JP2001294447A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001294447A5 JP2001294447A5 JP2000111253A JP2000111253A JP2001294447A5 JP 2001294447 A5 JP2001294447 A5 JP 2001294447A5 JP 2000111253 A JP2000111253 A JP 2000111253A JP 2000111253 A JP2000111253 A JP 2000111253A JP 2001294447 A5 JP2001294447 A5 JP 2001294447A5
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon oxide
- rinsed
- twice
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- BUZRAOJSFRKWPD-UHFFFAOYSA-N isocyanatosilane Chemical compound [SiH3]N=C=O BUZRAOJSFRKWPD-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000111253A JP2001294447A (ja) | 2000-04-12 | 2000-04-12 | ガラス容器およびその処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000111253A JP2001294447A (ja) | 2000-04-12 | 2000-04-12 | ガラス容器およびその処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001294447A JP2001294447A (ja) | 2001-10-23 |
| JP2001294447A5 true JP2001294447A5 (enExample) | 2005-03-17 |
Family
ID=18623618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000111253A Pending JP2001294447A (ja) | 2000-04-12 | 2000-04-12 | ガラス容器およびその処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001294447A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003275575A1 (en) * | 2002-10-23 | 2004-06-07 | Hoya Corporation | Glass substrate for information recording medium and method for manufacturing same |
| JP4795614B2 (ja) | 2002-10-23 | 2011-10-19 | Ｈｏｙａ株式会社 | 情報記録媒体用ガラス基板及びその製造方法 |
| AU2013226034C1 (en) * | 2012-02-28 | 2016-10-27 | Corning Incorporated | Glass articles with low-friction coatings |
| US10273048B2 (en) | 2012-06-07 | 2019-04-30 | Corning Incorporated | Delamination resistant glass containers with heat-tolerant coatings |
| US9988174B2 (en) | 2012-06-07 | 2018-06-05 | Corning Incorporated | Delamination resistant glass containers |
| US9034442B2 (en) * | 2012-11-30 | 2015-05-19 | Corning Incorporated | Strengthened borosilicate glass containers with improved damage tolerance |
| US10117806B2 (en) | 2012-11-30 | 2018-11-06 | Corning Incorporated | Strengthened glass containers resistant to delamination and damage |
| WO2016037083A1 (en) | 2014-09-05 | 2016-03-10 | Corning Incorporated | Glass articles and methods for improving the reliability of glass articles |
| US10065884B2 (en) | 2014-11-26 | 2018-09-04 | Corning Incorporated | Methods for producing strengthened and durable glass containers |
| JP7029459B2 (ja) | 2017-09-06 | 2022-03-03 | 富士フイルム株式会社 | 薬液収容体 |
| FR3098512B1 (fr) * | 2019-07-11 | 2022-08-26 | Sgd Sa | Procede et installation de desalcalinisation de recipients en verre par voie liquide |
-
2000
- 2000-04-12 JP JP2000111253A patent/JP2001294447A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2003514758A5 (enExample) | ||
| JP2000036959A5 (enExample) | ||
| JP2001294447A5 (enExample) | ||
| JP2003124208A5 (enExample) | ||
| AU2001289109A1 (en) | Metal-assisted chemical etch porous silicon formation method | |
| JPH1174257A5 (enExample) | ||
| JP2004501273A5 (enExample) | ||
| AU2001279746A1 (en) | Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates | |
| WO2005074449A3 (en) | Structure comprising amorphous carbon film and method of forming thereof | |
| AU2001247289A1 (en) | Method for transferring semiconductor device layers to different substrates | |
| ZA200209047B (en) | Process for permanently reshaping the hair using particular aminosilicones. | |
| WO2000048808A3 (en) | A method for creating a patterned concrete surface | |
| AU2001287141A1 (en) | Semiconductor device and process for forming the same | |
| AU2002365488A1 (en) | Method for the fabrication of silicon nitride, silicon oxynitride, and silicon oxide films by chemical vapor deposition | |
| EP1453085A3 (en) | Post-etch cleaning treatment | |
| EP1179749B8 (en) | Resist composition and method for manufacturing semiconductor device using the resist composition | |
| AU2001290415A1 (en) | Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching | |
| AU2002243538A1 (en) | Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor dram device | |
| AU2003301980A1 (en) | Composition for porous film formation, porous film, process for producing the same, interlayer insulation film and semiconductor device | |
| JPH11338286A5 (enExample) | ||
| JP2000323384A5 (enExample) | ||
| JPH10150033A5 (enExample) | ||
| CA2323683A1 (en) | A process for fabricating an optical device in a silicon substrate | |
| GB2363691B (en) | Media independent interface between ieee 802.3 (ethernet) based physical layer devices | |
| AU2003301981A1 (en) | Composition for porous film formation, porous film, process for producing the same, interlayer insulation film and semiconductor device |