JP3450477B2 - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof

Info

Publication number
JP3450477B2
JP3450477B2 JP31712294A JP31712294A JP3450477B2 JP 3450477 B2 JP3450477 B2 JP 3450477B2 JP 31712294 A JP31712294 A JP 31712294A JP 31712294 A JP31712294 A JP 31712294A JP 3450477 B2 JP3450477 B2 JP 3450477B2
Authority
JP
Japan
Prior art keywords
substrate
predetermined number
semiconductor device
substrates
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP31712294A
Other languages
Japanese (ja)
Other versions
JPH08172144A (en
Inventor
正司 竹中
順一郎 日吉
純一 河西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP31712294A priority Critical patent/JP3450477B2/en
Publication of JPH08172144A publication Critical patent/JPH08172144A/en
Application granted granted Critical
Publication of JP3450477B2 publication Critical patent/JP3450477B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、多層構造パッケージの
半導体装置に関する。近年、電子機器の小型化に伴っ
て、実装される半導体装置においても実装効率が良好で
軽量、低コストのパフォーマンスの高いパッケージが求
められている。そのため、パッケージを多層構造とする
ことが行われており、さらに低コストで高密度実装可能
とすることが望まれている。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device having a multilayer structure package. With the recent miniaturization of electronic devices, there is a demand for high-performance packages that have good mounting efficiency, light weight, and low cost even in semiconductor devices to be mounted. Therefore, the package is made to have a multi-layered structure, and it is desired that the package can be mounted at a high density at a lower cost.

【0002】[0002]

【従来の技術】図12に、従来の多層BGAパッケージ
の半導体装置の構成図を示す。図12(A)は断面図、
図12(B)は底面図である。図12(A),(B)に
示す半導体装置11は、多層構造のBGA(BallG
rid Arrey)パッケージのもので、多層基板1
2内に半導体チップ13が搭載されている。多層基板1
2は、例えばガラスエポキシで形成され、所定の配線パ
ターンが形成された基板121 〜125 が積層されてお
り、ベースとなる基板121 上に半導体チップ13が接
着材14により搭載される。
2. Description of the Related Art FIG. 12 is a block diagram of a conventional semiconductor device of a multi-layer BGA package. FIG. 12A is a sectional view,
FIG. 12B is a bottom view. A semiconductor device 11 shown in FIGS. 12A and 12B is a multi-layered BGA (BallG).
multi-layer substrate 1 in a rigid array package.
A semiconductor chip 13 is mounted in the unit 2. Multilayer board 1
2 is formed of, for example, glass epoxy, are given substrate 12 1 to 12 5 on which a wiring pattern is formed is stacked, the semiconductor chip 13 is mounted by an adhesive 14 on the substrate 12 1 as a base.

【0003】また、基板122 ,123 は半導体チップ
13の搭載領域部分が開口され、さらに基板124 ,1
5 が順次大きさを異ならせて開口される。半導体チッ
プ13と、基板123 ,124 上の所定のパターン端子
とがワイヤ15によりボンディングされて電気的接続が
行われる。さらに、基板121 〜125 はそのパターン
間がスルーホールで所定の電気的接続が行われており、
基板125 上に外部との接続を行うための所定数の半田
ボール16が設けられる。また、開口部分にキャップ1
7が取り付けられる。
The substrates 12 2 and 12 3 are opened in the mounting region of the semiconductor chip 13, and the substrates 12 4 and 1 are further opened.
2 5 are sequentially opened with varying sizes. The semiconductor chip 13 and the predetermined pattern terminals on the substrates 12 3 and 12 4 are bonded by the wires 15 to make electrical connection. Furthermore, the substrate 12 1 to 12 5 are among the pattern is performed a predetermined electrical connection through-hole,
A predetermined number of solder balls 16 are provided on the substrate 12 5 for external connection. Also, cap 1 on the opening.
7 is attached.

【0004】そして、多層基板12の半田ボール16の
反対側に放熱のためのヒートシンク18が取り付けられ
ている。このような半導体装置11は、多層構造となっ
ていることから、実装性に優れて高速であり、外部端子
(半田ボール16)の増大を図ることができる。また、
半田ボール16を外部端子とすることからPGA(Pi
n Grid Arrey)パッケージに比べて安価と
することができるものである。
A heat sink 18 for heat dissipation is attached to the side of the multilayer substrate 12 opposite to the solder balls 16. Since such a semiconductor device 11 has a multi-layer structure, it has excellent mountability and high speed, and the number of external terminals (solder balls 16) can be increased. Also,
Since the solder balls 16 are used as external terminals, PGA (Pi
It can be cheaper than an n grid array) package.

【0005】[0005]

【発明が解決しようとする課題】しかし、上記多層BG
Aパッケージの半導体装置11は、搭載される半導体チ
ップ13の性能が向上するにつれて層数が増大し、構造
複雑、製造コスト高となる。特に、層数が所定数より超
えると飛躍的にコスト高になる傾向となり、パッケージ
コストのみならず総合的に低コスト化を図ることができ
ないという問題がある。
However, the above-mentioned multilayer BG
In the semiconductor device 11 of the A package, the number of layers increases as the performance of the semiconductor chip 13 to be mounted is improved, and the structure becomes complicated and the manufacturing cost becomes high. In particular, if the number of layers exceeds a predetermined number, the cost tends to increase dramatically, and there is a problem that not only the package cost but also the overall cost reduction cannot be achieved.

【0006】そこで、本発明は上記課題に鑑みなされた
もので、高密度実装、低コスト化を図る半導体装置を提
供することを目的とする。
Therefore, the present invention has been made in view of the above problems, and an object of the present invention is to provide a semiconductor device capable of high-density mounting and cost reduction.

【0007】[0007]

【課題を解決するための手段】上記課題を解決するため
に、請求項1では、所定パターンが形成され、所定数の
半導体チップが接着材により搭載されて該パターンと電
気的接続された第1の基板と、該第1の基板と接続部材
により電気的接続されるものであって、一方面に所定数
の外部端子が形成された第2の基板とを有し、該第1の
基板上の該半導体チップは封止部材により覆われ封止さ
れてなり、該第2の基板は、該第1の基板上の半導体チ
ップを位置させる開口部が形成された半導体装置を構成
する。
According to a first aspect of the present invention, a predetermined pattern is formed and a predetermined number of semiconductor chips are mounted by an adhesive and electrically connected to the pattern. And a second substrate that is electrically connected to the first substrate by a connecting member and has a predetermined number of external terminals formed on one surface thereof .
The semiconductor chip on the substrate is covered and sealed with a sealing member.
The second substrate constitutes a semiconductor device in which an opening for positioning the semiconductor chip on the first substrate is formed.

【0008】請求項2では、請求項1記載の第1の基板
及び第2の基板のうち、少くとも該第2の基板が、積層
基板で形成されてなる。請求項3では、請求項1記載の
外部端子は、ボール形状又はピン形状の立体電極で形成
されてなる。請求項4では、請求項1記載の接続部材
は、電気的接続に応じた個数の高融点導電金属を含む導
電性接着材により形成されてなる。
According to a second aspect, at least the second substrate of the first substrate and the second substrate according to the first aspect is formed of a laminated substrate. In the third aspect, the external terminal according to the first aspect is formed of a ball-shaped or pin-shaped three-dimensional electrode. In a fourth aspect, the connection member according to the first aspect is formed of a conductive adhesive material containing a high-melting-point conductive metal in the number corresponding to electrical connection.

【0009】請求項5では、請求項1、2又は記載の
第2の基板は、前記開口部を塞ぐ基板が積層されて前記
外部端子が全面又は一部領域上で形成されてなる。
[0009] In claim 5, the second substrate according to claim 1, 2 or 4, wherein, the external terminal is formed on the entire surface or a partial area substrate for closing the opening is laminated.

【0010】請求項では、請求項1又は記載の第1
の基板と第2の基板との間に、前記接続部材で電気的接
続される所定数の中間基板が設けられる。請求項
は、請求項1,5又は6記載の第2の基板上に所定数の
半導体チップが搭載されてなる。請求項では、請求項
の中間基板間に、所定数の半導体チップが搭載された
所定数の第3の基板が電気的接続されて介在される。
According to a sixth aspect, the first aspect of the first or fifth aspect is provided.
A predetermined number of intermediate substrates electrically connected by the connecting member are provided between the first substrate and the second substrate. In a seventh aspect , a predetermined number of semiconductor chips are mounted on the second substrate according to the first, fifth or sixth aspect . Claim 8
A predetermined number of third substrates on which a predetermined number of semiconductor chips are mounted are electrically connected and interposed between the intermediate substrates of 6 .

【0011】請求項では、請求項1〜の何れか一項
において、前記第1の基板における表出面に放熱部材が
設けられる。請求項10では、所定数の半導体チップを
搭載した第1の基板を形成する工程と、該第1の基板上
の半導体チップを位置させる開口部が形成された複数の
基板を積層して第2の基板を形成する工程と、該第1及
び第2の基板とを、電気的接続を行う溶融金属性の接続
部材を介在させて位置合せを行う工程と、所定温度下で
該接続部材を溶融させて第1及び第2の基板とを接着し
て電気的接続を行う工程と、該第2の基板上に所定数の
外部端子を形成する工程と、を含んで半導体装置の製造
方法を構成する。
According to a ninth aspect , in any one of the first to eighth aspects, a heat dissipation member is provided on the exposed surface of the first substrate. According to a tenth aspect of the present invention, a step of forming a first substrate on which a predetermined number of semiconductor chips are mounted, and a plurality of openings formed with the semiconductor chips on the first substrate are formed.
A step of stacking the substrates to form a second substrate, a step of aligning the first and second substrates with a molten metallic connection member for electrical connection therebetween, and a predetermined temperature And a step of melting the connection member to bond the first and second substrates to each other for electrical connection, and a step of forming a predetermined number of external terminals on the second substrate. A method of manufacturing a semiconductor device is configured.

【0012】請求項11では、請求項10記載の第1及
び第2の基板間に、前記接続部材で電気的接続を行う所
定数の中間基板を介在させて前記位置合せが行われる。
請求項12では、請求項11記載の中間基板間に、所定
数の半導体チップが搭載された所定数の第3の基板が介
在されて前記位置合せが行われる。請求項13では、請
求項10〜12の何れか一項に記載の第2の基板上に、
所定数の半導体チップが搭載される。
In the eleventh aspect, the alignment is performed between the first and second substrates according to the tenth aspect by interposing a predetermined number of intermediate substrates electrically connected by the connecting member.
In a twelfth aspect , the alignment is performed by interposing a predetermined number of third substrates on which a predetermined number of semiconductor chips are mounted between the intermediate substrates according to the eleventh aspect . In claim 13 , on the second substrate according to any one of claims 10 to 12 ,
A predetermined number of semiconductor chips are mounted.

【0013】[0013]

【作用】上述のように請求項1乃至4、又は10の発明
では、所定数の半導体チップが搭載されて適宜封止され
た第1の基板と、該半導体チップを位置させる開口部を
形成させて積層され、一方面に立体電極等の外部端子が
形成された第2の基板とを、高融点導電金属を含む導電
性接着材等の接続部材を介在させて位置合せ後に接続さ
れる。これにより、第1及び第2の基板を個々に独立さ
せていることから一基板当りの内部構造層数が削減され
て製造工程が簡易となって歩留りの向上、低コストを図
ることが可能となる。
As described above, according to the first to fourth or tenth aspects of the present invention, the first substrate on which a predetermined number of semiconductor chips are mounted and appropriately sealed, and the opening for positioning the semiconductor chips are formed. The second substrate, which is laminated on one side and has external terminals such as three-dimensional electrodes formed on one surface thereof, is positioned and connected through a connecting member such as a conductive adhesive material containing a high melting point conductive metal. As a result, since the first and second substrates are individually independent, the number of internal structure layers per substrate is reduced, the manufacturing process is simplified, and the yield can be improved and the cost can be reduced. Become.

【0014】請求項5乃至7,11又は13の発明で
は、適宜所定数の半導体チップが搭載された第2の基板
が開口部を塞ぐ基板を積層して全面又は一部領域上に外
部端子が形成され、適宜中間基板を介在させて第1の基
板と接続される。これにより、多様化が可能になると共
に、低コストで実装密度の向上を図ることが可能とな
る。
According to the invention of claims 5 to 7, 11 or 13 , the second substrate on which a predetermined number of semiconductor chips are mounted is laminated with the substrate closing the opening, and external terminals are formed on the entire surface or part of the area. It is formed and is appropriately connected to the first substrate with an intermediate substrate interposed. As a result, it becomes possible to diversify and to improve the mounting density at low cost.

【0015】請求項8又は12の発明では、さらに中間
基板間に所定数の半導体チップを搭載した所定数の第3
の基板を介在させる。これにより、多様化が可能になる
と共に、低コストで実装密度の向上を図ることが可能と
なる。請求項の発明では、第1の基板の表出面に放熱
部材を設ける。これにより、高密度実装に伴う温度上昇
を効率的に放熱することが可能となる。
According to the invention of claim 8 or 12 , a predetermined number of third chips, each having a predetermined number of semiconductor chips mounted between the intermediate substrates, are further provided.
Interpose the substrate. As a result, it becomes possible to diversify and to improve the mounting density at low cost. In the invention of claim 9 , the heat dissipation member is provided on the exposed surface of the first substrate. This makes it possible to efficiently radiate the temperature rise due to high-density mounting.

【0016】[0016]

【実施例】図1に、本発明の第1実施例の構成図を示
す。図1(A)は底部斜視図、図1(B)は断面図であ
る。図1(A),(B)に示す半導体装置21Aは、第
1の基板22と第2の基板23とにより構成される。第
1の基板22は、金属配線のパターンが形成されたセラ
ミック基板241 〜244 を例えば4層に積層したセラ
ミック多層基板24が用いられ、該セラミック多層基板
24(セラミック基板244 )の上基板上にAu(金)
等のリード25が所定の端子数に応じて形成される。そ
して、半導体チップ26が銀ペースト等の接着材27に
より搭載される。なお、セラミック多層基板24は、各
セラミック基板の対応するパターン間でスルーホールに
より電気的接続が行われている。
FIG. 1 is a block diagram of the first embodiment of the present invention. 1A is a bottom perspective view, and FIG. 1B is a cross-sectional view. A semiconductor device 21A shown in FIGS. 1A and 1B is composed of a first substrate 22 and a second substrate 23. As the first substrate 22, a ceramic multilayer substrate 24 in which ceramic substrates 24 1 to 24 4 on which a pattern of metal wiring is formed is laminated, for example, in four layers is used, and on the ceramic multilayer substrate 24 (ceramic substrate 24 4 ). Au (gold) on the substrate
Leads 25, etc. are formed according to a predetermined number of terminals. Then, the semiconductor chip 26 is mounted with an adhesive 27 such as silver paste. The ceramic multilayer substrate 24 is electrically connected by through holes between the corresponding patterns of each ceramic substrate.

【0017】搭載された半導体チップ26は、周囲に配
設されたリード25とワイヤ28によりボンディングさ
れて電気的接続が行われている。そして、半導体チップ
26及びワイヤ28を覆うように封止部29が形成され
ている。一方、第2の基板23は、金属配線層のパター
ンが形成されたプリント基板311 〜314 を各基板間
でスルーホールにより電気的接続されて例えば4層に積
層したプリント多層基板31が用いられる。この場合、
後に第1の基板22と接続されるときの半導体チップ2
6(封止部29)を位置させる部分に開口部32が形成
されている。
The mounted semiconductor chip 26 is electrically connected by being bonded to the leads 25 and wires 28 arranged around it. A sealing portion 29 is formed so as to cover the semiconductor chip 26 and the wires 28. On the other hand, the second substrate 23, the printed multilayer substrate 31 obtained by laminating a printed circuit board 31 1-31 4 the pattern of the metal wiring layers are formed in four layers, for example, are electrically connected by a through-hole between each substrate using To be in this case,
The semiconductor chip 2 when it is later connected to the first substrate 22.
An opening 32 is formed in a portion where 6 (sealing portion 29) is located.

【0018】また、プリント多層基板31のプリント基
板314 上に、外部端子としての立体電極となる金属ボ
ール(ピンでもよい)33が、該プリント基板314
に設けられた所定数のパッド(図に表われず)に形成さ
れている。そして、第2の基板23の開口部32内に半
導体チップ26(封止部29)を位置させて、当該第2
の基板23のプリント基板311 上の所定パターンと、
第1の基板22の対応するリード25との間に高融点導
電金属を含む導電性接着材である接続部材34を介在さ
せて電気的接続させ、固着したものである。
Further, on the printed board 31 4 of the printed multilayer board 31, metal balls (which may be pins) 33 serving as three-dimensional electrodes as external terminals are provided on the printed board 31 4 by a predetermined number of pads ( (Not shown in the figure). Then, the semiconductor chip 26 (sealing portion 29) is positioned in the opening 32 of the second substrate 23, and the second
A predetermined pattern on the printed board 31 1 of the board 23 of
A connection member 34, which is a conductive adhesive containing a high-melting-point conductive metal, is interposed between the corresponding lead 25 of the first substrate 22 and electrically connected and fixed.

【0019】なお、半導体チップ26の電気的接続は、
ワイヤ28に限らずフリップチップ、TAB(Tape
Automated Bonding)で行ってもよ
い。そこで、図2に、図1の製造説明図を示す。また、
図3に図1における第1の基板の構成図を示すと共に、
図4に図1における第2の基板の構成図を示す。この場
合、図3(A)は第1の基板の断面図、図3(B)は第
1の基板の平面図、図4(A)は第2の基板の断面図、
図4(B)は第2の基板の平面図である。
The electrical connection of the semiconductor chip 26 is
Not limited to the wire 28, flip chip, TAB (Tape)
You may perform by Automated Bonding). Therefore, FIG. 2 shows a manufacturing explanatory view of FIG. Also,
FIG. 3 shows a block diagram of the first substrate in FIG.
FIG. 4 shows a configuration diagram of the second substrate in FIG. In this case, FIG. 3A is a cross-sectional view of the first substrate, FIG. 3B is a plan view of the first substrate, and FIG. 4A is a cross-sectional view of the second substrate.
FIG. 4B is a plan view of the second substrate.

【0020】図2において、まず第1の基板22が形成
されると共に(ステップ(S)1a)、第2の基板23
が形成される。第1の基板22は、図3(A),(B)
に示すように、前述のセラミック多層基板24がシート
積層法や印刷多層法等によりアルミナと導体の焼成やア
ルミナペーストの印刷により多層(4層)に積層された
もので、セラミック基板244上にAuめっきによりリ
ード25及び配線パターン25aが形成される。
In FIG. 2, the first substrate 22 is first formed (step (S) 1a), and the second substrate 23 is formed.
Is formed. The first substrate 22 is shown in FIGS.
As shown in, in which the ceramic multilayer substrate 24 described above are stacked in multiple layers (four layers) by printing the alumina and the conductor of the firing and the alumina paste by a sheet lamination method or a printing multilayer method, the ceramic substrate 24 4 on The lead 25 and the wiring pattern 25a are formed by Au plating.

【0021】そして、半導体チップ26が接着材27に
より搭載され、ワイヤ28によりリード25と電気的接
続される。その後、半導体チップ26とワイヤ28の部
分をトランスファモールド又はポッティングによりモー
ルド樹脂で封止部(パッケージ)29が形成されたもの
である。一方、第2の基板23は、図4(A),(B)
に示すように、プリント多層基板31が、両面に配線パ
ターンを示したプリント基板間をスルーホールで電気的
接続されて4層に積層したもので、中央部分に半導体チ
ップ26(封止部29)を位置させるための開口部32
が形成されたものである。そして、プリント基板311
上に高融点溶融金属の接続部材34が規則的に形成され
る。
Then, the semiconductor chip 26 is mounted by the adhesive 27, and is electrically connected to the lead 25 by the wire 28. After that, the sealing portion (package) 29 is formed of the molding resin by transfer molding or potting the semiconductor chip 26 and the wire 28. On the other hand, the second substrate 23 is shown in FIGS.
As shown in FIG. 3, a printed multilayer board 31 is a four-layered structure in which printed boards having wiring patterns on both sides are electrically connected by through holes and laminated in four layers, and the semiconductor chip 26 (sealing portion 29) is formed in the central portion. Opening 32 for positioning
Are formed. And the printed circuit board 31 1
The connection members 34 of the high melting point molten metal are regularly formed on the upper surface.

【0022】図2に戻り、図3及び図4で形成された第
1及び第2の基板22,23が、該第1の基板22のリ
ード25と該第2の基板23上の接続部材34とで位置
合せされる(S2)。位置合せ後、リフロー方式により
接続部材34が溶融する温度に加熱して当該第1及び第
2の基板22,23とが電気的接続された状態で固着さ
れる(S3)。
Returning to FIG. 2, the first and second substrates 22 and 23 formed in FIGS. 3 and 4 are connected to the lead 25 of the first substrate 22 and the connecting member 34 on the second substrate 23. It is aligned with and (S2). After alignment, the connection member 34 is heated to a melting temperature by a reflow method and fixed to the first and second substrates 22 and 23 in an electrically connected state (S3).

【0023】そして、第2の基板23のプリント基板3
4 上に、図1に示すように半田等の低融点溶融金属の
金属ボール(バンプ)33が、例えば転写法によって形
成されるものである(S4)。このような半導体装置2
1Aは、各独立状態の4層の第1の基板22と4層の第
2の基板23とが接合されて、8層構造のBGAパッケ
ージが形成される。ところで、従来において8層構造の
パッケージを形成する場合、その製造工程が複雑となっ
て歩留りが悪くコスト高となるが、本発明のように第1
の基板22と第2の基板23とに分けて多層とすること
から一基板当りの内部構造層数が削減される。これによ
り、製造工程の簡易化による歩留りが向上して低コスト
とすることができる。
The printed board 3 of the second board 23
On 1 4, a low melting point molten metal of the metal balls (bumps) 33 such as solder, as shown in FIG. 1 is intended to be formed for example by the transfer method (S4). Such a semiconductor device 2
In 1A, the four-layer first substrate 22 and the four-layer second substrate 23 in each independent state are bonded to each other to form an 8-layer BGA package. By the way, in the case of forming a package having an eight-layer structure in the related art, the manufacturing process is complicated and the yield is poor and the cost is high.
Since the substrate 22 and the second substrate 23 are divided into multiple layers, the number of internal structure layers per substrate can be reduced. Thereby, the yield can be improved by the simplification of the manufacturing process and the cost can be reduced.

【0024】また、第1の基板22と第2の基板23と
を独立させることから、各基板ごとに試験を行うことが
でき、信頼性の向上を図ることができると共に、開発面
で多様化することができ、開発コストを低減させること
ができるものである。次に、図5に、本発明の第2実施
例の断面構成図を示す。図5に示す半導体装置21B
は、第2の基板23のプリント基板344aには開口部を
形成させず、他のプリント基板341 〜343 で形成さ
せた開口部32を塞いで密閉型としている。また、この
プリント基板344a上の全面に金属ボール34が配置形
成されたもので、他の構成は第1実施例と同様である。
Since the first substrate 22 and the second substrate 23 are independent of each other, a test can be conducted for each substrate, reliability can be improved, and development is diversified. Therefore, the development cost can be reduced. Next, FIG. 5 shows a sectional configuration diagram of a second embodiment of the present invention. Semiconductor device 21B shown in FIG.
Is the printed circuit board 34 4a of the second substrate 23 without forming an opening, and a hermetic closing the opening 32 is formed in another printed circuit board 34 1-34 3. Further, the metal balls 34 are arranged and formed on the entire surface of the printed circuit board 344a , and other configurations are similar to those of the first embodiment.

【0025】これによれば、金属ボール33の外部端子
を増大させることができ、高機能の半導体チップが搭載
されても対処することができるものである。また、図6
に、本発明の第3実施例の断面構成図を示す。図6に示
す半導体装置21Cは、第2実施例における第1の基板
22と第2の基板23との間に中間基板41を介在さ
せ、前述と同様の接続部材34により接続したもので、
他の構成は第2実施例と同様である。この場合、中間基
板41は、例えば4層のプリント基板を積層した多層基
板である。
According to this, the number of external terminals of the metal ball 33 can be increased, and it is possible to cope with the mounting of a high-performance semiconductor chip. In addition, FIG.
FIG. 7 shows a sectional configuration diagram of the third embodiment of the present invention. A semiconductor device 21C shown in FIG. 6 is obtained by interposing an intermediate substrate 41 between the first substrate 22 and the second substrate 23 in the second embodiment and connecting them by the same connecting member 34 as described above.
The other structure is the same as that of the second embodiment. In this case, the intermediate board 41 is a multilayer board in which, for example, four layers of printed boards are laminated.

【0026】すなわち、このような半導体装置21C
は、12層構造のBGAパッケージであり、低コストで
より多層構造とすることができるものである。続いて、
図7に、本発明の第3実施例の構成図を示す。図7に示
す半導体装置21Dでは、第1の基板22は、上記第1
〜第3実施例と同様である。図7において第2の基板2
3aは、開口部を形成せずにプリント基板311 〜31
4 を4層に積層し、プリント基板311 上に所定のパタ
ーン層42が形成されている。そして、半導体チップ2
6aがパターン層42とバンプ43により接続されて搭
載され、当該半導体チップ26をトランスファモールド
やポッティング等でモールド樹脂により封止して封止部
44を形成させたものである。また、プリント基板31
4 上には前述と同様の金属ボール33が形成される。
That is, such a semiconductor device 21C
Is a BGA package having a 12-layer structure, which can be formed into a multi-layer structure at low cost. continue,
FIG. 7 shows a block diagram of a third embodiment of the present invention. In the semiconductor device 21D shown in FIG. 7, the first substrate 22 is the above-mentioned first substrate.
~ Similar to the third embodiment. In FIG. 7, the second substrate 2
3a is a printed circuit board 31 1 to 31 without forming an opening.
4 is laminated in four layers, and a predetermined pattern layer 42 is formed on the printed board 31 1 . And the semiconductor chip 2
6a is mounted by being connected to the pattern layer 42 and the bumps 43, and the semiconductor chip 26 is sealed with a molding resin by transfer molding, potting or the like to form the sealing portion 44. In addition, the printed circuit board 31
4 of the metal balls 33 similar to the above is formed on the.

【0027】なお、半導体チップ26aの接続は上記の
ようにバンプ43によらずに、ワイヤやTABによって
行ってもよい。この第2の基板23aと第1の基板22
との間に、3つの中間基板411 〜413 が介在され
て、当該第1の基板22、第2の基板23、及び中間基
板411〜413 が前述と同様の接続部材34により接
合される。この場合、各中間基板411 〜413 は各開
口部32aが形成された4層のプリント多層基板であ
り、2つの半導体チップ26,26aを搭載した20層
構造のパッケージが構成される。
The semiconductor chip 26a may be connected by a wire or TAB instead of the bump 43 as described above. The second substrate 23a and the first substrate 22
And the three intermediate substrates 41 1 to 41 3 are interposed between the first substrate 22, the second substrate 23, and the intermediate substrates 41 1 to 41 3 by the same connecting member 34 as described above. To be done. In this case, each of the intermediate substrates 41 1 to 41 3 is a four-layer printed multilayer substrate in which the openings 32a are formed, and a 20-layer structure package in which two semiconductor chips 26, 26a are mounted is configured.

【0028】このように半導体装置21Dは、2つの半
導体チップ26,26aが搭載されたいわゆるMCM
(マルチチップモジュール)構造で、実装密度が向上さ
れると共に、安価かつハイパフォーマンスな多層構造の
パッケージとすることができるものである。次に、図8
に、本発明の第5実施例の断面構成図を示す。図8に示
す半導体装置21Eでは、第2の基板23は、第2実施
例(図5)と同様である。第1の基板22aは、図5
(図1)と同様にセラミック基板241 〜244 が積層
されたセラミック多層基板24の該セラミック基板24
4 上に2つの半導体チップ26 1 ,262 が接着材27
a,27bにより搭載される。
As described above, the semiconductor device 21D has two halves.
So-called MCM on which conductor chips 26, 26a are mounted
(Multi-chip module) structure improves packaging density
In addition to the low cost and high performance of the multilayer structure
It can be a package. Next, FIG.
FIG. 9 shows a sectional configuration diagram of the fifth embodiment of the present invention. Shown in Figure 8
In the semiconductor device 21E, the second substrate 23 is
Similar to the example (FIG. 5). The first substrate 22a is shown in FIG.
Ceramic substrate 24 similar to (FIG. 1)1~ 24FourStacked
Ceramic multi-layer substrate 24
FourTwo semiconductor chips 26 on top 1, 262Adhesive 27
a and 27b.

【0029】そして、セラミック基板244 上に形成さ
れたパターン25aと各半導体チップ261 ,262
ワイヤ28により電気的接続が行われ(フリップチッ
プ、TAB等でもよい)、封止部29a,29bにより
封止されたものである。このような半導体装置21E
は、従来の多層パッケージ構造と異なって第1の基板2
2aがフラットであることから、複数の半導体チップを
搭載することができ、低コストで実装密度を向上させる
ことができるものである。
Then, the pattern 25a formed on the ceramic substrate 24 4 and each of the semiconductor chips 26 1 and 26 2 are electrically connected by a wire 28 (a flip chip, a TAB or the like may be used), and a sealing portion 29a, It is sealed by 29b. Such a semiconductor device 21E
Unlike the conventional multi-layer package structure, the first substrate 2
Since 2a is flat, a plurality of semiconductor chips can be mounted and the packaging density can be improved at low cost.

【0030】続いて、図9に、本発明の第6実施例の断
面構成図を示す。図9に示す半導体装置21Fでは、第
1の基板22aは第5実施例(図8)と同様である。ま
た、第2の基板23aは、図7(第4実施例)における
1つの半導体チップ26aに代えて、2つの半導体チッ
プ26a1 ,26a2 をバンプ(ワイヤ、TAB等でも
よい)により搭載して封止部44a,44bにより封止
したものである。
Next, FIG. 9 shows a sectional view of the sixth embodiment of the present invention. In the semiconductor device 21F shown in FIG. 9, the first substrate 22a is the same as in the fifth embodiment (FIG. 8). Further, the second substrate 23a has two semiconductor chips 26a 1 and 26a 2 mounted by bumps (which may be wires, TAB or the like) instead of the one semiconductor chip 26a shown in FIG. 7 (fourth embodiment). It is sealed by the sealing portions 44a and 44b.

【0031】この場合、中間基板411aの端部に位置さ
れるプリント基板には開口部を設けずに、他のプリント
基板に形成された開口部を密閉しているもので、他の構
成は図7(第4実施例)と同様である。このような半導
体装置21Fに構成することによっても、低コストで実
装密度を向上させることができるものである。
In this case, the printed board located at the end of the intermediate board 411a is not provided with an opening, but the opening formed in another printed board is sealed. This is similar to FIG. 7 (fourth embodiment). By configuring the semiconductor device 21F as described above, the packaging density can be improved at low cost.

【0032】また、図10に、本発明の第7実施例の断
面構成図を示す。図10に示す半導体装置21Gは、第
4実施例(図7)において、中間基板414 を追加し、
中間基板411 ,412 と中間基板413 ,414 との
間に第3の基板45を介在させたもので、第1及び第2
の基板22,23aは図7と同様である。この第3の基
板45は、プリント基板による4層のプリント多層基板
のうち、一つのプリント基板上に半導体チップ26bを
搭載してワイヤ28により電気的接続を行ない封止部4
6により封止したもので、他のプリント基板に形成され
た開口部32b内に当該半導体チップ26b(封止部4
6)が位置されたものである。
FIG. 10 is a sectional view showing the configuration of the seventh embodiment of the present invention. A semiconductor device 21G shown in FIG. 10 has an intermediate substrate 41 4 added in the fourth embodiment (FIG. 7).
A third substrate 45 is interposed between the intermediate substrates 41 1 and 41 2 and the intermediate substrates 41 3 and 41 4, and the first and second substrates
Substrates 22 and 23a are the same as in FIG. The third substrate 45 is one of the four-layer printed multi-layered printed circuit boards on which the semiconductor chip 26b is mounted and electrically connected by the wires 28 to form the sealing portion 4.
6, which is sealed with the semiconductor chip 26b (sealing portion 4) in an opening 32b formed in another printed circuit board.
6) is located.

【0033】このような半導体装置21Gは、3つの半
導体チップ26,26a,26bを搭載した28層構造
のBGAパッケージを構成したもので、低コストでより
実装密度を向上させることができるものである。上記第
6及び第7実施例のように、中間基板を適宜追加すると
共に、所定数の第3の基板45を追加することにより、
また第1及び第2の基板22a,23a上に適宜半導体
チップ26,26a,26bを追加することにより、低
コストで高密度実装を実現することができるものであ
る。
Such a semiconductor device 21G constitutes a 28-layer structure BGA package on which three semiconductor chips 26, 26a and 26b are mounted, and the packaging density can be further improved at low cost. . As in the sixth and seventh embodiments, by appropriately adding an intermediate substrate and adding a predetermined number of third substrates 45,
Further, by appropriately adding the semiconductor chips 26, 26a, 26b on the first and second substrates 22a, 23a, it is possible to realize high-density mounting at low cost.

【0034】次に、図11に、本発明の第8実施例の構
成図を示す。図11に示す半導体装置21Hは、第1実
施例(図1)に示す第1の基板22の表出面上に、熱伝
導率の良好な例えばアルミニウムで形成された放熱部材
であるヒートシンク47を設けたもので、他の構成は図
1と同様である。このヒートシンク47により放熱を行
うもので、半導体チップ26の高集積化に伴う発熱の影
響を回避させることができるものである。
Next, FIG. 11 shows a block diagram of an eighth embodiment of the present invention. In the semiconductor device 21H shown in FIG. 11, a heat sink 47, which is a heat dissipation member made of, for example, aluminum, having good thermal conductivity is provided on the exposed surface of the first substrate 22 shown in the first embodiment (FIG. 1). The other configuration is similar to that of FIG. Since the heat sink 47 radiates heat, it is possible to avoid the influence of heat generation due to high integration of the semiconductor chip 26.

【0035】なお、このようなヒートシンク47を上述
の第2〜第7実施例においても適用することができるも
のである。
Incidentally, such a heat sink 47 can be applied to the above-mentioned second to seventh embodiments.

【0036】[0036]

【発明の効果】以上のように請求項1乃至4、又は10
の発明によれば、所定数の半導体チップが搭載されて適
宜封止された第1の基板と、該半導体チップを位置させ
る開口部を形成させて積層され、一方面に立体電極等の
外部端子が形成された第2の基板とを、高融点導電金属
を含む導電性接着材等の接続部材を介在させて位置合せ
後に接続されることにより、第1及び第2の基板を個々
に独立させていることから一基板当りの内部構造層数が
削減されて製造工程が簡易となって歩留りの向上、低コ
ストを図ることができる。
As described above, the first to fourth or tenth aspects are as described above.
According to the invention, a first substrate, on which a predetermined number of semiconductor chips are mounted and appropriately sealed, and an opening for positioning the semiconductor chips are formed and laminated, and external terminals such as three-dimensional electrodes are formed on one surface. The first and second substrates are individually separated by connecting the second substrate on which is formed after alignment by interposing a connecting member such as a conductive adhesive material containing a high melting point conductive metal therebetween. As a result, the number of internal structure layers per substrate is reduced, the manufacturing process is simplified, and the yield can be improved and the cost can be reduced.

【0037】請求項5乃至7,11又は13の発明によ
れば、適宜所定数の半導体チップが搭載された第2の基
板が開口部を塞ぐ基板を積層して全面又は一部領域上に
外部端子が形成され、適宜中間基板を介在させて第1の
基板と接続されることにより、多様化が可能になると共
に、低コストで実装密度の向上を図ることができる。請
求項8又は12の発明によれば、さらに中間基板間に所
定数の半導体チップを搭載した所定数の第3の基板を介
在させることにより、多様化が可能になると共に、低コ
ストで実装密度の向上を図ることができる。
According to the invention of claims 5 to 7, 11 or 13 , the second substrate, on which a predetermined number of semiconductor chips are mounted, is stacked on the substrate covering the opening to form an external layer on the entire surface or a partial area. Since the terminals are formed and are connected to the first substrate with the intermediate substrate interposed as appropriate, diversification is possible and the packaging density can be improved at low cost. According to the invention of claim 8 or 12 , further, by interposing a predetermined number of third substrates on which a predetermined number of semiconductor chips are mounted between the intermediate substrates, it becomes possible to diversify and at a low cost the mounting density. Can be improved.

【0038】請求項の発明によれば、第1の基板の表
出面に放熱部材を設けることにより、高密度実装に伴う
温度上昇を効率的に放熱することができる。
According to the ninth aspect of the present invention, by providing the heat radiation member on the exposed surface of the first substrate, it is possible to efficiently radiate the temperature rise due to the high-density mounting.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例の構成図である。FIG. 1 is a configuration diagram of a first embodiment of the present invention.

【図2】図1の製造説明図である。FIG. 2 is a manufacturing explanatory view of FIG. 1.

【図3】図1における第1の基板の構成図である。FIG. 3 is a configuration diagram of a first substrate in FIG.

【図4】図1における第2の基板の構成図である。4 is a configuration diagram of a second substrate in FIG.

【図5】本発明の第2実施例の断面構成図である。FIG. 5 is a sectional configuration diagram of a second embodiment of the present invention.

【図6】本発明の第3実施例の断面構成図である。FIG. 6 is a sectional configuration diagram of a third embodiment of the present invention.

【図7】本発明の第4実施例の断面構成図である。FIG. 7 is a sectional configuration diagram of a fourth embodiment of the present invention.

【図8】本発明の第5実施例の断面構成図である。FIG. 8 is a sectional configuration diagram of a fifth embodiment of the present invention.

【図9】本発明の第6実施例の断面構成図である。FIG. 9 is a sectional configuration diagram of a sixth embodiment of the present invention.

【図10】本発明の第7実施例の断面構成図である。FIG. 10 is a sectional configuration diagram of a seventh embodiment of the present invention.

【図11】本発明の第8実施例の断面構成図である。FIG. 11 is a sectional configuration diagram of an eighth embodiment of the present invention.

【図12】従来の多層BGAパッケージの半導体装置の
構成図である。
FIG. 12 is a configuration diagram of a semiconductor device of a conventional multi-layer BGA package.

【符号の説明】[Explanation of symbols]

21A〜21H 半導体装置 22 第1の基板 23,23a 第2の基板 24 セラミック多層基板 25 リード 26,26a,26b 半導体チップ 28 ワイヤ 29,44,46 封止部 31 プリント多層基板 32,32a 開口部 33 金属ボール 34 接続部材 41 中間基板 43 バンプ 45 第3の基板 47 ヒートシンク 21A-21H Semiconductor device 22 First substrate 23, 23a Second substrate 24 Ceramic Multilayer Substrate 25 leads 26, 26a, 26b Semiconductor chip 28 wires 29,44,46 Sealing part 31 Printed multilayer board 32, 32a opening 33 metal balls 34 Connection member 41 Intermediate board 43 bump 45 Third substrate 47 heat sink

フロントページの続き (56)参考文献 特開 昭61−268046(JP,A) 特開 平4−370957(JP,A) 特開 平4−69993(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 23/12 Continuation of front page (56) Reference JP-A-61-268046 (JP, A) JP-A-4-370957 (JP, A) JP-A-4-69993 (JP, A) (58) Fields investigated (Int .Cl. 7 , DB name) H01L 23/12

Claims (13)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 所定パターンが形成され、所定数の半導
体チップが接着材により搭載されて該パターンと電気的
接続された第1の基板と、 該第1の基板と接続部材により電気的接続されるもので
あって、一方面に所定数の外部端子が形成された第2の
基板と、 を有し、該第1の基板上の該半導体チップは封止部材により覆わ
れ封止されてなり、 該第2の基板は、該第1の基板上の半導体チップを位置
させる開口部が形成されてなることを特徴とする半導体
装置。
1. A predetermined pattern is formed and a predetermined number of semiconductors are formed.
Body chipsBy adhesiveEquipped with the pattern and electrical
A connected first substrate, Electrically connected to the first substrate by a connecting member.
The second terminal having a predetermined number of external terminals formed on one side.
Board, HaveThe semiconductor chip on the first substrate is covered with a sealing member.
And sealed, The second substrate positions the semiconductor chip on the first substrate.
A semiconductor having an opening formed therein
apparatus.
【請求項2】 請求項1記載の第1の基板及び第2の基
板のうち、少くとも該第2の基板が、積層基板で形成さ
れてなることを特徴とする半導体装置。
2. The semiconductor device according to claim 1, wherein at least the second substrate of the first substrate and the second substrate is formed of a laminated substrate.
【請求項3】 請求項1記載の外部端子は、ボール形状
又はピン形状の立体電極で形成されてなることを特徴と
する半導体装置。
3. The semiconductor device according to claim 1, wherein the external terminal is formed of a ball-shaped or pin-shaped three-dimensional electrode.
【請求項4】 請求項1記載の接続部材は、電気的接続
に応じた個数の高融点導電金属を含む導電性接着材によ
り形成されてなることを特徴とする半導体装置。
4. The semiconductor device according to claim 1, wherein the connection member is formed of a conductive adhesive material containing a high-melting-point conductive metal in a number corresponding to electrical connection.
【請求項5】 請求項1、2又は記載の第2の基板
は、前記開口部を塞ぐ基板が積層されて前記外部端子が
全面又は一部領域上で形成されてなることを特徴とする
半導体装置。
5. The second substrate according to claim 1, 2 or 4 , wherein substrates for closing the opening are stacked and the external terminals are formed on the entire surface or a partial area. Semiconductor device.
【請求項6】 請求項1又は記載の第1の基板と第2
の基板との間に、前記接続部材で電気的接続される所定
数の中間基板が設けられることを特徴とする半導体装
置。
6. The first substrate and the second substrate according to claim 1 or 5 .
The semiconductor device is characterized in that a predetermined number of intermediate substrates electrically connected to the substrate by the connection member are provided.
【請求項7】 請求項1,又は記載の第2の基板上
に所定数の半導体チップが搭載されてなることを特徴と
する半導体装置。
7. A semiconductor device comprising a predetermined number of semiconductor chips mounted on the second substrate according to claim 1, 5, or 6 .
【請求項8】 請求項の中間基板間に、所定数の半導
体チップが搭載された所定数の第3の基板が電気的接続
されて介在されることを特徴とする半導体装置。
8. A semiconductor device, wherein a predetermined number of third substrates on which a predetermined number of semiconductor chips are mounted are electrically connected and interposed between the intermediate substrates of claim 6 .
【請求項9】 請求項1〜の何れか一項において、前
記第1の基板における表出面に放熱部材が設けられるこ
とを特徴とする半導体装置。
In any one of the claims 9 claims 1-8, wherein a heat dissipation member to the exposed surface of the first substrate is provided.
【請求項10】 所定数の半導体チップを搭載した第1
の基板を形成する工程と、 該第1の基板上の半導体チップを位置させる開口部が形
成された複数の基板を積層して第2の基板を形成する工
程と、 該第1及び第2の基板とを、電気的接続を行う溶融金属
性の接続部材を介在させて位置合せを行う工程と、 所定温度下で該接続部材を溶融させて第1及び第2の基
板とを接着して電気的接続を行う工程と、 該第2の基板上に所定数の外部端子を形成する工程と、 を含むことを特徴とする半導体装置の製造方法。
10. A first device on which a predetermined number of semiconductor chips are mounted.
Forming a second substrate by stacking a plurality of substrates each having an opening for positioning a semiconductor chip on the first substrate, and forming a second substrate. A step of aligning the substrate with a molten metal connecting member for electrical connection, and melting the connecting member at a predetermined temperature to bond the first and second substrates to each other for electrical connection. And a step of forming a predetermined number of external terminals on the second substrate. A method of manufacturing a semiconductor device, comprising:
【請求項11】 請求項10記載の第1及び第2の基板
間に、前記接続部材で電気的接続を行う所定数の中間基
板を介在させて前記位置合せが行われることを特徴とす
る半導体装置の製造方法。
11. The semiconductor device according to claim 10 , wherein the alignment is performed by interposing a predetermined number of intermediate substrates electrically connected by the connection member between the first and second substrates. Device manufacturing method.
【請求項12】 請求項11記載の中間基板間に、所定
数の半導体チップが搭載された所定数の第3の基板が介
在されて前記位置合せが行われることを特徴とする半導
体装置の製造方法。
12. The manufacturing of a semiconductor device, wherein the alignment is performed by interposing a predetermined number of third substrates on which a predetermined number of semiconductor chips are mounted between the intermediate substrates according to claim 11. Method.
【請求項13】 請求項10〜12の何れか一項に記載
の第2の基板上に、所定数の半導体チップが搭載される
ことを特徴とする半導体装置の製造方法。
13. A method of manufacturing a semiconductor device, wherein a predetermined number of semiconductor chips are mounted on the second substrate according to claim 10 .
JP31712294A 1994-12-20 1994-12-20 Semiconductor device and manufacturing method thereof Expired - Lifetime JP3450477B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31712294A JP3450477B2 (en) 1994-12-20 1994-12-20 Semiconductor device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31712294A JP3450477B2 (en) 1994-12-20 1994-12-20 Semiconductor device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH08172144A JPH08172144A (en) 1996-07-02
JP3450477B2 true JP3450477B2 (en) 2003-09-22

Family

ID=18084689

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3450477B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4190602B2 (en) * 1997-08-28 2008-12-03 株式会社ルネサステクノロジ Semiconductor device
JP2003204015A (en) * 2002-01-10 2003-07-18 Oki Electric Ind Co Ltd Semiconductor device, method for manufacturing the same and method for manufacturing interposer substrate
JP2007250764A (en) 2006-03-15 2007-09-27 Elpida Memory Inc Semiconductor device and manufacturing method therefor
JP2009194267A (en) * 2008-02-18 2009-08-27 Panasonic Corp Semiconductor device, method of manufacturing the same, and electronic appliance using same device
JP5544950B2 (en) * 2010-03-16 2014-07-09 カシオ計算機株式会社 Semiconductor device manufacturing method and semiconductor device mounting method
JP7243449B2 (en) 2019-05-24 2023-03-22 富士通オプティカルコンポーネンツ株式会社 optical module

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