JP2002260546A5 - - Google Patents

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Publication number
JP2002260546A5
JP2002260546A5 JP2002047341A JP2002047341A JP2002260546A5 JP 2002260546 A5 JP2002260546 A5 JP 2002260546A5 JP 2002047341 A JP2002047341 A JP 2002047341A JP 2002047341 A JP2002047341 A JP 2002047341A JP 2002260546 A5 JP2002260546 A5 JP 2002260546A5
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JP
Japan
Prior art keywords
electron
electron source
region
electrode
focusing structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002047341A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002260546A (ja
Filing date
Publication date
Priority claimed from US09/795,240 external-priority patent/US6815875B2/en
Application filed filed Critical
Publication of JP2002260546A publication Critical patent/JP2002260546A/ja
Publication of JP2002260546A5 publication Critical patent/JP2002260546A5/ja
Pending legal-status Critical Current

Links

JP2002047341A 2001-02-27 2002-02-25 平坦な放射領域と集束構造を有する電子源 Pending JP2002260546A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/795,240 US6815875B2 (en) 2001-02-27 2001-02-27 Electron source having planar emission region and focusing structure
US09/795240 2001-02-27

Publications (2)

Publication Number Publication Date
JP2002260546A JP2002260546A (ja) 2002-09-13
JP2002260546A5 true JP2002260546A5 (enExample) 2005-08-25

Family

ID=25165082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002047341A Pending JP2002260546A (ja) 2001-02-27 2002-02-25 平坦な放射領域と集束構造を有する電子源

Country Status (5)

Country Link
US (2) US6815875B2 (enExample)
EP (1) EP1237174A1 (enExample)
JP (1) JP2002260546A (enExample)
CN (1) CN1244121C (enExample)
HK (1) HK1048014A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6649431B2 (en) * 2001-02-27 2003-11-18 Ut. Battelle, Llc Carbon tips with expanded bases grown with simultaneous application of carbon source and etchant gases
US6781146B2 (en) * 2001-04-30 2004-08-24 Hewlett-Packard Development Company, L.P. Annealed tunneling emitter
JP4830217B2 (ja) * 2001-06-18 2011-12-07 日本電気株式会社 電界放出型冷陰極およびその製造方法
DE10225266A1 (de) * 2001-12-19 2003-07-03 Zeiss Carl Smt Ag Abbildungseinrichtung in einer Projektionsbelichtungsanlage
JP2004111292A (ja) * 2002-09-20 2004-04-08 Hitachi Displays Ltd 表示装置及びその製造方法
JP4298399B2 (ja) * 2003-06-26 2009-07-15 キヤノン株式会社 電子線装置及び該電子線装置を用いた電子線描画装置
US7456491B2 (en) * 2004-07-23 2008-11-25 Pilla Subrahmanyam V S Large area electron emission system for application in mask-based lithography, maskless lithography II and microscopy
US8035293B2 (en) * 2004-12-16 2011-10-11 Vu1 Corporation Cold-cathode light-emitting device with defocusing grid and associated methods of manufacturing
KR20060095318A (ko) * 2005-02-28 2006-08-31 삼성에스디아이 주식회사 전자 방출 소자와 이의 제조 방법
KR100889527B1 (ko) * 2007-11-21 2009-03-19 삼성에스디아이 주식회사 발광 장치 및 이 발광 장치를 광원으로 사용하는 표시 장치
US8084929B2 (en) 2009-04-29 2011-12-27 Atti International Services Company, Inc. Multiple device shaping uniform distribution of current density in electro-static focusing systems
WO2011074038A1 (ja) * 2009-12-17 2011-06-23 パイオニア株式会社 電子放出素子およびこれを備えた撮像装置
CN102696089B (zh) * 2010-01-07 2015-02-04 日本先锋公司 电子发射元件以及具备该电子发射元件的摄像装置
NL2007604C2 (en) * 2011-10-14 2013-05-01 Mapper Lithography Ip Bv Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams.
NL2006868C2 (en) 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
US9116290B1 (en) * 2011-10-07 2015-08-25 Bae Systems Information And Electronic Systems Integration Inc. Faceted, germanium slotted waveguide
JP6834817B2 (ja) * 2016-08-08 2021-02-24 株式会社ニューフレアテクノロジー マルチビーム検査用アパーチャ、マルチビーム用ビーム検査装置、及びマルチ荷電粒子ビーム描画装置
CN107331619A (zh) * 2017-06-28 2017-11-07 京东方科技集团股份有限公司 薄膜晶体管及其制作方法、显示装置、曝光装置

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DE3070002D1 (en) * 1980-06-07 1985-03-07 Hell Rudolf Dr Ing Gmbh Process for operating a high stability electron gun for the shaping of materials
US4904895A (en) * 1987-05-06 1990-02-27 Canon Kabushiki Kaisha Electron emission device
FR2641412B1 (fr) * 1988-12-30 1991-02-15 Thomson Tubes Electroniques Source d'electrons du type a emission de champ
JPH0512988A (ja) * 1990-10-13 1993-01-22 Canon Inc 半導体電子放出素子
JPH05242794A (ja) * 1991-11-29 1993-09-21 Motorola Inc 集積化された静電界レンズを有する電界放出デバイス
JP3243471B2 (ja) 1994-09-16 2002-01-07 三菱電機株式会社 電子放出素子の製造方法
US5557596A (en) * 1995-03-20 1996-09-17 Gibson; Gary Ultra-high density storage device
TW413828B (en) * 1995-07-07 2000-12-01 Nippon Electric Co Electron gun provided with a field emission cold cathode and an improved gate structure
JP2765533B2 (ja) 1995-10-31 1998-06-18 日本電気株式会社 直線ビームマイクロ波管
JP3512933B2 (ja) * 1996-01-25 2004-03-31 株式会社東芝 電界放出型冷陰極装置及びその製造方法
TW391022B (en) 1997-10-29 2000-05-21 Mitsubishi Rayon Co Field emission electron source, method of producing the same, and use of the same
US6326725B1 (en) * 1998-05-26 2001-12-04 Micron Technology, Inc. Focusing electrode for field emission displays and method
US6190223B1 (en) * 1998-07-02 2001-02-20 Micron Technology, Inc. Method of manufacture of composite self-aligned extraction grid and in-plane focusing ring
TW436837B (en) * 1998-11-16 2001-05-28 Matsushita Electric Works Ltd Field emission-type electron source and manufacturing method thereof and display using the electron source
JP2000268706A (ja) 1999-03-18 2000-09-29 Matsushita Electric Ind Co Ltd 電子放出素子及びそれを用いた画像描画装置
JP2000294122A (ja) 1999-04-08 2000-10-20 Nec Corp 電界放出型冷陰極及び平面ディスプレイの製造方法
US6498426B1 (en) * 1999-04-23 2002-12-24 Matsushita Electric Works, Ltd. Field emission-type electron source and manufacturing method thereof
US6538367B1 (en) 1999-07-15 2003-03-25 Agere Systems Inc. Field emitting device comprising field-concentrating nanoconductor assembly and method for making the same
JP3487229B2 (ja) 1999-07-27 2004-01-13 松下電工株式会社 電界放射型電子源およびその製造方法

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