JP2001257305A - Resin-sealed semiconductor device and method of manufacturing the same - Google Patents

Resin-sealed semiconductor device and method of manufacturing the same

Info

Publication number
JP2001257305A
JP2001257305A JP2000066025A JP2000066025A JP2001257305A JP 2001257305 A JP2001257305 A JP 2001257305A JP 2000066025 A JP2000066025 A JP 2000066025A JP 2000066025 A JP2000066025 A JP 2000066025A JP 2001257305 A JP2001257305 A JP 2001257305A
Authority
JP
Japan
Prior art keywords
resin
electrode
semiconductor chip
inner lead
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000066025A
Other languages
Japanese (ja)
Inventor
Shinichi Hasegawa
愼一 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2000066025A priority Critical patent/JP2001257305A/en
Publication of JP2001257305A publication Critical patent/JP2001257305A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic

Landscapes

  • Wire Bonding (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a low-cost and thin semiconductor device which can be manufactured by rationalized processes by directly bonding an electrode of a semiconductor chip and an inner lead, and also to provide a method of manufacturing the same. SOLUTION: A top part of a bonding projection 5a, embossed like a warhead in a flat face near a leading edge of the inner lead 5, is brought into pressure contact with the electrode 3 of the semiconductor chip 2. Under this condition, the semiconductor chip 2 and the inner lead 5 are bonded by an insulating adhesive member 8 applied on both faces with a thermosetting epoxy adhesive to hold the pressure contact conditions between the electrode 3 and the bonding projection 5a. Then, the semiconductor chip 2, the insulating adhesive member 8, and the inner lead 5 are sealed integrally by a sealing resin 9, to form a resin-sealed semiconductor device 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、半導体チップの
電極とインナーリードの先端部平面に打ち出し形成した
接合突起とを接圧した状態で半導体チップとインナーリ
ードとを絶縁性接着部材で接着し一体に樹脂封止するこ
とにより、製造工程の合理化を図った樹脂封止型半導体
装置及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor chip and an inner lead bonded to each other by an insulating adhesive member while an electrode of the semiconductor chip is pressed against a bonding projection formed on a flat end portion of the inner lead. The present invention relates to a resin-encapsulated semiconductor device whose production process is rationalized by resin-encapsulation, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】従来の樹脂封止型半導体装置において
は、通常、半導体チップの電極とインナーリードとの接
続はワイヤボンディング法によるものが一般的である
が、近年のLSI製造技術の急速な進歩に伴い高集積
化、小形化、高機能化への発展はめざましく、これに対
応して半導体チップの電極とインナーリードとの接続も
半導体チップの電極上に形成された半田バンプを介して
インナーリードと直接接続するフリップチップ接続方式
を適用したものが多数使用されるようになっている。フ
リップチップ接続方式を適用した従来の樹脂封止型半導
体装置としては、例えば特開平4−85837号公報が
あり、半田バンプ電極付き半導体チップの回路形成面上
に絶縁性接着フィルム(テープ)付きリードフレームを
載置し、加熱ブロックで圧着して、半導体チップの回路
形成面上に絶縁性接着フィルム(テープ)を被着すると
共に、リードのインナーリードと半導体チップの半田バ
ンプ電極とを溶融・接合する技術が開示されている。
2. Description of the Related Art In a conventional resin-encapsulated semiconductor device, the connection between an electrode of a semiconductor chip and an inner lead is generally performed by a wire bonding method. The development of high integration, miniaturization, and high functionality has been remarkable, and the connection between the electrode of the semiconductor chip and the inner lead has been correspondingly increased through the solder bump formed on the electrode of the semiconductor chip. Many devices using a flip-chip connection method for directly connecting to a device have been used. A conventional resin-encapsulated semiconductor device to which the flip-chip connection method is applied is disclosed in, for example, Japanese Patent Application Laid-Open No. 4-85837. The frame is placed and pressed with a heating block to apply an insulating adhesive film (tape) on the circuit forming surface of the semiconductor chip and to melt and join the inner lead of the lead and the solder bump electrode of the semiconductor chip. A technique for performing this is disclosed.

【0003】[0003]

【発明が解決しようとする課題】ところが、上記従来の
樹脂封止型半導体装置におけるリードは、半田バンプ電
極を加熱して融解・固化させることにより半導体チップ
の外部端子(アルミ電極)と接続されるため、同公報の
第6図に示すように、半田バンプ電極の構成は、半導体
チップの外部端子(アルミ電極)上にCu/Tiの2層
バリアメタル層を形成し、その上にNi層を形成し、そ
の上に半田バンプ(Pb/Sn)を形成したものとなっ
ており、半田バンプの構成が複雑で製造コストが高いと
言う問題があった。
However, the leads in the above-mentioned conventional resin-encapsulated semiconductor device are connected to the external terminals (aluminum electrodes) of the semiconductor chip by heating and melting and solidifying the solder bump electrodes. Therefore, as shown in FIG. 6 of the publication, the configuration of the solder bump electrode is such that a Cu / Ti two-layer barrier metal layer is formed on an external terminal (aluminum electrode) of a semiconductor chip, and a Ni layer is formed thereon. Formed, and a solder bump (Pb / Sn) is formed thereon, and there is a problem that the configuration of the solder bump is complicated and the manufacturing cost is high.

【0004】この発明は上記のような問題点を解消する
ためになされたもので、半導体チップの電極(アルミ電
極)とインナーリードとを直接接合するようにして、製
造工程の合理化を図った安価な樹脂封止型半導体装置及
びその製造方法を得ることを目的としている。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and is intended to reduce the cost by streamlining the manufacturing process by directly joining the electrodes (aluminum electrodes) of a semiconductor chip and inner leads. It is an object of the present invention to obtain a resin-sealed semiconductor device and a method of manufacturing the same.

【0005】[0005]

【課題を解決するための手段】この発明に係る樹脂封止
型半導体装置は、主表面に集積回路の電極が形成された
半導体チップと、この半導体チップの主表面に沿って近
接配置され先端部近傍の平面に形成された接合突起の頂
部が電極に接圧されたインナーリードを有するリード
と、電極の近傍の主表面の所定の領域とこの領域に対向
するインナーリード相互間を接着し、電極と接合突起の
頂部の接圧状態を保持する絶縁性接着部材と、半導体チ
ップ、絶縁性接着部材及びインナーリードを一体に封止
する封止樹脂とを備えたものである。また、絶縁性接着
部材を、電極の近傍の半導体チップの端部側又は中心側
の少なくとも一方の主表面の所定の領域に配置したもの
である。
A resin-encapsulated semiconductor device according to the present invention comprises a semiconductor chip having an electrode of an integrated circuit formed on a main surface thereof, and a tip portion disposed closely along the main surface of the semiconductor chip. The top of the bonding protrusion formed on the nearby flat surface has a lead having an inner lead pressed against the electrode, and a predetermined region of the main surface near the electrode and the inner lead facing the region are bonded to each other to form an electrode. And an insulating adhesive member for maintaining a contact pressure state at the top of the joint protrusion, and a sealing resin for integrally sealing the semiconductor chip, the insulating adhesive member, and the inner leads. Further, the insulating adhesive member is arranged in a predetermined region on at least one main surface on the end side or the center side of the semiconductor chip near the electrode.

【0006】この発明に係る樹脂封止型半導体装置の製
造方法は、半導体チップ及びこの半導体チップの主表面
に沿って近接配置され集積回路の電極に電気的に接続さ
れたインナーリードを一体に樹脂封止する樹脂封止型半
導体装置の製造方法において、インナーリードの先端部
近傍の平面に打ち出して接合突起を形成する工程と、電
極の近傍の主表面の所定の領域とこの領域に対向するイ
ンナーリード間に絶縁性接着部材を介在させ、電極と接
合突起の頂部とを位置合わせし接圧した状態で絶縁性接
着部材を加熱、固化する工程とを含むものである。ま
た、絶縁性接着部材を、電極の近傍の半導体チップの端
部側又は中心側の少なくとも一方の主表面の所定の領域
に配置したものである。また、絶縁性接着部材に、熱硬
化性樹脂又は樹脂封止温度を越える耐熱温度を有する熱
可塑性樹脂を被着したものである
A method of manufacturing a resin-encapsulated semiconductor device according to the present invention is a method of manufacturing a resin-sealed semiconductor device by integrating a semiconductor chip and inner leads closely disposed along a main surface of the semiconductor chip and electrically connected to electrodes of an integrated circuit. In a method of manufacturing a resin-encapsulated semiconductor device for sealing, a step of forming a bonding projection by punching a flat surface near a tip portion of an inner lead, and a predetermined region on a main surface near an electrode and an inner surface facing the region. A step of heating and solidifying the insulating adhesive member in a state where the insulating adhesive member is interposed between the leads, the electrodes and the tops of the joining protrusions are aligned, and the electrodes are pressed against each other. Further, the insulating adhesive member is arranged in a predetermined region on at least one main surface on the end side or the center side of the semiconductor chip near the electrode. Further, the insulating adhesive member is formed by applying a thermosetting resin or a thermoplastic resin having a heat resistant temperature exceeding the resin sealing temperature.

【0007】[0007]

【発明の実施の形態】実施の形態1.以下、この発明の
一実施の形態の樹脂封止型半導体装置及びその製造方法
につき、図面に基づいて説明する。図1は、この発明の
実施の形態1である樹脂封止型半導体装置の断面図、図
2は、図1の樹脂封止型半導体装置のリード接続工程を
終えた状態を示す平面図、図3は、図1におけるA部の
拡大断面図、図4は、図1の樹脂封止型半導体装置の製
造方法を示す図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 Hereinafter, a resin-sealed semiconductor device and a method of manufacturing the same according to an embodiment of the present invention will be described with reference to the drawings. 1 is a cross-sectional view of a resin-sealed semiconductor device according to Embodiment 1 of the present invention. FIG. 2 is a plan view showing a state in which a lead connection step of the resin-sealed semiconductor device of FIG. 1 has been completed. 3 is an enlarged cross-sectional view of a portion A in FIG. 1, and FIG. 4 is a diagram illustrating a method of manufacturing the resin-sealed semiconductor device of FIG.

【0008】図1〜図4において、2は集積回路が形成
された半導体チップであり、その主表面端部周辺にはア
ルミニウム膜で形成された80〜100μm□寸法の電
極3が複数個配設されている。そして、160〜300
μm程度の幅と90〜200μm程度厚さを有するリー
ド4の半田めっきされたインナーリード5が、図1〜図
3に示すように半導体チップ2の主表面に沿って電極3
に向けて配設され、その先端部近傍の平面に打ち出し形
成された接合突起5aの頂部が上記電極3上に、例えば
40〜70g程度の力で接圧される。なお、接合突起5
aは根元径が約100μm、高さが約100μm程度で
弾頭状に形成される。そして、上記電極3が形成された
領域近傍の半導体チップ2の主表面端部側は、両面に熱
硬化性エポキシ接着剤が被着された絶縁性接合部材8を
介して対向するインナーリード5と接着され、接合突起
5aと電極3との接圧状態が保持されている。7は枠内
にインナーリード5及びアウターリード6を有するリー
ド4が複数形成された(図示せず)リードフレームであ
る。ここで、絶縁性接合部材8は、例えば50μm程度
厚さのポリイミド樹脂フィルムを基材として両面に熱硬
化性エポキシ接着剤が被着されたものである。9は熱硬
化性エポキシからなる封止樹脂であり、半導体チップ
2、電極3、インナーリード5、接合突起5a及び絶縁
性接合部材8は封止樹脂9により一体に封止されて樹脂
封止型半導体装置1が構成されている。
In FIG. 1 to FIG. 4, reference numeral 2 denotes a semiconductor chip on which an integrated circuit is formed, and a plurality of 80 to 100 μm square electrodes 3 formed of an aluminum film are arranged around the main surface edge. Have been. And 160-300
The inner lead 5 of the lead 4 having a width of about μm and a thickness of about 90 to 200 μm is formed along the main surface of the semiconductor chip 2 as shown in FIGS.
, And the top of the joint protrusion 5a formed on a plane near the tip is pressed against the electrode 3 with a force of, for example, about 40 to 70 g. In addition, the joining protrusion 5
a has a root diameter of about 100 μm and a height of about 100 μm and is formed in a warhead shape. The end of the main surface of the semiconductor chip 2 in the vicinity of the region where the electrode 3 is formed is connected to the inner lead 5 which is opposed via the insulating bonding member 8 having both surfaces to which a thermosetting epoxy adhesive is adhered. It is adhered, and the contact pressure state between the joining protrusion 5a and the electrode 3 is maintained. Reference numeral 7 denotes a lead frame (not shown) in which a plurality of leads 4 having an inner lead 5 and an outer lead 6 are formed in a frame. Here, the insulating joint member 8 is a member in which a thermosetting epoxy adhesive is adhered to both sides using a polyimide resin film having a thickness of, for example, about 50 μm as a base material. Reference numeral 9 denotes a sealing resin made of a thermosetting epoxy. The semiconductor chip 2, the electrodes 3, the inner leads 5, the bonding protrusions 5a, and the insulating bonding members 8 are integrally sealed with the sealing resin 9 to form a resin sealing type. The semiconductor device 1 is configured.

【0009】次に、上記構成の樹脂封止型半導体装置1
の製造方法につき、図4を基に説明する。まず、ダイ2
0の加工穴20a及び押圧具21の弾頭状突起21aと
インナーリード5の先端部とを位置合わせしてリードフ
レーム7をダイ20上にセットし、押圧具21を矢印方
向に下降させてインナーリード5の先端部近傍の平面に
弾頭状に打ち出した接合突起5aを形成する(図4
(a))。主表面に上記接合部材8が接着された複数の
半導体チップ2をヒータ23が埋設されたヒートブロッ
ク22上の所定位置に固定し、例えば100℃程度に半
導体チップ2を余熱する(図4(b))。次いで、イン
ナーリード5の接合突起5aの頂部を半導体チップ2の
電極3に位置合わせしてリードフレーム7を半導体チッ
プ2上に載置する。そして、押圧具24を矢印方向に下
降させてインナーリード5の先端部を押圧し、電極3と
接合突起5aの頂部とを接圧した状態で半導体チップ2
の温度を約170℃程度となるようにヒータ23を加熱
して約10〜20秒間保持し、絶縁性接合部材8の熱硬
化性エポキシ接着剤をキュアしてインナーリード5の半
導体チップ2の電極3へのボンディングが終わる(図4
(c))。そして、半導体チップ2が接着されたリード
フレーム7を上、下の封止金型31、30のキャビティ
31a、30a内にセットし、ポット31cに注入され
た溶融樹脂をプランジャー32により加圧してランナー
31b、30bを経てキャビティ31a、30a内に注
入し、半導体チップ2、絶縁性接着部材8及びインナー
リード5が封止樹脂9により一体に樹脂封止される(図
4(e))。
Next, the resin-sealed semiconductor device 1 having the above configuration
Will be described with reference to FIG. First, die 2
The lead frame 7 is set on the die 20 by aligning the processing hole 20a of No. 0 and the warhead-shaped projection 21a of the pressing tool 21 with the tip of the inner lead 5, and lowering the pressing tool 21 in the direction of the arrow to the inner lead. A joint projection 5a is formed on a plane near the front end of the joint 5 in the form of a warhead.
(A)). A plurality of semiconductor chips 2 having the bonding member 8 adhered to the main surface are fixed at predetermined positions on a heat block 22 in which a heater 23 is embedded, and the semiconductor chips 2 are preheated to, for example, about 100 ° C. (FIG. 4B )). Next, the lead frame 7 is mounted on the semiconductor chip 2 with the top of the joint protrusion 5 a of the inner lead 5 aligned with the electrode 3 of the semiconductor chip 2. Then, the pressing tool 24 is lowered in the direction of the arrow to press the tip of the inner lead 5, and the semiconductor chip 2 is pressed against the electrode 3 and the top of the joint protrusion 5 a.
Is heated to about 170 ° C. and maintained for about 10 to 20 seconds, and the thermosetting epoxy adhesive of the insulating joint member 8 is cured to cure the electrode of the semiconductor chip 2 of the inner lead 5. 3 is completed (Fig. 4
(C)). Then, the lead frame 7 to which the semiconductor chip 2 is adhered is set in the cavities 31a, 30a of the upper and lower sealing dies 31, 30, and the molten resin injected into the pot 31c is pressed by the plunger 32. The semiconductor chip 2, the insulating adhesive member 8, and the inner lead 5 are integrally resin-sealed with the sealing resin 9 after being injected into the cavities 31a, 30a via the runners 31b, 30b (FIG. 4E).

【0010】以上のように、本発明の実施の形態1にお
いては、インナーリード5の接合突起5aを弾頭状突起
21a付きの押圧具21により打ち出し形成し、半導体
チップ2の電極3と接合突起5aの頂部とを接圧した状
態で電極3近傍の半導体チップ2の主表面端部の領域と
対向するインナーリード5間を絶縁性接着部材8を介し
接着・固化して電極3と接合突起5a間を強固に接圧保
持し一体に樹脂封止したので、パッケージ厚さを薄く形
成できると共に、半導体チップ2の各電極3とインナー
リード5間の電気的ボンディングが安価に得られ、安価
で薄型の樹脂封止型半導体装置が得られる。また、電極
3とインナーリード5間がボンディングワイヤーで接続
されていないので、樹脂封止を信頼性高く行うことがで
きる。
As described above, according to the first embodiment of the present invention, the joint protrusion 5a of the inner lead 5 is formed by being pushed out by the pressing tool 21 having the warhead-shaped protrusion 21a, and the electrode 3 of the semiconductor chip 2 and the joint protrusion 5a are formed. In a state in which the top of the semiconductor chip 2 is brought into contact with the top of the semiconductor chip 2, the area between the inner leads 5 facing the area of the main surface end of the semiconductor chip 2 is bonded and solidified via an insulating adhesive member 8 between the electrode 3 and the bonding projection 5 a. Is firmly held in contact pressure and is integrally resin-sealed, so that the thickness of the package can be reduced, and electrical bonding between each electrode 3 of the semiconductor chip 2 and the inner lead 5 can be obtained at low cost. A resin-sealed semiconductor device is obtained. Further, since the electrode 3 and the inner lead 5 are not connected by the bonding wire, the resin sealing can be performed with high reliability.

【0011】実施の形態2.図5は、この発明の実施の
形態2である樹脂封止型半導体装置の断面図、図6は、
樹脂封止型半導体装置のリード接続工程を終えた状態を
示す平面図、図7は、図1におけるB部の拡大断面図で
ある。
Embodiment 2 FIG. 5 is a sectional view of a resin-encapsulated semiconductor device according to Embodiment 2 of the present invention, and FIG.
FIG. 7 is an enlarged sectional view of a portion B in FIG. 1 showing a state after the lead connection step of the resin-sealed semiconductor device has been completed.

【0012】図5〜図7において、10は半導体チップ
2の主表面の電極3の近傍領域と対向するインナーリー
ド5の先端面の間に接着された絶縁性接着部材であり、
絶縁性接着部材8と同様の構成になっている。本実施の
形態2おいては、図示のように電極3と接合突起5aと
の接合部を挟んで絶縁性接着部材8,9を接着し、これ
による接圧保持をより確実にしている点が実施の形態1
の場合と異なる。したがって、樹脂封止型半導体装置の
製造方法も実施の形態1の場合と同様であり、実施の形
態1におけると同様の効果を奏する。
In FIG. 5 to FIG. 7, reference numeral 10 denotes an insulating adhesive member bonded between the front end surface of the inner lead 5 and the area near the electrode 3 on the main surface of the semiconductor chip 2;
It has the same configuration as the insulating adhesive member 8. In the second embodiment, as shown in the figure, the insulating adhesive members 8 and 9 are adhered to each other with the joint between the electrode 3 and the joint protrusion 5a interposed therebetween, thereby more reliably maintaining the contact pressure. Embodiment 1
It is different from the case. Therefore, the method of manufacturing the resin-encapsulated semiconductor device is the same as that of the first embodiment, and has the same effect as that of the first embodiment.

【0013】なお、上記実施の形態1、2においては、
半導体チップの電極が主表面の端部に配設されたものを
示したが、これに限らず、本発明は、電極が主表面の中
央部に配列されたLOC(Lead On Chip)
型半導体チップに対しても適用できる。また、絶縁性接
着部材を電極の近傍の半導体チップの端部側主表面上に
設けたものや、電極の近傍の半導体チップの端部側及び
中心側主表面上に設けたものを示したが、中心側主表面
上に設けたものとしても同様の効果を奏する。更に、絶
縁性接着部材は両面に熱硬化性エポキシ樹脂を被着した
ものを示したが、樹脂封止時の温度(約180°C)を
越える耐熱温度を有する公知の熱可塑性ポリエステル系
樹脂接着剤を用いても良く、電極と接合突起との接圧保
持力が失われることなく樹脂封止を行うことができる。
In the first and second embodiments,
Although the case where the electrodes of the semiconductor chip are arranged at the ends of the main surface is shown, the invention is not limited to this, and the present invention provides a LOC (Lead On Chip) in which the electrodes are arranged at the center of the main surface.
It can also be applied to die semiconductor chips. Also, the insulating adhesive member provided on the end side main surface of the semiconductor chip near the electrode and the one provided on the end side and center side main surface of the semiconductor chip near the electrode are shown. The same effect can be obtained by providing the device on the center-side main surface. Further, the insulating adhesive member has a thermosetting epoxy resin adhered to both surfaces, but a known thermoplastic polyester resin adhesive having a heat resistance temperature exceeding the temperature at the time of resin sealing (about 180 ° C.) is shown. An agent may be used, and resin sealing can be performed without losing the contact pressure holding force between the electrode and the joining protrusion.

【0014】[0014]

【発明の効果】この発明は以上のように構成したので、
以下に示す効果を奏する。樹脂封止型半導体装置及びそ
の製造方法を、半導体チップの電極とインナーリードの
先端部近傍の平面に形成した接合突起の頂部とを接圧し
た状態で電極近傍の半導体チップ表面と対向するインナ
ーリード間を絶縁性接着部材で接着して電極と接合突起
との接圧状態を保持し一体に樹脂封止する構成としたの
で、インナーリードと電極との電気的接続を安価に実現
できると共に、樹脂封止を信頼性高く、かつ、パッケー
ジ厚さを薄く形成できる。
The present invention is configured as described above.
The following effects are obtained. A resin-encapsulated semiconductor device and a method of manufacturing the same are described by using an inner lead facing a semiconductor chip surface near an electrode in a state where an electrode of a semiconductor chip and a top of a joint protrusion formed on a plane near an end of an inner lead are brought into pressure contact with each other. The space between the electrodes is bonded with an insulating adhesive member to maintain the contact pressure between the electrodes and the joint protrusions and is integrally sealed with resin, so that the electrical connection between the inner leads and the electrodes can be realized at low cost and the resin The sealing can be performed with high reliability and the package thickness can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 この発明の実施の形態1である樹脂封止型半
導体装置の断面図である。
FIG. 1 is a sectional view of a resin-sealed semiconductor device according to a first embodiment of the present invention.

【図2】 この発明の実施の形態1である樹脂封止型半
導体装置のリード接続工程を終えた状態を示す平面図で
ある。
FIG. 2 is a plan view showing a state in which a lead connection step of the resin-encapsulated semiconductor device according to the first embodiment of the present invention has been completed;

【図3】 図1におけるA部の拡大断面図である。FIG. 3 is an enlarged sectional view of a portion A in FIG.

【図4】 この発明の実施の形態1である樹脂封止型半
導体装置の製造方法を示す図である。
FIG. 4 is a diagram illustrating a method for manufacturing the resin-encapsulated semiconductor device according to the first embodiment of the present invention.

【図5】 この発明の実施の形態2である樹脂封止型半
導体装置の断面図である。
FIG. 5 is a sectional view of a resin-sealed semiconductor device according to a second embodiment of the present invention;

【図6】 この発明の実施の形態2である樹脂封止型半
導体装置のリード接続工程を終えた状態を示す平面図で
ある。
FIG. 6 is a plan view showing a state in which a lead connection step of a resin-sealed semiconductor device according to a second embodiment of the present invention has been completed;

【図7】 図5におけるB部の拡大断面図である。FIG. 7 is an enlarged sectional view of a portion B in FIG.

【符号の説明】[Explanation of symbols]

1,11;樹脂封止型半導体装置 2;半導体チップ
3;電極 4;リード 5;インナーリード 5a;接合突起 8,10;絶縁性接着部材 9;封止樹脂
1, 11; resin-encapsulated semiconductor device 2: semiconductor chip
3; electrode 4; lead 5; inner lead 5a; bonding projection 8, 10; insulating adhesive member 9;

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 主表面に集積回路の電極が形成された半
導体チップ、この半導体チップの上記主表面に沿って近
接配置され先端部近傍の平面に形成された接合突起の頂
部が上記電極に接圧されたインナーリードを有するリー
ド、上記電極の近傍の上記主表面の所定の領域とこの領
域に対向する上記インナーリード相互間を接着し、上記
電極と上記接合突起の頂部の接圧状態を保持する絶縁性
接着部材、上記半導体チップ、上記絶縁性接着部材及び
上記インナーリードを一体に封止する封止樹脂を備えた
ことを特徴とする樹脂封止型半導体装置。
1. A semiconductor chip having an electrode of an integrated circuit formed on a main surface thereof, and a top portion of a bonding projection formed on a plane near the front end portion of the semiconductor chip near the main surface and in contact with the electrode. A lead having a pressed inner lead, a predetermined area of the main surface in the vicinity of the electrode and the inner lead facing the area are bonded to each other to maintain a contact pressure state between the electrode and the top of the joining protrusion. And a sealing resin for integrally sealing the insulating adhesive member, the semiconductor chip, the insulating adhesive member, and the inner lead.
【請求項2】 絶縁性接着部材は、電極の近傍の半導体
チップの端部側又は中心側の少なくとも一方の主表面の
所定の領域に配置されていることを特徴とする請求項1
記載の樹脂封止型半導体装置。
2. The semiconductor device according to claim 1, wherein the insulating adhesive member is disposed in a predetermined region of at least one of the main surfaces on the edge side or the center side of the semiconductor chip near the electrode.
The resin-encapsulated semiconductor device according to claim 1.
【請求項3】 半導体チップ及びこの半導体チップの主
表面に沿って近接配置され集積回路の電極に電気的に接
続されたインナーリードを一体に樹脂封止する樹脂封止
型半導体装置の製造方法において、上記インナーリード
の先端部近傍の平面に打ち出して接合突起を形成する工
程、上記電極の近傍の上記主表面の所定の領域とこの領
域に対向する上記インナーリード間に絶縁性接着部材を
介在させ、上記電極と上記接合突起の頂部とを位置合わ
せし接圧した状態で上記絶縁性接着部材を加熱、固化す
る工程を含むことを特徴とする樹脂封止型半導体装置の
製造方法。
3. A method of manufacturing a resin-encapsulated semiconductor device in which a semiconductor chip and an inner lead which is disposed closely along a main surface of the semiconductor chip and electrically connected to an electrode of an integrated circuit are integrally resin-encapsulated. Forming a bonding projection by stamping out on a plane near the tip of the inner lead, interposing an insulating adhesive member between a predetermined region of the main surface near the electrode and the inner lead facing this region. And a step of heating and solidifying the insulating adhesive member in a state where the electrode and the top of the joining protrusion are aligned and pressed against each other.
【請求項4】 絶縁性接着部材は、電極の近傍の半導体
チップの端部側又は中心側の少なくとも一方の主表面の
所定の領域に配置することを特徴とする請求項3記載の
樹脂封止型半導体装置の製造方法。
4. The resin encapsulation according to claim 3, wherein the insulating adhesive member is arranged in a predetermined region on at least one of the main surfaces on the end side or the center side of the semiconductor chip near the electrodes. Of manufacturing a semiconductor device.
【請求項5】 絶縁性接着部材は、熱硬化性樹脂又は樹
脂封止温度を越える耐熱温度を有する熱可塑性樹脂が被
着されていることを特徴とする請求項3又は請求項4記
載の樹脂封止型半導体装置の製造方法。
5. The resin according to claim 3, wherein the insulating adhesive member is coated with a thermosetting resin or a thermoplastic resin having a heat-resistant temperature exceeding a resin sealing temperature. A method for manufacturing a sealed semiconductor device.
JP2000066025A 2000-03-10 2000-03-10 Resin-sealed semiconductor device and method of manufacturing the same Pending JP2001257305A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000066025A JP2001257305A (en) 2000-03-10 2000-03-10 Resin-sealed semiconductor device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000066025A JP2001257305A (en) 2000-03-10 2000-03-10 Resin-sealed semiconductor device and method of manufacturing the same

Publications (1)

Publication Number Publication Date
JP2001257305A true JP2001257305A (en) 2001-09-21

Family

ID=18585459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000066025A Pending JP2001257305A (en) 2000-03-10 2000-03-10 Resin-sealed semiconductor device and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP2001257305A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006303006A (en) * 2005-04-18 2006-11-02 Yaskawa Electric Corp Power module
JP2013062396A (en) * 2011-09-14 2013-04-04 Toyota Motor Corp Semiconductor device and manufacturing method of the same
JP2020123691A (en) * 2019-01-31 2020-08-13 株式会社三社電機製作所 Semiconductor product

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006303006A (en) * 2005-04-18 2006-11-02 Yaskawa Electric Corp Power module
JP2013062396A (en) * 2011-09-14 2013-04-04 Toyota Motor Corp Semiconductor device and manufacturing method of the same
JP2020123691A (en) * 2019-01-31 2020-08-13 株式会社三社電機製作所 Semiconductor product

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