JP2002174904A5 - - Google Patents
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- Publication number
- JP2002174904A5 JP2002174904A5 JP2001244077A JP2001244077A JP2002174904A5 JP 2002174904 A5 JP2002174904 A5 JP 2002174904A5 JP 2001244077 A JP2001244077 A JP 2001244077A JP 2001244077 A JP2001244077 A JP 2001244077A JP 2002174904 A5 JP2002174904 A5 JP 2002174904A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- electron beam
- resist composition
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000010894 electron beam technology Methods 0.000 description 36
- -1 nitrogen-containing compound Chemical class 0.000 description 26
- 125000003118 aryl group Chemical group 0.000 description 25
- 150000001875 compounds Chemical class 0.000 description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 20
- 229920002120 photoresistant polymer Polymers 0.000 description 18
- 125000004432 carbon atom Chemical group C* 0.000 description 13
- 125000000217 alkyl group Chemical group 0.000 description 12
- 125000001424 substituent group Chemical group 0.000 description 12
- 125000003545 alkoxy group Chemical group 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 6
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 4
- 125000005647 linker group Chemical group 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 125000003302 alkenyloxy group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 0 CC(C)(C)C(C)(*)c1cc(O)ccc1 Chemical compound CC(C)(C)C(C)(*)c1cc(O)ccc1 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001244077A JP4105414B2 (ja) | 2000-08-15 | 2001-08-10 | 電子線又はｘ線レジスト組成物 |
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000246380 | 2000-08-15 | ||
| JP2000268891 | 2000-09-05 | ||
| JP2000278106 | 2000-09-13 | ||
| JP2000-294244 | 2000-09-27 | ||
| JP2000-246380 | 2000-09-27 | ||
| JP2000-278106 | 2000-09-27 | ||
| JP2000-268891 | 2000-09-27 | ||
| JP2000294244 | 2000-09-27 | ||
| JP2001244077A JP4105414B2 (ja) | 2000-08-15 | 2001-08-10 | 電子線又はｘ線レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002174904A JP2002174904A (ja) | 2002-06-21 |
| JP2002174904A5 true JP2002174904A5 (enrdf_load_stackoverflow) | 2006-01-26 |
| JP4105414B2 JP4105414B2 (ja) | 2008-06-25 |
Family
ID=27531637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001244077A Expired - Fee Related JP4105414B2 (ja) | 2000-08-15 | 2001-08-10 | 電子線又はｘ線レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4105414B2 (enrdf_load_stackoverflow) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4678383B2 (ja) * | 2007-03-29 | 2011-04-27 | 信越化学工業株式会社 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
| JP5548427B2 (ja) * | 2009-10-30 | 2014-07-16 | 富士フイルム株式会社 | 組成物、レジスト膜、パターン形成方法、及びインクジェット記録方法 |
| JP5703197B2 (ja) * | 2011-01-18 | 2015-04-15 | 富士フイルム株式会社 | 化学増幅型レジスト組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク、並びに、高分子化合物 |
| JP5597616B2 (ja) * | 2011-10-03 | 2014-10-01 | 富士フイルム株式会社 | ネガ型化学増幅レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| JP5663526B2 (ja) * | 2012-06-06 | 2015-02-04 | 富士フイルム株式会社 | 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、マスクブランクス、及びレジストパターン形成方法 |
| CN104253024B (zh) | 2013-06-27 | 2017-07-28 | 第一毛织株式会社 | 硬掩模组合物、使用其形成图案的方法以及包括该图案的半导体集成电路装置 |
| JP6248861B2 (ja) * | 2014-08-19 | 2017-12-20 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
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2001
- 2001-08-10 JP JP2001244077A patent/JP4105414B2/ja not_active Expired - Fee Related