JP2001337463A5 - - Google Patents

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Publication number
JP2001337463A5
JP2001337463A5 JP2000157038A JP2000157038A JP2001337463A5 JP 2001337463 A5 JP2001337463 A5 JP 2001337463A5 JP 2000157038 A JP2000157038 A JP 2000157038A JP 2000157038 A JP2000157038 A JP 2000157038A JP 2001337463 A5 JP2001337463 A5 JP 2001337463A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000157038A
Other languages
Japanese (ja)
Other versions
JP4655332B2 (ja
JP2001337463A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000157038A priority Critical patent/JP4655332B2/ja
Priority claimed from JP2000157038A external-priority patent/JP4655332B2/ja
Priority to US09/861,698 priority patent/US6811953B2/en
Priority to KR1020010028014A priority patent/KR100827874B1/ko
Priority to TW090112212A priority patent/TW520526B/zh
Publication of JP2001337463A publication Critical patent/JP2001337463A/ja
Publication of JP2001337463A5 publication Critical patent/JP2001337463A5/ja
Application granted granted Critical
Publication of JP4655332B2 publication Critical patent/JP4655332B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000157038A 2000-05-22 2000-05-26 露光装置、露光装置の調整方法、およびマイクロデバイスの製造方法 Expired - Lifetime JP4655332B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000157038A JP4655332B2 (ja) 2000-05-26 2000-05-26 露光装置、露光装置の調整方法、およびマイクロデバイスの製造方法
US09/861,698 US6811953B2 (en) 2000-05-22 2001-05-22 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice
KR1020010028014A KR100827874B1 (ko) 2000-05-22 2001-05-22 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
TW090112212A TW520526B (en) 2000-05-22 2001-05-22 Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000157038A JP4655332B2 (ja) 2000-05-26 2000-05-26 露光装置、露光装置の調整方法、およびマイクロデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2001337463A JP2001337463A (ja) 2001-12-07
JP2001337463A5 true JP2001337463A5 (pt) 2008-02-28
JP4655332B2 JP4655332B2 (ja) 2011-03-23

Family

ID=18661737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000157038A Expired - Lifetime JP4655332B2 (ja) 2000-05-22 2000-05-26 露光装置、露光装置の調整方法、およびマイクロデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP4655332B2 (pt)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4548969B2 (ja) * 2001-04-20 2010-09-22 パナソニック株式会社 露光装置、及び露光方法
JP4051204B2 (ja) * 2002-01-11 2008-02-20 株式会社オーク製作所 投影露光装置
JP4051278B2 (ja) * 2001-12-26 2008-02-20 株式会社オーク製作所 投影露光装置
JP4496711B2 (ja) * 2003-03-31 2010-07-07 株式会社ニコン 露光装置及び露光方法
JP5143331B2 (ja) * 2003-05-28 2013-02-13 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
KR20060009956A (ko) 2003-05-28 2006-02-01 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
JP2005345582A (ja) * 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
JP4583827B2 (ja) * 2004-07-21 2010-11-17 富士フイルム株式会社 画像形成装置および画像形成方法
WO2007055199A1 (ja) * 2005-11-09 2007-05-18 Nikon Corporation 露光装置及び方法、並びにデバイス製造方法
JP2008166650A (ja) * 2007-01-05 2008-07-17 Nikon Corp 走査型露光装置、デバイスの製造方法及びマスク
JP2008185908A (ja) * 2007-01-31 2008-08-14 Nikon Corp マスクの製造方法、露光方法、露光装置、および電子デバイスの製造方法
KR20160084539A (ko) 2015-01-05 2016-07-14 (주)그린광학 Ghi라인 차단용 반사 필터

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06302494A (ja) * 1993-04-14 1994-10-28 Canon Inc 投影露光装置及びそれを用いた半導体素子の製造方法
JP3526042B2 (ja) * 1995-08-09 2004-05-10 株式会社ニコン 投影露光装置
JP3521416B2 (ja) * 1995-10-06 2004-04-19 株式会社ニコン 投影露光装置
JP3991241B2 (ja) * 1997-04-07 2007-10-17 株式会社ニコン 面位置調整装置及びその方法並びに露光装置及びその方法
JP4029130B2 (ja) * 1997-06-03 2008-01-09 株式会社ニコン 露光装置及び露光方法

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