JP2002170924A - Laminated type semiconductor device and mounting board - Google Patents

Laminated type semiconductor device and mounting board

Info

Publication number
JP2002170924A
JP2002170924A JP2000363705A JP2000363705A JP2002170924A JP 2002170924 A JP2002170924 A JP 2002170924A JP 2000363705 A JP2000363705 A JP 2000363705A JP 2000363705 A JP2000363705 A JP 2000363705A JP 2002170924 A JP2002170924 A JP 2002170924A
Authority
JP
Japan
Prior art keywords
semiconductor device
wiring board
connection terminals
external circuit
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000363705A
Other languages
Japanese (ja)
Other versions
JP4521984B2 (en
Inventor
Kazutaka Maeda
和孝 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000363705A priority Critical patent/JP4521984B2/en
Publication of JP2002170924A publication Critical patent/JP2002170924A/en
Application granted granted Critical
Publication of JP4521984B2 publication Critical patent/JP4521984B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA

Abstract

PROBLEM TO BE SOLVED: To provide a laminated type semiconductor device and a mounting board which are excellent in electrical connecting property with an external circuit board and have high reliability. SOLUTION: This laminated type semiconductor device is constituted by laminating a plurality of semiconductor devices 7 which are provided with wiring boards 3 having conductor layers 15 inside insulating boards 13, and with semiconductor elements 5 arranged on surfaces of the wiring boards 3. A plurality of connection terminals 23 electrically connected with the conductor layers 15 of the wiring boards 3 are arranged between the upper and the lower semiconductor devices 7, and on the lower surface of the semiconductor device 7 of the lowermost layer. Auxiliary connection terminals 27 which are not electrically connected with the conductor layers 15 of the wiring boards 3 are arranged in the outer peripheral part of a connection terminal group 25.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体素子を搭載
した半導体装置に関し、特に、積層型半導体装置および
実装基板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device having a semiconductor element mounted thereon, and more particularly to a stacked semiconductor device and a mounting substrate.

【0002】[0002]

【従来技術】近年、半導体素子の高速化および高集積
化、ならびに携帯機器の急速な普及に伴い、電子機器の
小型、軽量化の要求が高まっている。これに伴い半導体
素子や電子部品の高密度実装技術の開発が進められてい
るが、電子機器の内部では、実装面積が限られており、
伝送速度に関する考慮から半導体素子を近接して設置す
ることが要求され、よりコンパクトな実装技術が必要と
なっている。
2. Description of the Related Art In recent years, with the increase in speed and integration of semiconductor devices and the rapid spread of portable devices, there has been an increasing demand for smaller and lighter electronic devices. Along with this, the development of high-density mounting technology for semiconductor elements and electronic components has been promoted, but the mounting area inside electronic equipment is limited,
Considering the transmission speed, it is required to arrange semiconductor elements close to each other, and a more compact mounting technique is required.

【0003】一般に、半導体素子は、トランジスタの集
積度の増加とともに、半導体素子に形成される電極数が
増加するため、これを収納する配線基板の端子数を増や
す必要がある。ところが、電極数が増大すると、配線基
板自体の寸法が大きくなり、実装面積の増大につながっ
ている。
In general, in a semiconductor device, the number of electrodes formed on the semiconductor device increases as the degree of integration of the transistor increases. Therefore, it is necessary to increase the number of terminals of a wiring board that houses the semiconductor device. However, as the number of electrodes increases, the dimensions of the wiring board itself increase, leading to an increase in mounting area.

【0004】このため、近年では、高密度実装に対応し
た配線基板はその下面にハンダを含有する接続端子を格
子状に配置して形成し、表面実装を可能としたボールグ
リッドアレイ(BGA)型の配線基板が主流となってい
る。このようなBGA型配線基板の中でも、さらに実装
面積を低減するため、配線基板のサイズを、より半導体
素子のサイズに近づけたチップスケールパッケージ(C
SP)と言われる小型の配線基板への移行が進んでい
る。
For this reason, in recent years, a wiring board compatible with high-density mounting is formed by arranging connection terminals containing solder in a lattice pattern on the lower surface of the wiring board, thereby enabling a surface-mounted ball grid array (BGA) type. Wiring boards are the mainstream. Among such BGA type wiring boards, in order to further reduce the mounting area, a chip scale package (C) in which the size of the wiring board is made closer to the size of the semiconductor element.
The shift to small-sized wiring boards referred to as SP) is in progress.

【0005】これらの取り組みは配線基板を平面的(二
次元的)に外部回路基板に実装することを前提としてお
り、半導体素子の合計面積よりも実装面積を削減するこ
とは原理的に不可能である。すなわち、二次元的な実装
方式には高密度化に限界がある。
[0005] These approaches are based on the premise that a wiring board is mounted on an external circuit board two-dimensionally (two-dimensionally), and it is in principle impossible to reduce the mounting area from the total area of the semiconductor elements. is there. That is, the two-dimensional mounting method has a limit in increasing the density.

【0006】このため、半導体素子を配線基板に搭載し
た半導体装置自体を3次元的に積層する積層型半導体装
置が提案されている。このような積層型半導体装置とし
ては、例えば、特開平6−13541号公報に開示され
たものが知られている。
For this reason, a stacked semiconductor device has been proposed in which a semiconductor device itself having a semiconductor element mounted on a wiring board is three-dimensionally stacked. As such a stacked semiconductor device, for example, a device disclosed in Japanese Patent Application Laid-Open No. Hei 6-13541 is known.

【0007】この公報に開示された積層型半導体装置で
は、上方および下方の半導体装置の配線基板に、窒化ア
ルミニウム質セラミックスのような高熱伝導性材料を用
い、それらの半導体装置が隣合う上下層の界面側にハン
ダバンプを形成して接合されている。
In the stacked semiconductor device disclosed in this publication, a high thermal conductive material such as aluminum nitride ceramics is used for the wiring substrates of the upper and lower semiconductor devices, and the upper and lower layers of the semiconductor devices are adjacent to each other. Solder bumps are formed on the interface side and joined.

【0008】このように、半導体装置を3次元的に積み
重ねて構成した実装方式は、従来の2次元的に配置した
半導体装置の実装よりも、さらに半導体素子および電子
部品の高密度化を図ることができ、半導体素子ならびに
それを搭載した半導体装置間の配線長を短縮できること
から、半導体素子の駆動回路から発信される信号伝送の
高速化につながるものである。
As described above, the mounting method in which the semiconductor devices are three-dimensionally stacked is intended to further increase the density of semiconductor elements and electronic components as compared with the conventional mounting of the two-dimensionally arranged semiconductor devices. Therefore, the wiring length between the semiconductor element and the semiconductor device on which the semiconductor element is mounted can be reduced, which leads to an increase in the speed of transmission of a signal transmitted from a driving circuit of the semiconductor element.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、上記特
開平6−13541号公報では、積層型半導体装置を構
成する上方および下方の配線基板の材料として、窒化ア
ルミニウム質セラミックスのような高熱伝導性材料を用
い、それらの配線基板は、隣合う上下層の界面側に設け
られた接続端子によって、物理的および電気的に接合さ
れている。
However, in Japanese Patent Application Laid-Open No. Hei 6-13541, a high thermal conductive material such as an aluminum nitride ceramic is used as a material for the upper and lower wiring boards constituting the stacked semiconductor device. These wiring boards are physically and electrically joined by connection terminals provided on the interface side between adjacent upper and lower layers.

【0010】このような積層型半導体装置をガラス−エ
ポキシ樹脂複合材料やガラス−ポリイミド樹脂複合材料
などの有機樹脂を含むプリント基板などの外部回路基板
へ実装した場合、使用環境や半導体素子の駆動、停止に
伴う発熱、冷却の繰返しによって、外部回路基板と積層
型半導体装置との接続性が損なわれ、従来の単層型の半
導体装置に比べて、長期にわたり安定な接続を維持でき
ないという問題があった。
When such a laminated semiconductor device is mounted on an external circuit board such as a printed circuit board containing an organic resin such as a glass-epoxy resin composite material or a glass-polyimide resin composite material, the operating environment, the driving of the semiconductor elements, Due to the repeated heat generation and cooling associated with the shutdown, the connectivity between the external circuit board and the stacked semiconductor device is impaired, and there is a problem that stable connection cannot be maintained for a long period of time as compared with the conventional single-layer semiconductor device. Was.

【0011】この信頼性の低下は、主として半導体装置
を構成する配線基板と外部回路基板との熱膨張係数差に
起因する熱応力が接続端子に繰り返し作用するにより、
接続端子が疲労し、最終的にクラック等が発生するため
と考えられる。
[0011] This reduction in reliability is mainly due to the fact that thermal stress caused by the difference in thermal expansion coefficient between the wiring board and the external circuit board constituting the semiconductor device repeatedly acts on the connection terminals.
It is considered that the connection terminals are fatigued and eventually cracks and the like are generated.

【0012】このような接続端子に発生するクラックに
関して、外部回路基板に実装する半導体装置が単層であ
れば、剛性はさほど高くないため、配線基板の反りによ
って熱膨張差を緩和することができるが、複数の半導体
装置を積層した積層型半導体装置では、剛性が高くなる
ため、反りによって熱膨張差を緩和することができず、
熱応力による熱疲労破壊が接続端子に発生しやすくな
る。
With respect to such cracks generated in the connection terminals, if the semiconductor device mounted on the external circuit board is a single layer, the rigidity is not so high, so that the difference in thermal expansion can be reduced by the warpage of the wiring board. However, in a stacked semiconductor device in which a plurality of semiconductor devices are stacked, rigidity is increased, so that a difference in thermal expansion cannot be reduced due to warpage,
Thermal fatigue fracture due to thermal stress is likely to occur in the connection terminal.

【0013】このように、熱疲労破壊は積層型半導体装
置と外部回路基板とを接続している接続端子において最
も発生しやすいものであるが、半導体装置同士を接続し
ている接続端子においても同様に熱疲労破壊が発生する
という問題があった。
As described above, the thermal fatigue failure is most likely to occur at the connection terminal connecting the stacked semiconductor device and the external circuit board, but also at the connection terminal connecting the semiconductor devices. However, there is a problem that thermal fatigue fracture occurs.

【0014】従って、本発明は、半導体装置間および半
導体装置と外部回路基板との電気的接続性に優れ、長期
間安定した接続を維持できる積層型半導体装置および実
装基板を提供することを目的とする。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a stacked semiconductor device and a mounting substrate which are excellent in electrical connectivity between semiconductor devices and between a semiconductor device and an external circuit board and can maintain stable connection for a long period of time. I do.

【0015】[0015]

【課題を解決するための手段】本発明の積層型半導体装
置では、絶縁基板の内部に導体層を有する配線基板と、
該配線基板の表面に設けられた半導体素子とを具備する
半導体装置を複数積み重ねてなるとともに、上下の前記
半導体装置間および最下層の前記半導体装置の下面に、
前記配線基板の導体層と電気的に接続する接続端子を複
数設け、該接続端子群の外周部に前記配線基板の導体層
と電気的に接続しない補助接続端子を設けたことを特徴
とするものである。
According to the stacked semiconductor device of the present invention, a wiring board having a conductor layer inside an insulating substrate;
A plurality of semiconductor devices each including a semiconductor element provided on the surface of the wiring substrate are stacked, and between the upper and lower semiconductor devices and on the lower surface of the lowermost semiconductor device,
A plurality of connection terminals that are electrically connected to the conductor layer of the wiring board, and auxiliary connection terminals that are not electrically connected to the conductor layer of the wiring board are provided on an outer peripheral portion of the connection terminal group. It is.

【0016】このような構成によれば、半導体装置が外
部回路基板に積み重ねられた構成においても、半導体装
置の下面に形成された接続端子に発生する応力を補助接
続端子が支えるとともに、補助接続端子自体の変形によ
って応力を吸収できるため、例え、積層された半導体装
置であっても、接続端子群におけるハンダの疲労断線を
防止し接続信頼性を飛躍的に向上できる。
According to such a configuration, even in a configuration in which the semiconductor device is stacked on the external circuit board, the stress generated in the connection terminal formed on the lower surface of the semiconductor device is supported by the auxiliary connection terminal, and the auxiliary connection terminal is supported. Since stress can be absorbed by the deformation of itself, even in the case of stacked semiconductor devices, fatigue disconnection of solder in the connection terminal group can be prevented and connection reliability can be dramatically improved.

【0017】本発明の積層型半導体装置では、最下層の
半導体装置の熱膨張係数が、上層の半導体装置の熱膨張
係数よりも大きいことが望ましい。
In the stacked semiconductor device of the present invention, it is desirable that the lowermost semiconductor device has a higher thermal expansion coefficient than the upper semiconductor device.

【0018】例えば、半導体装置を外部回路基板に積層
して接続した場合に、半導体装置と外部回路基板との熱
膨張差により、特に、最下層の半導体装置に発生する応
力を緩和でき、接続端子群の疲労断線を防止し接続信頼
性を飛躍的に向上できる。
For example, when a semiconductor device is stacked on an external circuit board and connected, the stress generated in the lowermost semiconductor device can be relieved due to a difference in thermal expansion between the semiconductor device and the external circuit board. Fatigue disconnection of the group can be prevented, and connection reliability can be dramatically improved.

【0019】本発明の積層型半導体装置では、積層され
た前記半導体装置の熱膨張係数が、下層ほど大きくなる
ことが望ましい。
In the stacked semiconductor device according to the present invention, it is desirable that the thermal expansion coefficient of the stacked semiconductor devices be higher in lower layers.

【0020】例えば、半導体装置が外部回路基板に実装
された構造において、使用環境あるいは半導体素子の駆
動により温度変化が発生した場合にも、外部回路基板と
ともに積層型半導体装置が凹状に且つ曲率中心が同じに
なるように変形するため、接続端子の上下層の熱膨張差
による歪を小さくすることができ、外部回路基板と半導
体装置、および半導体装置同士を接続している接続端子
の断線を防止し、接続信頼性を高めることができる。
For example, in a structure in which the semiconductor device is mounted on an external circuit board, even when the temperature changes due to the operating environment or the driving of the semiconductor element, the stacked semiconductor device is concavely formed and the center of curvature is formed together with the external circuit board. Since they are deformed to be the same, distortion due to the difference in thermal expansion between the upper and lower layers of the connection terminal can be reduced, and disconnection of the external circuit board and the semiconductor device, and disconnection of the connection terminal connecting the semiconductor devices can be prevented. , Connection reliability can be improved.

【0021】本発明の積層型半導体装置では、配線基板
の主面が四角形状をなし、この配線基板の主面に、配線
基板の外形に対応するように四角形状の接続端子群を設
け、さらに、配線基板の主面の角部に補助接続端子を設
けることが望ましい。
In the stacked semiconductor device of the present invention, the main surface of the wiring board has a rectangular shape, and a group of square connection terminals is provided on the main surface of the wiring substrate so as to correspond to the outer shape of the wiring substrate. It is desirable to provide auxiliary connection terminals at corners of the main surface of the wiring board.

【0022】四角形状の配線基板では、その角部近傍に
形成された接続端子に最も高い応力が発生し疲労断線が
起こりやすくなることが知られているが、本発明では、
配線基板の下面に形成された接続端子に発生する応力
を、より効果的に補助接続端子が支え、接続端子群にお
けるハンダの疲労断線を防止し接続信頼性をさらに向上
できる。
It is known that, in a rectangular wiring board, the highest stress is generated in connection terminals formed near the corners and fatigue disconnection is likely to occur.
The auxiliary connection terminals can more effectively support the stress generated in the connection terminals formed on the lower surface of the wiring board, and can prevent the fatigue breakage of the solder in the connection terminal group and further improve the connection reliability.

【0023】本発明の実装基板は、上記の積層型半導体
装置が、最下層の半導体装置の下面に形成された接続端
子および補助接続端子を介して外部回路基板に接続され
たものである。
In the mounting board of the present invention, the above-mentioned stacked semiconductor device is connected to an external circuit board via connection terminals and auxiliary connection terminals formed on the lower surface of the lowermost semiconductor device.

【0024】このような構成によれば、例えば、積層さ
れる各半導体装置に比較して大きな熱膨張差を有する外
部回路基板に接続された場合であっても、例えば、半導
体装置の角部に特に電気的に接続されていない補助接続
端子を形成することにより、接続端子群に発生する応力
を補助接続端子が支え、接続端子群におけるハンダの疲
労断線を防止し接続信頼性を向上できる。
According to such a configuration, for example, even when the semiconductor device is connected to an external circuit board having a large difference in thermal expansion as compared with each semiconductor device to be stacked, for example, the semiconductor device may be connected to a corner of the semiconductor device. In particular, by forming an auxiliary connection terminal that is not electrically connected, the stress generated in the connection terminal group is supported by the auxiliary connection terminal, and fatigue disconnection of solder in the connection terminal group can be prevented, and connection reliability can be improved.

【0025】本発明の実装基板は、外部回路基板と接合
される最下層の配線基板の熱膨張係数が、上層の配線基
板の熱膨張係数よりも大きく、且つ前記外部回路基板の
熱膨張係数よりも小さいことが望ましい。
In the mounting board of the present invention, the lowermost wiring board to be joined to the external circuit board has a thermal expansion coefficient larger than that of the upper wiring board and higher than that of the external circuit board. Is also desirable.

【0026】このような構成によれば、例えば、外部回
路基板の熱膨張係数が、その上に接合される半導体装置
に比較して大きい場合に、外部回路基板とその直上に接
合された半導体装置との熱膨張差により、実装基板が凹
状に反り、発生する応力をより効果的に緩和でき、接続
端子の疲労断線を防止し接続信頼性を向上できる。
According to such a configuration, for example, when the coefficient of thermal expansion of the external circuit board is larger than that of the semiconductor device bonded thereon, the semiconductor device bonded directly to the external circuit board can be used. Due to the difference in thermal expansion between the mounting substrate and the mounting substrate, the mounting substrate is warped in a concave shape, and the generated stress can be more effectively relieved.

【0027】[0027]

【発明の実施の形態】(構造)本発明の積層型半導体装
置および半導体装置が実装された実装基板の一形態につ
いて、図1の概略断面図をもとに詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS (Structure) One embodiment of a stacked semiconductor device of the present invention and a mounting board on which the semiconductor device is mounted will be described in detail with reference to a schematic sectional view of FIG.

【0028】本発明の積層型半導体装置1は、配線基板
3の上面に半導体素子5が設けられた半導体装置7を複
数重ねて構成され、この積層型半導体装置1が、さらに
外部回路基板9に接合され、実装基板11が構成されて
いる。
The stacked semiconductor device 1 of the present invention is constituted by stacking a plurality of semiconductor devices 7 each having a semiconductor element 5 provided on the upper surface of a wiring board 3, and this stacked semiconductor device 1 is further mounted on an external circuit board 9. They are joined to form a mounting substrate 11.

【0029】この半導体装置7を構成している配線基板
3は絶縁基板13の内部に導体層15を形成して構成さ
れ、また、その上面および下面には複数の接続パッド1
7が形成され、導体層15と接続パッド17とはビアホ
ール導体19を介して接続され、さらに、配線基板3の
上面の半導体素子5と接続パッド17とはワイヤ21に
よって接続されている。
The wiring substrate 3 constituting the semiconductor device 7 is formed by forming a conductor layer 15 inside an insulating substrate 13, and has a plurality of connection pads 1 on its upper and lower surfaces.
7 is formed, the conductor layer 15 and the connection pad 17 are connected via a via-hole conductor 19, and the semiconductor element 5 on the upper surface of the wiring board 3 and the connection pad 17 are connected by a wire 21.

【0030】また、上から2層目以降の半導体装置7の
配線基板3の上下面にも複数の接続パッド17が形成さ
れ、内部の導体層15とビアホール導体19を介してそ
れぞれ接続されている。
A plurality of connection pads 17 are also formed on the upper and lower surfaces of the wiring board 3 of the semiconductor device 7 in the second and subsequent layers from the top, and are respectively connected to the internal conductor layer 15 via the via-hole conductors 19. .

【0031】そして、各配線基板3の接続パッド17は
接続端子23によりそれぞれ相互に、機械的および電気
的に接続されている。
The connection pads 17 of each wiring board 3 are mechanically and electrically connected to each other by connection terminals 23.

【0032】また、複数の接続端子23の集合体である
接続端子群25の外周部には、各配線基板3の接続パッ
ド17には接続されているが、導体層15には接続され
ていない補助接続端子27が設けられ、機械的に上下の
半導体装置7が接続されている。
The outer peripheral portion of the connection terminal group 25, which is an aggregate of the plurality of connection terminals 23, is connected to the connection pad 17 of each wiring board 3, but is not connected to the conductor layer 15. An auxiliary connection terminal 27 is provided, and the upper and lower semiconductor devices 7 are mechanically connected.

【0033】そして、最下層の半導体装置7を構成する
配線基板3の下面の接続パッド17は、積層型半導体装
置1が実装される外部回路基板9の表面に形成された接
続パッド17に、各配線基板3同士が接続されたと同様
に、接続端子23と補助接続端子27により接続されて
いる。
The connection pads 17 on the lower surface of the wiring board 3 constituting the lowermost semiconductor device 7 are connected to the connection pads 17 formed on the surface of the external circuit board 9 on which the stacked semiconductor device 1 is mounted. The connection terminals 23 and the auxiliary connection terminals 27 are connected in the same manner as the wiring boards 3 are connected to each other.

【0034】これらの接続端子23は、図2(a)に示
すように、半導体素子5を搭載した部分を除いて、配線
基板3の下面に格子状に形成され、その接続端子群25
は主面が四角形状の配線基板3の下面の外形に対応して
四角形状とされ、その外周部に位置する配線基板3の主
面の角部には、それぞれ補助接続端子27が設けられて
いる。
As shown in FIG. 2A, these connection terminals 23 are formed in a lattice pattern on the lower surface of the wiring board 3 except for the portion where the semiconductor element 5 is mounted.
The main surface has a rectangular shape corresponding to the outer shape of the lower surface of the wiring substrate 3 having a rectangular shape, and auxiliary connection terminals 27 are provided at the corners of the main surface of the wiring substrate 3 located at the outer peripheral portion thereof. I have.

【0035】また、これらの接続端子23や補助接続端
子27は配線基板3の上下の表面に形成される接続パッ
ド17の総数に応じて、その大きさ(面積)や間隔は任
意に変えることができる。
The size (area) and interval of these connection terminals 23 and auxiliary connection terminals 27 can be arbitrarily changed according to the total number of connection pads 17 formed on the upper and lower surfaces of the wiring board 3. it can.

【0036】そして、補助接続端子27が形成される接
続パッド17の大きさは、接続端子23を形成する接続
パッド17と同じ大きさ(面積)に形成されても良い
が、図2(b)に示すように、配線基板3の下面に形成
された接続端子23に発生する応力を充分に支えるため
に大きくすることもできる。
The size of the connection pad 17 on which the auxiliary connection terminal 27 is formed may be the same size (area) as the connection pad 17 on which the connection terminal 23 is formed, but FIG. As shown in (2), the size can be increased to sufficiently support the stress generated in the connection terminals 23 formed on the lower surface of the wiring board 3.

【0037】さらに、図2(c)に示すように、接続端
子23を形成する接続パッド17の大きさは接続端子2
3と補助接続端子27との短絡が発生しない程度の間隔
が設けられ、さらには、この補助接続端子27の応力を
充分に支える効果を向上させる上で、配線基板3の角部
4箇所か、もしくは、規則的に配列された接続端子群2
5の格子の延長線上から離れた位置に形成されることも
可能である。
Further, as shown in FIG. 2C, the size of the connection pad 17 forming the connection terminal 23 is
An interval is provided to the extent that a short circuit does not occur between the auxiliary connection terminal 3 and the auxiliary connection terminal 27. Further, in order to improve the effect of sufficiently supporting the stress of the auxiliary connection terminal 27, four corners of the wiring board 3 Or, the connection terminal group 2 which is regularly arranged
5 may be formed at a position apart from the extension of the lattice.

【0038】また、この配線基板3上に設けられる半導
体素子5は、図1に示したように、半導体素子5と配線
基板3に形成された接続パッド17とをAl、Auなど
のワイヤ21で接続するワイヤボンディング方式で接合
され、封止樹脂によって気密封止されている。
As shown in FIG. 1, the semiconductor element 5 provided on the wiring board 3 connects the semiconductor element 5 and the connection pads 17 formed on the wiring board 3 with wires 21 such as Al and Au. They are joined by a wire bonding method for connection, and hermetically sealed with a sealing resin.

【0039】また、この半導体素子5を実装する他の方
法として、図示しないが、その一方主面に形成された端
子部と配線基板3に形成された接続パッド17との間に
ハンダバンプを形成して接続され、さらに、半導体素子
5と配線基板3との間に有機樹脂を含有するアンダーフ
ィル充填剤を流し込んで封止するフリップチップ方式の
接合法を用いることもできる。
As another method for mounting the semiconductor element 5, although not shown, a solder bump is formed between a terminal portion formed on one main surface thereof and a connection pad 17 formed on the wiring board 3. In addition, a flip-chip type joining method in which an underfill filler containing an organic resin is poured between the semiconductor element 5 and the wiring board 3 for sealing is used.

【0040】また、半導体装置7を構成する配線基板3
の熱膨張係数は、半導体素子5の熱膨張係数よりも大き
く、且つ、外部回路基板9のそれよりも小さいことが望
ましく、6〜13×10-6(/℃)の範囲であることが
好ましい。これは、半導体素子5の熱膨張係数が3〜4
×10-6(/℃)と小さく、また、外部回路基板9が、
熱膨張係数が13〜25×10-6(/℃)である有機樹
脂を含むプリント基板が多くの場合用いられることか
ら、配線基板3の熱膨張係数はそれらの中間の値を持つ
ことが、応力を緩和する上で好ましいからである。
The wiring board 3 constituting the semiconductor device 7
Is preferably larger than the coefficient of thermal expansion of the semiconductor element 5 and smaller than that of the external circuit board 9, and is preferably in the range of 6 to 13 × 10 −6 (/ ° C.). . This is because the coefficient of thermal expansion of the semiconductor element 5 is 3-4.
× 10 −6 (/ ° C.), and the external circuit board 9
Since a printed circuit board containing an organic resin having a thermal expansion coefficient of 13 to 25 × 10 −6 (/ ° C.) is used in many cases, the thermal expansion coefficient of the wiring board 3 may have an intermediate value between them. This is because it is preferable in relieving stress.

【0041】そして、積層型半導体装置1を構成する最
下層の配線基板3の熱膨張係数は、上層の配線基板3の
熱膨張係数よりも大きいことが望ましい。
It is desirable that the lowermost wiring board 3 of the stacked semiconductor device 1 has a larger thermal expansion coefficient than that of the upper wiring board 3.

【0042】例えば、積層型半導体装置1が外部回路基
板9に接続された実装基板において、最下層の配線基板
3がの熱膨張係数が、外部回路基板9の熱膨張係数によ
り近い方が最下層の配線基板3の接続端子23に発生す
る応力を弱めることができるためである。
For example, in the mounting board in which the stacked semiconductor device 1 is connected to the external circuit board 9, the one whose thermal expansion coefficient of the lowermost wiring board 3 is closer to the thermal expansion coefficient of the external circuit board 9 is the lowermost layer. This is because the stress generated in the connection terminals 23 of the wiring board 3 can be reduced.

【0043】即ち、外部回路基板9に接合される最下層
の配線基板3の熱膨張係数は、上層の配線基板3の熱膨
張係数よりも大きく、且つ前記外部回路基板9の熱膨張
係数よりも小さいことが望ましい。
That is, the thermal expansion coefficient of the lowermost wiring board 3 bonded to the external circuit board 9 is larger than the thermal expansion coefficient of the upper wiring board 3 and is smaller than the thermal expansion coefficient of the external circuit board 9. Desirably small.

【0044】(材料および製法)本発明の半導体装置7
における絶縁基板13の材質としては、アルミナ、ムラ
イト等のセラミックス、あるいは低温焼成のガラスセラ
ミックスなどの電気絶縁材料のいずれであっても良い
が、積層型半導体装置1が実装された構造においては、
部品相互の熱膨張差を緩和し、発生する応力を低減する
上で絶縁基板13がガラスセラミックス焼結体からなる
ことが望ましい。
(Material and Manufacturing Method) Semiconductor Device 7 of the Present Invention
The material of the insulating substrate 13 may be any of ceramics such as alumina and mullite and electric insulating materials such as glass ceramics fired at a low temperature. However, in the structure in which the stacked semiconductor device 1 is mounted,
In order to reduce the difference in thermal expansion between the components and reduce the generated stress, it is desirable that the insulating substrate 13 be made of a glass ceramic sintered body.

【0045】本発明の積層型半導体装置1および実装基
板11を形成する接続端子23および補助接続端子27
はハンダを含有する金属材料が用いられ、配線基板3の
表面に形成された接続パッド17とは、金、錫、ニッケ
ルのうち少なくとも1種を含有する金属層を介して接続
されている。
The connection terminals 23 and the auxiliary connection terminals 27 forming the stacked semiconductor device 1 and the mounting board 11 of the present invention
Is made of a metal material containing solder, and is connected to a connection pad 17 formed on the surface of the wiring board 3 via a metal layer containing at least one of gold, tin, and nickel.

【0046】また、本発明の積層型半導体装置1を実装
する外部回路基板9は、いわゆるプリント基板からな
り、ガラス−エポキシ樹脂、ガラス−ポリイミド樹脂複
合材料などの有機樹脂を含む材料からなる絶縁体の表面
および内部に、Cu、Au、Al、Ni、Sn−Pbな
どの金属からなる配線導体が被着形成されたものであ
る。このような外部回路基板9を、以下、単にプリント
基板と称する場合もある。
The external circuit board 9 on which the stacked semiconductor device 1 of the present invention is mounted is made of a so-called printed board, and is made of an insulator made of a material containing an organic resin such as a glass-epoxy resin or a glass-polyimide resin composite material. And a wiring conductor made of a metal such as Cu, Au, Al, Ni, or Sn—Pb is formed on the surface and inside of the substrate. Hereinafter, such an external circuit board 9 may be simply referred to as a printed board.

【0047】(作用)本発明の積層型半導体装置1は、
積層された上下の半導体装置7間および最下層の半導体
装置7の下面に、配線基板3の接続パッド17と電気的
に接続する接続端子23を複数設け、この接続端子群2
5の外周部にこの配線基板3の導体層15と電気的に接
続しない補助接続端子27を設けることが重要である。
(Operation) The stacked semiconductor device 1 of the present invention
A plurality of connection terminals 23 for electrically connecting to the connection pads 17 of the wiring board 3 are provided between the upper and lower semiconductor devices 7 and on the lower surface of the lowermost semiconductor device 7.
It is important to provide auxiliary connection terminals 27 that are not electrically connected to the conductor layer 15 of the wiring board 3 on the outer periphery of the wiring board 3.

【0048】例えば、主面が四角形状の配線基板3の角
部に、特に電気的に接続されていない補助接続端子27
を形成することにより、配線基板3の下面に形成された
接続端子23に発生する応力を補助接続端子27が支
え、ハンダからなる接続端子23におけるハンダの疲労
断線を防止し接続信頼性を飛躍的に向上できる。
For example, the auxiliary connection terminals 27 not particularly electrically connected to the corners of the wiring board 3 having a square main surface.
Is formed, the auxiliary connection terminal 27 supports the stress generated in the connection terminal 23 formed on the lower surface of the wiring board 3, prevents the solder from breaking due to solder in the connection terminal 23 made of solder, and dramatically improves connection reliability. Can be improved.

【0049】即ち、単層の半導体装置7の場合には、半
導体装置7と外部回路基板9との熱膨張差を、反り変形
によって緩和することができるが、半導体装置7が積層
された場合には、外部回路基板9の直上の半導体装置7
に比較して、下から2段目以上の半導体装置7では反り
変形が小さくなり、外部回路基板9との熱膨張差によっ
て引き起こる応力を緩和し難くなる。
That is, in the case of the single-layer semiconductor device 7, the difference in thermal expansion between the semiconductor device 7 and the external circuit board 9 can be reduced by warping deformation. Is the semiconductor device 7 directly above the external circuit board 9
In the semiconductor device 7 at the second or higher stage from the bottom, the warpage deformation is small, and it is difficult to reduce the stress caused by the difference in thermal expansion with the external circuit board 9.

【0050】これに対して、例えば、四角形状に形成さ
れた配線基板3の主面の角部に補助接続端子27を設け
た場合には、配線基板3の代わりに、補助接続端子27
自体が変形し、応力を伝達する役割を担うため、半導体
装置7を積層した場合であっても、各半導体装置7に発
生する応力を大きく緩和することができる。
On the other hand, for example, when the auxiliary connection terminal 27 is provided at a corner of the main surface of the wiring substrate 3 formed in a square shape, the auxiliary connection terminal 27 is used instead of the wiring substrate 3.
Since the semiconductor device 7 itself deforms and plays a role of transmitting the stress, even when the semiconductor devices 7 are stacked, the stress generated in each semiconductor device 7 can be greatly reduced.

【0051】また、補助接続端子27を設けることによ
って、半導体装置7にハンダペーストを印刷して積層
し、リフローを通して接合する際に、溶融したハンダ
が、表面張力によって上下のパッドの位置を補正するセ
ルフアライメント効果を高めることができる。
Further, by providing the auxiliary connection terminals 27, when solder paste is printed and laminated on the semiconductor device 7 and joined through reflow, the molten solder corrects the positions of the upper and lower pads by surface tension. The self-alignment effect can be enhanced.

【0052】また、積層型半導体装置を能動装置として
駆動させる場合、即ち、半導体素子5の駆動によって温
度が上昇した場合、各配線基板3には、半導体素子5と
の熱膨張差に起因して、半導体素子5の搭載側が凹とな
るような反り変形が生じる。ただし、その反り(撓み)
量は下層の配線基板3ほど小さくなる。
When the stacked semiconductor device is driven as an active device, that is, when the temperature rises due to the driving of the semiconductor element 5, each wiring board 3 has a thermal expansion difference with the semiconductor element 5. Then, warpage deformation occurs such that the mounting side of the semiconductor element 5 becomes concave. However, the warpage (bending)
The amount is smaller for the lower wiring board 3.

【0053】これは、下層の配線基板3では、上層の配
線基板3の存在により、反り(撓み)変形が抑制される
ためである。その結果、補助接続端子27が無い場合に
は、最下層の配線基板3は外部回路基板9との熱膨張差
を反り(撓み)変形によって緩和できないために、熱疲
労破壊が顕著に現れる。
This is because the lower wiring board 3 suppresses warpage (bending) deformation due to the presence of the upper wiring board 3. As a result, when the auxiliary connection terminals 27 are not provided, the thermal expansion difference between the lowermost wiring board 3 and the external circuit board 9 cannot be alleviated by warping (bending) deformation, so that thermal fatigue destruction appears remarkably.

【0054】これに対して、本発明のように、例えば、
四角形状の配線基板3の角部に補助接続端子27を設け
た場合には、上下間に配置した半導体装置7の反り(撓
み)変形が互いに伝えられるため、最下層の配線基板3
であっても十分な反り(撓み)変形が可能であり、外部
回路基板9との熱膨張差を十分緩和することができる。
On the other hand, as in the present invention, for example,
When the auxiliary connection terminals 27 are provided at the corners of the rectangular wiring board 3, the warpage (bending) deformations of the semiconductor devices 7 arranged between the upper and lower sides are transmitted to each other, so that the lowermost wiring board 3 is formed.
However, sufficient warping (bending) deformation is possible, and the difference in thermal expansion with the external circuit board 9 can be sufficiently reduced.

【0055】これは、積層型半導体装置1が外部回路基
板9に実装され、温度変化等により応力や歪が発生した
際に、積層された半導体装置7の間、若しくは半導体装
置7と外部回路基板8との間で配線基板3の角部に形成
された補助接続端子27が、スペーサの役割を担い、接
続端子23に加えて接続部の面積を大きくでき、そし
て、ハンダボール自身が半導体装置7や外部回路基板9
の変形による圧縮応力を緩和するためである。
This is because when the stacked semiconductor device 1 is mounted on the external circuit board 9 and stress or strain is generated due to a temperature change or the like, between the stacked semiconductor devices 7 or between the semiconductor device 7 and the external circuit board. The auxiliary connection terminals 27 formed at the corners of the wiring board 3 between the semiconductor device 7 and the semiconductor device 7 serve as spacers, and can increase the area of the connection portion in addition to the connection terminals 23. And external circuit board 9
This is for reducing the compressive stress caused by the deformation of.

【0056】さらに、この補助接続端子27は電気的な
導通を有していないため、たとえ熱疲労によって破壊し
ても半導体装置7の信頼性には影響しない。
Further, since the auxiliary connection terminal 27 does not have electrical continuity, even if it is broken by thermal fatigue, it does not affect the reliability of the semiconductor device 7.

【0057】なお、補助接続端子27の効果は、少なく
とも最下層の配線基板3の熱膨張係数が、他の配線基板
3の熱膨張係数よりも大きい場合に特に顕著に現れる。
これは、最下層の配線基板3の反り(撓み)量が、外部
回路基板9だけでなく、上層の配線基板3との熱膨張差
によって倍加され、その結果として外部回路基板9との
熱膨張差を一層緩和できるためである。
The effect of the auxiliary connection terminals 27 is particularly remarkable when the thermal expansion coefficient of at least the lowermost wiring board 3 is larger than the thermal expansion coefficients of the other wiring boards 3.
This is because the amount of warpage (bending) of the lowermost wiring board 3 is doubled not only by the external circuit board 9 but also by the thermal expansion difference with the upper wiring board 3, and as a result, the thermal expansion with the external circuit board 9 This is because the difference can be further reduced.

【0058】[0058]

【実施例】表1に示す2種類のセラミック材料について
配線基板を作製し、これを切断して、5×4×40mm
の形状の試料基板を作製した。そして、各試料基板につ
いて室温〜400℃の平均熱膨張係数を測定し、その結
果を表1に示した。
EXAMPLE A wiring board was prepared from the two types of ceramic materials shown in Table 1, cut, and cut into 5 × 4 × 40 mm.
Was prepared. Then, the average thermal expansion coefficient of each sample substrate from room temperature to 400 ° C. was measured, and the results are shown in Table 1.

【0059】また、これらの配線基板3を用いて表2の
組み合わせからなる4層タイプの積層型半導体装置1を
試作した。このとき、半導体素子はワイヤボンディング
方式を用いて実装した。表2において層の順番は下層か
らつけており、1層目が最下層で外部回路基板9と接続
される配線基板3である。
Further, a four-layer type stacked semiconductor device 1 composed of the combinations shown in Table 2 was prototyped using these wiring boards 3. At this time, the semiconductor element was mounted using a wire bonding method. In Table 2, the order of the layers is from the lower layer, and the first layer is the wiring board 3 connected to the external circuit board 9 at the lowermost layer.

【0060】この配線基板3は、ドクターブレード法で
成形した絶縁シートに導体加工を行い、これらを複数枚
積層した後、焼成して作製した。
The wiring board 3 was manufactured by conducting conductor processing on an insulating sheet formed by a doctor blade method, laminating a plurality of these sheets, and then firing.

【0061】また、作製した配線基板3の寸法は縦12
mm×横12mm×厚さ0.3mm、とし、中央には半
導体素子5を収納するために縦5.5mm×横5.5m
m×深さ0.2mmのキャビティを設けた。この内部に
縦4mm×横4mm×厚さ0.1mmの半導体素子5を
載置し、ワイヤボンディング後にエポキシ樹脂により封
止した。また、配線基板3の表裏面には、半導体素子5
を搭載する部分を除いて、0.5mm径の接続端子23
用の接続パッド17を0.8mmピッチで設け、また、
補助接続端子27用の接続パッド17は配線基板3の角
部に1.0mm径のものを配置した。
The dimension of the manufactured wiring board 3 is 12
mm × width 12 mm × thickness 0.3 mm, and 5.5 mm in length × 5.5 m in width at the center for housing the semiconductor element 5.
A cavity of mx 0.2 mm in depth was provided. A semiconductor element 5 having a length of 4 mm, a width of 4 mm and a thickness of 0.1 mm was placed in the inside, and sealed with an epoxy resin after wire bonding. The semiconductor element 5 is provided on the front and back surfaces of the wiring board 3.
The connection terminal 23 having a diameter of 0.5 mm except for the portion where
Connection pads 17 are provided at a pitch of 0.8 mm.
The connection pad 17 for the auxiliary connection terminal 27 having a diameter of 1.0 mm was arranged at a corner of the wiring board 3.

【0062】そして、半導体装置7の接続パッド17に
ハンダペーストを塗布した後、一旦リフローを行って接
続端子23および補助接続端子27を形成し、その後、
外部回路基板9の接続パッド17上に、各半導体装置7
を外部回路基板9の上に順に載置し、再度、一括リフロ
ー処理して実装基板11を作製した。尚、外部回路基板
9の熱膨張係数は17×10-6(/℃)、サイズは縦6
7mm×横67mm×厚み1.25mmのサイズのもの
を用いた。
Then, after solder paste is applied to the connection pads 17 of the semiconductor device 7, reflow is performed once to form the connection terminals 23 and the auxiliary connection terminals 27.
Each semiconductor device 7 is placed on the connection pad 17 of the external circuit board 9.
Were mounted on the external circuit board 9 in order, and a batch reflow process was performed again to manufacture the mounting board 11. The external circuit board 9 has a coefficient of thermal expansion of 17 × 10 −6 (/ ° C.) and a size of 6
The size used was 7 mm x 67 mm x 1.25 mm in thickness.

【0063】このように作製した実装基板11に対して
−40℃〜125℃の温度サイクル試験を最高1500
サイクルまで行った。実施例に使用した外部回路基板9
には電気的導通の有無を確認することができるように外
部接続パッドが設けられており、テスターを用いて接続
端子23による実装部の抵抗変化を検出することができ
るようにした。
A temperature cycle test of -40 ° C. to 125 ° C. is performed on the mounting board 11 thus manufactured up to 1500.
It went up to the cycle. External circuit board 9 used in the embodiment
Is provided with external connection pads so that the presence or absence of electrical conduction can be checked, and a tester can be used to detect a change in resistance of the mounting portion due to the connection terminal 23.

【0064】そして、100サイクル毎にそれぞれの積
層型半導体装置1の各接続端子23による実装部の電気
抵抗を測定し、初期抵抗に対し、1箇所でも、10%以
上抵抗変化する接続端子23が現れるまでの回数を表2
に示した。
Then, the electrical resistance of the mounting portion by each connection terminal 23 of each stacked semiconductor device 1 is measured every 100 cycles, and the connection terminal 23 whose resistance changes by 10% or more at any one position with respect to the initial resistance is measured. Table 2 shows the number of appearances
It was shown to.

【0065】[0065]

【表1】 [Table 1]

【0066】[0066]

【表2】 [Table 2]

【0067】表2から明らかなように、配線基板の接続
端子群25の外周部に補助接続端子27を設けて作製し
た本発明の試料No.1、3、5、6、7、8、9、1
0、の実装基板11では、温度サイクル試験回数が10
00回以上と熱疲労寿命を長くできた。また、最下層の
配線基板3の熱膨張係数が他の上層の配線基板3よりも
大きい試料No.3、5、6において、寿命サイクル数
を1300サイクルまで延ばすことができた。これは積
層型半導体装置1の最下層により大きな熱膨張係数を有
する半導体装置7を配置していることで、外部回路基板
9とともに積層型半導体装置1が凹状に且つ曲率中心が
同じになるように変形するため、接続端子23の上下層
の熱膨張差による歪を小さくすることができ、外部回路
基板9と半導体装置7、および半導体装置7同士を接続
している接続端子23の断線を防止しできたためであ
る。
As is apparent from Table 2, the sample No. of the present invention manufactured by providing the auxiliary connection terminal 27 on the outer peripheral portion of the connection terminal group 25 of the wiring board. 1, 3, 5, 6, 7, 8, 9, 1,
0, the number of temperature cycle tests is 10
The thermal fatigue life could be prolonged when the number was 00 or more. The sample No. 3 in which the lowermost wiring board 3 has a larger thermal expansion coefficient than the other upper wiring boards 3 has. In 3, 5, and 6, the number of life cycles could be extended up to 1300 cycles. This is because the semiconductor device 7 having a larger thermal expansion coefficient is arranged in the lowermost layer of the stacked semiconductor device 1, so that the stacked semiconductor device 1 and the external circuit board 9 are concave and have the same center of curvature. Due to the deformation, the distortion due to the difference in thermal expansion between the upper and lower layers of the connection terminal 23 can be reduced, and the disconnection of the external circuit board 9 and the semiconductor device 7 and the connection terminal 23 connecting the semiconductor devices 7 can be prevented. Because it was done.

【0068】一方、補助接続端子27を形成しなかった
試料No.2、4、11では、温度サイクル数は100
0サイクルに満たなかった。
On the other hand, Sample No. in which the auxiliary connection terminal 27 was not formed. For 2, 4, and 11, the number of temperature cycles is 100
Less than 0 cycles.

【0069】[0069]

【発明の効果】本発明によれば、配線基板の表面に半導
体素子を設けた半導体装置を複数積み重ねて構成された
積層型半導体装置において、上下に積み重ねられた半導
体装置間および最下層の半導体装置の下面に、配線基板
の導体層と電気的に接続する接続端子を複数設けるとと
もに、この接続端子群の外周部に配線基板の導体層と電
気的に接続しない補助接続端子を設けることにより、半
導体装置の下面に形成された接続端子に発生する応力を
補助接続端子が支え、接続端子群におけるハンダの疲労
断線を防止し接続信頼性を飛躍的に向上できる。
According to the present invention, in a stacked semiconductor device in which a plurality of semiconductor devices each having a semiconductor element provided on the surface of a wiring board are stacked, a semiconductor device between the vertically stacked semiconductor devices and a lowermost semiconductor device are provided. A plurality of connection terminals electrically connected to the conductor layer of the wiring board are provided on the lower surface of the wiring board, and auxiliary connection terminals not electrically connected to the conductor layer of the wiring board are provided on an outer peripheral portion of the connection terminal group, so that The auxiliary connection terminals support the stress generated in the connection terminals formed on the lower surface of the device, so that the fatigue breakage of the solder in the connection terminal group can be prevented and the connection reliability can be greatly improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の積層型半導体装置および実装基板を示
す概略断面図である。
FIG. 1 is a schematic sectional view showing a stacked semiconductor device and a mounting substrate according to the present invention.

【図2】(a)は配線基板の下面に格子状に配列された
接続端子群および接続端子と同列の角部に設けられた補
助接続端子の配置を示す平面図、(b)は配線基板の下
面に格子状に配列された接続端子群の角部に設けられた
大きさの異なる補助接続端子を示す平面図、(c)は配
線基板の下面に格子状に配列された接続端子群の最外列
の外側に設けられた補助接続端子を示す平面図である。
FIG. 2A is a plan view showing the arrangement of connection terminals arranged in a grid on the lower surface of a wiring board and auxiliary connection terminals provided at the same corners as the connection terminals; FIG. FIG. 3C is a plan view showing auxiliary connection terminals of different sizes provided at the corners of the connection terminal group arranged in a lattice on the lower surface of FIG. It is a top view which shows the auxiliary connection terminal provided outside the outermost row.

【符号の説明】[Explanation of symbols]

1 積層型半導体装置 3 配線基板 5 半導体素子 7 半導体装置 9 外部回路基板 11 実装基板 13 絶縁基板 15 導体層 23 接続端子 25 接続端子群 27 補助接続端子 DESCRIPTION OF SYMBOLS 1 Stacked semiconductor device 3 Wiring board 5 Semiconductor element 7 Semiconductor device 9 External circuit board 11 Mounting board 13 Insulating board 15 Conductive layer 23 Connection terminal 25 Connection terminal group 27 Auxiliary connection terminal

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】絶縁基板の内部に導体層を有する配線基板
と、該配線基板の表面に設けられた半導体素子とを具備
する半導体装置を複数積み重ねてなるとともに、上下の
前記半導体装置間および最下層の前記半導体装置の下面
に、前記配線基板の導体層と電気的に接続する接続端子
を複数設け、該接続端子群の外周部に前記配線基板の導
体層と電気的に接続しない補助接続端子を設けたことを
特徴とする積層型半導体装置。
A plurality of semiconductor devices each including a wiring substrate having a conductor layer inside an insulating substrate and a semiconductor element provided on a surface of the wiring substrate; A plurality of connection terminals that are electrically connected to the conductor layer of the wiring board are provided on the lower surface of the lower semiconductor device, and auxiliary connection terminals that are not electrically connected to the conductor layer of the wiring board on the outer periphery of the connection terminal group. A stacked semiconductor device, comprising:
【請求項2】最下層の配線基板の熱膨張係数が、上層の
配線基板の熱膨張係数よりも大きいことを特徴とする請
求項1記載の積層型半導体装置。
2. The stacked semiconductor device according to claim 1, wherein a thermal expansion coefficient of the lowermost wiring board is larger than a thermal expansion coefficient of the upper wiring board.
【請求項3】配線基板の主面が四角形状をなし、該配線
基板の主面に、前記配線基板の外形に対応するように四
角形状の接続端子群を設け、前記配線基板の主面の角部
に補助接続端子を設けたことを特徴とする請求項1また
は2に記載の積層型半導体装置。
3. A main surface of the wiring board has a square shape, and a group of connection terminals having a square shape is provided on the main surface of the wiring board so as to correspond to an outer shape of the wiring board. 3. The stacked semiconductor device according to claim 1, wherein auxiliary connection terminals are provided at the corners.
【請求項4】請求項1乃至3のうちいずれかに記載の積
層型半導体装置が、最下層の半導体装置の下面に設けら
れた接続端子および補助接続端子を介して外部回路基板
に接合されていることを特徴とする実装基板。
4. The stacked semiconductor device according to claim 1, wherein the stacked semiconductor device is joined to an external circuit board via connection terminals and auxiliary connection terminals provided on the lower surface of the lowermost semiconductor device. A mounting substrate.
【請求項5】外部回路基板に接合された最下層の配線基
板の熱膨張係数が、上層の配線基板の熱膨張係数よりも
大きく、且つ前記外部回路基板の熱膨張係数よりも小さ
いことを特徴とする請求項4記載の実装基板。
5. A thermal expansion coefficient of a lowermost wiring board joined to an external circuit board is larger than a thermal expansion coefficient of an upper wiring board and smaller than a thermal expansion coefficient of the external circuit board. The mounting substrate according to claim 4, wherein
JP2000363705A 2000-11-29 2000-11-29 Multilayer semiconductor device and mounting substrate Expired - Fee Related JP4521984B2 (en)

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Country Link
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JP2007318183A (en) * 2007-09-03 2007-12-06 Fujitsu Ltd Multilayer semiconductor device
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JP2005072587A (en) * 2003-08-20 2005-03-17 Samsung Electronics Co Ltd Bga package, package stacking structure and manufacturing method therefor
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