JP2001223199A - Substrate treating device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate treating device for efficiently resuming treatment in a stopped device. SOLUTION: After substrate treatment in a device has been suspended, the resumption of treatment by either of 'washing drying unloading mode', 'arbitrary process continuation mode', and 'treatment bath continuation mode' is specified and inputted. In the 'washing drying unloading mode', a substrate whose treatment has been suspended is washed without using any soap, is dried, and then is unloaded by the device. In the 'arbitrary process continuation mode', treatment for a substrate is made from an arbitrary process in treatment procedures for the substrate. In the 'treatment bath continuation mode', treatment is made from the treatment regarding the next treatment bath of the treatment bath where treatment in treatment procedures for the substrate has been suspended. In either mode, the treatment can be resumed by simple specification, thus efficiently resuming the treatment.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor substrate, a glass substrate for a liquid crystal display, a glass substrate for a photomask, a substrate for an optical disk, etc. The present invention relates to a substrate processing apparatus that interrupts the processing for a predetermined reason when the processing is performed.

[0002]

2. Description of the Related Art Conventionally, a substrate processing apparatus as described above has been used to immerse a lot (a set of a plurality of substrates when performing batch processing) in a chemical solution such as hydrofluoric acid or pure water according to a predetermined procedure. By repeating the process, a series of substrate processes of removing contaminants on the substrate surface, etching an oxide film on the substrate surface, and stripping the resist film are achieved.

[0003] In such a substrate processing apparatus, when any trouble (for example, a trouble in a transfer system) occurs in the apparatus, an alarm for occurrence of a trouble is generated because the trouble may be related to the safety of people, equipment, apparatuses and the like. , To stop the device. Also, even in the case where no alarm occurs, a stop instruction is given by the operator's judgment,
The substrate processing apparatus may be stopped.

[0004] When the apparatus is stopped, the lot being processed at that time remains in the apparatus without completing the processing.

[0005]

However, in the prior art, even if it is desired to restart the processing after the malfunction of the apparatus has been resolved, the lot which was being processed at the time of the stoppage is manually paid out one by one from the apparatus. Must be
The processing could not be resumed efficiently.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to provide a substrate processing apparatus that can efficiently restart processing in a stopped apparatus.

[0007]

In order to solve the above-mentioned problems, the invention according to claim 1 is based on a predetermined situation when processing is performed on a substrate in accordance with a processing procedure predetermined for each substrate. A substrate processing apparatus for interrupting the processing, wherein an interrupt-only mode activation means for activating an interrupt-only mode for performing a fixed process exclusively for the interrupt on the substrate for which the processing is interrupted; and A processing continuation mode activating means for activating a processing continuation mode for continuing processing in accordance with the processing procedure on a substrate whose processing has been interrupted; and Specifying means for specifying processing restart in either the mode or the processing continuation mode, and the interruption for the substrate in which the processing has been interrupted based on the specification by the specifying means. The resume processing by the processing resume or the processing continues mode by only mode and a, a processing resumption request means for requesting each of the dedicated mode activation means or the processing continues mode activation circuit when said interruption.

According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect of the present invention, the substrate is discharged from the apparatus after the substrate is washed with water and then dried in the dedicated mode for interruption. Mode.

According to a third aspect of the present invention, in the substrate processing apparatus according to the first or second aspect, the processing continuation mode is a mode in which processing on a substrate can be continued from an arbitrary step in the processing procedure. I have.

According to a fourth aspect of the present invention, in the substrate processing apparatus according to the first or second aspect, the substrate is circulated and transported to a plurality of processing tanks by the substrate processing apparatus. The processing according to the procedure is performed, and the processing continuation mode is a mode in which the processing on the substrate can be continued from the processing on the processing tank next to the processing tank in which the processing in the processing procedure is interrupted.

According to a fifth aspect of the present invention, in the substrate processing apparatus according to the first or second aspect of the present invention, the substrate is processed by circulating the substrate to a plurality of processing tanks. A process according to the procedure, the process continuation mode is an optional process continuation mode in which the process on the substrate can be continued from an arbitrary process in the process procedure, and a process tank next to the process tank in which the process in the process procedure is interrupted. A processing tank continuation mode in which the processing of the substrate can be continued from the processing related to the above is included, and the restart of the processing in either the optional step continuation mode or the processing tank continuation mode can be designated by the designation means.

According to a sixth aspect of the present invention, a plurality of processing tanks are provided, and the substrates are circulated and conveyed to the plurality of processing tanks in accordance with a processing procedure predetermined for each substrate, thereby performing processing on the substrates. A substrate processing apparatus for interrupting the processing for a predetermined reason when performing the processing;
An interruption-only mode activation means for activating an interruption-only mode for performing a fixed interruption-only process on a substrate whose processing has been interrupted; and An optional step continuation mode activating means for activating an optional step continuation mode capable of continuing the processing from an arbitrary step in the procedure, and a processing tank next to the processing tank in which the processing in the processing procedure is interrupted for the substrate in which the processing is interrupted. A processing tank continuation mode activating means for activating a processing tank continuation mode that can be continued from the processing relating to the processing tank, and the interruption only mode, the optional step continuation mode or the processing tank continuation mode after the processing of the substrate is interrupted. Means for designating the resumption of processing by any one of Mode by processing resumes, the optional step continues mode by processing resume or the processing bath continues mode by processing only mode activation circuit when said interrupt resumed,
Processing restart requesting means for requesting the optional process continuation mode activating means or the processing tank continuation mode activating means, respectively.

[0013]

Embodiments of the present invention will be described below in detail with reference to the drawings.

<1. Overall Configuration of Substrate Processing Apparatus> First, the overall configuration of the substrate processing apparatus according to the present invention will be described.
FIG. 1 is a schematic front view showing an example of the substrate processing apparatus according to the present invention. The substrate processing apparatus 100 includes a chemical solution tank CHB
1, five processing tanks of CHB2, multi-function tanks ONB1, ONB2, and drying unit LPD, and a transfer robot TR for transferring a substrate. Further, the substrate processing apparatus 100 includes:
A loader unit (left end in the figure) for mounting a cassette 20 containing unprocessed substrates W on both ends thereof, and an unloader unit (right end in the figure) for mounting a cassette 20 for storing processed substrates W. It has.

The chemical liquid tanks CHB1 and CHB2 are tanks capable of storing a chemical liquid such as sulfuric acid, ammonia, hydrochloric acid, hydrofluoric acid, aqueous hydrogen peroxide, or a mixture thereof, and are used for performing an etching process or the like on a substrate. It is a tank. Further, the multi-function tanks ONB1 and ONB2 are processing tanks that store the above-described chemical solution or pure water and perform various chemical liquid treatments and washing treatments in a single tank. Further, the drying unit LPD is a processing tank that performs a reduced-pressure drying process of removing and drying water droplets attached to the substrate W by lifting the substrate W from pure water in a reduced-pressure atmosphere. Note that a tank capable of storing the liquid is provided inside the drying unit LPD, and in the tank, a washing treatment with pure water or a chemical treatment with a chemical can be performed. In addition, the reason that two chemical tanks and two multi-function tanks are provided
This is to promote the efficiency of processing by performing parallel processing.
These may be provided one by one.

The transfer robot TR is movable in the horizontal and vertical directions, pays out unprocessed lots from a loader section, circulates and transfers the lots among the processing tanks according to a predetermined processing procedure, and processes the processed lots. Is a robot that transfers the lot to the unloader section. When the transfer robot TR receives a lot from the loader unit,
This is performed by a pair of hands 11 of the transport robot TR gripping the lot raised from the cassette 20 by a holder (not shown) provided below the cassette 20. When the lot is transferred to the unloader, the lot is transferred from the hand 11 to a holder (not shown), and the lot is stored in the cassette 20 by lowering the holder. . The example shown here is an apparatus of a system in which a lot is taken out from the cassette 20 and the lot is directly gripped and transported by the transport robot TR. That is, the apparatus may be a so-called cassette transport type apparatus.

<2. Control Mechanism of Substrate Processing Apparatus> Next, a control mechanism of the substrate processing apparatus 100 will be described. FIG.
3 is a functional block diagram for explaining a control mechanism of the substrate processing apparatus 100. FIG. The substrate processing apparatus 100 incorporates a control unit 30 configured using a computer, and an operator can give commands to the apparatus and set processing patterns and processing conditions via the control unit 30. .

The control unit 30 has a CPU 3 as its main body.
1, a ROM 32 that is a read-only memory, a RAM 33 that is a readable and writable memory, a magnetic disk 34 that stores control software and recipes (files describing processing procedures), and associated input / output devices. An input / output port 35 which is an interface of the substrate processing apparatus 100; a network port 36 which is an interface with an apparatus for directly controlling the substrate processing apparatus 100;
And a communication port 37 for communicating with a host computer or the like provided outside. The control unit 3
0 is provided with a display 38 and a keyboard 39 via an input / output port 35, so that an operator can input commands and parameters from the keyboard 39 while checking the display on the display 38. In the present embodiment, the display 38 and the keyboard 39 correspond to a designation unit. Further, a mouse may be used instead of the keyboard 39, or a touch panel may be used instead of the combination of the display 38 and the keyboard 39.

The command input to the control unit 30 is processed based on processing software, and is transmitted from the control unit 30 to the master controller 40 and the tank controller 50 via the network port 36 as necessary. The master controller 40 includes the transfer robot TR
(See FIG. 1). Further, the tank controller 50 controls liquid injection into and out of each processing tank, processing conditions, and the like.

<3. Processing Procedure> Next, the substrate processing apparatus 10
0 will be described. The general procedure of substrate processing for the entire apparatus is as follows. The transport robot TR sequentially transports lots sequentially from the loader section to the unloader section, and the chemical solution tanks CHB1, CHB2, and the multi-function tank O on the way.
By circulating the lot to some of the NB1, the ONB2, and the drying unit LPD, the substrate W is subjected to chemical treatment such as etching, washing with pure water, and drying. Such a processing procedure is predetermined for each substrate, and is executed by the control unit 30 controlling each unit of the apparatus in accordance with a recipe describing the processing procedure. Here, a description will be given of a restart processing procedure after a situation in which the processing should be interrupted when a normal processing according to such a recipe is being performed.

FIG. 3 is a diagram showing an example of a restart processing procedure after the processing is interrupted. First, something wrong with the device,
For example, when a failure occurs in the transport robot TR, an alarm is generated and the processing on the substrate W is interrupted (step S1). Further, even when no trouble is particularly occurring in the apparatus, the processing may be interrupted by the judgment of the operator. Usually, a plurality of interruption modes are set according to the circumstances in which the processing is interrupted, but here, for convenience of explanation, the processing is immediately interrupted, and the processing during the processing in a certain processing tank is performed. It is assumed that the substrate W remains in the processing bath as it is.

After the processing is interrupted, the process proceeds to step S2, where the control unit 30 determines whether or not a restart command has been input. The “resume command” is a command for resuming the interrupted process, and designates one of “washing / drying / dispensing mode”, “optional process continuation mode”, and “treatment tank continuation mode” to be described later. . The operator inputs the restart command via the display 38 and the keyboard 39.

When a restart command is input, the input restart command is a “wash-dry-dispense mode”
The control unit 30 determines whether the mode is the “optional process continuation mode” or the “processing tank continuation mode” (steps S3, S5, S6). In addition, the input restart command is “Washing / drying / dispensing mode”, “Optional process continuation mode”,
If the mode is not any of the “processing tank continuation mode”, the process proceeds to step S8 to be treated as NG, and returns to step S2.
However, in the present embodiment, as described later, whether or not the substrate W whose processing has been interrupted remains in the drying unit LPD before it is determined whether the mode is the “optional process continuation mode” or the “processing tank continuation mode”. Is also determined by the control unit 30.

If it is determined in step S3 that the input restart command is in the "drying and dispensing mode", the control unit 30 requests a restart of the process in the "drying and dispensing mode" and proceeds to step S7. Then, the control unit 30 activates the "washing / drying / dispensing mode" and executes the restart processing. In the “washing / drying / dispensing mode”, the substrate W whose processing has been interrupted is supplied to the chemical solution tanks CHB1 and CHB2, the multifunctional tanks ONB1 and O
This mode is executed regardless of whether it remains in the NB2 or the drying unit LPD.

"Washing / drying / dispensing mode" means that, regardless of the processing history before the processing was interrupted, the substrate W where the processing was interrupted is washed and dried, and then the substrate W is returned from the apparatus. This is the payout mode. For example, when the processing of the substrate W is interrupted in the chemical solution tank CHB1 (or the chemical solution tank CHB2), the substrate W is transferred to the chemical solution tank CHB1 (CH
B2) to multi-function tank ONB1 (or multi-function tank ONB)
After being conveyed to 2) and subjected to a rinsing treatment with pure water, the conveyed product is further conveyed to the drying unit LPD and subjected to the drying treatment, and then discharged from the apparatus. Further, when the processing of the substrate W is interrupted in the multi-function tank ONB1 (or the multi-function tank ONB2), regardless of the processing history of the substrate W, in the same multi-function tank where the processing is interrupted. After performing a rinsing process with pure water for a predetermined time, the wafer is conveyed to the drying unit LPD, dried, and then discharged from the apparatus. Further, when the processing of the substrate W is interrupted in the drying unit LPD, the drying unit LPD is temporarily added to the substrate W.
After performing a water-washing process with pure water in the inside, a lifting and drying process is performed, and then the product is discharged from the apparatus.

"Washing / drying / dispensing mode" is, specifically,
This is performed by describing a procedure dedicated to the interruption of the process at the end of the recipe for each substrate W and causing the control unit 30 to execute the procedure. FIG. 4 is a diagram conceptually showing the structure of the recipe. The recipes are created for each substrate W to be processed (strictly, for each lot). For example, in FIG. 4, five recipes 1 to 5 are stored in the magnetic disk 34 of the control unit 30. Have been. Each recipe first describes what processing is performed in which processing tank, and further describes detailed procedures and conditions for each processing. For example, if attention is paid to the recipe 1 of FIG.
Chemical solution treatment is performed in HB1, then multi-function tank ONB1
Rinsing with pure water is performed at the
Describes that a drying process is performed. The detailed procedure and conditions of the chemical solution treatment performed in the chemical solution tank CHB1 are described as Step 1 to Step 5. For example, the substrate is lowered into the solution at a certain speed, and at a predetermined temperature and time. It describes that the substrate is immersed, and the substrate is lifted and separated from the liquid at a predetermined speed. In FIG. 4, a plurality of steps are similarly described for processes other than the chemical solution process, and recipes 2 to 5 are described similarly to recipe 1.

In the present embodiment, as shown in FIG. 4, at the end of the recipe for each substrate W, “rinse, dry, and pay-out” is described as a dedicated procedure when the processing is interrupted, and the detailed procedure and conditions are “ "Washing for 10 minutes", "drying", "dispensing" and the like are described. When the input restart command is the “washing / drying / dispensing mode”, in step S7, the control unit 30 executes the above-described procedure at the end of the recipe for the substrate W whose processing has been interrupted, which is dedicated to the interruption of the process. As a result, the substrate W whose processing has been interrupted is subjected to a rinsing process using pure water, dried, and then discharged from the apparatus.

By executing the “washing / drying / dispensing mode” in this manner, for example, when the processing is interrupted, the chemical tank CHB
1 (or the chemical solution tank CHB2), and the unusable substrate W is washed out with pure water after the chemical solution attached to the substrate W is dried, and then dried in a safe state (danger such as hydrofluoric acid). The liquid is automatically dispensed to the outside of the apparatus (without any chemical liquid attached).

In the case of a substrate W whose processing is interrupted during the rinsing process and which is still usable, the substrate W is subjected to a rinsing process and then dried, so that the substrate W can be automatically put out of the apparatus in a usable state. Will be paid out.

The above-mentioned "washing / drying / dispensing mode" can be said to be an interruption-only mode for causing the substrate W for which the processing has been interrupted to be subjected to fixed processing such as rinsing, drying and dispensing. .

Next, when the input restart command is not the "washing / drying / dispensing mode" and the control unit 30 determines in step S4 that the substrate W whose processing has been interrupted remains in the drying unit LPD. In step S8, the process proceeds to step S8, and the process is treated as NG. Then, the process returns to step S2 without performing the restart process. On the other hand, in step S4, it is determined that the substrate W whose processing has been interrupted does not remain in the drying unit LPD as in the case where the substrate W remains in one of the chemical solution tanks CHB1, CHB2 or the multi-function tanks ONB1, ONB2. If so, the process proceeds to step S5. If it is determined in step S5 that the process is in the “optional process continuation mode”, the control unit 30 requests processing restart in the “optional process continuation mode” and proceeds to step S7. Activate the "mode" and execute the restart processing.
In the “optional process continuation mode”, the substrate W whose processing has been interrupted is supplied to the chemical solution tanks CHB1 and CHB2 or the multi-function tanks ONB1 and O2.
This mode is executed only when it remains in any of the NB2. That is, in step S4, the control unit 30 determines whether the substrate W whose processing has been interrupted remains in the drying unit LPD. If the substrate W remains in the drying unit LPD, the process proceeds to step S8 as described above. And N
Then, the process returns to step S2 without performing the restart process. The reason for this is that in the drying section LPD, if the processing can be restarted from an arbitrary step, processing inconvenience occurs.

The “arbitrary process continuation mode” is a mode in which the processing on the substrate W can be continued from an arbitrary step in the processing procedure described in the recipe for the substrate W whose processing has been interrupted. For example, assuming that the recipe for a certain substrate W is the recipe 1 in FIG. 4 and the process is interrupted during the process of the process 2 of the chemical solution in the chemical solution tank CHB1, if the process is interrupted from the next process 3 Processing of the substrate W can be continued.

More specifically, in step S2 in FIG. 3, the operator designates the "arbitrary process continuation mode" as a restart command, and determines from which process in the recipe the process for the substrate W has been interrupted. Is specified and input by the process number. The control unit 30 recognizing that the input restart command is in the “optional process continuation mode” and the process number for which the process is to be continued, performs the process corresponding to the process number on the recipe for the substrate W for which the process is interrupted. The process is continued from (step S7 in FIG. 3). In addition,
After the processing is restarted, the subsequent processing is continued according to the recipe for the substrate W.

By executing the “optional process continuation mode” in this manner, the processing on the substrate W can be restarted from any process desired by the operator.

Finally, if it is determined that the input restart command is neither the "washing / drying / dispensing mode" nor the "optional step continuation mode" but the "processing tank continuation mode" in step S6, the control unit 30 Requests the processing restart in the “processing tank continuation mode” and proceeds to step S7,
The control unit 30 activates the “processing tank continuation mode” and executes the restart processing. The “processing tank continuation mode” is also a mode that is executed only when the substrate W whose processing has been interrupted remains in any of the chemical solution tanks CHB1 and CHB2 or the multifunctional tanks ONB1 and ONB2.

In the “processing tank continuation mode”, the processing for the substrate W is continued from the processing for the processing tank next to the processing tank whose processing is interrupted in the processing procedure described in the recipe for the substrate W for which the processing is interrupted. It is a mode that can be done. For example, assuming that the recipe for a certain substrate W is the recipe 1 in FIG. 4 and the processing is interrupted during the chemical processing in the chemical tank CHB1, the chemical tank CHB1 in the processing procedure described in the recipe 1 is assumed. The processing for the substrate W can be continued from the processing for the multi-function tank ONB1, which is the next processing tank.

Specifically, in step S2 in FIG. 3, the operator designates and inputs "processing tank continuation mode" as a restart command. The control unit 30 that recognizes that the input restart command is the “processing tank continuation mode”
The processing is resumed from the processing for the processing tank next to the processing tank in which the processing in the processing procedure described in the recipe is interrupted for the interrupted substrate W (step S7 in FIG. 3). After the processing is restarted, the subsequent processing is continued according to the recipe for the substrate W.

Such a “treatment tank continuation mode” is, for example, a case where the treatment is interrupted during the immersion treatment in the chemical solution tank CHB1 and the interruption time substantially coincides with the planned immersion time. This is convenient when it is desired to restart the processing for the substrate W from the water washing processing in the next multi-function tank ONB1.

The "optional process continuation mode" and the "processing tank continuation mode" both allow the substrate W whose processing has been interrupted to continue processing in accordance with the processing procedure described in the recipe for that substrate W. It can be said that this is a processing continuation mode.

As described above, regardless of the mode, the restart process for the substrate W whose processing has been interrupted by the operator simply performing simple designation and input via the display 38 and the keyboard 39 is automatically performed. This eliminates the necessity of manually dispensing the substrate W from the apparatus and creating a new recipe by manual operation at the time of restarting the processing as in the related art, and efficiently restarting the processing in the stopped apparatus in a short time. be able to.

Further, the substrate W whose processing has been interrupted is not only discharged from the apparatus, but also the substrate W which can be used after the processing is interrupted.
As for the substrate W, the processing in accordance with the processing procedure scheduled in the recipe can be continued, so that the same processing as performed in the normal processing procedure can be performed on the substrate W whose processing has been interrupted. it can. That is, the number of substrates W that cannot be used due to the interruption of the processing can be reduced.

<4. Modifications> While the preferred embodiments of the present invention have been described above, the present invention is not limited to the above-described examples. For example, in the above-described embodiment, the drying unit LPD is a processing tank that performs a reduced-pressure drying process by lifting from pure water. However, it may be a processing tank that shakes off and drying by rotating the substrate W. In this case, when the “washing / drying / dispensing mode” is designated and the processing of the substrate W is interrupted in the drying unit, the substrate W is not subjected to the water washing processing, and only the shake-off drying processing by rotation is performed. To pay out from.

Further, in the above embodiment, it is determined whether or not the substrate W, the processing of which has been interrupted in step S4, remains in the drying unit LPD so that the substrate W remaining in the drying unit LPD can be determined in the “optional process”. Although the processing is not restarted in the “continuation mode” and the processing is not restarted in the “processing tank continuation mode”, for example, the substrate W remaining in the drying unit LPD is If there is no problem in restarting the process in "Optional process continuation mode",
Step S4 may be replaced between step S5 and step S6. Further, step S4 may not be provided if there is no problem that the processing of the substrate W remaining in the drying unit LPD is restarted in the “processing tank continuation mode”.

Further, the technology according to the present invention can be applied to a case where a multi-function tank for performing a chemical solution treatment and a water washing treatment in a single tank is replaced with a washing tank for performing only a washing treatment with pure water. be able to.

In the above embodiment, when there is a situation to be interrupted, the processing is immediately interrupted, and the substrate W being processed in a certain processing tank is left as it is in the processing tank. But other interruptions, such as
Regarding the substrate W being processed in the chemical solution tanks CHB1 and CHB2, even if the processing is interrupted after the substrate W is once evacuated to pure water in one of the multi-function tanks ONB1 and ONB2, the processing is interrupted. The technology according to the invention can be applied.

The substrate processing apparatus 100 is a so-called batch type apparatus for processing a plurality of substrates W as a set of lots. The technology according to the present invention can be applied to the device.

[0047]

As described above, according to the first aspect of the present invention, based on the designation by the designation means, the processing resumes in the interruption only mode or the processing continuation mode for the substrate whose processing has been suspended. Therefore, the processing is automatically restarted only by a simple designation, and the processing restart in the stopped apparatus can be efficiently performed.

According to the second aspect of the present invention, the exclusive mode at the time of interruption is a mode in which the substrate is washed out of the substrate and then dried and then the substrate is discharged from the apparatus. You can pay more out.

According to the third aspect of the present invention, since the processing continuation mode is a mode in which the processing on the substrate can be continued from an arbitrary step in the processing procedure, the processing continuation mode starts from a desired step in the processing procedure for the substrate whose processing has been interrupted. Processing can be resumed.

According to the fourth aspect of the present invention, since the processing continuation mode is a mode in which the processing on the substrate can be continued from the processing for the processing tank next to the processing tank in which the processing in the processing procedure has been interrupted, the processing is interrupted. The processing can be restarted from the processing for the processing tank next to the processed processing tank.

According to the fifth aspect of the present invention, the processing continuation mode is an optional step continuation mode in which the processing on the substrate can be continued from an arbitrary step in the processing procedure, and the next processing in the processing tank in which the processing in the processing procedure is interrupted. Since the processing tank continuation mode in which the processing on the substrate can be continued from the processing on the tank is included, the effect of the invention of claim 2 or 3 can be obtained.

According to the sixth aspect of the present invention, based on the designation by the designation means, the process resumed in the interruption only mode, the process resumed in the optional process continuation mode, or the process tank continuation mode for the substrate whose process has been suspended. Since the processing is restarted, the processing is automatically restarted only by simple designation, and the processing restart in the stopped apparatus can be efficiently performed.

[Brief description of the drawings]

FIG. 1 is a schematic front view showing an example of a substrate processing apparatus according to the present invention.

FIG. 2 is a functional block diagram for explaining a control mechanism of the substrate processing apparatus of FIG.

FIG. 3 is a diagram illustrating an example of a restart processing procedure after the processing is interrupted.

FIG. 4 is a diagram conceptually showing the structure of a recipe.

[Explanation of symbols]

 30 control unit 38 display 39 keyboard 100 substrate processing device CHB1, CHB2 chemical solution tank LPD drying unit ONB1, ONB2 multifunctional tank W board

Continued on the front page (72) Inventor Akihiro Shibata 4-chome Tenjin Kitamachi 1-chome, Horikawa-dori-Terauchi, Kamigyo-ku, Kyoto F-term (reference) in Dainippon Screen Mfg. Co., Ltd. 3B201 AA03 AB24 AB44 BB92 BB93 BB96 CB15 CC15

Claims (6)

[Claims] When processing is performed on a substrate according to a processing procedure predetermined for each substrate,
A substrate processing apparatus for interrupting the process according to a predetermined situation, wherein the interrupt-only mode activates an interrupt-only mode for performing a fixed interrupt-only process on a substrate for which the process has been interrupted. Activating means, processing continuation mode activating means for activating a processing continuation mode for continuing processing according to the processing procedure for a substrate whose processing has been interrupted, and after the processing of the substrate has been interrupted, Designation means for designating processing resumption in either the interruption-only mode or the processing continuation mode; and processing resumption or processing in the interruption-only mode for a substrate for which processing has been interrupted, based on the designation in the designation means. A processing restart requesting the interruption-only mode activation means or the processing continuation mode activation means to resume processing in the continuation mode, respectively. A substrate processing apparatus comprising: an opening request unit. 2. The substrate processing apparatus according to claim 1, wherein the interrupt only mode is a mode in which the substrate is washed with water and then dried and then the substrate is discharged from the apparatus. Processing equipment. 3. The substrate processing apparatus according to claim 1, wherein the processing continuation mode is a mode in which processing on the substrate can be continued from an arbitrary step in the processing procedure. apparatus. 4. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus performs processing according to the processing procedure on the substrate by circulating and transporting the substrate to a plurality of processing tanks. The substrate processing apparatus is characterized in that the processing continuation mode is a mode in which processing on a substrate can be continued from processing on a processing tank next to a processing tank in which processing in the processing procedure has been interrupted. 5. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus performs processing according to the processing procedure on the substrate by circulating and transporting the substrate to a plurality of processing tanks. The processing continuation mode is an optional process continuation mode in which processing on a substrate can be continued from an arbitrary step in the processing procedure, and a processing on a substrate can be continued from processing on a processing tank next to a processing tank in which processing in the processing procedure has been interrupted. A substrate processing apparatus, comprising: a processing tank continuation mode, wherein the designation means can designate processing restart in either the optional step continuation mode or the processing tank continuation mode. 6. When a plurality of processing tanks are provided and processing is performed on the substrates by circulating and transporting the substrates to the plurality of processing tanks according to a processing procedure predetermined for each substrate, A substrate processing apparatus for interrupting the processing according to the circumstances, wherein an interrupt-only mode is activated for performing an interrupt-only mode for performing a fixed-only interrupt-time process on the substrate whose processing has been interrupted. An optional step continuation mode activation means for activating an optional step continuation mode capable of continuing processing from an arbitrary step in the processing procedure for a substrate whose processing has been interrupted; Processing tank continuation mode activating means for activating a processing tank continuation mode in which the processing in the processing procedure can be continued from the processing for the processing tank next to the processing tank interrupted; After the processing of the substrate is interrupted, a designating means for designating any one of the interruption-only mode, the optional process continuation mode and the processing tank continuation mode, and a processing based on the designation by the designation means. Resume processing in the interrupt only mode for the interrupted substrate,
A process restart requesting the interruption-dedicated mode activation means, the arbitrary step continuation mode activation means, or the processing tank continuation mode activation means to resume processing in the optional process continuation mode or in the processing tank continuation mode, respectively. Requesting means.