |
| US4475027A (en) * | 1981-11-17 | 1984-10-02 | Allied Corporation | Optical beam homogenizer |
| US4516832A (en) * | 1982-06-23 | 1985-05-14 | International Business Machines Corporation | Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture |
| US4733944A (en) * | 1986-01-24 | 1988-03-29 | Xmr, Inc. | Optical beam integration system |
| US5503959A (en) * | 1991-10-31 | 1996-04-02 | Intel Corporation | Lithographic technique for patterning a semiconductor device |
| DE4220705C2 (de) * | 1992-06-24 | 2003-03-13 | Lambda Physik Ag | Vorrichtung zum Aufteilen eines Lichtstrahles in homogene Teilstrahlen |
| GB2269055B (en) * | 1992-07-09 | 1996-06-05 | Flat Antenna Co Ltd | Phase correcting zone plate |
| GB2278458B (en) * | 1993-05-07 | 1996-09-11 | Secr Defence | Laser beam converter |
| US5850300A (en) * | 1994-02-28 | 1998-12-15 | Digital Optics Corporation | Diffractive beam homogenizer having free-form fringes |
| US5610733A (en) * | 1994-02-28 | 1997-03-11 | Digital Optics Corporation | Beam-homogenizer |
| US5631721A (en) * | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
-
1998
- 1998-07-09 US US09/112,664 patent/US6072631A/en not_active Expired - Fee Related
- 1998-10-28 WO PCT/US1998/022925 patent/WO2000003286A1/en not_active Ceased
- 1998-10-28 EP EP98956305A patent/EP1093595A1/en not_active Withdrawn
- 1998-10-28 CN CN98814157A patent/CN1301358A/zh active Pending
- 1998-10-28 JP JP2000559466A patent/JP2002520651A/ja not_active Withdrawn
- 1998-10-28 AU AU12858/99A patent/AU1285899A/en not_active Withdrawn
-
2000
- 2000-02-24 US US09/512,117 patent/US6252714B1/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019092833A1 (ja) | 2017-11-09 | 2019-05-16 | 株式会社彩世 | 光学素子及びレーザ照射装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US6072631A (en) | 2000-06-06 |
| US6252714B1 (en) | 2001-06-26 |
| CN1301358A (zh) | 2001-06-27 |
| EP1093595A1 (en) | 2001-04-25 |
| AU1285899A (en) | 2000-02-01 |
| WO2000003286A1 (en) | 2000-01-20 |
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