JP2002341539A5 - - Google Patents
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- Publication number
- JP2002341539A5 JP2002341539A5 JP2001149620A JP2001149620A JP2002341539A5 JP 2002341539 A5 JP2002341539 A5 JP 2002341539A5 JP 2001149620 A JP2001149620 A JP 2001149620A JP 2001149620 A JP2001149620 A JP 2001149620A JP 2002341539 A5 JP2002341539 A5 JP 2002341539A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl group
- hydrogen atom
- embedded image
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 14
- 125000000217 alkyl group Chemical group 0.000 description 12
- 125000001424 substituent group Chemical group 0.000 description 8
- 125000006165 cyclic alkyl group Chemical group 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 5
- 125000000753 cycloalkyl group Chemical group 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical group C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000006574 non-aromatic ring group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- -1 —COOR 5 Chemical group 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001149620A JP4067284B2 (ja) | 2001-03-12 | 2001-05-18 | ポジ型レジスト組成物 |
| US10/093,411 US6777160B2 (en) | 2001-03-12 | 2002-03-11 | Positive-working resist composition |
| TW091104604A TW538317B (en) | 2001-03-12 | 2002-03-12 | Positive-working resist composition |
| KR1020020013339A KR100773045B1 (ko) | 2001-03-12 | 2002-03-12 | 포지티브 레지스트 조성물 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001068849 | 2001-03-12 | ||
| JP2001-68849 | 2001-03-12 | ||
| JP2001149620A JP4067284B2 (ja) | 2001-03-12 | 2001-05-18 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002341539A JP2002341539A (ja) | 2002-11-27 |
| JP2002341539A5 true JP2002341539A5 (enrdf_load_stackoverflow) | 2006-01-19 |
| JP4067284B2 JP4067284B2 (ja) | 2008-03-26 |
Family
ID=26611062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001149620A Expired - Fee Related JP4067284B2 (ja) | 2001-03-12 | 2001-05-18 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4067284B2 (enrdf_load_stackoverflow) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4193478B2 (ja) * | 2001-12-03 | 2008-12-10 | 住友化学株式会社 | スルホニウム塩及びその用途 |
| US7303852B2 (en) | 2001-12-27 | 2007-12-04 | Shin-Etsu Chemical Co., Ltd. | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method |
| JP4448705B2 (ja) | 2004-02-05 | 2010-04-14 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP4579019B2 (ja) * | 2005-03-17 | 2010-11-10 | 富士フイルム株式会社 | ポジ型レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
| JP4677293B2 (ja) * | 2005-06-20 | 2011-04-27 | 富士フイルム株式会社 | ポジ型感光性組成物及び該ポジ型感光性組成物を用いたパターン形成方法 |
| JP4562628B2 (ja) | 2005-09-20 | 2010-10-13 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP5140354B2 (ja) * | 2006-09-19 | 2013-02-06 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP2009251037A (ja) * | 2008-04-01 | 2009-10-29 | Tokyo Ohka Kogyo Co Ltd | レジスト組成物、レジストパターン形成方法、新規な化合物および酸発生剤 |
| JP5352120B2 (ja) * | 2008-05-12 | 2013-11-27 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、新規な化合物、および該化合物からなるクエンチャー |
| JP2011093868A (ja) * | 2009-11-02 | 2011-05-12 | Asahi Kasei Corp | 環状構造を有するスルホニウム塩の製造方法 |
| JP2010159256A (ja) * | 2010-01-18 | 2010-07-22 | Fujifilm Corp | 感光性組成物に有用な酸及びその塩 |
| JP2011008293A (ja) * | 2010-09-15 | 2011-01-13 | Fujifilm Corp | ポジ型感光性組成物及び該ポジ型感光性組成物を用いたパターン形成方法 |
| JP5737242B2 (ja) | 2012-08-10 | 2015-06-17 | 信越化学工業株式会社 | 単量体、高分子化合物、レジスト組成物及びパターン形成方法 |
| JP5780221B2 (ja) | 2012-08-20 | 2015-09-16 | 信越化学工業株式会社 | パターン形成方法 |
| WO2020196235A1 (ja) | 2019-03-27 | 2020-10-01 | Jsr株式会社 | 感光性樹脂組成物、レジストパターン膜の製造方法、メッキ造形物の製造方法、および錫銀メッキ造形物の製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5554664A (en) * | 1995-03-06 | 1996-09-10 | Minnesota Mining And Manufacturing Company | Energy-activatable salts with fluorocarbon anions |
| CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
| JP3901342B2 (ja) * | 1998-05-14 | 2007-04-04 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物 |
| JP2001013688A (ja) * | 1999-04-28 | 2001-01-19 | Jsr Corp | 感放射線性樹脂組成物 |
| FR2809829B1 (fr) * | 2000-06-05 | 2002-07-26 | Rhodia Chimie Sa | Nouvelle composition photosensible pour la fabrication de photoresist |
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2001
- 2001-05-18 JP JP2001149620A patent/JP4067284B2/ja not_active Expired - Fee Related