JP2002361069A5 - - Google Patents

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Publication number
JP2002361069A5
JP2002361069A5 JP2001175536A JP2001175536A JP2002361069A5 JP 2002361069 A5 JP2002361069 A5 JP 2002361069A5 JP 2001175536 A JP2001175536 A JP 2001175536A JP 2001175536 A JP2001175536 A JP 2001175536A JP 2002361069 A5 JP2002361069 A5 JP 2002361069A5
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JP
Japan
Prior art keywords
corrosion
temperature
iridium oxide
oxide layer
layer
Prior art date
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Application number
JP2001175536A
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English (en)
Japanese (ja)
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JP2002361069A (ja
JP4922500B2 (ja
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Priority to JP2001175536A priority Critical patent/JP4922500B2/ja
Priority claimed from JP2001175536A external-priority patent/JP4922500B2/ja
Publication of JP2002361069A publication Critical patent/JP2002361069A/ja
Publication of JP2002361069A5 publication Critical patent/JP2002361069A5/ja
Application granted granted Critical
Publication of JP4922500B2 publication Critical patent/JP4922500B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001175536A 2001-06-11 2001-06-11 超臨界水反応装置 Expired - Fee Related JP4922500B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001175536A JP4922500B2 (ja) 2001-06-11 2001-06-11 超臨界水反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001175536A JP4922500B2 (ja) 2001-06-11 2001-06-11 超臨界水反応装置

Publications (3)

Publication Number Publication Date
JP2002361069A JP2002361069A (ja) 2002-12-17
JP2002361069A5 true JP2002361069A5 (OSRAM) 2008-07-24
JP4922500B2 JP4922500B2 (ja) 2012-04-25

Family

ID=19016650

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001175536A Expired - Fee Related JP4922500B2 (ja) 2001-06-11 2001-06-11 超臨界水反応装置

Country Status (1)

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JP (1) JP4922500B2 (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4545417B2 (ja) * 2003-11-04 2010-09-15 オルガノ株式会社 超臨界水反応装置
JP4276627B2 (ja) 2005-01-12 2009-06-10 ソルボサーマル結晶成長技術研究組合 単結晶育成用圧力容器およびその製造方法
JP2007186572A (ja) * 2006-01-12 2007-07-26 Hitachi Ltd 重質油の改質装置、重質油改質装置を備えたガスタービン、重質油改質装置を備えたガスタービンプラント、及び重質油の改質方法
JP4946071B2 (ja) * 2006-01-20 2012-06-06 日本ゼオン株式会社 環状ケトン化合物の連続製造装置および連続製造方法。
JP2014004523A (ja) * 2012-06-25 2014-01-16 Ricoh Co Ltd 流体浄化装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS504459B1 (OSRAM) * 1970-12-25 1975-02-19
JPS5373478A (en) * 1976-12-14 1978-06-29 Japan Carlit Co Ltd Method of manufacturing platinum coated metal electrode
JPH0681198A (ja) * 1992-06-04 1994-03-22 Nippon Steel Corp 不溶性電極及びその製造方法
JPH06294000A (ja) * 1993-04-08 1994-10-21 Nippon Steel Corp 不溶性酸化イリジウム被覆電極
JPH10314766A (ja) * 1997-05-21 1998-12-02 Japan Organo Co Ltd 超臨界水反応装置
JP3437408B2 (ja) * 1997-05-22 2003-08-18 オルガノ株式会社 超臨界水酸化方法及び装置
JPH10314768A (ja) * 1997-05-22 1998-12-02 Japan Organo Co Ltd 超臨界水酸化方法
JP4455703B2 (ja) * 1999-10-27 2010-04-21 オルガノ株式会社 超臨界水反応装置

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