JP2002009578A - 圧電デバイス - Google Patents
圧電デバイスInfo
- Publication number
- JP2002009578A JP2002009578A JP2000191258A JP2000191258A JP2002009578A JP 2002009578 A JP2002009578 A JP 2002009578A JP 2000191258 A JP2000191258 A JP 2000191258A JP 2000191258 A JP2000191258 A JP 2000191258A JP 2002009578 A JP2002009578 A JP 2002009578A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- base
- piezoelectric
- electrode film
- ground electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 235000014676 Phragmites communis Nutrition 0.000 claims abstract description 49
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 239000000919 ceramic Substances 0.000 claims description 13
- 229910010293 ceramic material Inorganic materials 0.000 claims description 12
- 239000010410 layer Substances 0.000 description 207
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 15
- 230000005284 excitation Effects 0.000 description 14
- 229910052786 argon Inorganic materials 0.000 description 10
- 238000010586 diagram Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- -1 for example Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000000149 penetrating effect Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000005394 sealing glass Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000191258A JP2002009578A (ja) | 2000-06-26 | 2000-06-26 | 圧電デバイス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000191258A JP2002009578A (ja) | 2000-06-26 | 2000-06-26 | 圧電デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002009578A true JP2002009578A (ja) | 2002-01-11 |
| JP2002009578A5 JP2002009578A5 (enExample) | 2005-02-24 |
Family
ID=18690584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000191258A Withdrawn JP2002009578A (ja) | 2000-06-26 | 2000-06-26 | 圧電デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002009578A (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101741341A (zh) * | 2008-11-10 | 2010-06-16 | 日本电波工业株式会社 | 表面安装型水晶振荡器 |
| JPWO2009122704A1 (ja) * | 2008-03-31 | 2011-07-28 | 株式会社村田製作所 | 圧電振動部品 |
| US8561095B2 (en) | 2001-11-13 | 2013-10-15 | Koninklijke Philips N.V. | Affective television monitoring and control in response to physiological data |
| JP2014236452A (ja) * | 2013-06-05 | 2014-12-15 | 日本電波工業株式会社 | 水晶デバイス |
| WO2018008480A1 (ja) * | 2016-07-05 | 2018-01-11 | 株式会社村田製作所 | 共振子及び共振装置 |
| JPWO2018092572A1 (ja) * | 2016-11-16 | 2019-10-17 | 株式会社大真空 | 水晶振動デバイス |
-
2000
- 2000-06-26 JP JP2000191258A patent/JP2002009578A/ja not_active Withdrawn
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8561095B2 (en) | 2001-11-13 | 2013-10-15 | Koninklijke Philips N.V. | Affective television monitoring and control in response to physiological data |
| JPWO2009122704A1 (ja) * | 2008-03-31 | 2011-07-28 | 株式会社村田製作所 | 圧電振動部品 |
| US8247953B2 (en) | 2008-03-31 | 2012-08-21 | Murata Manufacturing Co., Ltd. | Piezoelectric oscillator part |
| CN101741341A (zh) * | 2008-11-10 | 2010-06-16 | 日本电波工业株式会社 | 表面安装型水晶振荡器 |
| JP2010136340A (ja) * | 2008-11-10 | 2010-06-17 | Nippon Dempa Kogyo Co Ltd | 表面実装用の水晶発振器 |
| JP2014236452A (ja) * | 2013-06-05 | 2014-12-15 | 日本電波工業株式会社 | 水晶デバイス |
| WO2018008480A1 (ja) * | 2016-07-05 | 2018-01-11 | 株式会社村田製作所 | 共振子及び共振装置 |
| WO2018008198A1 (ja) * | 2016-07-05 | 2018-01-11 | 株式会社村田製作所 | 共振子及び共振装置 |
| JPWO2018008480A1 (ja) * | 2016-07-05 | 2019-03-07 | 株式会社村田製作所 | 共振子及び共振装置 |
| CN109478876A (zh) * | 2016-07-05 | 2019-03-15 | 株式会社村田制作所 | 谐振器和谐振装置 |
| US11329624B2 (en) | 2016-07-05 | 2022-05-10 | Murata Manufacturing Co., Ltd. | Resonator and resonance device |
| CN109478876B (zh) * | 2016-07-05 | 2022-05-31 | 株式会社村田制作所 | 谐振器和谐振装置 |
| JPWO2018092572A1 (ja) * | 2016-11-16 | 2019-10-17 | 株式会社大真空 | 水晶振動デバイス |
| US11342899B2 (en) | 2016-11-16 | 2022-05-24 | Daishinku Corporation | Crystal resonator device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040318 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040318 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060131 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060207 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20060405 |