JP2002059346A - Method and device for chamfering plate-like work - Google Patents

Method and device for chamfering plate-like work

Info

Publication number
JP2002059346A
JP2002059346A JP2000251285A JP2000251285A JP2002059346A JP 2002059346 A JP2002059346 A JP 2002059346A JP 2000251285 A JP2000251285 A JP 2000251285A JP 2000251285 A JP2000251285 A JP 2000251285A JP 2002059346 A JP2002059346 A JP 2002059346A
Authority
JP
Japan
Prior art keywords
plate
annular groove
chamfering
face
chamfered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000251285A
Other languages
Japanese (ja)
Inventor
Mikio Kida
幹夫 木田
Tatsuya Nagata
達也 永田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP2000251285A priority Critical patent/JP2002059346A/en
Publication of JP2002059346A publication Critical patent/JP2002059346A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method and a device for chamfering a plate-like work capable of prolonging the service life of a grinding wheel, performing the continuous operation of a working machine, and improving the production efficiency. SOLUTION: The axis O of rotation of a rotary grinding wheel 2 is inclined in a plane parallel to an end face 1a to be chamfered of the plate-like work 1 around a contact point C of an annular groove 2a with an end face 1a to be chamfered of the plate-like work 1, a groove bottom surface 2a1 of the annular groove 2a is pressed against the end face 1a of the plate-like work 1, and both inner surfaces 2a2 and 2a3 of the annular groove 2a are pressed against face and back sides 1b and 1c in the vicinity of the end face 1a of the plate-like work 1 so as to apply a small bending moment to perform the chamfering.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、液晶ディスプレイ
用板ガラスの面取り加工等に適用して好適な板状物の面
取り加工方法及び装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for chamfering a plate-like material which are suitable for chamfering a glass sheet for a liquid crystal display.

【0002】[0002]

【従来の技術】液晶ディスプレイ装置は、テレビ、パソ
コン、携帯電話等の多方面の用途に使用されている。
2. Description of the Related Art Liquid crystal display devices are used in various applications such as televisions, personal computers, and mobile phones.

【0003】上記用途に使用される液晶ディスプレイ用
板ガラスは、主要面における内部欠陥(気泡、異物混入
等)や外部欠陥(凹凸、キズ、異物付着、汚損等)があ
ると、像の歪みやボケ、濁り、輝点等が発生し、表示を
不鮮明にするといった致命傷となるため、製造工程から
仕上げ工程まで、高い精度と精密性を維持すべく厳密な
管理の下で製造されている。
[0003] The flat glass for a liquid crystal display used for the above-mentioned applications has an image which is distorted or blurred when there are internal defects (bubbles, inclusion of foreign substances, etc.) or external defects (irregularities, scratches, adhesion of foreign substances, contamination, etc.) on the main surface. Since turbidity, luminescent spots, etc. occur and cause serious damage such as obscuring the display, it is manufactured under strict control from the manufacturing process to the finishing process in order to maintain high accuracy and precision.

【0004】そして、各用途に適合する大きさ、サイズ
にカットして出荷されるが、その端面について、予め面
取り加工を施している。
[0004] Then, the product is cut into a size and size suitable for each application and shipped, and the end face is preliminarily chamfered.

【0005】従来、液晶ディスプレイ用板ガラスの面取
り加工方法は、図4の(A)に示すように、ガラス基板
10の厚さよりも僅かに広い溝幅の環状溝11を有し、
ダイヤモンド砥粒等の粒子径の大きい砥粒をメタルボン
ド等で結合した粗研削用の回転砥石12を使用して粗研
削を行い、続いて、図4の(B)に示すように、同様な
形状の環状溝13を有し、炭化珪素等の細かい砥粒をポ
リウレタン樹脂等で結合した仕上げ研削用の回転砥石1
4で仕上げ研削を行うのが一般的であった。
Conventionally, a method of chamfering a glass sheet for a liquid crystal display has an annular groove 11 having a groove width slightly larger than the thickness of a glass substrate 10 as shown in FIG.
Rough grinding is performed using a rotary grinding wheel 12 for rough grinding in which abrasive grains having a large particle diameter such as diamond abrasive grains are bonded by a metal bond or the like, and then, as shown in FIG. A rotary grindstone 1 for finishing grinding which has an annular groove 13 of a shape and in which fine abrasive grains such as silicon carbide are combined with polyurethane resin or the like.
It was common to perform finish grinding at 4.

【0006】上記方法は、回転砥石12、14の環状溝
11、13をガラス基板10の端面に圧接して面取り加
工を行うもので、面取り加工による摩耗の進行で環状溝
11、13の形状が悪くなるとドレッシングを行って再
び加工を続行し、これを何度か繰り返すが、環状溝1
1、13が徐々に深くなって所定の深さに達すると、環
状溝11、13の両側内面によってガラス基板10の端
面に隣接する表面に研削キズが発生するようになる。こ
の時点になると、当該環状溝11、13は寿命となり、
新しい砥石と交換するか、または、図5に示すような幅
広の砥石15であれば、位置をずらせて新しい環状溝1
6により研削を行わせ、その環状溝16が前述のように
寿命になると、さらに位置をずらせて新しい環状溝17
により研削を行わせ、これを砥石の幅方向全長に亘って
繰り返すようにされている。
In the above method, the circular grooves 11, 13 of the rotary grindstones 12, 14 are pressed against the end face of the glass substrate 10 to perform the chamfering. When it becomes worse, dressing is performed and machining is continued again, and this is repeated several times.
When the grooves 1 and 13 gradually increase in depth and reach a predetermined depth, grinding flaws occur on the surface adjacent to the end face of the glass substrate 10 due to the inner surfaces on both sides of the annular grooves 11 and 13. At this point, the annular grooves 11 and 13 reach the end of their life,
Either replace it with a new grindstone or, if it is a wide grindstone 15 as shown in FIG.
6, when the annular groove 16 reaches the end of its life as described above, the position is further shifted and a new annular groove 17 is formed.
, And this is repeated over the entire length of the grinding wheel in the width direction.

【0007】しかし、この方法では、各環状溝間等や溝
底側等に砥石の未使用領域が多く残存したままで寿命と
して交換する必要があるため、砥石の寿命が非常に短
く、不経済であるのみならず、ドレッシング時や位置調
整時、砥石交換時等の各時点で面取り加工機の稼動を一
旦停止してそれらの作業を行う必要があり、特に、仕上
げ研削用の砥石の場合には摩耗が激しく、その分、砥石
の寿命が短く、その上、ドレッシングや位置調整、砥石
交換等を行う頻度が増加するために、生産効率が著しく
低下するという問題があった。
However, in this method, it is necessary to replace the whetstone with a long unused area between the annular grooves or at the bottom of the groove, etc., so that the whetstone has a very short life and is uneconomical. Not only that, it is necessary to temporarily stop the operation of the chamfering machine at each time such as dressing, position adjustment, wheel replacement, etc., and to perform such work, especially in the case of finish grinding wheels. Has a problem that the production efficiency is remarkably reduced because the wear is severe, the life of the grindstone is correspondingly short, and the frequency of dressing, position adjustment, replacement of the grindstone and the like is increased.

【0008】また、前記方法は、ガラス基板10の端面
の両側に角部が残っている場合が多く、定盤の上等で後
加工を行う際、該角部に欠けが発生し易く、さらにその
破片のうちの目視では確認不可能な程度の微小粒子がガ
ラス基板10の主要面に付着したままとなっていること
があり、そのまま液晶ディスプレイ装置に組込まれる
と、表示を不鮮明にする要因の1つになるという問題が
あった。また、前記の方法では、面取り加工されたガラ
ス基板10の端面中央部の仕上げ研削が不十分となり易
く、粗荒面となっていることがあり、この粗荒面から脱
落した微小粒子がガラス基板10の主要面に付着したま
まとなり、そのまま液晶ディスプレイ装置に組込まれる
と、前記と同様に表示を不鮮明にする要因の1つになる
という問題もあった。
In the above method, corners often remain on both sides of the end face of the glass substrate 10, and when post-processing is performed on a surface plate or the like, the corners are likely to be chipped. Of the fragments, fine particles that cannot be visually confirmed may remain attached to the main surface of the glass substrate 10. There was a problem of becoming one. Further, in the above method, the finish grinding of the center portion of the end surface of the chamfered glass substrate 10 is likely to be insufficient, and the rough surface may be rough. There is also a problem that, as described above, if it remains attached to the main surface of the liquid crystal display 10 and is directly incorporated into a liquid crystal display device, it becomes one of the factors that render the display unclear.

【0009】そこで、従来、上記問題を解消するため
に、図4の(A)で粗研削したガラス基板10の端面を
図4の(B)の代わりに、図4の(C)及び(D)に示
すような方法で仕上げ研削することも行われている。即
ち、図4の(C)に示すように、上下一対の仕上げ研削
用の回転砥石18、19をガラス基板10の端面の両側
角部に対して所定の角度(例えば、端面に対して45度
の角度)で圧接して角部の仕上げ研削を行い、続いて、
図4の(D)に示すように、ガラス基板10の端面中央
部を仕上げ研削用の回転砥石20で研削する方法であ
る。
Conventionally, in order to solve the above problem, the end face of the glass substrate 10 roughly ground in FIG. 4A is replaced with FIG. 4C and FIG. 4D instead of FIG. 4B. In some cases, finish grinding is performed by the method shown in (1). That is, as shown in FIG. 4C, a pair of upper and lower rotary grinding stones 18 and 19 for finish grinding are formed at a predetermined angle (for example, 45 degrees with respect to the end face) with respect to both side corners of the end face of the glass substrate 10. Angle) to finish grind the corners,
As shown in FIG. 4 (D), this is a method in which the center of the end face of the glass substrate 10 is ground with a rotary grindstone 20 for finish grinding.

【0010】しかし、この方法は、先の方法に比べて、
加工装置も複雑で加工工数が増加し、生産コストがアッ
プする問題がある。
However, this method is different from the previous method in that
There is a problem that the processing apparatus is complicated, the number of processing steps increases, and the production cost increases.

【0011】[0011]

【発明が解決しようとする課題】従来のガラス基板に対
する面取り加工方法は、多くの未使用領域を残存させた
ままの砥石を寿命として取替え交換する必要があり、砥
石の寿命が非常に短く、ランニングコストが高くなり、
しかも、ドレッシング時や次の環状溝への位置調整時、
並びに、回転砥石の取替え交換時、一旦、加工機の稼動
を停止することが必要になる。特に、仕上げ用砥石やレ
ジンボンド等の比較的柔らかい砥石では、摩耗が早く、
寿命が短いため、加工機の稼動を停止させることが多く
なり、生産効率が著しく低下するという問題があった。
In the conventional chamfering method for a glass substrate, it is necessary to replace a whetstone with many unused areas remaining as a service life, and the life of the whetstone is very short, and the running time is extremely short. Higher costs,
Moreover, when dressing or adjusting the position to the next annular groove,
In addition, it is necessary to temporarily stop the operation of the processing machine when replacing and replacing the rotating grindstone. In particular, with relatively soft whetstones such as finishing whetstones and resin bonds, wear is fast,
Since the service life is short, the operation of the processing machine is often stopped, and there has been a problem that production efficiency is significantly reduced.

【0012】そこで本発明は、未使用領域を著減させて
砥石寿命を延長させ、加工機の連続稼動を可能とし、生
産効率を向上させ得る板状物の面取り加工方法及び装置
を提供することを目的としている。
Accordingly, the present invention provides a method and an apparatus for chamfering a plate-like object capable of significantly reducing an unused area, extending the life of a grinding wheel, enabling continuous operation of a processing machine, and improving production efficiency. It is an object.

【0013】[0013]

【課題を解決するための手段】上記目的を達成するた
め、本発明の板状物の面取り加工方法は、回転砥石の外
周面の環状溝を板状物の端面に圧接させつつ該回転砥石
と板状物とを板状物の端面に沿う方向に相対的に移動さ
せて、回転砥石の環状溝の溝底面及び両側内面によって
板状物の端面を円弧状に面取り加工する方法であって、
回転砥石の回転軸線を、環状溝と板状物の面取りすべき
端面との接触点を中心として、板状物の面取りすべき端
面に平行な平面内で傾けて、前記環状溝の溝底を板状物
の端面に圧接させて面取り加工することを特徴とする。
In order to achieve the above object, a method for chamfering a plate-like object according to the present invention is characterized in that an annular groove on the outer peripheral surface of a rotary grindstone is brought into contact with the end surface of the plate-like object while being pressed against the end surface of the plate-like object. A method of relatively moving the plate-like object in the direction along the end surface of the plate-like object, and chamfering the end surface of the plate-like object in an arc shape by the groove bottom surface and both inner surfaces of the annular groove of the rotating grindstone,
The rotation axis of the rotary grindstone is inclined about a contact point between the annular groove and the end face of the plate-like object to be chamfered in a plane parallel to the end face of the plate-like object to be chamfered, and the groove bottom of the annular groove is inclined. It is characterized in that chamfering is performed by pressing against the end face of the plate-like object.

【0014】この構成によれば、回転砥石の摩耗の進行
状態が、丁度、環状溝の溝幅及び深さを広げながら板状
物の端面を円弧状に面取り加工させていくような関係と
なる。従って、板状物の端面の面取り加工は、回転砥石
の軸線方向幅寸法のほぼ全長に亘る領域が摩耗するまで
連続して行わせることができる。その結果、加工機の連
続稼動が可能となり、かつ、回転砥石の未使用領域が著
減し、砥石の寿命を従来の2〜3倍に延ばすことがで
き、これによって、生産効率を向上させ、板状物の製造
コストの低減を図ることができる。しかも、本発明によ
れば、環状溝の摩耗が、従来の如く深さ方向だけではな
く、同時に溝幅方向にも進行するため、板状物の端面付
近の表裏面にキズが発生することもない。さらに、本発
明によれば、環状溝の溝幅が増大するように摩耗が進行
するため、加工部位への冷却媒体の供給が良好に行わ
れ、面取り部の品質及び精度を向上させることができ
る。
According to this configuration, the progress of the wear of the rotary grindstone is such that the end face of the plate-like object is chamfered in an arc while just widening the groove width and depth of the annular groove. . Therefore, the chamfering of the end face of the plate-like object can be continuously performed until the region over substantially the entire length in the axial direction width dimension of the rotary grindstone is worn. As a result, the continuous operation of the processing machine becomes possible, and the unused area of the rotating grindstone is remarkably reduced, and the life of the grindstone can be extended two to three times as compared with the conventional one. It is possible to reduce the manufacturing cost of the plate-like object. Moreover, according to the present invention, the wear of the annular groove proceeds not only in the depth direction as in the conventional case but also in the groove width direction at the same time, so that the front and back surfaces near the end surface of the plate-like object may be scratched. Absent. Furthermore, according to the present invention, since the wear progresses so that the groove width of the annular groove increases, the supply of the cooling medium to the processing portion is performed favorably, and the quality and accuracy of the chamfered portion can be improved. .

【0015】本発明の板状物の面取り加工方法は、液晶
ディスプレイ用板ガラスの端面の面取り加工に適用して
好適である。
The method for chamfering a plate-like object according to the present invention is suitably applied to the chamfering of an end face of a glass sheet for a liquid crystal display.

【0016】本発明の板状物の面取り加工装置は、板状
物を面取りすべき端面に沿って搬送する搬送機構と、該
板状物の端面に圧接可能とした環状溝を外周面に有し、
駆動手段及び支持手段を備えた回転砥石と、該回転砥石
の回転軸線を、環状溝と板状物の面取りすべき端面との
接触点を中心として、板状物の面取りすべき端面に平行
な平面内で傾動可能とする傾動機構とを具備し、前記傾
動機構によって、前記回転砥石の回転軸線を回転砥石の
環状溝の摩耗状態に応じて前記接触点を中心として前記
平面内で傾動させるようにしたことを特徴とする。この
構成によれば、前記本発明の面取り加工方法を容易に実
施することができる。
The apparatus for chamfering a plate-like object according to the present invention has a transport mechanism for transporting the plate-like object along an end surface to be chamfered, and an annular groove on the outer peripheral surface capable of being pressed against the end surface of the plate-like object. And
A rotary grindstone provided with a driving means and a support means, and a rotation axis of the rotary grindstone is parallel to an end face of the plate-like object to be chamfered around a contact point between the annular groove and an end face of the plate-like object to be chamfered. A tilting mechanism capable of tilting in a plane, wherein the tilting mechanism tilts the rotation axis of the rotating grindstone in the plane about the contact point in accordance with the wear state of the annular groove of the rotating grindstone. It is characterized by the following. According to this configuration, the chamfering method of the present invention can be easily implemented.

【0017】[0017]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基いて説明する。図1の(A)は本発明に係る面取り
加工方法の原理説明用正面図、(B)はその要部拡大側
面図、図2は本発明に係る面取り加工方法の実施形態概
念を示す要部概略斜視図、図3は本発明に係る面取り加
工装置の実施形態例を示す要部概略側面図である。
Embodiments of the present invention will be described below with reference to the drawings. 1A is a front view for explaining the principle of the chamfering method according to the present invention, FIG. 1B is an enlarged side view of a principal part thereof, and FIG. 2 is a principal part showing the concept of an embodiment of the chamfering method according to the present invention. FIG. 3 is a schematic perspective view, and FIG. 3 is a schematic side view of an essential part showing an embodiment of a chamfering apparatus according to the present invention.

【0018】本発明の面取り加工方法は、図1の(A)
(B)及び図2に示すように、回転砥石2の外周面の環
状溝2aを、板状物1の端面1aに圧接係合させつつ該
回転砥石2に対して、ベルトコンベア等の搬送機構3に
よって、板状物1を端面1aに沿う方向に移動させて、
図1の(B)に示すように、回転砥石2の環状溝2aの
溝底面2a1及び両側内面2a2、2a3によって板状物
1の端面1aを面取り加工するものであるが、その際、
回転砥石2の回転軸線Oを、図1の(A)に一点鎖線で
示すように、環状溝2aと板状物1の面取りすべき端面
1aとの接触点Cを中心として、板状物1の面取りすべ
き端面1aに平行な平面(図1(A)の紙面と平行な
面)内で傾けて、前記環状溝2aの溝底面2a1を板状
物1の端面1aに圧接させると共に、前記回転軸線Oの
左右対称位置で前記環状溝2aの両側内面2a2、2a3
を板状物1の端面1a付近の表裏両面1b、1cに僅か
に曲げモーメントが加わるように圧接させて面取り加工
することを特徴とするものである。
The chamfering method of the present invention is shown in FIG.
As shown in FIG. 2B and FIG. 2, a transfer mechanism such as a belt conveyer is provided to the rotary grindstone 2 while the annular groove 2 a on the outer peripheral surface of the rotary grindstone 2 is pressed into engagement with the end surface 1 a of the plate-shaped object 1. 3, the plate-like object 1 is moved in a direction along the end face 1a,
As shown in FIG. 1 (B), although the plate-like material 1 of the end face 1a by groove bottom surface 2a 1 and both the inner surface 2a 2, 2a 3 of the grinding wheel 2 the annular groove 2a is for chamfering, in which ,
As shown by a dashed line in FIG. 1A, the rotation axis O of the rotary grindstone 2 is centered on the contact point C between the annular groove 2a and the end face 1a of the plate-like object 1 to be chamfered. the plane parallel to the end surface 1a to be chamfered inclined in (FIG. 1 (the plane parallel to the plane of a)), together with the is pressed against the groove bottom surface 2a 1 of the annular groove 2a on the end face 1a of the plate-like object 1, The inner surfaces 2a 2 , 2a 3 on both sides of the annular groove 2a at the left-right symmetric position of the rotation axis O.
Is chamfered by pressing the front and back surfaces 1b and 1c near the end surface 1a of the plate-like object 1 so that a slight bending moment is applied.

【0019】上記環状溝2aの初期の溝幅は、板状物1
の厚さよりも僅かに大きく形成され、これによって、図
1の(A)に一点鎖線で示すように、回転砥石2の回転軸
線Oを反時計方向へ僅かに傾けて、板状物1の表面側1
bには環状溝2aの上側内面2a2を回転軸線Oの左側
で下向きに押圧接触させ、板状物1の裏面側1cには環
状溝2aの下側内面2a3を回転軸線Oの右側で上向き
に押圧接触させて、板状物1の表裏面に僅かな曲げモー
メントを加えながら面取り加工させるものである。この
場合の曲げモーメントの大きさは、板状物1を破損させ
ない程度に設定される。また、回転砥石2は、板状物1
の端面1aに向けて常に一定の圧力で圧接可能とされ
る。
The initial groove width of the annular groove 2a is
1A, the rotation axis O of the rotary grindstone 2 is slightly tilted counterclockwise as shown by a dashed line in FIG. Side 1
b downward to press contact with the upper inner surface 2a 2 of the annular groove 2a on the left side of the rotary axis O to, on the back side 1c of the platelet 1 in the right rotational axis O of the lower inner surface 2a 3 of the annular groove 2a The plate-like object 1 is chamfered while being pressed upward to apply a slight bending moment to the front and back surfaces of the plate-like object 1. The magnitude of the bending moment in this case is set to such an extent that the plate-like object 1 is not damaged. The rotating whetstone 2 is a plate-shaped object 1
Can always be pressed against the end face 1a at a constant pressure.

【0020】板状物1は、図2に示すように、ベルトコ
ンベア等の搬送機構3によって、端面1aに沿う方向に
所定の速度で移動させて、搬送路の途中両側に設置した
回転砥石2、2を、前記図1の(A)に示す要領で圧接
係合させるものである。回転砥石2、2の回転方向は、
図2に示すように、板状物1の移動方向に逆らう方向と
している。この場合、板状物1の搬送を確実に行わせる
ために、前記ベルトコンベア等の搬送機構3には、送り
爪等が設けられる。また、板状物1の搬送路の途中両側
に設置された回転砥石2、2は、一方を基準として、他
方を板状物1の幅方向に常時一定の圧力で押圧して研削
を行うように構成される。なお、板状物1を固定してお
き、回転砥石2を回転させつつ板状物1の端面1aに沿
う方向に移動させるようにしてもよい。
As shown in FIG. 2, the plate-shaped object 1 is moved at a predetermined speed in a direction along the end face 1a by a transfer mechanism 3 such as a belt conveyer, and the rotary grindstones 2 installed on both sides of the transfer path. 1 and 2 are pressed and engaged in the manner shown in FIG. The rotation direction of the rotary whetstones 2 and 2
As shown in FIG. 2, the direction is opposite to the moving direction of the plate-like object 1. In this case, a feeding claw or the like is provided in the transport mechanism 3 such as the belt conveyor in order to surely transport the plate-like material 1. In addition, the rotating grindstones 2, 2 installed on both sides of the conveyance path of the plate-like object 1 perform grinding by pressing one at a constant pressure in the width direction of the plate-like object 1, with one as a reference. It is composed of The plate-like object 1 may be fixed, and the rotating grindstone 2 may be moved in a direction along the end surface 1a of the plate-like object 1 while rotating.

【0021】図3は、回転砥石2の傾動機構4を示すも
のであって、回転砥石2の駆動手段及び支持手段を備え
た駆動ユニット5を固定支持基板6に複数の長孔6aと
該長孔6aに係合する複数のガイドピン5aとによっ
て、板状物1との接触点Cを中心とし、板状物1の端面
1aに平行な平面内で傾動可能に支持しており、前記駆
動ユニット5を、固定支持基板6に設けたモータ4aに
よりボールねじ4bとボールナット4cとを介して傾動
させるように構成している。
FIG. 3 shows a tilting mechanism 4 for the rotary grindstone 2. A drive unit 5 having driving means and support means for the rotary grindstone 2 is provided on a fixed support substrate 6 with a plurality of elongated holes 6 a. The plurality of guide pins 5a engaged with the holes 6a are supported so as to be tiltable in a plane parallel to the end surface 1a of the plate 1 with the contact point C with the plate 1 as a center. The unit 5 is configured to be tilted by a motor 4a provided on the fixed support substrate 6 via a ball screw 4b and a ball nut 4c.

【0022】即ち、具体的には、前記長孔6aは、固定
支持基板6に、前記回転砥石2の環状溝2aが板状物1
と接触する点Cを中心として、同心円弧状に複数個(図
3は4個を例示)が形成されており、これに対して、ガ
イドピン5aは、回転砥石2の駆動ユニット5にブラケ
ット(図示省略)を介して取付けられている。そして、
モータ4aは、固定支持基板6に支持ピン4dを介して
回動可能に取付けられており、このモータ4aにボール
ねじ4bの一端が連結されてモータ4aと一体的に前記
支持ピン4dの回りで回動可能とされており、ボールね
じ4bの他端側は自由端とされ、この自由端側にボール
ナット4cが螺合されており、このボールナット4c
は、回転砥石2の駆動ユニット5のブラケット5bに連
結ピン5cを介して該連結ピン5cの回りで回動可能に
連結されており、この構成によって、ボールねじ4bと
ボールナット4cによる直線運動を駆動ユニット5の円
弧運動に変換伝達可能としている。
More specifically, the elongated hole 6a is formed in the fixed support substrate 6 so that the annular groove 2a of the rotary grindstone 2 is
A plurality (four in FIG. 3 are illustrated) of concentric arcs are formed around a point C at which the guide pin 5a comes into contact with the drive unit 5 of the rotating grindstone 2 (see FIG. 3). (Omitted). And
The motor 4a is rotatably mounted on the fixed support substrate 6 via support pins 4d. One end of a ball screw 4b is connected to the motor 4a, and the motor 4a is integrated with the motor 4a around the support pins 4d. The other end of the ball screw 4b is a free end, and a ball nut 4c is screwed onto the free end.
Is rotatably connected to the bracket 5b of the drive unit 5 of the rotary grindstone 2 via the connecting pin 5c via the connecting pin 5c. With this configuration, the linear motion by the ball screw 4b and the ball nut 4c is performed. The conversion into the circular motion of the drive unit 5 can be transmitted.

【0023】上記モータ4aは、回転砥石2の環状溝2
aの摩耗状態に応じて自動的に駆動されるように構成さ
れるもので、例えば、回転砥石2の上記傾動方向の研削
反力を歪み計等で検出させ、その値が所定範囲内になる
ように自動制御させたり、または、板状物1の面取り加
工枚数が所定数になる毎に所定量ずつ傾動させるように
してもよい。なお、前記駆動ユニット5の傾動手段とし
てサーボモータを用いると、無段変速の傾動が可能とな
るため好ましい。
The motor 4a is provided with an annular groove 2 of the rotary grindstone 2.
It is configured to be automatically driven in accordance with the abrasion state of a. For example, the grinding reaction force of the rotating grindstone 2 in the tilting direction is detected by a strain gauge or the like, and the value is within a predetermined range. Automatic control may be performed as described above, or the plate-shaped object 1 may be tilted by a predetermined amount every time the number of chamfered sheets reaches a predetermined number. It is preferable to use a servomotor as the tilting means of the drive unit 5 because the tilting of the continuously variable transmission is possible.

【0024】本発明の実施形態の構成は、以上であっ
て、次に板状物1の面取り加工要領を説明する。図2に
示すように、一対の回転砥石2、2の間に板状物1を搬
送機構3により一定速度で送り込み通過させて、先ず、
両側2面の面取りを行わせ、続いて、板状物1の送り方
向を90°変更して他の2面の面取りを行わせるもので
ある。この時、回転砥石2、2は、それぞれ図1の
(A)に一点鎖線で示す状態に傾動機構4によって傾動
させておく。これによって、環状溝2aの溝底面2a 1
を板状物1の端面1aに圧接させると共に、前記回転軸
線Oの左右対称位置で前記環状溝2aの両側内面2
2、2a3を板状物1の端面1a付近の表裏両面1b、
1cに僅かに曲げモーメントが加わるように圧接させて
面取り加工することになる。加工の進行に伴って回転砥
石2の環状溝2aの溝底面2a1及び両側内面2a2、2
3の摩耗が進行していくが、その状態は、丁度、環状
溝2aの溝幅及び深さを広げながら板状物1の端面1a
を円弧状に面取り加工させていくような状態となる。従
って、板状物1の端面1aの面取り加工は、図1の
(A)に二点鎖線で示すように、回転砥石2の軸線方向
幅寸法のほぼ全長に亘る領域が摩耗するまで連続して行
わせることができる。なお、回転砥石2の環状溝2aの
摩耗が、図1の(A)の二点鎖線に示す状態に達する
と、軸線方向両端の鍔状残存部が平坦になるようにドレ
ッシングを行い、軸線方向中央部に新しく初期の環状溝
2aを形成して、再び、前記と同様に面取り加工を行わ
せる。これを回転砥石2の径方向厚みの殆ど全部に達す
るまで繰り返すことができる。
The configuration of the embodiment of the present invention has been described above.
Next, the procedure of chamfering the plate-like object 1 will be described. In FIG.
As shown, the plate-like material 1 is carried between a pair of rotary grindstones 2 and 2.
It is fed at a constant speed by the feeding mechanism 3 and passed therethrough.
Have two sides chamfered, then feed the plate 1
Change the direction by 90 ° and make the other two chamfers
is there. At this time, the rotating grindstones 2 and 2 respectively correspond to those shown in FIG.
(A) Tilt by the tilt mechanism 4 to the state shown by the dashed line
Let it be. Thereby, the groove bottom surface 2a of the annular groove 2a 1
Is pressed against the end face 1a of the plate-like object 1 and the rotary shaft
The inner surfaces 2 on both sides of the annular groove 2a at symmetric positions of the line O
aTwo, 2aThreeThe front and back surfaces 1b near the end surface 1a of the plate-like material 1,
1c is pressed so that a slight bending moment is applied.
It will be chamfered. Rotary grinding with progress of processing
Groove bottom 2a of annular groove 2a of stone 21And both inner surfaces 2aTwo, 2
aThreeWear progresses, but the condition is just
The end face 1a of the plate-like object 1 while increasing the groove width and depth of the groove 2a
Is chamfered into an arc shape. Subordinate
Therefore, the chamfering of the end surface 1a of the plate-like material 1
As shown by a two-dot chain line in FIG.
Run continuously until the area over almost the entire width is worn.
I can make it. In addition, the annular groove 2a of the rotary grindstone 2
Abrasion reaches the state shown by the two-dot chain line in FIG.
And drain so that the flange-shaped remaining portions at both ends in the axial direction become flat.
And a new initial annular groove at the center in the axial direction.
2a is formed, and chamfering is performed again as described above.
Let This reaches almost all of the radial thickness of the rotary grindstone 2
Can be repeated until

【0025】本発明において、回転砥石の回転軸線Oの
傾動は、0°〜45°の範囲内で行うことが可能であ
り、通常では、0°〜30°程度の範囲で使用するのが
適当である。また、環状溝2aは、1つの回転砥石2の
軸線方向に複数個形成しておいてもよい。但し、その場
合、環状溝2aの設置間隔を従来よりも広くしておき、
両側の環状溝2a、2aの間の砥石の未使用領域を半分
ずつ使用する形態となる。
In the present invention, the rotation axis O of the rotary grindstone can be tilted within a range of 0 ° to 45 °, and usually, it is suitable to use the rotary axis O within a range of about 0 ° to 30 °. It is. Further, a plurality of annular grooves 2a may be formed in the axial direction of one rotating grindstone 2. However, in this case, the interval between the annular grooves 2a is set wider than before,
An unused area of the grindstone between the annular grooves 2a, 2a on both sides is used in half.

【0026】本発明の板状物の面取り加工方法は、液晶
ディスプレイ用板ガラスの端面の面取り加工に適用して
好適である。例えば、400×500×0.7mmの液
晶ディスプレイ用板ガラスの端面の仕上げ研削を行う場
合、砥石直径200mm、回転周速度1500〜200
0m/min、砥石の軸線方向幅30〜100mm、砥
石粒度♯220〜300、板ガラスの送り速度4m/m
inで実施したところ、角部がなく、均一に研摩された
円弧状の面取り加工面が得られた。
The method for chamfering a plate-like object according to the present invention is suitably applied to the chamfering of an end face of a glass sheet for a liquid crystal display. For example, when performing the finish grinding of the end face of the liquid crystal display glass plate of 400 × 500 × 0.7 mm, the grinding wheel diameter is 200 mm and the rotation peripheral speed is 1500 to 200.
0 m / min, width of grinding wheel in the axial direction 30 to 100 mm, grinding wheel grain size 220 to 300, feed speed of sheet glass 4 m / m
When performed in, an arc-shaped chamfered surface having no corners and uniformly polished was obtained.

【0027】なお、本発明は、液晶ディスプレイ用板ガ
ラス以外の板状物1の面取り加工に適用することがで
き、その際、粗研削と仕上げ研削の両方に同様に適用す
ることができるものである。
The present invention can be applied to the chamfering of a plate-like material 1 other than a glass plate for a liquid crystal display, and in this case, it can be similarly applied to both rough grinding and finish grinding. .

【0028】[0028]

【発明の効果】本発明の板状物の面取り加工方法によれ
ば、回転砥石の軸線方向幅寸法のほぼ全長に亘る領域が
摩耗するまで連続して面取り加工を行わせることができ
る。その結果、加工機の連続稼動が可能となり、かつ、
回転砥石の未使用領域が著減し、砥石の寿命を従来の2
〜3倍に延ばすことができ、これによって、生産効率を
向上させ、板状物の製造コストの低減を図ることができ
る。しかも、本発明によれば、環状溝の摩耗が、従来の
如く深さ方向だけではなく、同時に溝幅方向にも進行す
るため、板状物の端面付近の表裏面にキズが発生するこ
ともない。さらに、本発明によれば、環状溝の溝幅が増
大するように摩耗が進行するため、加工部位への冷却媒
体の供給が良好に行われ、面取り部の品質及び精度を向
上させることができる。
According to the method for chamfering a plate-like object of the present invention, chamfering can be continuously performed until a region over substantially the entire length of the rotary grindstone in the axial direction is worn. As a result, continuous operation of the processing machine becomes possible, and
The unused area of the grinding wheel has been significantly reduced, and the life of the grinding wheel
It can be extended up to three times, whereby the production efficiency can be improved and the production cost of the plate-like object can be reduced. Moreover, according to the present invention, the wear of the annular groove proceeds not only in the depth direction as in the conventional case but also in the groove width direction at the same time, so that the front and back surfaces near the end surface of the plate-like object may be scratched. Absent. Furthermore, according to the present invention, since the wear progresses so that the groove width of the annular groove increases, the supply of the cooling medium to the processing portion is performed favorably, and the quality and accuracy of the chamfered portion can be improved. .

【0029】従って、本発明の板状物の面取り加工方法
は、液晶ディスプレイ用板ガラスの端面の面取り加工に
適用して好適である。
Therefore, the method for chamfering a plate-like object of the present invention is suitable for application to the chamfering of an end face of a glass sheet for a liquid crystal display.

【0030】また、本発明の板状物の面取り加工装置に
よれば、前記本発明の面取り加工方法を容易に実施する
ことができる。
Further, according to the plate-shaped chamfering apparatus of the present invention, the chamfering method of the present invention can be easily implemented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)は本発明に係る面取り加工方法の原理説
明用正面図、(B)はその要部拡大側面図。
FIG. 1A is a front view for explaining the principle of a chamfering method according to the present invention, and FIG.

【図2】本発明に係る面取り加工方法の実施形態概念を
示す要部概略斜視図。
FIG. 2 is a schematic perspective view of a main part showing a concept of an embodiment of a chamfering method according to the present invention.

【図3】本発明に係る面取り加工装置の実施形態例を示
す要部概略側面図。
FIG. 3 is a schematic side view of a main part showing an embodiment of a chamfering apparatus according to the present invention.

【図4】(A)(B)は従来の面取り加工方法の加工順
序説明図、(C)(D)は従来の別の面取り加工方法の
加工順序説明図。
FIGS. 4A and 4B are explanatory diagrams of a processing order of a conventional chamfering method, and FIGS. 4C and 4D are explanatory diagrams of a processing order of another conventional chamfering method.

【図5】複数の環状溝を有する従来の面取り加工用回転
砥石の加工要領説明図。
FIG. 5 is an explanatory diagram of a processing procedure of a conventional rotary grindstone for chamfering having a plurality of annular grooves.

【符号の説明】[Explanation of symbols]

1 板状物 1a 端面 1b 表面 1c 裏面 2 回転砥石 2a 環状溝 2a1 溝底面 2a2、2a3 両側内面 O 回転軸線 C 接触点 3 搬送機構 4 傾動機構 4a モータ 4b ボールねじ 4c ボールナット 4d 支持ピン 5 駆動ユニット 5a ガイドピン 5b ブラケット 5c 連結ピン 6 固定支持基板 6a 長孔1 platelet 1a end face 1b surface 1c backside 2 grindstone 2a annular groove 2a 1 groove bottom face 2a 2, 2a 3 on both sides the inner surface O rotational axis C contact point 3 transport mechanism 4 tilting mechanism 4a motor 4b ball screw 4c ball nut 4d support pins Reference Signs List 5 Drive unit 5a Guide pin 5b Bracket 5c Connecting pin 6 Fixed support substrate 6a Slot

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 回転砥石の外周面の環状溝を板状物の端
面に圧接させつつ該回転砥石と板状物とを板状物の端面
に沿う方向に相対的に移動させて、回転砥石の環状溝の
溝底面及び両側内面によって板状物の端面を円弧状に面
取り加工する方法であって、 回転砥石の回転軸線を、環状溝と板状物の面取りすべき
端面との接触点を中心として、板状物の面取りすべき端
面に平行な平面内で傾けて、前記環状溝の溝底を板状物
の端面に圧接させて面取り加工することを特徴とする板
状物の面取り加工方法。
A rotating grindstone that moves the rotary grindstone and the plate-shaped member relatively in a direction along the end surface of the plate-shaped member while pressing an annular groove on an outer peripheral surface of the rotary grindstone against an end surface of the plate-shaped member; A method of chamfering an end surface of a plate-like object in an arc shape by a groove bottom surface and both side inner surfaces of an annular groove, wherein a rotation axis of a rotary grindstone is set to a contact point between an annular groove and an end surface of the plate-like object to be chamfered. Chamfering a plate-like object characterized by being inclined as a center in a plane parallel to an end surface of the plate-like object to be chamfered and pressing a groove bottom of the annular groove against an end surface of the plate-like object. Method.
【請求項2】 前記板状物が液晶ディスプレイ用板ガ
ラスに適用されることを特徴とする請求項1に記載の板
状物の面取り加工方法。
2. The method according to claim 1, wherein the plate is applied to a glass sheet for a liquid crystal display.
【請求項3】 板状物を面取りすべき端面に沿って搬
送する搬送機構と、 該板状物の端面に圧接可能とした環状溝を外周面に有
し、駆動手段及び支持手段を備えた回転砥石と、 該回転砥石の回転軸線を、環状溝と板状物の面取りすべ
き端面との接触点を中心として、板状物の面取りすべき
端面に平行な平面内で傾動可能とする傾動機構とを具備
し、 前記傾動機構によって、前記回転砥石の回転軸線を回転
砥石の環状溝の摩耗状態に応じて前記接触点を中心とし
て前記平面内で傾動させるようにしたことを特徴とする
板状物の面取り加工装置。
3. A transport mechanism for transporting a plate-like object along an end surface to be chamfered, an annular groove which can be pressed against the end surface of the plate-like object on an outer peripheral surface, and a driving unit and a support unit. A rotary grindstone, and a tilting mechanism that allows the rotation axis of the rotary grindstone to be tiltable in a plane parallel to the end face of the plate-like object to be chamfered about a contact point between the annular groove and the end face of the plate-shaped object to be chamfered. A plate, characterized in that the tilting mechanism tilts the rotation axis of the rotary grindstone in the plane about the contact point in accordance with the wear state of the annular groove of the rotary grindstone. Equipment for chamfering workpieces.
JP2000251285A 2000-08-22 2000-08-22 Method and device for chamfering plate-like work Pending JP2002059346A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000251285A JP2002059346A (en) 2000-08-22 2000-08-22 Method and device for chamfering plate-like work

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000251285A JP2002059346A (en) 2000-08-22 2000-08-22 Method and device for chamfering plate-like work

Publications (1)

Publication Number Publication Date
JP2002059346A true JP2002059346A (en) 2002-02-26

Family

ID=18740707

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2002059346A (en)

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* Cited by examiner, † Cited by third party
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JP2008093744A (en) * 2006-10-06 2008-04-24 Nippon Electric Glass Co Ltd Rotary grinding wheel
KR20140067886A (en) 2012-11-27 2014-06-05 니혼 미크로 코팅 가부시끼 가이샤 The polishing apparatus and the polishing methdo for polishing the peripheral edge of the work, etc by the polishing tape
CN106808328A (en) * 2017-01-23 2017-06-09 苏州科弗曼机械有限公司 A kind of adjustable rounding side mechanism
TWI610894B (en) * 2011-05-13 2018-01-11 日本電氣硝子股份有限公司 Laminate processing method
CN108340237A (en) * 2018-03-27 2018-07-31 京东方科技集团股份有限公司 Grinding device and grinding method
KR20220025528A (en) * 2020-08-24 2022-03-03 주식회사 케이엔제이 Tilting type apparatus and method for substrate grinding

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008093744A (en) * 2006-10-06 2008-04-24 Nippon Electric Glass Co Ltd Rotary grinding wheel
TWI610894B (en) * 2011-05-13 2018-01-11 日本電氣硝子股份有限公司 Laminate processing method
US10279568B2 (en) 2011-05-13 2019-05-07 Nippon Electric Glass Co., Ltd. Laminate, method for cutting laminate, method for processing laminate, and device and method for cutting brittle plate-like object
KR20140067886A (en) 2012-11-27 2014-06-05 니혼 미크로 코팅 가부시끼 가이샤 The polishing apparatus and the polishing methdo for polishing the peripheral edge of the work, etc by the polishing tape
JP2014104526A (en) * 2012-11-27 2014-06-09 Mipox Corp Polishing apparatus and polishing method for polishing peripheral edge part of workpiece, e.g. plate glass with polishing tape
CN106808328A (en) * 2017-01-23 2017-06-09 苏州科弗曼机械有限公司 A kind of adjustable rounding side mechanism
CN108340237A (en) * 2018-03-27 2018-07-31 京东方科技集团股份有限公司 Grinding device and grinding method
KR20220025528A (en) * 2020-08-24 2022-03-03 주식회사 케이엔제이 Tilting type apparatus and method for substrate grinding
KR102406793B1 (en) * 2020-08-24 2022-06-10 주식회사 케이엔제이 Tilting type apparatus and method for substrate grinding

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