JP2002217514A - Multichip semiconductor device - Google Patents

Multichip semiconductor device

Info

Publication number
JP2002217514A
JP2002217514A JP2001007847A JP2001007847A JP2002217514A JP 2002217514 A JP2002217514 A JP 2002217514A JP 2001007847 A JP2001007847 A JP 2001007847A JP 2001007847 A JP2001007847 A JP 2001007847A JP 2002217514 A JP2002217514 A JP 2002217514A
Authority
JP
Japan
Prior art keywords
substrate
substrates
spacer
semiconductor device
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001007847A
Other languages
Japanese (ja)
Other versions
JP4572467B2 (en
Inventor
Hisanori Takenaka
久宜 竹中
Kenji Kondo
健治 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denso Corp filed Critical Denso Corp
Priority to JP2001007847A priority Critical patent/JP4572467B2/en
Publication of JP2002217514A publication Critical patent/JP2002217514A/en
Application granted granted Critical
Publication of JP4572467B2 publication Critical patent/JP4572467B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
  • Combinations Of Printed Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a multichip semiconductor device with deterioration of connection between substrates restrained, in which the substrates mounting components are laminated. SOLUTION: Electronic components 3-5 are mounted on a first substrate 1 and a second substrate 2, which are laminated with spacers 20 having leads 22 between them. Lands 1b, 2b for connection which are formed on a surface of the first substrate 1 and the back of the second substrate 2 are electrically connected via the leads 22. The leads 22 have elasticity so as to be able to bend by the thermal stress generated between the first substrate 1 and the second substrate 2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体チップや受
動部品等を実装した基板を積層してなるマルチチップ半
導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-chip semiconductor device formed by stacking substrates on which semiconductor chips, passive components and the like are mounted.

【0002】[0002]

【従来の技術】近年、電子機器の小型化の要求に応える
ため、半導体装置における半導体チップや受動部品等の
電子部品の高密度な実装が求められている。その方法の
1つとして、実効的な実装面積が上がることの無い3次
元実装、つまり、積層構造にしたマルチチップ半導体装
置がある。この技術は、特許第2541487号や特許
第2728432号において開示されている。
2. Description of the Related Art In recent years, in order to meet the demand for miniaturization of electronic equipment, high-density mounting of electronic components such as semiconductor chips and passive components in semiconductor devices has been required. As one of the methods, there is a multi-chip semiconductor device having a three-dimensional mounting without increasing the effective mounting area, that is, a laminated structure. This technology is disclosed in Japanese Patent No. 2541487 and Japanese Patent No. 2728432.

【0003】図8はこの様なマルチチップ半導体装置の
概略断面図である。図8に示すように、複数の基板(図
示例では2個)101、102に半導体チップや受動部
品等(以下、単に部品という)103が実装されてお
り、これらの基板101、102を枠状の部材(以下、
枠体とする)104を介して積層している。
FIG. 8 is a schematic sectional view of such a multichip semiconductor device. As shown in FIG. 8, semiconductor chips and passive components (hereinafter, simply referred to as components) 103 are mounted on a plurality of substrates (two in the illustrated example) 101 and 102, and these substrates 101 and 102 are frame-shaped. Of the member (hereinafter,
(Hereinafter referred to as a frame) 104.

【0004】図9はこの枠体104を詳細に示す図であ
って、(a)は平面図であり、(b)は側面図である。
図9に示すように、枠体104の表裏面には基板10
1、102と電気的に接続するための接続用ランド10
5が形成されており、表面の接続用ランド105と裏面
の接続用ランド105とが枠体104の側面に形成され
た配線部106により電気的に接続されている。なお、
これらの接続用ランド105と配線部106はメッキ等
により形成することができる。
FIG. 9 is a view showing the frame 104 in detail, wherein (a) is a plan view and (b) is a side view.
As shown in FIG.
Connection lands 10 for electrically connecting to the first and the second 102
5 are formed, and the connection lands 105 on the front surface and the connection lands 105 on the back surface are electrically connected by the wiring portion 106 formed on the side surface of the frame 104. In addition,
These connection lands 105 and wiring portions 106 can be formed by plating or the like.

【0005】そして、図8に示すように、基板101、
102に形成された接続用ランド107と枠体104の
接続用ランド105とが、半田や導電性ぺースト等の接
続部材108を介して電気的に接続されている。
[0005] Then, as shown in FIG.
The connection land 107 formed on the frame 102 and the connection land 105 of the frame 104 are electrically connected via a connection member 108 such as a solder or a conductive paste.

【0006】この様な構成になっているため、部品10
3をマザーボード等の基板に搭載する際の搭載面積は、
半導体装置に搭載する部品全ての搭載面積の総和になる
のではなく、積層した基板101、102のうちの一番
下の基板の搭載面積分になる。従って、部品の搭載面積
を大幅に削減し、半導体装置において部品を高密度に実
装することができる。
[0006] With such a configuration, the parts 10
The mounting area when mounting 3 on a board such as a motherboard is:
It is not the sum of the mounting areas of all the components mounted on the semiconductor device, but the mounting area of the lowermost substrate of the stacked substrates 101 and 102. Therefore, the mounting area of the components can be significantly reduced, and the components can be mounted at a high density in the semiconductor device.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、枠体1
04を挟んだ上下の基板101、102の材質が互いに
異なったり、上下の基板に搭載されている部品103の
材質が上下の基板101、102同士で互いに異なった
りして、半導体装置を作動させたときの上下の基板10
1、102の熱歪みの程度が異なると、枠体104と基
板101、102との接続部において熱応力が集中し
て、基板間の電気的な接続が劣化し易い。
However, the frame 1
The semiconductor device was operated because the materials of the upper and lower substrates 101 and 102 sandwiching 04 were different from each other, or the materials of the components 103 mounted on the upper and lower substrates were different from each other between the upper and lower substrates 101 and 102. Upper and lower substrates 10
If the degrees of thermal distortion of the substrates 1 and 102 are different, thermal stress is concentrated at a connection portion between the frame 104 and the substrates 101 and 102, and electrical connection between the substrates is likely to deteriorate.

【0008】この様に、枠体104と基板101、10
2との接続部において熱応力が集中するのは、積層され
た基板101、102と枠体104とが完全に固定され
ており、他に熱応力を分散したり吸収したりすることが
無いためである。
As described above, the frame 104 and the substrates 101, 10
The reason why the thermal stress is concentrated at the connection portion with the substrate 2 is that the laminated substrates 101 and 102 and the frame 104 are completely fixed, and the thermal stress is not dispersed or absorbed. It is.

【0009】本発明は、上記問題点に鑑み、部品を実装
した基板を積層してなるマルチチップ半導体装置におい
て、基板間の接続の劣化を抑制したマルチチップ半導体
装置を提供することを目的とする。
SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a multi-chip semiconductor device in which a substrate on which components are mounted is stacked, in which deterioration of connection between the substrates is suppressed. .

【0010】[0010]

【課題を解決するための手段】上記目的を達成するた
め、請求項1に記載の発明では、電子部品(3〜5)が
実装された第1及び第2の基板(1、2)を有し、第1
及び第2の基板がスペーサ(20)を間に配置して積層
されてなるマルチチップ半導体装置において、スペーサ
は、第1及び第2の基板を電気的に接続するリード(2
2)を有し、該リードは、第1及び第2の基板間に生じ
る熱歪みによってたわむことができるように弾性を有す
るものであることを特徴としている。
In order to achieve the above object, according to the first aspect of the present invention, first and second substrates (1, 2) on which electronic components (3 to 5) are mounted are provided. And the first
In a multichip semiconductor device in which a first substrate and a second substrate are stacked with a spacer (20) interposed therebetween, the spacer is a lead (2) for electrically connecting the first and second substrates.
2), wherein the lead has elasticity so that it can bend by thermal strain generated between the first and second substrates.

【0011】これにより、第1及び第2の基板間で異な
る熱歪みが生じた場合に、リードがたわむことで、この
異なる熱歪みに起因する熱応力を吸収することができ
る。従って、基板とリードとの接続部に過大な熱応力が
加わらず接続が確保されるため、基板間の接続の劣化を
抑制したマルチチップ半導体装置を提供することができ
る。
Thus, when different thermal strains occur between the first and second substrates, the leads bend, thereby absorbing thermal stress caused by the different thermal strains. Therefore, the connection is secured without applying excessive thermal stress to the connection between the substrate and the lead, so that it is possible to provide a multi-chip semiconductor device in which the deterioration of the connection between the substrates is suppressed.

【0012】具体的には、請求項2に記載の発明の様
に、第1の基板における第2の基板と対向する面に複数
個の第1のランド(1b)が形成されており、第2の基
板における第1の基板と対向する面に複数個の第2のラ
ンド(2b)が形成されており、スペーサは複数個のリ
ードを有しており、第1のランドの各々と第2のランド
の各々とが、リードの各々を介して電気的に接続される
ようにすることができる。
More specifically, a plurality of first lands (1b) are formed on a surface of the first substrate facing the second substrate, as in the second aspect of the present invention. A plurality of second lands (2b) are formed on a surface of the second substrate facing the first substrate, the spacer has a plurality of leads, and each of the first lands is connected to the second land. Are electrically connected to each other through each of the leads.

【0013】なお、上記各手段の括弧内の符号は、後述
する実施形態に記載の具体的手段との対応関係を示すも
のである。
The reference numerals in parentheses of the above means indicate the correspondence with specific means described in the embodiments described later.

【0014】[0014]

【発明の実施の形態】(第1実施形態)以下、図に示す
実施形態について説明する。図1は本実施形態のマルチ
チップ半導体装置の概略断面図である。図1に示すよう
に、複数の基板1、2に電子部品3〜5が実装されてい
る。本実施形態では2つの基板1、2を用いており、図
1において下側に配置されている基板を第1の基板1と
し、上側に配置されている基板を第2の基板2とする。
これら第1及び第2の基板1、2としてはプリント基板
やセラミック基板を用いることができ、第1の基板1
は、例えばマザーボードとなっている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS (First Embodiment) The embodiment shown in the drawings will be described below. FIG. 1 is a schematic sectional view of the multi-chip semiconductor device of the present embodiment. As shown in FIG. 1, electronic components 3 to 5 are mounted on a plurality of substrates 1 and 2. In the present embodiment, two substrates 1 and 2 are used. In FIG. 1, the substrate disposed on the lower side is referred to as a first substrate 1 and the substrate disposed on the upper side is referred to as a second substrate 2.
A printed board or a ceramic substrate can be used as the first and second substrates 1 and 2.
Is, for example, a motherboard.

【0015】第1の基板1の表面には部品用ランド1a
が形成され、電子部品としての半導体チップ3がバンプ
6を介して部品用ランド1aに対して電気的に接続され
ている。この半導体チップ3は、フェースダウンでフリ
ップチップ法により実装されている。このバンプ6とし
ては、半田やAu(金)などを用いることができる。ま
た、半導体チップ3と第1の基板1との間はアンダーフ
ィル樹脂7が充填されており、半導体チップ3と第1の
基板1との熱膨張係数の違いによる接続部の熱疲労寿命
を向上させるようにしている。
On the surface of the first substrate 1, a component land 1a is provided.
Are formed, and the semiconductor chip 3 as an electronic component is electrically connected to the component land 1 a via the bump 6. The semiconductor chip 3 is mounted face down by a flip chip method. As the bump 6, solder, Au (gold), or the like can be used. The space between the semiconductor chip 3 and the first substrate 1 is filled with an underfill resin 7 to improve the thermal fatigue life of the connection due to the difference in the coefficient of thermal expansion between the semiconductor chip 3 and the first substrate 1. I try to make it.

【0016】第2の基板2の表面には、半導体チップ4
がフェースアップで接続部材8を介して接合されてい
る。また、この半導体チップ4と第2の基板2とが、ワ
イヤボンディング法によりワイヤ9を介して電気的に接
続されている。このワイヤ9としては、AuやAl(ア
ルミニウム)を用いることができる。また、この半導体
チップ4及びワイヤ9は樹脂10により封止されて保護
(耐湿性向上等)されている。
On the surface of the second substrate 2, a semiconductor chip 4
Are joined face-up via the connection member 8. The semiconductor chip 4 and the second substrate 2 are electrically connected via wires 9 by a wire bonding method. Au or Al (aluminum) can be used as the wire 9. The semiconductor chip 4 and the wire 9 are sealed with a resin 10 and protected (for example, improvement in moisture resistance).

【0017】また、第2の基板2の表面には、電子部品
としてのチップ抵抗やチップコンデンサなどの受動部品
5が実装されている。これらの受動部品5は、第2の基
板2の表面に形成された部品ランド2aに対して、半田
や導電性ペーストなどの接続部材を介して電気的に接続
されている。また、第2の基板2の裏面に対しても、表
面と同様にして受動部品5が実装されている。
A passive component 5 such as a chip resistor or a chip capacitor as an electronic component is mounted on the surface of the second substrate 2. These passive components 5 are electrically connected to component lands 2 a formed on the surface of the second substrate 2 via connection members such as solder and conductive paste. The passive component 5 is mounted on the back surface of the second substrate 2 in the same manner as on the front surface.

【0018】また、第1の基板1と第2の基板2はスペ
ーサ20を間に配置して積層されている。図2はこのス
ペーサ20の平面図である。図2に示すように、このス
ペーサ20は枠状の部材(以下、枠体という)21とリ
ード22とから構成されている。そして、枠体21の各
辺においてリード22が複数個配置されている。
The first substrate 1 and the second substrate 2 are stacked with a spacer 20 interposed therebetween. FIG. 2 is a plan view of the spacer 20. As shown in FIG. 2, the spacer 20 includes a frame-shaped member (hereinafter, referred to as a frame) 21 and a lead 22. A plurality of leads 22 are arranged on each side of the frame 21.

【0019】この枠体21は例えばエポキシ樹脂からな
り、リード22は電気伝導性の部材からなる。また、リ
ード22は、後述の様に、第1及び第2の基板1、2と
接続した際に、第1及び第2の基板1、2間に生じる熱
歪みによってたわむことができるように弾性を有するも
のとなっている。
The frame 21 is made of, for example, epoxy resin, and the lead 22 is made of an electrically conductive member. Further, as described later, the leads 22 are elastic so that when connected to the first and second substrates 1 and 2, they can be bent by thermal strain generated between the first and second substrates 1 and 2. It has what has.

【0020】これらのリード22としては、42合金や
Cu合金などを用いることができる。また、第1及び第
2の基板1、2と熱膨張係数が近いものが望ましく、具
体的には、第1及び第2の基板1、2としてガラスエポ
キシ基板を用いる場合は、Cu合金を用いると良い。
As these leads 22, a 42 alloy, a Cu alloy or the like can be used. Further, it is desirable that the first and second substrates 1 and 2 have thermal expansion coefficients close to each other. Specifically, when a glass epoxy substrate is used as the first and second substrates 1 and 2, a Cu alloy is used. And good.

【0021】各々のリード22は中央部が枠体21の内
部に配置されて固定され、両端が枠体21のうちの枠体
21の厚み方向(第1及び第2の基板1、2の法線方
向)の中央部から突出している。そして、リード22の
一端が上側に曲げられ、他端が下側に曲げられて、各々
のリード22はガルウィング形状になっている。また、
両端の先端部は半田等によりメッキされている。
Each of the leads 22 has a central portion disposed inside the frame 21 and fixed thereto, and has both ends in the thickness direction of the frame 21 of the frame 21 (in the direction of the first and second substrates 1 and 2). (In the line direction). One end of the lead 22 is bent upward and the other end is bent downward, so that each lead 22 has a gull-wing shape. Also,
The tips at both ends are plated with solder or the like.

【0022】そして、図1に示すように、第1の基板1
の表面と第2の基板2の裏面に複数個の接続用ランド
(本発明でいう第1及び第2のランド)1b、2bが形
成されて、スペーサ20のリード22を介して、第1の
基板1の接続用ランド1bと第2の基板2の接続用ラン
ド2bが電気的に接続され、第1及び第2の基板1、2
が電気的に接続されている。
Then, as shown in FIG. 1, the first substrate 1
A plurality of connection lands (first and second lands in the present invention) 1 b and 2 b are formed on the front surface of the second substrate 2 and the back surface of the second substrate 2. The connection lands 1b of the substrate 1 and the connection lands 2b of the second substrate 2 are electrically connected, and the first and second substrates 1 and 2 are connected.
Are electrically connected.

【0023】このリード22と接続用ランド1b、2b
とは、半田や導電性ペースト等の接続部材を介して電気
的に接続されている。また、リード22を第1及び第2
の基板1、2に接続した状態では、枠体21と第1及び
第2の基板1、2との間には隙間が生じている。
The lead 22 and the connecting lands 1b, 2b
Are electrically connected via a connection member such as solder or conductive paste. Also, the lead 22 is connected to the first and second leads.
In the state of being connected to the first and second substrates 1 and 2, there is a gap between the frame 21 and the first and second substrates 1 and 2.

【0024】そして、この様な構成のマルチチップ半導
体装置を作動させ、第1及び第2の基板1、2に異なる
熱歪みが生じた場合、リード22がたわむようになって
いる。
When the multichip semiconductor device having such a configuration is operated and different thermal strains occur in the first and second substrates 1 and 2, the leads 22 bend.

【0025】本実施形態では、リード22を介して第1
及び第2の基板1、2を接続しており、枠体21と第1
及び第2の基板1、2とが接合されていないため、第1
及び第2の基板2間で異なる熱歪みが生じた場合に、リ
ード22がたわむことができる。
In the present embodiment, the first
And the second substrates 1 and 2, and the frame 21 and the first
And the second substrates 1 and 2 are not bonded,
In the case where different thermal strains occur between the second substrate 2 and the second substrate 2, the leads 22 can bend.

【0026】従って、この熱歪みに起因する熱応力をリ
ード22により吸収することができるため、第1及び第
2の基板1、2とリード22との接続部に過大な熱応力
が加わることを防止して、第1及び第2の基板1、2と
リード22との接続を確保することができる。そのた
め、第1及び第2の基板1、2間の接続の劣化を抑制し
たマルチチップ半導体装置を提供することができる。
Accordingly, since the thermal stress caused by the thermal strain can be absorbed by the leads 22, excessive thermal stress is applied to the connection between the first and second substrates 1, 2 and the leads 22. In this way, the connection between the first and second substrates 1 and 2 and the leads 22 can be ensured. Therefore, it is possible to provide a multi-chip semiconductor device in which the deterioration of the connection between the first and second substrates 1 and 2 is suppressed.

【0027】次に、この様な構成のマルチチップ半導体
装置の製造方法について説明する。まず、第1及び第2
の基板1、2に対して、各種の部品3〜5を搭載する。
これらの搭載は、周知のフリップチップ法やワイヤボン
ディング法等により行うことができる。第2の基板2に
対しては、表裏面のうち一方の面に部品を搭載した後、
もう一方の面に部品を搭載すれば良い。
Next, a method of manufacturing a multi-chip semiconductor device having such a configuration will be described. First, the first and second
Various components 3 to 5 are mounted on the substrates 1 and 2.
These can be mounted by a known flip chip method, a wire bonding method, or the like. For the second substrate 2, after mounting components on one of the front and back surfaces,
It is sufficient to mount components on the other side.

【0028】また、スペーサ20を用意する。図3〜図
5はスペーサ20の形成方法を示す図であって、各図に
おいて(a)は平面図であり、(b)は(a)における
A−A断面図である。
Further, a spacer 20 is prepared. 3 to 5 are views showing a method of forming the spacer 20, wherein (a) is a plan view and (b) is a cross-sectional view taken along the line AA in (a).

【0029】まず、枠状の空間部を有する型(金型等)
を用意する。そして、図3に示すように、複数のリード
22が一体化されたリード部材23を型に配置する(型
は図示せず)。
First, a mold having a frame-shaped space (a mold or the like)
Prepare Then, as shown in FIG. 3, the lead member 23 in which the plurality of leads 22 are integrated is arranged in a mold (the mold is not shown).

【0030】そして、枠体21を構成する軟化状態の樹
脂を型内に注入してリード部材23をモールドする。そ
して軟化状態の樹脂を硬化させた後、型から取り出し
て、図4に示す様に、枠体21からリード部材23の両
端が突出した状態となる。つまり、QFP(Quad Flat P
ackage)に中子を入れた形でスペーサ20を成形する。
Then, the softened resin constituting the frame 21 is injected into the mold, and the lead member 23 is molded. After the resin in the softened state is cured, the resin is taken out of the mold, and both ends of the lead member 23 project from the frame 21 as shown in FIG. In other words, QFP (Quad Flat P
The spacer 20 is formed in a form in which a core is placed in the ackage).

【0031】その後、リード部材23のうち繋がった部
分を切断し、リード22の端部を半田等でメッキする。
そして、枠体21から突出したリード22の両端を上側
と下側に曲げることにより、図5に示す状態とする。こ
の様にしてスペーサ20が完成する。つまり、モールド
パッケージと同様にしてスペーサ20を形成することが
できる。
Thereafter, the connected portion of the lead member 23 is cut, and the end of the lead 22 is plated with solder or the like.
Then, both ends of the lead 22 protruding from the frame body 21 are bent upward and downward to obtain the state shown in FIG. Thus, the spacer 20 is completed. That is, the spacer 20 can be formed in the same manner as the mold package.

【0032】そして、このスペーサ20を第1の基板1
上に配置して、接続部材を介してリード22を第1の基
板1に形成された接続用ランド1bに対して接続する。
そして、第2の基板2をスペーサ20上に配置して、接
続部材を介して第2の基板2の接続用ランド2bとリー
ド22とを接続する。この様にして、本実施形態のマル
チチップ半導体装置が完成する。
Then, the spacer 20 is connected to the first substrate 1.
The lead 22 is connected to a connection land 1b formed on the first substrate 1 via a connection member.
Then, the second substrate 2 is arranged on the spacer 20, and the connection lands 2b of the second substrate 2 and the leads 22 are connected via the connection members. Thus, the multichip semiconductor device of the present embodiment is completed.

【0033】(第2実施形態)本実施形態は第1実施形
態と比較してスペーサ20の形状が異なる。以下、主と
して第1実施形態と異なる部分について述べる。図6は
本実施形態のスペーサ20の枠体21の一辺を部分的に
示す図であって、(a)は平面図であり、(b)は断面
図である。
(Second Embodiment) The present embodiment differs from the first embodiment in the shape of the spacer 20. Hereinafter, parts different from the first embodiment will be mainly described. FIGS. 6A and 6B are views partially showing one side of the frame 21 of the spacer 20 according to the present embodiment, wherein FIG. 6A is a plan view and FIG. 6B is a cross-sectional view.

【0034】図6に示すように、リード22の中央部は
枠体21の内部で固定されており、枠体21のうち第2
の基板2と対向する一面とほぼ同じ高さからリード22
の両端が突出している。そして、リード22の両端は枠
体21の一面と反対側の他面側に伸ばされて曲げられて
いる。
As shown in FIG. 6, the center of the lead 22 is fixed inside the frame 21 and the second
Lead 22 from substantially the same height as one surface facing substrate 2
Are protruding at both ends. Both ends of the lead 22 are extended and bent toward the other surface opposite to the one surface of the frame 21.

【0035】図7はこの様なスペーサ20を用いた場合
の第1及び第2の基板1、2との接続構成を示す概略断
面図である。図7に示すように、第1及び第2の基板
1、2の間にスペーサ20を配置し、第1及び第2の基
板1、2とリード22とを各々接続部材を介して接続す
る。この際、枠体21と第2の基板2とは接触し、枠体
21と第1の基板1との間に隙間ができる。
FIG. 7 is a schematic sectional view showing a connection structure between the first and second substrates 1 and 2 when such a spacer 20 is used. As shown in FIG. 7, a spacer 20 is disposed between the first and second substrates 1 and 2, and the first and second substrates 1 and 2 are connected to the leads 22 via connecting members. At this time, the frame 21 and the second substrate 2 come into contact with each other, and a gap is formed between the frame 21 and the first substrate 1.

【0036】この様な構成でも、第1実施形態と同様の
効果を発揮することができる。
With such a configuration, the same effect as in the first embodiment can be exhibited.

【0037】(他の実施形態)上記第2実施形態に示し
た構成のスペーサ20を図7とは上下を逆にした状態で
第1及び第2の基板1、2の間に配置しても良い。ま
た、枠体21の両側からリード22を突出させている
が、片側からのみ突出させても良い。また、枠体21と
第2の基板2とは接合しても良い。
(Other Embodiments) The spacer 20 having the structure shown in the second embodiment may be disposed between the first and second substrates 1 and 2 with the upside down of FIG. good. Further, the leads 22 are projected from both sides of the frame 21, but may be projected from only one side. Further, the frame body 21 and the second substrate 2 may be joined.

【0038】また、上記各実施形態では、スペーサ20
が枠体21とリード22とから構成されるものについて
示したが、直線状の部材、L字形状の部材、或はコの字
形状の部材のいずれかとリード22とから構成されるも
のを用いても良い。
In each of the above embodiments, the spacer 20
Has been described as comprising a frame 21 and a lead 22, but a member composed of a linear member, an L-shaped member, or a U-shaped member and a lead 22 is used. May be.

【0039】この場合、必要に応じて直線状の部材を複
数個用いたり、L字形状の部材を2個用いたり、コの字
形状の部材と直線状の部材とを組み合わせたりして、ス
ペーサ20が枠状に配置されるようにしても良い。ま
た、枠状に配置しなくても、コの字形状やL字形状に配
置したり、直線状の部材を略平行に配置したりしても良
い。
In this case, if necessary, a plurality of linear members may be used, two L-shaped members may be used, or a U-shaped member and a linear member may be combined to form a spacer. 20 may be arranged in a frame shape. Further, instead of being arranged in a frame shape, they may be arranged in a U-shape or L-shape, or linear members may be arranged substantially in parallel.

【0040】特に、直線状の部材を用いてスペーサ20
を構成する場合は、第2実施形態のように、直線状の部
材の一面と同じ高さからリード22の両端を突出させ、
直線状部材の他面側に伸ばして曲げるようにすると、ス
ペーサ20を第1及び第2の基板1、2の間に配置する
際に安定してスペーサ20を配置することができる。
In particular, the spacer 20 is formed by using a linear member.
In the case of the second embodiment, both ends of the lead 22 are projected from the same height as one surface of the linear member as in the second embodiment,
If the straight member is extended to the other surface side and bent, the spacer 20 can be stably arranged when the spacer 20 is arranged between the first and second substrates 1 and 2.

【0041】また、上記各実施形態ではリード22をガ
ルウィング形状にしているが、更に屈曲させてリード2
2をしなやかにすると、更に熱応力を吸収し易くなり望
ましい。具体的には、各リード22がZ字形状になる様
に曲げたり、曲げる回数を増やしたりすることができ
る。但し、リード22は、第2の基板2をある程度支え
ることができる程度の強度があるようにする。また、リ
ード22としては、42合金やCu合金以外にも、電気
伝導性を有し且つ弾性を有する材質より構成されるもの
を用いることができる。
In each of the above embodiments, the lead 22 has a gull-wing shape.
It is desirable to make 2 flexible so that thermal stress can be more easily absorbed. Specifically, each lead 22 can be bent so as to have a Z-shape, or the number of times of bending can be increased. However, the leads 22 should be strong enough to support the second substrate 2 to some extent. The lead 22 may be made of a material having electrical conductivity and elasticity other than the 42 alloy and the Cu alloy.

【0042】また、スペーサ20の形成はモールドによ
り行う場合について示したが、リード22を板状の樹脂
により挟み込み接着する等してスペーサ20を形成して
も良い。また、枠体21や直線状の部材、L字形状の部
材、或はコの字形状の部材としてエポキシ樹脂を用いな
くても、セラミック基板を用いてリード22を固定する
ようにしたスペーサ20を用いても良い。
Although the case where the spacer 20 is formed by molding has been described, the spacer 20 may be formed by sandwiching and bonding the lead 22 with a plate-like resin. In addition, the frame 21 and the spacer 20 that fixes the lead 22 using a ceramic substrate without using an epoxy resin as the U-shaped member or the U-shaped member may be used. May be used.

【0043】また、スペーサ20としては、リード22
の中央部分が枠体21や直線状の部材、L字形状の部
材、或はコの字形状の部材の内部で固定されるようにし
なくても、表面にリード22が出ていても良い。具体的
には、第2実施形態で示した様な構成のスペーサ20に
おいて、第2の基板2と対向する部位でもリード22が
表面に出た状態にし、この表面に出ている部位と第2の
基板2の接続用ランド2bとを接続するようにしても良
い。
As the spacer 20, a lead 22 is used.
The central part of the lead 22 does not have to be fixed inside the frame 21, a linear member, an L-shaped member, or a U-shaped member, but the lead 22 may be exposed on the surface. Specifically, in the spacer 20 having the structure as shown in the second embodiment, the lead 22 is made to protrude even at a portion facing the second substrate 2, and the portion protruding from this surface and the second The connection lands 2b of the substrate 2 may be connected.

【0044】また、第1実施形態では、第1及び第2の
基板1、2と枠体21とが接触する様な構成にしても良
く、第2実施形態では、第1の基板1と枠体21とが接
触する様な構成にしても良い。また、2層の基板1、2
を積層する例について示したが、3層以上の基板を積層
しても良い。
In the first embodiment, the structure may be such that the first and second substrates 1 and 2 and the frame 21 are in contact with each other. In the second embodiment, the first substrate 1 and the frame The configuration may be such that the body 21 is in contact with the body 21. Also, two layers of substrates 1, 2
Although the example of laminating is shown, three or more layers of substrates may be laminated.

【0045】また、この様なマルチチップ半導体装置を
製造する際は、第1の基板1に各種の部品を搭載する際
に、同時にスペーサ20を実装しても良い。
When manufacturing such a multi-chip semiconductor device, the spacers 20 may be mounted simultaneously when various components are mounted on the first substrate 1.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施形態に係るマルチチップ半導
体装置の概略断面図である。
FIG. 1 is a schematic sectional view of a multi-chip semiconductor device according to a first embodiment of the present invention.

【図2】本発明の第1実施形態に係るスペーサの平面図
である。
FIG. 2 is a plan view of the spacer according to the first embodiment of the present invention.

【図3】本発明の第1実施形態に係るスペーサの製造方
法を示す概略図である。
FIG. 3 is a schematic view illustrating a method for manufacturing a spacer according to the first embodiment of the present invention.

【図4】図3に続く工程を示す概略図である。FIG. 4 is a schematic view showing a step following FIG. 3;

【図5】図4に続く工程を示す概略図である。FIG. 5 is a schematic view showing a step following FIG. 4;

【図6】本発明の第2実施形態に係るスペーサの概略図
である。
FIG. 6 is a schematic view of a spacer according to a second embodiment of the present invention.

【図7】本発明の第2実施形態に係るマルチチップ半導
体装置を部分的に示す概略断面図である。
FIG. 7 is a schematic sectional view partially showing a multi-chip semiconductor device according to a second embodiment of the present invention.

【図8】従来のマルチチップ半導体装置の概略断面図で
ある。
FIG. 8 is a schematic sectional view of a conventional multi-chip semiconductor device.

【図9】従来のマルチチップ半導体装置で用いる枠体を
示す図である。
FIG. 9 is a view showing a frame used in a conventional multi-chip semiconductor device.

【符号の説明】[Explanation of symbols]

1…第1の基板、1b…接続用ランド(第1のラン
ド)、2…第2の基板、2b…接続用ランド(第2のラ
ンド)、3〜5…電子部品、20…スペーサ、22…リ
ード。
DESCRIPTION OF SYMBOLS 1 ... 1st board | substrate, 1b ... Connection land (1st land), 2 ... 2nd board, 2b ... Connection land (2nd land), 3-5 ... Electronic components, 20 ... Spacer, 22 ... lead.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 1/18 3/36 Fターム(参考) 5E336 AA04 AA14 BB02 CC31 CC36 CC51 CC52 CC53 CC58 EE01 EE05 EE08 EE17 EE20 GG01 5E344 AA01 AA16 AA19 AA22 BB02 BB06 CC23 CD14 CD27 DD02 DD06 EE01 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05K 1/18 3/36 F-term (Reference) 5E336 AA04 AA14 BB02 CC31 CC36 CC51 CC52 CC53 CC58 EE01 EE05 EE08 EE17 EE20 GG01 5E344 AA01 AA16 AA19 AA22 BB02 BB06 CC23 CD14 CD27 DD02 DD06 EE01

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 電子部品(3〜5)が実装された第1及
び第2の基板(1、2)を有し、前記第1及び第2の基
板がスペーサ(20)を間に配置して積層されてなるマ
ルチチップ半導体装置において、 前記スペーサは、前記第1及び第2の基板を電気的に接
続するリード(22)を有し、該リードは、前記第1及
び第2の基板間に生じる熱歪みによってたわむことがで
きるように弾性を有するものであることを特徴とするマ
ルチチップ半導体装置。
An electronic device includes first and second substrates (1 and 2) on which electronic components (3 to 5) are mounted, and the first and second substrates have a spacer (20) interposed therebetween. In the multi-chip semiconductor device formed by stacking, the spacer has a lead (22) for electrically connecting the first and second substrates, and the lead is provided between the first and second substrates. A multi-chip semiconductor device having elasticity so that it can be bent by thermal strain generated in the multi-chip semiconductor device.
【請求項2】 前記第1の基板における前記第2の基板
と対向する面に複数個の第1のランド(1b)が形成さ
れており、 前記第2の基板における前記第1の基板と対向する面に
複数個の第2のランド(2b)が形成されており、 前記スペーサは複数個の前記リードを有しており、 前記第1のランドの各々と前記第2のランドの各々と
が、前記リードの各々を介して電気的に接続されている
ことを特徴とする請求項1に記載のマルチチップ半導体
装置。
2. A plurality of first lands (1b) are formed on a surface of the first substrate facing the second substrate, and a plurality of first lands are formed on the surface of the second substrate facing the first substrate. A plurality of second lands (2b) are formed on a surface to be formed, the spacer has a plurality of the leads, and each of the first lands and each of the second lands are 2. The multi-chip semiconductor device according to claim 1, wherein said multi-chip semiconductor device is electrically connected through each of said leads.
JP2001007847A 2001-01-16 2001-01-16 Multi-chip semiconductor device and manufacturing method thereof Expired - Fee Related JP4572467B2 (en)

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