|
US7112517B2
(en)
*
|
2001-09-10 |
2006-09-26 |
Semiconductor Energy Laboratory Co., Ltd. |
Laser treatment device, laser treatment method, and semiconductor device fabrication method
|
|
JP4610867B2
(ja)
*
|
2002-06-14 |
2011-01-12 |
株式会社半導体エネルギー研究所 |
半導体装置の作製方法
|
|
US6747245B2
(en)
*
|
2002-11-06 |
2004-06-08 |
Ultratech Stepper, Inc. |
Laser scanning apparatus and methods for thermal processing
|
|
US7154066B2
(en)
*
|
2002-11-06 |
2006-12-26 |
Ultratech, Inc. |
Laser scanning apparatus and methods for thermal processing
|
|
US7097709B2
(en)
*
|
2002-11-27 |
2006-08-29 |
Mitsubishi Denki Kabushiki Kaisha |
Laser annealing apparatus
|
|
KR100992120B1
(ko)
*
|
2003-03-13 |
2010-11-04 |
삼성전자주식회사 |
규소 결정화 시스템 및 규소 결정화 방법
|
|
JP4860116B2
(ja)
*
|
2003-03-17 |
2012-01-25 |
株式会社半導体エネルギー研究所 |
結晶性半導体膜の作製方法
|
|
US7304005B2
(en)
*
|
2003-03-17 |
2007-12-04 |
Semiconductor Energy Laboratory Co., Ltd. |
Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device
|
|
JP4590880B2
(ja)
*
|
2003-06-24 |
2010-12-01 |
富士電機システムズ株式会社 |
半導体素子の製造方法
|
|
JP4831961B2
(ja)
*
|
2003-12-26 |
2011-12-07 |
株式会社半導体エネルギー研究所 |
半導体装置の作製方法、選択方法
|
|
US7199330B2
(en)
*
|
2004-01-20 |
2007-04-03 |
Coherent, Inc. |
Systems and methods for forming a laser beam having a flat top
|
|
TWI272149B
(en)
|
2004-02-26 |
2007-02-01 |
Ultratech Inc |
Laser scanning apparatus and methods for thermal processing
|
|
JP4660103B2
(ja)
*
|
2004-03-09 |
2011-03-30 |
三菱電機株式会社 |
レーザ熱処理方法
|
|
JP4935059B2
(ja)
*
|
2005-02-17 |
2012-05-23 |
三菱電機株式会社 |
半導体装置の製造方法
|
|
JP4311364B2
(ja)
*
|
2005-03-18 |
2009-08-12 |
セイコーエプソン株式会社 |
液滴吐出装置
|
|
US20070212859A1
(en)
|
2006-03-08 |
2007-09-13 |
Paul Carey |
Method of thermal processing structures formed on a substrate
|
|
KR20090007277A
(ko)
*
|
2006-04-14 |
2009-01-16 |
가부시키가이샤 니콘 |
노광 장치, 디바이스 제조 방법 및 노광 방법
|
|
TW200741883A
(en)
*
|
2006-04-21 |
2007-11-01 |
Zeiss Carl Laser Optics Gmbh |
Apparatus for laser annealing of large substrates and method for laser annealing for large substrates
|
|
US7545838B2
(en)
*
|
2006-06-12 |
2009-06-09 |
Coherent, Inc. |
Incoherent combination of laser beams
|
|
EP2054751A1
(de)
*
|
2006-07-13 |
2009-05-06 |
Hentze-Lissotschenko Patentverwaltungs GmbH & Co.KG |
Vorrichtung zur homogenisierung von licht sowie laservorrichtung zur erzeugung einer linienförmigen intensitätsverteilung in einer arbeitsebene
|
|
US7548364B2
(en)
|
2006-07-31 |
2009-06-16 |
Applied Materials, Inc. |
Ultra-fast beam dithering with surface acoustic wave modulator
|
|
US20080025354A1
(en)
*
|
2006-07-31 |
2008-01-31 |
Dean Jennings |
Ultra-Fast Beam Dithering with Surface Acoustic Wave Modulator
|
|
US7674999B2
(en)
*
|
2006-08-23 |
2010-03-09 |
Applied Materials, Inc. |
Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system
|
|
JP2008270540A
(ja)
*
|
2007-04-20 |
2008-11-06 |
Sony Corp |
半導体装置の製造方法および表示装置
|
|
US8148663B2
(en)
|
2007-07-31 |
2012-04-03 |
Applied Materials, Inc. |
Apparatus and method of improving beam shaping and beam homogenization
|
|
DE102007061358B4
(de)
*
|
2007-12-19 |
2012-02-16 |
Limo Patentverwaltung Gmbh & Co. Kg |
Vorrichtung zur Formung von Laserstrahlung
|
|
US8586398B2
(en)
*
|
2008-01-18 |
2013-11-19 |
Miasole |
Sodium-incorporation in solar cell substrates and contacts
|
|
US8536054B2
(en)
*
|
2008-01-18 |
2013-09-17 |
Miasole |
Laser polishing of a solar cell substrate
|
|
US8546172B2
(en)
|
2008-01-18 |
2013-10-01 |
Miasole |
Laser polishing of a back contact of a solar cell
|
|
JP5670862B2
(ja)
*
|
2011-11-02 |
2015-02-18 |
トーカロ株式会社 |
溶射皮膜における緻密化層の形成方法
|
|
US20150247998A1
(en)
*
|
2012-09-24 |
2015-09-03 |
Limo Patentverwaltung Gmbh & Co. Kg |
Device for Generating A Linear Intensity Distribution of a Laser Beam in a Working Plane
|
|
DE102013103422B4
(de)
*
|
2013-04-05 |
2022-01-05 |
Focuslight Technologies Inc. |
Vorrichtung zur Erzeugung von Laserstrahlung mit einer linienförmigen Intensitätsverteilung
|
|
FR3012264B1
(fr)
|
2013-10-21 |
2017-04-21 |
Saint Gobain |
Appareil laser modulaire
|
|
JP2015115401A
(ja)
*
|
2013-12-10 |
2015-06-22 |
三菱電機株式会社 |
レーザアニール方法およびレーザアニール装置
|
|
US9613815B2
(en)
|
2014-11-24 |
2017-04-04 |
Ultratech, Inc. |
High-efficiency line-forming optical systems and methods for defect annealing and dopant activation
|
|
FR3040319B1
(fr)
*
|
2015-08-25 |
2017-11-24 |
Saint Gobain |
Appareil laser modulaire
|
|
CN108886232B
(zh)
*
|
2015-12-25 |
2021-08-17 |
鸿海精密工业股份有限公司 |
线束光源及线束照射装置以及激光剥离方法
|
|
CN107398634A
(zh)
*
|
2016-05-19 |
2017-11-28 |
上海新昇半导体科技有限公司 |
一种激光退火装置及激光退火方法
|
|
JP6334074B1
(ja)
*
|
2017-05-23 |
2018-05-30 |
堺ディスプレイプロダクト株式会社 |
素子基板の製造方法およびレーザクリーニング装置
|
|
FR3072895B1
(fr)
|
2017-10-31 |
2019-10-18 |
Saint-Gobain Glass France |
Procede d'alignement d'une pluralite de lignes lasers
|
|
FR3095605A1
(fr)
*
|
2019-04-30 |
2020-11-06 |
Saint-Gobain Glass France |
Systeme d’alignement d’un dispositif de traitement thermique et son fonctionnement
|
|
TWI885574B
(zh)
*
|
2022-11-30 |
2025-06-01 |
騰錂鐳射股份有限公司 |
雷射錫焊設備
|