JP2001511315A5 - - Google Patents
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- Publication number
- JP2001511315A5 JP2001511315A5 JP1998534944A JP53494498A JP2001511315A5 JP 2001511315 A5 JP2001511315 A5 JP 2001511315A5 JP 1998534944 A JP1998534944 A JP 1998534944A JP 53494498 A JP53494498 A JP 53494498A JP 2001511315 A5 JP2001511315 A5 JP 2001511315A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Description
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/795,135 US6570185B1 (en) | 1997-02-07 | 1997-02-07 | Structure to reduce the on-resistance of power transistors |
US08/795,135 | 1997-02-07 | ||
US08/797,535 US6180958B1 (en) | 1997-02-07 | 1997-02-07 | Structure for increasing the maximum voltage of silicon carbide power transistors |
US08/797,535 | 1997-02-07 | ||
PCT/US1998/002384 WO1998035390A1 (en) | 1997-02-07 | 1998-02-06 | Structure for increasing the maximum voltage of silicon carbide power transistors |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001511315A JP2001511315A (ja) | 2001-08-07 |
JP2001511315A5 true JP2001511315A5 (ja) | 2005-10-06 |
JP5054255B2 JP5054255B2 (ja) | 2012-10-24 |
Family
ID=27121597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53494498A Expired - Lifetime JP5054255B2 (ja) | 1997-02-07 | 1998-02-06 | シリコン・カーバイド・パワー・トランジスタの最大電圧を増大させるための構造 |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0966763B1 (ja) |
JP (1) | JP5054255B2 (ja) |
AT (1) | ATE287127T1 (ja) |
AU (1) | AU6272798A (ja) |
DE (1) | DE69828588T2 (ja) |
ES (1) | ES2236887T3 (ja) |
WO (1) | WO1998035390A1 (ja) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3716490B2 (ja) | 1996-04-05 | 2005-11-16 | トヨタ自動車株式会社 | 制動力制御装置 |
WO1998039185A1 (fr) | 1997-03-06 | 1998-09-11 | Toyota Jidosha Kabushiki Kaisha | Regulateur de freinage |
US6313482B1 (en) | 1999-05-17 | 2001-11-06 | North Carolina State University | Silicon carbide power devices having trench-based silicon carbide charge coupling regions therein |
US6392273B1 (en) * | 2000-01-14 | 2002-05-21 | Rockwell Science Center, Llc | Trench insulated-gate bipolar transistor with improved safe-operating-area |
JP4738562B2 (ja) * | 2000-03-15 | 2011-08-03 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP4865166B2 (ja) * | 2001-08-30 | 2012-02-01 | 新電元工業株式会社 | トランジスタの製造方法、ダイオードの製造方法 |
SE525574C2 (sv) | 2002-08-30 | 2005-03-15 | Okmetic Oyj | Lågdopat kiselkarbidsubstrat och användning därav i högspänningskomponenter |
JP4564362B2 (ja) * | 2004-01-23 | 2010-10-20 | 株式会社東芝 | 半導体装置 |
GB0417749D0 (en) * | 2004-08-10 | 2004-09-08 | Eco Semiconductors Ltd | Improved bipolar MOSFET devices and methods for their use |
JP4802542B2 (ja) * | 2005-04-19 | 2011-10-26 | 株式会社デンソー | 炭化珪素半導体装置 |
JP2008016747A (ja) * | 2006-07-10 | 2008-01-24 | Fuji Electric Holdings Co Ltd | トレンチmos型炭化珪素半導体装置およびその製造方法 |
JP5444608B2 (ja) * | 2007-11-07 | 2014-03-19 | 富士電機株式会社 | 半導体装置 |
JP4640436B2 (ja) * | 2008-04-14 | 2011-03-02 | 株式会社デンソー | 炭化珪素半導体装置の製造方法 |
WO2012077617A1 (ja) * | 2010-12-10 | 2012-06-14 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
JP6197995B2 (ja) | 2013-08-23 | 2017-09-20 | 富士電機株式会社 | ワイドバンドギャップ絶縁ゲート型半導体装置 |
US10453951B2 (en) | 2014-09-26 | 2019-10-22 | Mitsubishi Electric Corporation | Semiconductor device having a gate trench and an outside trench |
JP6698697B2 (ja) * | 2015-01-27 | 2020-05-27 | アーベーベー・シュバイツ・アーゲー | 絶縁ゲートパワー半導体デバイスおよびそのデバイスの製造方法 |
DE112016002613B4 (de) | 2015-06-09 | 2022-04-28 | Mitsubishi Electric Corporation | Leistungs-Halbleiterbauelement |
WO2017064887A1 (ja) | 2015-10-16 | 2017-04-20 | 三菱電機株式会社 | 半導体装置 |
US10559652B2 (en) | 2016-02-09 | 2020-02-11 | Mitsubishi Electric Corporation | Semiconductor device |
US9728599B1 (en) | 2016-05-10 | 2017-08-08 | Fuji Electric Co., Ltd. | Semiconductor device |
JP6855793B2 (ja) | 2016-12-28 | 2021-04-07 | 富士電機株式会社 | 半導体装置 |
JP7067021B2 (ja) | 2017-11-07 | 2022-05-16 | 富士電機株式会社 | 絶縁ゲート型半導体装置及びその製造方法 |
GB2572442A (en) * | 2018-03-29 | 2019-10-02 | Cambridge Entpr Ltd | Power semiconductor device with a double gate structure |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4941026A (en) * | 1986-12-05 | 1990-07-10 | General Electric Company | Semiconductor devices exhibiting minimum on-resistance |
JPH0783118B2 (ja) * | 1988-06-08 | 1995-09-06 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
US5168331A (en) * | 1991-01-31 | 1992-12-01 | Siliconix Incorporated | Power metal-oxide-semiconductor field effect transistor |
JP2682272B2 (ja) * | 1991-06-27 | 1997-11-26 | 三菱電機株式会社 | 絶縁ゲート型トランジスタ |
US5233215A (en) * | 1992-06-08 | 1993-08-03 | North Carolina State University At Raleigh | Silicon carbide power MOSFET with floating field ring and floating field plate |
JP2883501B2 (ja) * | 1992-09-09 | 1999-04-19 | 三菱電機株式会社 | トレンチ絶縁ゲート型バイポーラトランジスタおよびその製造方法 |
US5506421A (en) * | 1992-11-24 | 1996-04-09 | Cree Research, Inc. | Power MOSFET in silicon carbide |
US5488236A (en) * | 1994-05-26 | 1996-01-30 | North Carolina State University | Latch-up resistant bipolar transistor with trench IGFET and buried collector |
US5688725A (en) * | 1994-12-30 | 1997-11-18 | Siliconix Incorporated | Method of making a trench mosfet with heavily doped delta layer to provide low on-resistance |
-
1998
- 1998-02-06 WO PCT/US1998/002384 patent/WO1998035390A1/en active IP Right Grant
- 1998-02-06 AU AU62727/98A patent/AU6272798A/en not_active Abandoned
- 1998-02-06 DE DE69828588T patent/DE69828588T2/de not_active Expired - Lifetime
- 1998-02-06 JP JP53494498A patent/JP5054255B2/ja not_active Expired - Lifetime
- 1998-02-06 ES ES98904992T patent/ES2236887T3/es not_active Expired - Lifetime
- 1998-02-06 AT AT98904992T patent/ATE287127T1/de not_active IP Right Cessation
- 1998-02-06 EP EP98904992A patent/EP0966763B1/en not_active Expired - Lifetime