JP2001345261A5 - - Google Patents

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Publication number
JP2001345261A5
JP2001345261A5 JP2001074737A JP2001074737A JP2001345261A5 JP 2001345261 A5 JP2001345261 A5 JP 2001345261A5 JP 2001074737 A JP2001074737 A JP 2001074737A JP 2001074737 A JP2001074737 A JP 2001074737A JP 2001345261 A5 JP2001345261 A5 JP 2001345261A5
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JP
Japan
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JP2001074737A
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JP4947842B2 (ja
JP2001345261A (ja
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Priority to JP2001074737A priority Critical patent/JP4947842B2/ja
Priority claimed from JP2001074737A external-priority patent/JP4947842B2/ja
Priority to US09/819,906 priority patent/US6872952B2/en
Publication of JP2001345261A publication Critical patent/JP2001345261A/ja
Publication of JP2001345261A5 publication Critical patent/JP2001345261A5/ja
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Publication of JP4947842B2 publication Critical patent/JP4947842B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2001074737A 2000-03-31 2001-03-15 荷電粒子線露光装置 Expired - Fee Related JP4947842B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001074737A JP4947842B2 (ja) 2000-03-31 2001-03-15 荷電粒子線露光装置
US09/819,906 US6872952B2 (en) 2000-03-31 2001-03-29 Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000-97066 2000-03-31
JP2000097066 2000-03-31
JP2000097066 2000-03-31
JP2001074737A JP4947842B2 (ja) 2000-03-31 2001-03-15 荷電粒子線露光装置

Publications (3)

Publication Number Publication Date
JP2001345261A JP2001345261A (ja) 2001-12-14
JP2001345261A5 true JP2001345261A5 (ja) 2008-04-17
JP4947842B2 JP4947842B2 (ja) 2012-06-06

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JP2001074737A Expired - Fee Related JP4947842B2 (ja) 2000-03-31 2001-03-15 荷電粒子線露光装置

Country Status (2)

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US (1) US6872952B2 (ja)
JP (1) JP4947842B2 (ja)

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