JP2001337462A - 露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法 - Google Patents

露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法

Info

Publication number
JP2001337462A
JP2001337462A JP2000157039A JP2000157039A JP2001337462A JP 2001337462 A JP2001337462 A JP 2001337462A JP 2000157039 A JP2000157039 A JP 2000157039A JP 2000157039 A JP2000157039 A JP 2000157039A JP 2001337462 A JP2001337462 A JP 2001337462A
Authority
JP
Japan
Prior art keywords
image
projection optical
exposure apparatus
optical system
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000157039A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001337462A5 (enrdf_load_stackoverflow
Inventor
Masanori Kato
正紀 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2000157039A priority Critical patent/JP2001337462A/ja
Publication of JP2001337462A publication Critical patent/JP2001337462A/ja
Publication of JP2001337462A5 publication Critical patent/JP2001337462A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000157039A 2000-05-26 2000-05-26 露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法 Pending JP2001337462A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000157039A JP2001337462A (ja) 2000-05-26 2000-05-26 露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000157039A JP2001337462A (ja) 2000-05-26 2000-05-26 露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2001337462A true JP2001337462A (ja) 2001-12-07
JP2001337462A5 JP2001337462A5 (enrdf_load_stackoverflow) 2008-02-28

Family

ID=18661738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000157039A Pending JP2001337462A (ja) 2000-05-26 2000-05-26 露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2001337462A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029234A (ja) * 2002-06-24 2004-01-29 Pentax Corp 投影露光光学系および投影露光装置
JP2006220903A (ja) * 2005-02-10 2006-08-24 Canon Inc 反射ミラー、露光装置及びデバイス製造方法
JP2008185908A (ja) * 2007-01-31 2008-08-14 Nikon Corp マスクの製造方法、露光方法、露光装置、および電子デバイスの製造方法
US8493549B2 (en) 2006-03-27 2013-07-23 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
KR20160084539A (ko) 2015-01-05 2016-07-14 (주)그린광학 Ghi라인 차단용 반사 필터

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0272365A (ja) * 1988-09-07 1990-03-12 Hitachi Ltd 写真処理装置
JPH0855783A (ja) * 1994-08-16 1996-02-27 Nikon Corp 露光装置
JPH09266159A (ja) * 1996-03-29 1997-10-07 Nikon Corp 露光量制御装置
JPH10335242A (ja) * 1997-06-03 1998-12-18 Nikon Corp 露光装置及び露光方法
JPH11121357A (ja) * 1997-10-14 1999-04-30 Nikon Corp 位置検出装置及び位置検出方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0272365A (ja) * 1988-09-07 1990-03-12 Hitachi Ltd 写真処理装置
JPH0855783A (ja) * 1994-08-16 1996-02-27 Nikon Corp 露光装置
JPH09266159A (ja) * 1996-03-29 1997-10-07 Nikon Corp 露光量制御装置
JPH10335242A (ja) * 1997-06-03 1998-12-18 Nikon Corp 露光装置及び露光方法
JPH11121357A (ja) * 1997-10-14 1999-04-30 Nikon Corp 位置検出装置及び位置検出方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029234A (ja) * 2002-06-24 2004-01-29 Pentax Corp 投影露光光学系および投影露光装置
JP2006220903A (ja) * 2005-02-10 2006-08-24 Canon Inc 反射ミラー、露光装置及びデバイス製造方法
US8493549B2 (en) 2006-03-27 2013-07-23 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
JP5392468B2 (ja) * 2006-03-27 2014-01-22 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JP2008185908A (ja) * 2007-01-31 2008-08-14 Nikon Corp マスクの製造方法、露光方法、露光装置、および電子デバイスの製造方法
KR20160084539A (ko) 2015-01-05 2016-07-14 (주)그린광학 Ghi라인 차단용 반사 필터

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