JP2002176000A5 - - Google Patents

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Publication number
JP2002176000A5
JP2002176000A5 JP2000370779A JP2000370779A JP2002176000A5 JP 2002176000 A5 JP2002176000 A5 JP 2002176000A5 JP 2000370779 A JP2000370779 A JP 2000370779A JP 2000370779 A JP2000370779 A JP 2000370779A JP 2002176000 A5 JP2002176000 A5 JP 2002176000A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000370779A
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JP2002176000A (ja
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Priority to JP2000370779A priority Critical patent/JP2002176000A/ja
Priority claimed from JP2000370779A external-priority patent/JP2002176000A/ja
Priority to US10/001,197 priority patent/US7179729B2/en
Publication of JP2002176000A publication Critical patent/JP2002176000A/ja
Priority to US11/652,094 priority patent/US7666772B2/en
Publication of JP2002176000A5 publication Critical patent/JP2002176000A5/ja
Withdrawn legal-status Critical Current

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JP2000370779A 2000-12-05 2000-12-05 熱処理装置及び半導体装置の製造方法 Withdrawn JP2002176000A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000370779A JP2002176000A (ja) 2000-12-05 2000-12-05 熱処理装置及び半導体装置の製造方法
US10/001,197 US7179729B2 (en) 2000-12-05 2001-12-04 Heat treatment apparatus and method of manufacturing a semiconductor device
US11/652,094 US7666772B2 (en) 2000-12-05 2007-01-11 Heat treatment apparatus and method of manufacturing a semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000370779A JP2002176000A (ja) 2000-12-05 2000-12-05 熱処理装置及び半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2002176000A JP2002176000A (ja) 2002-06-21
JP2002176000A5 true JP2002176000A5 (ja) 2008-01-17

Family

ID=18840606

Family Applications (1)

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JP2000370779A Withdrawn JP2002176000A (ja) 2000-12-05 2000-12-05 熱処理装置及び半導体装置の製造方法

Country Status (2)

Country Link
US (2) US7179729B2 (ja)
JP (1) JP2002176000A (ja)

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US7534977B2 (en) * 2000-12-28 2009-05-19 Semiconductor Energy Laboratory Co., Ltd. Heat treatment apparatus and method of manufacturing a semiconductor device
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JP2011091386A (ja) * 2009-09-24 2011-05-06 Semiconductor Energy Lab Co Ltd 熱処理装置、熱処理方法及び半導体装置の作製方法
JP5955604B2 (ja) * 2012-03-28 2016-07-20 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
US9663854B2 (en) 2013-03-14 2017-05-30 Taiwan Semiconductor Manufacturing Company, Ltd. High-throughput system and method for post-implantation single wafer warm-up
US9318360B2 (en) 2013-10-11 2016-04-19 Applied Materials, Inc. Linear high packing density for LED arrays
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US10638648B2 (en) * 2016-04-28 2020-04-28 Ge Energy Power Conversion Technology Ltd. Cooling system with pressure regulation
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US6759313B2 (en) 2000-12-05 2004-07-06 Semiconductor Energy Laboratory Co., Ltd Method of fabricating a semiconductor device
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