JP2001521187A5 - - Google Patents

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Publication number
JP2001521187A5
JP2001521187A5 JP2000517316A JP2000517316A JP2001521187A5 JP 2001521187 A5 JP2001521187 A5 JP 2001521187A5 JP 2000517316 A JP2000517316 A JP 2000517316A JP 2000517316 A JP2000517316 A JP 2000517316A JP 2001521187 A5 JP2001521187 A5 JP 2001521187A5
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Japan
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composition
embedded image
embedded
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JP2000517316A
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English (en)
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JP4374483B2 (ja
JP2001521187A (ja
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Priority claimed from US08/954,425 external-priority patent/US5935760A/en
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Publication of JP2001521187A publication Critical patent/JP2001521187A/ja
Publication of JP2001521187A5 publication Critical patent/JP2001521187A5/ja
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Publication of JP4374483B2 publication Critical patent/JP4374483B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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【請求項7】
3が:
【化5】
Figure 2001521187
からなる群から選択され、そしてR7およびR8が独立して−H、−OH、−OCH3、−
NO2、−Cl、−F、−Br、−N(CH32、または−N(CH2CH32を表し;R9が−H、−CO−OR10、−CO−N(R102、−CO−R10、−CNを表し;そしてR10が−H、−CH3、または−CH 2CH3を表す請求項6の組成物。
JP2000517316A 1997-10-20 1998-10-20 多層ホトレジストプロセスのための熱硬化性ポリエステル抗反射コーティング Expired - Lifetime JP4374483B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/954,425 US5935760A (en) 1997-10-20 1997-10-20 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
US08/954,425 1997-10-20
PCT/US1998/022143 WO1999021058A1 (en) 1997-10-20 1998-10-20 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008293674A Division JP4374502B2 (ja) 1997-10-20 2008-11-17 多層ホトレジストプロセスのための熱硬化性ポリエステル抗反射コーティング

Publications (3)

Publication Number Publication Date
JP2001521187A JP2001521187A (ja) 2001-11-06
JP2001521187A5 true JP2001521187A5 (ja) 2006-01-05
JP4374483B2 JP4374483B2 (ja) 2009-12-02

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ID=25495407

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000517316A Expired - Lifetime JP4374483B2 (ja) 1997-10-20 1998-10-20 多層ホトレジストプロセスのための熱硬化性ポリエステル抗反射コーティング
JP2008293674A Expired - Lifetime JP4374502B2 (ja) 1997-10-20 2008-11-17 多層ホトレジストプロセスのための熱硬化性ポリエステル抗反射コーティング

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008293674A Expired - Lifetime JP4374502B2 (ja) 1997-10-20 2008-11-17 多層ホトレジストプロセスのための熱硬化性ポリエステル抗反射コーティング

Country Status (9)

Country Link
US (3) US5935760A (ja)
EP (1) EP1025462B1 (ja)
JP (2) JP4374483B2 (ja)
KR (1) KR20010031185A (ja)
CN (1) CN1276883A (ja)
CA (1) CA2305461A1 (ja)
DE (1) DE69807913T2 (ja)
TW (1) TW446738B (ja)
WO (1) WO1999021058A1 (ja)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3852889B2 (ja) * 1998-09-24 2006-12-06 富士写真フイルム株式会社 フォトレジスト用反射防止膜材料組成物
US6316165B1 (en) * 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US20040034134A1 (en) 1999-08-26 2004-02-19 Lamb James E. Crosslinkable fill compositions for uniformly protecting via and contact holes
WO2001015211A1 (en) * 1999-08-26 2001-03-01 Brewer Science Improved fill material for dual damascene processes
WO2001040865A1 (en) * 1999-11-30 2001-06-07 Brewer Science, Inc. Non-aromatic chromophores for use in polymer anti-reflective coatings
JP3795333B2 (ja) * 2000-03-30 2006-07-12 東京応化工業株式会社 反射防止膜形成用組成物
US6323310B1 (en) * 2000-04-19 2001-11-27 Brewer Science, Inc. Anti-reflective coating compositions comprising polymerized aminoplasts
TW556047B (en) 2000-07-31 2003-10-01 Shipley Co Llc Coated substrate, method for forming photoresist relief image, and antireflective composition
AU8500701A (en) 2000-08-17 2002-02-25 Shipley Co Llc Etch resistant antireflective coating compositions
US20020162031A1 (en) * 2001-03-08 2002-10-31 Shmuel Levin Method and apparatus for automatic control of access
TW576859B (en) 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US20040151656A1 (en) * 2001-11-26 2004-08-05 Siegele Stephen H. Modular molecular halogen gas generation system
US20030121796A1 (en) * 2001-11-26 2003-07-03 Siegele Stephen H Generation and distribution of molecular fluorine within a fabrication facility
US20040037768A1 (en) * 2001-11-26 2004-02-26 Robert Jackson Method and system for on-site generation and distribution of a process gas
US20090001524A1 (en) * 2001-11-26 2009-01-01 Siegele Stephen H Generation and distribution of a fluorine gas
US6844131B2 (en) 2002-01-09 2005-01-18 Clariant Finance (Bvi) Limited Positive-working photoimageable bottom antireflective coating
US20030215736A1 (en) * 2002-01-09 2003-11-20 Oberlander Joseph E. Negative-working photoimageable bottom antireflective coating
US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US7217491B2 (en) * 2002-06-07 2007-05-15 Battelle Memorial Institute Antireflective coatings
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
US7425399B2 (en) * 2002-10-09 2008-09-16 Nissan Chemical Industries, Ltd. Composition for forming anti-reflective coating for use in lithography
US7038328B2 (en) 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
JP2004177952A (ja) 2002-11-20 2004-06-24 Rohm & Haas Electronic Materials Llc 多層フォトレジスト系
KR20040044369A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
US7264913B2 (en) * 2002-11-21 2007-09-04 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
US7008476B2 (en) * 2003-06-11 2006-03-07 Az Electronic Materials Usa Corp. Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof
US20050026084A1 (en) * 2003-07-31 2005-02-03 Garza Cesar M. Semiconductor device and method for elimination of resist linewidth slimming by fluorination
DE102004004865B4 (de) * 2004-01-30 2008-01-10 Qimonda Ag Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie
US20050214674A1 (en) * 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
US7081511B2 (en) 2004-04-05 2006-07-25 Az Electronic Materials Usa Corp. Process for making polyesters
JP4738054B2 (ja) * 2004-05-18 2011-08-03 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. オーバーコートされるフォトレジストと共に使用するコーティング組成物
KR101216403B1 (ko) 2004-07-02 2012-12-28 닛산 가가쿠 고교 가부시키 가이샤 할로겐 원자를 갖는 나프탈렌환을 포함하는 리소그라피용 하층막 형성 조성물
US7691556B2 (en) * 2004-09-15 2010-04-06 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
US20060057501A1 (en) * 2004-09-15 2006-03-16 Hengpeng Wu Antireflective compositions for photoresists
EP1691238A3 (en) * 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
EP1705519B1 (en) * 2005-03-20 2016-07-06 Rohm and Haas Electronic Materials, L.L.C. Method of treating a microelectronic substrate
US7632626B2 (en) * 2005-04-19 2009-12-15 Nissan Chemical Industries, Ltd. Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure
EP1762895B1 (en) * 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
US7553905B2 (en) * 2005-10-31 2009-06-30 Az Electronic Materials Usa Corp. Anti-reflective coatings
US7638262B2 (en) * 2006-08-10 2009-12-29 Az Electronic Materials Usa Corp. Antireflective composition for photoresists
US8017296B2 (en) * 2007-05-22 2011-09-13 Az Electronic Materials Usa Corp. Antireflective coating composition comprising fused aromatic rings
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
US8088548B2 (en) * 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
US7989144B2 (en) * 2008-04-01 2011-08-02 Az Electronic Materials Usa Corp Antireflective coating composition
US7932018B2 (en) * 2008-05-06 2011-04-26 Az Electronic Materials Usa Corp. Antireflective coating composition
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
KR100997502B1 (ko) * 2008-08-26 2010-11-30 금호석유화학 주식회사 개환된 프탈릭 언하이드라이드를 포함하는 유기 반사 방지막 조성물과 이의 제조방법
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
US20100119979A1 (en) * 2008-11-13 2010-05-13 Rahman M Dalil Antireflective Coating Composition Comprising Fused Aromatic Rings
US20100119980A1 (en) * 2008-11-13 2010-05-13 Rahman M Dalil Antireflective Coating Composition Comprising Fused Aromatic Rings
US20100151392A1 (en) * 2008-12-11 2010-06-17 Rahman M Dalil Antireflective coating compositions
CN102405248B (zh) * 2009-04-23 2013-07-31 花王株式会社 电子照相用色调剂
US20100316949A1 (en) * 2009-06-10 2010-12-16 Rahman M Dalil Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic Rings
US8632948B2 (en) * 2009-09-30 2014-01-21 Az Electronic Materials Usa Corp. Positive-working photoimageable bottom antireflective coating
US8551686B2 (en) * 2009-10-30 2013-10-08 Az Electronic Materials Usa Corp. Antireflective composition for photoresists
US8486609B2 (en) 2009-12-23 2013-07-16 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
KR101172763B1 (ko) 2010-12-24 2012-08-09 금호석유화학 주식회사 공중합체, 이의 제조방법 및 이를 포함하는 레지스트 조성물
US8623589B2 (en) 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
CN103387775A (zh) * 2013-08-22 2013-11-13 吴江市冰心文教用品有限公司 一种隔热防水颜料
EP3318337A1 (en) * 2016-11-03 2018-05-09 PPG Industries Ohio, Inc. A coating composition and coating system
KR102417180B1 (ko) * 2017-09-29 2022-07-05 삼성전자주식회사 Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5866947A (ja) * 1981-10-16 1983-04-21 Mita Ind Co Ltd 電子写真用感光体
US5234990A (en) * 1992-02-12 1993-08-10 Brewer Science, Inc. Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
US5607824A (en) * 1994-07-27 1997-03-04 International Business Machines Corporation Antireflective coating for microlithography
US5693691A (en) * 1995-08-21 1997-12-02 Brewer Science, Inc. Thermosetting anti-reflective coatings compositions
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
JP3053072B2 (ja) * 1996-09-10 2000-06-19 東京応化工業株式会社 レジスト積層体及びそれを用いたパターン形成方法
US5733714A (en) * 1996-09-30 1998-03-31 Clariant Finance (Bvi) Limited Antireflective coating for photoresist compositions

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