JP2001345262A5 - - Google Patents
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- JP2001345262A5 JP2001345262A5 JP2001085531A JP2001085531A JP2001345262A5 JP 2001345262 A5 JP2001345262 A5 JP 2001345262A5 JP 2001085531 A JP2001085531 A JP 2001085531A JP 2001085531 A JP2001085531 A JP 2001085531A JP 2001345262 A5 JP2001345262 A5 JP 2001345262A5
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- Japan
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001085531A JP4689064B2 (ja) | 2000-03-30 | 2001-03-23 | 露光装置およびデバイス製造方法 |
| US09/818,625 US6714277B2 (en) | 2000-03-30 | 2001-03-28 | Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000093686 | 2000-03-30 | ||
| JP2000-93686 | 2000-03-30 | ||
| JP2000093686 | 2000-03-30 | ||
| JP2001085531A JP4689064B2 (ja) | 2000-03-30 | 2001-03-23 | 露光装置およびデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001345262A JP2001345262A (ja) | 2001-12-14 |
| JP2001345262A5 true JP2001345262A5 (enExample) | 2008-05-08 |
| JP4689064B2 JP4689064B2 (ja) | 2011-05-25 |
Family
ID=26588857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001085531A Expired - Fee Related JP4689064B2 (ja) | 2000-03-30 | 2001-03-23 | 露光装置およびデバイス製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6714277B2 (enExample) |
| JP (1) | JP4689064B2 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11312640A (ja) * | 1998-02-25 | 1999-11-09 | Canon Inc | 処理装置および該処理装置を用いたデバイス製造方法 |
| US6937316B2 (en) * | 2001-08-15 | 2005-08-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
| US6778258B2 (en) * | 2001-10-19 | 2004-08-17 | Asml Holding N.V. | Wafer handling system for use in lithography patterning |
| US7004715B2 (en) * | 2002-01-09 | 2006-02-28 | Asml Holding N.V. | Apparatus for transferring and loading a reticle with a robotic reticle end-effector |
| EP1333329B1 (en) * | 2002-02-01 | 2008-07-02 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| SG141228A1 (en) * | 2003-05-19 | 2008-04-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| JP4370924B2 (ja) | 2003-08-27 | 2009-11-25 | 株式会社ニコン | 真空装置、真空装置の運転方法、露光装置、及び露光装置の運転方法 |
| TWI569308B (zh) | 2003-10-28 | 2017-02-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
| TWI385414B (zh) | 2003-11-20 | 2013-02-11 | 尼康股份有限公司 | 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法 |
| JP2005158926A (ja) * | 2003-11-25 | 2005-06-16 | Canon Inc | ロードロック装置および方法 |
| JP4478440B2 (ja) * | 2003-12-02 | 2010-06-09 | キヤノン株式会社 | ロードロック装置および方法 |
| JP4564742B2 (ja) | 2003-12-03 | 2010-10-20 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
| TWI379344B (en) | 2004-02-06 | 2012-12-11 | Nikon Corp | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
| US7184123B2 (en) * | 2004-03-24 | 2007-02-27 | Asml Netherlands B.V. | Lithographic optical system |
| JP4547997B2 (ja) * | 2004-06-04 | 2010-09-22 | 株式会社ニコン | 真空容器、露光装置、及び検査装置 |
| JP2006165371A (ja) * | 2004-12-09 | 2006-06-22 | Canon Inc | 転写装置およびデバイス製造方法 |
| TWI423301B (zh) * | 2005-01-21 | 2014-01-11 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| KR101762083B1 (ko) | 2005-05-12 | 2017-07-26 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
| US7385673B2 (en) * | 2005-06-10 | 2008-06-10 | International Business Machines Corporation | Immersion lithography with equalized pressure on at least projection optics component and wafer |
| JP4708876B2 (ja) * | 2005-06-21 | 2011-06-22 | キヤノン株式会社 | 液浸露光装置 |
| JP2007281142A (ja) * | 2006-04-05 | 2007-10-25 | Canon Inc | 露光装置及び方法、並びに、デバイス製造方法 |
| JP2008216949A (ja) * | 2007-02-06 | 2008-09-18 | Toppan Printing Co Ltd | 感光性樹脂版用露光装置、および有機ｅｌ素子の製造方法 |
| US8749753B2 (en) * | 2007-04-27 | 2014-06-10 | Nikon Corporation | Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP2010040831A (ja) * | 2008-08-06 | 2010-02-18 | Orc Mfg Co Ltd | 露光装置における基板の露光方法 |
| JP5644101B2 (ja) * | 2009-12-22 | 2014-12-24 | 株式会社ブイ・テクノロジー | 露光装置 |
| JP7036666B2 (ja) * | 2018-05-23 | 2022-03-15 | 三菱重工業株式会社 | レーザ装置及び加工装置 |
| KR20240095522A (ko) * | 2021-11-17 | 2024-06-25 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 시스템 및 기판 처리 방법 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01225118A (ja) * | 1988-03-04 | 1989-09-08 | Canon Inc | Ｘ線露光装置 |
| FR2639567B1 (fr) * | 1988-11-25 | 1991-01-25 | France Etat | Machine a microfaisceau laser d'intervention sur des objets a couche mince, en particulier pour la gravure ou le depot de matiere par voie chimique en presence d'un gaz reactif |
| JP2731950B2 (ja) | 1989-07-13 | 1998-03-25 | キヤノン株式会社 | 露光方法 |
| JPH0388400A (ja) * | 1989-08-31 | 1991-04-12 | Canon Inc | 真空装置 |
| JPH03108311A (ja) * | 1989-09-21 | 1991-05-08 | Canon Inc | Ｘ線露光装置 |
| JP2766935B2 (ja) | 1989-10-20 | 1998-06-18 | キヤノン株式会社 | Ｘ線露光装置 |
| DE69130434T2 (de) | 1990-06-29 | 1999-04-29 | Canon K.K., Tokio/Tokyo | Platte zum Arbeiten unter Vakuum |
| US6341006B1 (en) * | 1995-04-07 | 2002-01-22 | Nikon Corporation | Projection exposure apparatus |
| JP3629790B2 (ja) * | 1995-12-05 | 2005-03-16 | 株式会社ニコン | 露光装置 |
| JP4011643B2 (ja) * | 1996-01-05 | 2007-11-21 | キヤノン株式会社 | 半導体製造装置 |
| TWI249760B (en) * | 1996-07-31 | 2006-02-21 | Canon Kk | Remote maintenance system |
| JPH11224839A (ja) * | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
| US6333775B1 (en) * | 1999-01-13 | 2001-12-25 | Euv Llc | Extreme-UV lithography vacuum chamber zone seal |
| JP2002118054A (ja) * | 2000-10-11 | 2002-04-19 | Nikon Corp | 真空チャンバー及びそれを有する露光装置 |
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2001
- 2001-03-23 JP JP2001085531A patent/JP4689064B2/ja not_active Expired - Fee Related
- 2001-03-28 US US09/818,625 patent/US6714277B2/en not_active Expired - Fee Related