JP2002246454A - 静電チャック - Google Patents

静電チャック

Info

Publication number
JP2002246454A
JP2002246454A JP2001134121A JP2001134121A JP2002246454A JP 2002246454 A JP2002246454 A JP 2002246454A JP 2001134121 A JP2001134121 A JP 2001134121A JP 2001134121 A JP2001134121 A JP 2001134121A JP 2002246454 A JP2002246454 A JP 2002246454A
Authority
JP
Japan
Prior art keywords
coating layer
electrostatic chuck
peak height
carbon
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001134121A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002246454A5 (enrdf_load_stackoverflow
Inventor
Shinsuke Masuda
眞助 増田
Kiyotoshi Fujii
清利 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ADVANCE CERAMICS INTERNATL CORP
Original Assignee
ADVANCE CERAMICS INTERNATL CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ADVANCE CERAMICS INTERNATL CORP filed Critical ADVANCE CERAMICS INTERNATL CORP
Priority to JP2001134121A priority Critical patent/JP2002246454A/ja
Priority to KR1020010077914A priority patent/KR20020046214A/ko
Priority to US10/006,657 priority patent/US6678143B2/en
Priority to DE60126576T priority patent/DE60126576T2/de
Priority to EP01310328A priority patent/EP1220311B1/en
Priority to TW090130670A priority patent/TW516155B/zh
Priority to AT01310328T priority patent/ATE354177T1/de
Priority to US10/198,052 priority patent/US20030107865A1/en
Publication of JP2002246454A publication Critical patent/JP2002246454A/ja
Publication of JP2002246454A5 publication Critical patent/JP2002246454A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
JP2001134121A 2000-12-11 2001-05-01 静電チャック Pending JP2002246454A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2001134121A JP2002246454A (ja) 2000-12-11 2001-05-01 静電チャック
KR1020010077914A KR20020046214A (ko) 2000-12-11 2001-12-10 정전척 및 그 제조방법
US10/006,657 US6678143B2 (en) 2000-12-11 2001-12-10 Electrostatic chuck and method of manufacturing the same
DE60126576T DE60126576T2 (de) 2000-12-11 2001-12-11 Elektrostatische Spannvorrichtung und Verfahren zur Herstellung derselben
EP01310328A EP1220311B1 (en) 2000-12-11 2001-12-11 Electrostatic chuck and method of manufacturing the same
TW090130670A TW516155B (en) 2000-12-11 2001-12-11 Electrostatic chuck and the manufacturing method thereof
AT01310328T ATE354177T1 (de) 2000-12-11 2001-12-11 Elektrostatische haltevorrichtung und methode zur herstellung derselben
US10/198,052 US20030107865A1 (en) 2000-12-11 2002-07-19 Wafer handling apparatus and method of manufacturing the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000376599 2000-12-11
JP2000-376599 2000-12-11
JP2001134121A JP2002246454A (ja) 2000-12-11 2001-05-01 静電チャック

Publications (2)

Publication Number Publication Date
JP2002246454A true JP2002246454A (ja) 2002-08-30
JP2002246454A5 JP2002246454A5 (enrdf_load_stackoverflow) 2004-09-02

Family

ID=26605625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001134121A Pending JP2002246454A (ja) 2000-12-11 2001-05-01 静電チャック

Country Status (1)

Country Link
JP (1) JP2002246454A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007157962A (ja) * 2005-12-05 2007-06-21 Sumitomo Electric Ind Ltd 型成形工具

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007157962A (ja) * 2005-12-05 2007-06-21 Sumitomo Electric Ind Ltd 型成形工具

Similar Documents

Publication Publication Date Title
TW516155B (en) Electrostatic chuck and the manufacturing method thereof
JP3136307B2 (ja) 電子用途用ダイヤモンド載置基板
JP2572438B2 (ja) ガラスプレス成形型の製造方法
CN101116170B (zh) 封装晶片加工装置及其制造方法
JPWO2007043519A1 (ja) 静電吸着機能を有するウエハ加熱装置
EP1376660A2 (en) Wafer heating apparatus with electrostatic attraction function
Ahmed et al. Low-macroscopic field emission from silicon-incorporated diamond-like carbon film synthesized by dc PECVD
US6949726B2 (en) Heating apparatus having electrostatic adsorption function
JP4595153B2 (ja) 炭化ケイ素体およびその製造方法
JP3602067B2 (ja) 静電チャック
JP3623938B2 (ja) 静電チャックの製造方法
TW200912017A (en) Conductive and protective film and method for producing the same
JP2007317820A (ja) 静電吸着装置
US20030107865A1 (en) Wafer handling apparatus and method of manufacturing the same
JP2002246454A (ja) 静電チャック
JPH11251093A (ja) プラズマ発生用電極
JPH02239622A (ja) 安定化層のための保護層及びその製法
Lin et al. Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere
JP4911743B2 (ja) 電気化学素子及びその製造方法
JPH04118884A (ja) 固体放電素子
JP4639334B2 (ja) ダイヤモンド膜、その製造方法、電気化学素子、及びその製造方法
JP2017034042A (ja) ウエハ支持装置
KR102780851B1 (ko) 포커스 링 및 그 제조 방법
JP7553750B1 (ja) SiC成形体及びSiC成形体の製造方法
JPH01104761A (ja) パターン化ダイヤモンド状炭素膜の製法

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20040907