JP2002520651A5 - - Google Patents

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Publication number
JP2002520651A5
JP2002520651A5 JP2000559466A JP2000559466A JP2002520651A5 JP 2002520651 A5 JP2002520651 A5 JP 2002520651A5 JP 2000559466 A JP2000559466 A JP 2000559466A JP 2000559466 A JP2000559466 A JP 2000559466A JP 2002520651 A5 JP2002520651 A5 JP 2002520651A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2000559466A
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Japanese (ja)
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JP2002520651A (ja
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Priority claimed from US09/112,664 external-priority patent/US6072631A/en
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Publication of JP2002520651A publication Critical patent/JP2002520651A/ja
Publication of JP2002520651A5 publication Critical patent/JP2002520651A5/ja
Withdrawn legal-status Critical Current

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JP2000559466A 1998-07-09 1998-10-28 有限空間干渉性補正を備えた回折均質化装置 Withdrawn JP2002520651A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/112,664 1998-07-09
US09/112,664 US6072631A (en) 1998-07-09 1998-07-09 Diffractive homogenizer with compensation for spatial coherence
PCT/US1998/022925 WO2000003286A1 (en) 1998-07-09 1998-10-28 Diffractive homogenizer with compensation for finite spatial coherence

Publications (2)

Publication Number Publication Date
JP2002520651A JP2002520651A (ja) 2002-07-09
JP2002520651A5 true JP2002520651A5 (https=) 2006-01-05

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ID=22345196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000559466A Withdrawn JP2002520651A (ja) 1998-07-09 1998-10-28 有限空間干渉性補正を備えた回折均質化装置

Country Status (6)

Country Link
US (2) US6072631A (https=)
EP (1) EP1093595A1 (https=)
JP (1) JP2002520651A (https=)
CN (1) CN1301358A (https=)
AU (1) AU1285899A (https=)
WO (1) WO2000003286A1 (https=)

Families Citing this family (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6555449B1 (en) 1996-05-28 2003-04-29 Trustees Of Columbia University In The City Of New York Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication
EP1002297A1 (en) * 1997-08-07 2000-05-24 Imaging Research, Inc. A digital imaging system for assays in well plates, gels and blots
JP2000293508A (ja) * 1999-04-01 2000-10-20 Takayuki Aoki 非等間隔格子において空間微係数を用いたポアソン方程式、拡散方程式および類似の偏微分方程式の高精度計算プログラム
JP2001174615A (ja) * 1999-04-15 2001-06-29 Nikon Corp 回折光学素子、該素子の製造方法、該素子を備える照明装置、投影露光装置、露光方法、及び光ホモジナイザー、該光ホモジナイザーの製造方法
JP2001023918A (ja) * 1999-07-08 2001-01-26 Nec Corp 半導体薄膜形成装置
US6618106B1 (en) * 1999-07-23 2003-09-09 Bae Systems Information And Electronics Systems Integration, Inc Sunlight viewable color liquid crystal display using diffractive color separation microlenses
US6313948B1 (en) * 1999-08-02 2001-11-06 James I. Hanna Optical beam shaper
US6934038B2 (en) * 2000-02-15 2005-08-23 Asml Holding N.V. Method for optical system coherence testing
US6830993B1 (en) * 2000-03-21 2004-12-14 The Trustees Of Columbia University In The City Of New York Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method
KR100854834B1 (ko) 2000-10-10 2008-08-27 더 트러스티스 오브 컬럼비아 유니버시티 인 더 시티 오브 뉴욕 얇은 금속층을 가공하는 방법 및 장치
CN1200320C (zh) * 2000-11-27 2005-05-04 纽约市哥伦比亚大学托管会 用激光结晶化法加工衬底上半导体薄膜区域的方法和掩模投影系统
JP2004536350A (ja) * 2001-07-16 2004-12-02 オイ アイシーエス インテリジェント コントロール システムズ リミテッド 空間的に部分的にコヒーレントな光ビームの強度分布の回折成形
US7160763B2 (en) * 2001-08-27 2007-01-09 The Trustees Of Columbia University In The City Of New York Polycrystalline TFT uniformity through microstructure mis-alignment
SE0103006D0 (sv) * 2001-09-10 2001-09-10 Micronic Lasersystems Ab Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece
US6744502B2 (en) * 2001-09-28 2004-06-01 Pe Corporation (Ny) Shaped illumination geometry and intensity using a diffractive optical element
US6649990B2 (en) * 2002-03-29 2003-11-18 Intel Corporation Method and apparatus for incorporating a low contrast interface and a high contrast interface into an optical device
WO2003084688A2 (en) * 2002-04-01 2003-10-16 The Trustees Of Columbia University In The City Of New York Method and system for providing a thin film
US6815638B2 (en) * 2002-07-25 2004-11-09 Matsushita Electric Industrial Co., Ltd. Method of determining a minimum pulse width for a short pulse laser system
TWI331803B (en) 2002-08-19 2010-10-11 Univ Columbia A single-shot semiconductor processing system and method having various irradiation patterns
WO2004017379A2 (en) * 2002-08-19 2004-02-26 The Trustees Of Columbia University In The City Of New York Process and system for processing a thin film sample and thin film structure
AU2003272222A1 (en) 2002-08-19 2004-03-03 The Trustees Of Columbia University In The City Of New York Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions
AU2003265498A1 (en) * 2002-08-19 2004-03-03 The Trustees Of Columbia University In The City Of New York Process and system for laser crystallization processing of film regions on a substrate to provide substantial uniformity within areas in such regions and edge areas thereof, and a structure of such film regions
TW200414280A (en) * 2002-09-25 2004-08-01 Adv Lcd Tech Dev Ct Co Ltd Semiconductor device, annealing method, annealing apparatus and display apparatus
GB2395289A (en) * 2002-11-11 2004-05-19 Qinetiq Ltd Structured light generator
US7027164B2 (en) * 2003-01-15 2006-04-11 Asml Holding N.V. Speckle reduction method and system for EUV interferometry
US7002747B2 (en) * 2003-01-15 2006-02-21 Asml Holding N.V. Diffuser plate and method of making same
US6867846B2 (en) * 2003-01-15 2005-03-15 Asml Holding Nv Tailored reflecting diffractor for EUV lithographic system aberration measurement
US7268891B2 (en) * 2003-01-15 2007-09-11 Asml Holding N.V. Transmission shear grating in checkerboard configuration for EUV wavefront sensor
KR101191837B1 (ko) 2003-02-19 2012-10-18 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 순차적 측면 고상화 기술을 이용하여 결정화되는 복수의 반도체 박막을 가공하는 방법 및 장치
US7174077B1 (en) 2003-07-30 2007-02-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Fiber coupled laser diodes with even illumination pattern
WO2005029550A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for producing crystalline thin films with a uniform crystalline orientation
WO2005029548A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York System and process for providing multiple beam sequential lateral solidification
US7364952B2 (en) * 2003-09-16 2008-04-29 The Trustees Of Columbia University In The City Of New York Systems and methods for processing thin films
WO2005029547A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Enhancing the width of polycrystalline grains with mask
TWI351713B (en) 2003-09-16 2011-11-01 Univ Columbia Method and system for providing a single-scan, con
US7164152B2 (en) * 2003-09-16 2007-01-16 The Trustees Of Columbia University In The City Of New York Laser-irradiated thin films having variable thickness
WO2005029546A2 (en) 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts, and a mask for facilitating such artifact reduction/elimination
US7318866B2 (en) * 2003-09-16 2008-01-15 The Trustees Of Columbia University In The City Of New York Systems and methods for inducing crystallization of thin films using multiple optical paths
WO2005029551A2 (en) 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions
US7311778B2 (en) 2003-09-19 2007-12-25 The Trustees Of Columbia University In The City Of New York Single scan irradiation for crystallization of thin films
JP2005337851A (ja) * 2004-05-26 2005-12-08 Hitachi High-Technologies Corp 欠陥検査方法及びその装置
DE102004039936A1 (de) * 2004-08-17 2006-02-23 Hentze-Lissotschenko Patentverwaltungs Gmbh & Co. Kg Vorrichtung zur Homogenisierung von Licht sowie Verfahren zur Herstellung der Vorrichtung
US7374569B2 (en) * 2004-09-02 2008-05-20 Dynatronics, Corporation Dynamically distributing power of a light beam for use in light therapy
JP4293098B2 (ja) * 2004-09-15 2009-07-08 セイコーエプソン株式会社 レーザー加工方法、レーザー加工装置、電子機器
US7645337B2 (en) 2004-11-18 2010-01-12 The Trustees Of Columbia University In The City Of New York Systems and methods for creating crystallographic-orientation controlled poly-silicon films
EP1825317B1 (en) * 2004-11-24 2013-04-17 Battelle Memorial Institute Optical system for cell imaging
US8221544B2 (en) 2005-04-06 2012-07-17 The Trustees Of Columbia University In The City Of New York Line scan sequential lateral solidification of thin films
WO2006124878A2 (en) * 2005-05-12 2006-11-23 Mark Lawson Palmer Method for achieving virtual resolution enhancement of a diagnostic imaging modality by using coupled fea analyses
WO2007067541A2 (en) 2005-12-05 2007-06-14 The Trustees Of Columbia University In The City Of New York Systems and methods for processing a film, and thin films
JP4996856B2 (ja) * 2006-01-23 2012-08-08 株式会社日立ハイテクノロジーズ 欠陥検査装置およびその方法
US20070208396A1 (en) * 2006-03-03 2007-09-06 Gary Whatcott Systems and methods for providing a dynamic light pad
US20070208289A1 (en) * 2006-03-03 2007-09-06 Jay Walther Systems and methods for providing light therapy traction
JP2008130129A (ja) * 2006-11-17 2008-06-05 Funai Electric Co Ltd 光ピックアップ装置
US8614471B2 (en) 2007-09-21 2013-12-24 The Trustees Of Columbia University In The City Of New York Collections of laterally crystallized semiconductor islands for use in thin film transistors
JP5385289B2 (ja) 2007-09-25 2014-01-08 ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク 横方向に結晶化した薄膜上に作製される薄膜トランジスタデバイスにおいて高い均一性を生成する方法
US8012861B2 (en) 2007-11-21 2011-09-06 The Trustees Of Columbia University In The City Of New York Systems and methods for preparing epitaxially textured polycrystalline films
WO2009067688A1 (en) 2007-11-21 2009-05-28 The Trustees Of Columbia University In The City Of New York Systems and methods for preparing epitaxially textured polycrystalline films
KR20100105606A (ko) 2007-11-21 2010-09-29 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 에피택셜하게 텍스쳐화된 후막의 제조를 위한 시스템 및 방법
US8569155B2 (en) 2008-02-29 2013-10-29 The Trustees Of Columbia University In The City Of New York Flash lamp annealing crystallization for large area thin films
KR20110094022A (ko) 2008-11-14 2011-08-19 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 박막 결정화를 위한 시스템 및 방법
US9646831B2 (en) 2009-11-03 2017-05-09 The Trustees Of Columbia University In The City Of New York Advanced excimer laser annealing for thin films
US9087696B2 (en) 2009-11-03 2015-07-21 The Trustees Of Columbia University In The City Of New York Systems and methods for non-periodic pulse partial melt film processing
US8440581B2 (en) 2009-11-24 2013-05-14 The Trustees Of Columbia University In The City Of New York Systems and methods for non-periodic pulse sequential lateral solidification
US8875066B2 (en) * 2013-03-15 2014-10-28 Synopsys, Inc. Performing image calculation based on spatial coherence
DE102014011954B4 (de) * 2013-08-28 2024-12-24 Jenoptik Optical Systems Gmbh Vorrichtung zur Messung einer Leistungsdichteverteilung einer Strahlungsquelle
CN104765216B (zh) * 2015-04-30 2017-12-19 京东方科技集团股份有限公司 阵列基板及其制备方法及显示装置
US10002435B2 (en) * 2016-01-29 2018-06-19 Google Llc Detecting motion in images
CN109643009B (zh) * 2016-08-31 2021-09-03 亮锐控股有限公司 具有定制的光照图案的基于激光器的光源
DE102017215850B4 (de) * 2017-09-08 2019-12-24 Robert Bosch Gmbh Verfahren zur Herstellung eines diffraktiven optischen Elements, LIDAR-System mit einem diffraktiven optischen Element und Kraftfahrzeug mit einem LIDAR-System
JP6496894B1 (ja) 2017-11-09 2019-04-10 株式会社 彩世 光学素子及びレーザ照射装置
US10895752B1 (en) * 2018-01-10 2021-01-19 Facebook Technologies, Llc Diffractive optical elements (DOEs) for high tolerance of structured light
US11852843B1 (en) 2018-01-10 2023-12-26 Meta Platforms Technologies, Llc Diffractive optical elements (DOEs) for high tolerance of structured light
DE102018219190A1 (de) * 2018-11-09 2020-05-14 Thyssenkrupp Ag Vorrichtung und Verfahren zur Strukturierung einer Walzenoberfläche
US11281160B2 (en) 2018-12-17 2022-03-22 Facebook Technologies, Llc Holographic pattern generation for head-mounted display (HMD) eye tracking using a fiber exposure
US10816809B2 (en) 2018-12-17 2020-10-27 Facebook Technologies, Llc Holographic in-field illuminator
US11409240B2 (en) * 2018-12-17 2022-08-09 Meta Platforms Technologies, Llc Holographic pattern generation for head-mounted display (HMD) eye tracking using a diffractive optical element
US11256213B2 (en) 2018-12-17 2022-02-22 Facebook Technologies, Llc Holographic pattern generation for head-mounted display (HMD) eye tracking using an array of parabolic mirrors
CN109946943B (zh) * 2019-04-15 2020-04-10 北京航空航天大学 一种基于光束整形抑制散斑噪声的全息显示系统
JP7303053B2 (ja) * 2019-07-17 2023-07-04 ファナック株式会社 調整補助具及びレーザ溶接装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
US4475027A (en) * 1981-11-17 1984-10-02 Allied Corporation Optical beam homogenizer
US4516832A (en) * 1982-06-23 1985-05-14 International Business Machines Corporation Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture
US4733944A (en) * 1986-01-24 1988-03-29 Xmr, Inc. Optical beam integration system
US5503959A (en) * 1991-10-31 1996-04-02 Intel Corporation Lithographic technique for patterning a semiconductor device
DE4220705C2 (de) * 1992-06-24 2003-03-13 Lambda Physik Ag Vorrichtung zum Aufteilen eines Lichtstrahles in homogene Teilstrahlen
GB2269055B (en) * 1992-07-09 1996-06-05 Flat Antenna Co Ltd Phase correcting zone plate
GB2278458B (en) * 1993-05-07 1996-09-11 Secr Defence Laser beam converter
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
US5610733A (en) * 1994-02-28 1997-03-11 Digital Optics Corporation Beam-homogenizer
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography

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