JP2001508226A - 強力マイクロ波プラズマ発生装置 - Google Patents
強力マイクロ波プラズマ発生装置Info
- Publication number
- JP2001508226A JP2001508226A JP53146697A JP53146697A JP2001508226A JP 2001508226 A JP2001508226 A JP 2001508226A JP 53146697 A JP53146697 A JP 53146697A JP 53146697 A JP53146697 A JP 53146697A JP 2001508226 A JP2001508226 A JP 2001508226A
- Authority
- JP
- Japan
- Prior art keywords
- resonator
- plasma chamber
- chamber
- plasma
- microwave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32247—Resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.マイクロ波プラズマ発生装置であり、マイクロ波発生装置、結合点を有する 給送共振器、プラズマチャンバ、及びオプションとしての容器を備えており、外 部及び内部境界が、好ましい幾何学的方向を持つか又は持たない同軸共振器の外 部導体及び内部導体として設計されている共振器を備えているマイクロ波プラズ マ発生装置。 2.前記プラズマチャンバが、前記共振器によって完全に又は部分的に囲まれて いることを特徴とする請求項1記載の装置。 3.前記共振器が、前記プラズマチャンバによって完全に又は部分的に囲まれて いることを特徴とする請求項1記載の装置。 4.一以上のチャンバが前記共振器の内部及び/又は外部に配置されているか、 或いは、前記プラズマチャンバが分割されていることを特徴とする請求項1記載 の装置。 5.前記同軸共振器及び前記プラズマチャンバが、同一の好ましい方向に、等し い長さ又は異なった長さに設計されていることを特徴とする請求項1記載の装置 。 6.前記共振器に、又は前記共振器から前記マイクロ波を結合するための前記結 合点が、前記同軸共振器の壁中又は壁上に、或いは前記チャンバと共振器の共通 の壁中又は壁上に配置されていることを特徴とする前記請求項の一に記載の装置 。 7.前記結合点がロッドアンテナ及び/又はループ及び/又はスロット及び/又 は間隙であることを特徴とする前記請求項の一に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19608949.2 | 1996-03-08 | ||
DE19608949A DE19608949A1 (de) | 1996-03-08 | 1996-03-08 | Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen |
PCT/EP1997/001114 WO1997033299A1 (de) | 1996-03-08 | 1997-03-03 | Vorrichtung zur erzeugung von leistungsfähigen mikrowellenplasmen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001508226A true JP2001508226A (ja) | 2001-06-19 |
JP3571056B2 JP3571056B2 (ja) | 2004-09-29 |
Family
ID=7787582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53146697A Expired - Lifetime JP3571056B2 (ja) | 1996-03-08 | 1997-03-03 | 強力マイクロ波プラズマ発生装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6204603B1 (ja) |
EP (1) | EP0885455B1 (ja) |
JP (1) | JP3571056B2 (ja) |
KR (1) | KR100458080B1 (ja) |
AT (1) | ATE271717T1 (ja) |
CA (1) | CA2248250C (ja) |
DE (2) | DE19608949A1 (ja) |
ES (1) | ES2225953T3 (ja) |
WO (1) | WO1997033299A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011513941A (ja) * | 2008-03-11 | 2011-04-28 | ビタ ツァーンファブリク ハー.ラウター ゲーエムベーハー ウント コー カーゲー | 歯科用焼結炉及びセラミック歯科要素の焼結方法 |
JP2020115468A (ja) * | 2015-02-06 | 2020-07-30 | エムケイエス インストゥルメンツ, インコーポレイテッド | 自己共振装置を備えたプラズマ点火装置および方法 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19726663A1 (de) * | 1997-06-23 | 1999-01-28 | Sung Spitzl Hildegard Dr Ing | Vorrichtung zur Erzeugung von homogenen Mikrowellenplasmen |
DE19847848C1 (de) | 1998-10-16 | 2000-05-11 | R3 T Gmbh Rapid Reactive Radic | Vorrichtung und Erzeugung angeregter/ionisierter Teilchen in einem Plasma |
DE19928876A1 (de) * | 1999-06-24 | 2000-12-28 | Leybold Systems Gmbh | Vorrichtung zur lokalen Erzeugung eines Plasmas in einer Behandlungskammer durch Mikrowellenanregung |
DE10114115A1 (de) * | 2001-03-22 | 2002-10-02 | Muegge Electronic Gmbh | Anordnung zur Erzeugung von Plasma in einem Behandlungsraum |
DE10138693A1 (de) * | 2001-08-07 | 2003-07-10 | Schott Glas | Vorrichtung zum Beschichten von Gegenständen |
US20050212626A1 (en) * | 2002-05-07 | 2005-09-29 | Toshiyuki Takamatsu | High frequency reaction processing system |
DE10322367A1 (de) * | 2003-05-13 | 2004-12-02 | Dreyer, Dietmar, Dipl.-Ing. (FH) | Speicherbatterie auf der Basis eines Hochfrequenzplasmas |
DE10358329B4 (de) * | 2003-12-12 | 2007-08-02 | R3T Gmbh Rapid Reactive Radicals Technology | Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen |
DE102006062339A1 (de) * | 2006-12-22 | 2008-07-03 | TRüTZSCHLER GMBH & CO. KG | Mikrowellenresonator für eine oder an einer Textilmaschine, insb. Karde, Strecke, Kämmmaschine o. dgl. |
GB0902784D0 (en) | 2009-02-19 | 2009-04-08 | Gasplas As | Plasma reactor |
NO339087B1 (no) | 2010-08-17 | 2016-11-14 | Gasplas As | Anordning, system og fremgangsmåte for fremstilling av hydrogen |
DE102011051542B4 (de) * | 2011-07-04 | 2013-04-25 | Jenoptik Katasorb Gmbh | Mikrowellenreaktor zur mikrowellenunterstützten Erwärmung eines Mediums |
DE102014016380A1 (de) | 2014-11-06 | 2016-05-12 | Brückner Maschinenbau GmbH & Co. KG | Plasma Abgasreinigung |
US10748745B2 (en) * | 2016-08-16 | 2020-08-18 | Applied Materials, Inc. | Modular microwave plasma source |
US10707058B2 (en) | 2017-04-11 | 2020-07-07 | Applied Materials, Inc. | Symmetric and irregular shaped plasmas using modular microwave sources |
US11037764B2 (en) | 2017-05-06 | 2021-06-15 | Applied Materials, Inc. | Modular microwave source with local Lorentz force |
DE102018000401A1 (de) | 2018-01-19 | 2019-07-25 | Ralf Spitzl | Mikrowellenplasmavorrichtung |
US10504699B2 (en) | 2018-04-20 | 2019-12-10 | Applied Materials, Inc. | Phased array modular high-frequency source |
US11393661B2 (en) | 2018-04-20 | 2022-07-19 | Applied Materials, Inc. | Remote modular high-frequency source |
US11081317B2 (en) | 2018-04-20 | 2021-08-03 | Applied Materials, Inc. | Modular high-frequency source |
KR20220157481A (ko) * | 2020-03-23 | 2022-11-29 | 에스에스티 인크. | 고주파 반응 프로세싱 장치 및 고주파 반응 프로세싱 시스템 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3577207A (en) * | 1969-05-07 | 1971-05-04 | Vladimir Pavlovich Kirjushin | Microwave plasmatron |
DE1960022B2 (de) | 1969-11-29 | 1973-09-27 | Grundig E.M.V. Elektro-Mechanische Versuchsanstalt Max Grundig, 8510 Fuerth | Schaltungsanordnung zur Anzeige der Senderfeldstarke am Signaleingang eines Empfangers für Frequenzmoduherte Hochfrequente Schwingungen |
FR2147497A5 (ja) * | 1971-07-29 | 1973-03-09 | Commissariat Energie Atomique | |
US4559099A (en) * | 1984-08-24 | 1985-12-17 | Technics Gmbh Europa | Etching device |
FR2668676B2 (fr) * | 1986-06-06 | 1993-06-11 | Univ Bordeaux 1 | Dispositif perfectionne pour l'application de micro-ondes. |
FR2631199B1 (fr) * | 1988-05-09 | 1991-03-15 | Centre Nat Rech Scient | Reacteur a plasma |
US5134965A (en) * | 1989-06-16 | 1992-08-04 | Hitachi, Ltd. | Processing apparatus and method for plasma processing |
DE4113142A1 (de) * | 1991-03-14 | 1992-09-17 | Leybold Ag | Vorrichtung zur erzeugung von glimmentladungen |
US5487875A (en) * | 1991-11-05 | 1996-01-30 | Canon Kabushiki Kaisha | Microwave introducing device provided with an endless circular waveguide and plasma treating apparatus provided with said device |
FR2689717B1 (fr) * | 1992-04-03 | 1994-05-13 | Commissariat A Energie Atomique | Dispositif d'application de micro-ondes et reacteur a plasma utilisant ce dispositif. |
DE4235914A1 (de) * | 1992-10-23 | 1994-04-28 | Juergen Prof Dr Engemann | Vorrichtung zur Erzeugung von Mikrowellenplasmen |
DE19507077C1 (de) * | 1995-01-25 | 1996-04-25 | Fraunhofer Ges Forschung | Plasmareaktor |
US9476968B2 (en) * | 2014-07-24 | 2016-10-25 | Rosemount Aerospace Inc. | System and method for monitoring optical subsystem performance in cloud LIDAR systems |
-
1996
- 1996-03-08 DE DE19608949A patent/DE19608949A1/de not_active Withdrawn
-
1997
- 1997-03-03 DE DE59711791T patent/DE59711791D1/de not_active Expired - Lifetime
- 1997-03-03 ES ES97906173T patent/ES2225953T3/es not_active Expired - Lifetime
- 1997-03-03 EP EP97906173A patent/EP0885455B1/de not_active Expired - Lifetime
- 1997-03-03 KR KR10-1998-0707082A patent/KR100458080B1/ko not_active IP Right Cessation
- 1997-03-03 CA CA002248250A patent/CA2248250C/en not_active Expired - Fee Related
- 1997-03-03 WO PCT/EP1997/001114 patent/WO1997033299A1/de active IP Right Grant
- 1997-03-03 JP JP53146697A patent/JP3571056B2/ja not_active Expired - Lifetime
- 1997-03-03 US US09/142,513 patent/US6204603B1/en not_active Expired - Lifetime
- 1997-03-03 AT AT97906173T patent/ATE271717T1/de not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011513941A (ja) * | 2008-03-11 | 2011-04-28 | ビタ ツァーンファブリク ハー.ラウター ゲーエムベーハー ウント コー カーゲー | 歯科用焼結炉及びセラミック歯科要素の焼結方法 |
JP2020115468A (ja) * | 2015-02-06 | 2020-07-30 | エムケイエス インストゥルメンツ, インコーポレイテッド | 自己共振装置を備えたプラズマ点火装置および方法 |
JP7187500B2 (ja) | 2015-02-06 | 2022-12-12 | エムケイエス インストゥルメンツ, インコーポレイテッド | 自己共振装置を備えたプラズマ点火装置および方法 |
Also Published As
Publication number | Publication date |
---|---|
AU729335B2 (en) | 2001-02-01 |
ES2225953T3 (es) | 2005-03-16 |
AU2095597A (en) | 1997-09-22 |
EP0885455B1 (de) | 2004-07-21 |
DE59711791D1 (de) | 2004-08-26 |
WO1997033299A1 (de) | 1997-09-12 |
KR100458080B1 (ko) | 2005-04-06 |
JP3571056B2 (ja) | 2004-09-29 |
US6204603B1 (en) | 2001-03-20 |
CA2248250C (en) | 2003-07-08 |
EP0885455A1 (de) | 1998-12-23 |
CA2248250A1 (en) | 1997-09-12 |
DE19608949A1 (de) | 1997-09-11 |
KR19990087630A (ko) | 1999-12-27 |
ATE271717T1 (de) | 2004-08-15 |
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