JP3638242B2 - Substrate processing equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
In the present invention, when processing is performed on a semiconductor substrate, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, an optical disk substrate, etc. (hereinafter simply referred to as “substrate”) in accordance with a predetermined processing procedure. The present invention relates to a substrate processing apparatus for interrupting the processing due to predetermined circumstances.
[0002]
[Prior art]
Conventionally, a substrate processing apparatus as described above repeatedly performs immersion processing of a lot (a set of a plurality of substrates when performing batch processing) in a chemical solution such as hydrofluoric acid and pure water according to a predetermined procedure. A series of substrate processing has been achieved in which contaminants on the surface are removed, an oxide film on the substrate surface is etched, and a resist film is peeled off.
[0003]
In such a substrate processing apparatus, when some trouble occurs in the apparatus (for example, a failure in the transport system), it may be related to the safety of people, equipment, apparatus, etc., so a trouble occurrence alarm is generated and the apparatus is I try to stop. Even if an alarm does not occur, a stop instruction may be given by the operator's judgment to stop the substrate processing apparatus.
[0004]
When the apparatus is stopped, the lot being processed at that time remains in the apparatus without completing the process.
[0005]
[Problems to be solved by the invention]
However, in the past, even when it is desired to restart the processing after the trouble of the device has been resolved, the lot that was being processed at the time of stopping must be paid out from the device one by one by manual operation. Could not resume.
[0006]
The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus that can efficiently restart processing in a stopped apparatus.
[0007]
[Means for Solving the Problems]
In order to solve the above-described problems, the invention of claim 1 is a substrate processing apparatus that interrupts the processing due to a predetermined circumstance when processing the substrate according to a processing procedure predetermined for each substrate. In addition, for the interrupted substrate, the interrupt-only mode activation means for activating the interrupt-only mode for performing the interrupted fixed process for the interrupted substrate, and the substrate for which the process is interrupted. A process continuation mode activation means for activating a process continuation mode for continuing the process according to the process procedure, and either the suspend-only mode or the process continuation mode after the process for the substrate is interrupted And a process for resuming the process in the suspension-only mode for the substrate on which the process is suspended based on the designation in the designation means. Is and a processing resumption request means for requesting each of the interruption time only mode activation means or the processing continues mode activation circuit to resume processing by the processing continues mode.
[0008]
  In addition, the interruption-only mode isIn this mode, after the substrate is washed with water and dried, the substrate is discharged from the apparatus.
[0009]
  Also,Claim 2The invention ofInvention of Claim 1In the substrate processing apparatus according to the first aspect, the processing continuation mode is a mode in which processing on the substrate can be continued from an arbitrary step in the processing procedure.
[0010]
  Also,Claim 3The invention ofInvention of Claim 1In the substrate processing apparatus according to the present invention, the substrate processing apparatus causes the substrate to perform processing according to the processing procedure by circulating and transporting the substrate to a plurality of processing tanks. In this mode, the processing on the substrate can be continued from the processing related to the processing tank next to the interrupted processing tank.
[0011]
  Also,Claim 4The invention ofInvention of Claim 1In the substrate processing apparatus according to the present invention, the substrate processing apparatus causes the substrate to perform processing according to the processing procedure by circulating and transporting the substrate to a plurality of processing tanks. Including an optional process continuation mode in which the process for the substrate can be continued from the process and a process tank continuation mode in which the process for the substrate can be continued from the process for the process tank next to the process tank in which the process in the process procedure has been interrupted. Processing resumption can be designated by either the arbitrary process continuation mode or the processing tank continuation mode.
[0012]
  Also,Claim 5The present invention comprises a plurality of processing tanks, and performs processing on the substrate by circulating and transporting the substrate to the plurality of processing tanks according to a predetermined processing procedure for each substrate. A substrate processing apparatus that interrupts the processing depending on the circumstances, and activates a dedicated mode at the time of interruption to activate a fixed mode only at the time of interruption for a substrate for which the processing is interrupted. Means for activating optional process continuation mode for activating an arbitrary process continuation mode in which processing can be continued from any process in the processing procedure for the substrate for which processing has been interrupted, and for a substrate for which processing has been interrupted A processing tank continuation mode activating means for activating a processing tank continuation mode in which processing can be continued from processing related to the processing tank next to the processing tank in which processing in the processing procedure has been interrupted; After the process is interrupted, the process is suspended based on the designation in the designation means for designating resumption of the process in any one of the dedicated mode at the time of interruption, the optional process continuation mode or the processing tank continuation mode, and the designation in the designation means Resumption of processing in the interruption-only mode, processing resumption in the optional process continuation mode, or processing resumption in the processing tank continuation mode for the substrate that has been interrupted, the suspending-only mode activation means, the arbitrary process continuation mode activation means, or the And a process resumption requesting unit that respectively requests the processing tank continuation mode activation unit.
  Further, the interruption-only mode is a mode in which the substrate is discharged from the apparatus after the substrate is washed and then dried.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
[0014]
<1. Overall configuration of substrate processing apparatus>
First, the overall configuration of the substrate processing apparatus according to the present invention will be described. FIG. 1 is a schematic front view showing an example of a substrate processing apparatus according to the present invention. The substrate processing apparatus 100 includes five processing tanks of chemical tanks CHB1 and CHB2, multi-function tanks ONB1 and ONB2, and a drying unit LPD, and a transport robot TR that transports a substrate. Further, the substrate processing apparatus 100 includes a loader unit (left end in the drawing) for placing the cassette 20 containing the unprocessed substrates W at both ends thereof, and an unloader for placing the cassette 20 in which the processed substrates W are stored. (Right end in the figure).
[0015]
The chemical tanks CHB1 and CHB2 are tanks that can store chemical liquids such as sulfuric acid, ammonia, hydrochloric acid, hydrofluoric acid, hydrogen peroxide water, or a mixture thereof, and are processing tanks for performing an etching process on the substrate. . The multifunctional tanks ONB1 and ONB2 are processing tanks that store the chemical liquid or pure water and perform various chemical liquid treatments and water washing processes in a single tank. Furthermore, the drying unit LPD is a processing tank that performs a reduced-pressure drying process for removing and drying water droplets attached to the substrate W by lifting the substrate W from pure water in a reduced-pressure atmosphere. In addition, the tank which can store a liquid is provided in the inside of the drying part LPD, The water washing process by a pure water and the chemical | medical solution process by a chemical | medical solution can be performed in the said tank. The reason why two chemical tanks and two multifunctional tanks are provided is to perform parallel processing to promote the efficiency of the process, and these may be provided one by one.
[0016]
The transfer robot TR is movable in the horizontal direction and the vertical direction, pays out an unprocessed lot from the loader unit, circulates the lot between the processing tanks according to a predetermined processing procedure, and transfers the processed lot. It is a robot handed to the unloader part. When the transport robot TR receives a lot from the loader unit, the pair of hands 11 of the transport robot TR grips the lot lifted from the cassette 20 by a holder (not shown) provided below the cassette 20. Done. When delivering a lot to the unloader unit, contrary to the above, the lot is delivered from the hand 11 to a holder (not shown), and the lot is stored in the cassette 20 by lowering the holder. . The example shown here is a system in which a lot is taken out from the cassette 20 and directly held and transported by the transport robot TR. However, the transport robot TR holds the entire cassette 20 and transports the lot. In other words, it may be a so-called cassette conveyance type apparatus.
[0017]
<2. Control mechanism of substrate processing apparatus>
Next, a control mechanism of the substrate processing apparatus 100 will be described. FIG. 2 is a functional block diagram for explaining a control mechanism of the substrate processing apparatus 100. The substrate processing apparatus 100 incorporates a control unit 30 configured using a computer, and an operator can give a command to the apparatus via the control unit 30 and set a processing pattern and processing conditions. .
[0018]
The control unit 30 includes a CPU 31 as a main body, a ROM 32 as a read-only memory, a RAM 33 as a readable / writable memory, a magnetic for storing control software, a recipe (a file describing a processing procedure), and the like. An input / output port 35 that is an interface between the disk 34 and an associated input / output device, a network port 36 that is an interface with an apparatus that directly controls the substrate processing apparatus 100, and a host provided outside the substrate processing apparatus 100. A communication port 37 for communicating with a computer or the like is provided. Further, the control unit 30 is provided with a display 38 and a keyboard 39 via the input / output port 35, and the operator inputs commands and parameters from the keyboard 39 while confirming the display on the display 38. be able to. In the present embodiment, the display 38 and the keyboard 39 correspond to designation means. A mouse may be used instead of the keyboard 39, or a touch panel may be used instead of the combination of the display 38 and the keyboard 39.
[0019]
The command input to the control unit 30 is processed based on processing software, and is transmitted from the control unit 30 to the master controller 40 and the tank controller 50 via the network port 36 as necessary. The master controller 40 controls the operation of the transport robot TR (see FIG. 1). Moreover, the tank controller 50 controls the pouring and discharging liquid to each processing tank, processing conditions, and the like.
[0020]
<3. Processing procedure>
Next, a processing procedure in the substrate processing apparatus 100 will be described. The normal substrate processing procedure for the entire apparatus is as follows. The transfer robot TR sequentially transfers lots from the loader unit to the unloader unit, and the chemical tanks CHB1, CHB2, multifunctional tanks ONB1, ONB2, and the drying unit on the way. By circulating the lots to some of the LPDs, the substrate W is subjected to chemical processing such as etching, washing with pure water, and drying. Such a processing procedure is predetermined for each substrate, and is executed by the control unit 30 controlling each unit of the apparatus according to a recipe describing the processing procedure. Here, a description will be given of a resumption process procedure after a situation in which the process should be interrupted occurs when a normal process according to such a recipe is performed.
[0021]
FIG. 3 is a diagram illustrating an example of a restart process procedure after the process is interrupted. First, when some trouble occurs in the apparatus, for example, a failure of the transfer robot TR, an alarm is generated and the processing for the substrate W is interrupted (step S1). Even when there is no particular problem with the apparatus, the process may be interrupted by the operator's judgment. Normally, a plurality of modes of interruption are set according to the circumstances where the processing is interrupted, but here, for convenience of explanation, the processing is immediately interrupted and processing is being performed in a processing tank. The substrate W is left in the processing tank as it is.
[0022]
After the process is interrupted, the process proceeds to step S2, and the control unit 30 determines whether or not a restart command has been input. “Resume command” is a command for resuming the interrupted process, and is to designate one of “washing / drying / dispensing mode”, “arbitrary process continuation mode”, and “treatment tank continuation mode” to be described later. . The restart command is input by the operator via the display 38 and the keyboard 39.
[0023]
When the restart command is input, the control unit 30 determines whether the input restart command is “washing / drying / dispensing mode”, “arbitrary process continuation mode”, or “treatment tank continuation mode” (step S30). S3, S5, S6). If the input restart command is not one of the “washing / drying / dispensing mode”, “arbitrary process continuation mode”, and “treatment tank continuation mode”, the process proceeds to step S8 and is treated as NG, and the process returns to step S2. However, in this embodiment, whether or not the substrate W whose processing has been interrupted remains in the drying unit LPD before it is determined whether the “arbitrary process continuation mode” or the “processing tank continuation mode” is set, as will be described later. This is also determined by the control unit 30.
[0024]
In step S3, when it is determined that the input restart command is the “washing / drying / dispensing mode”, the control unit 30 requests processing resumption in the “washing / drying / dispensing mode” and proceeds to step S7. 30 activates the “water-washing / drying-out mode” and executes the resumption process. The “water-washing / drying-out mode” is a mode that is executed even when the substrate W whose processing has been interrupted remains in any one of the chemical baths CHB1, CHB2, the multi-function baths ONB1, ONB2, and the drying unit LPD. .
[0025]
“Washing / drying / dispensing mode” is a mode in which the substrate W is discharged from the apparatus after being dried after performing the water-washing process on the substrate W whose processing has been interrupted, regardless of the processing history before the processing is interrupted. It is. For example, when the processing of the substrate W is interrupted in the chemical tank CHB1 (or the chemical tank CHB2), the substrate W is transferred from the chemical tank CHB1 (CHB2) to the multi-function tank ONB1 (or multi-function tank ONB2). After performing a water washing process with pure water, it is further transported to the drying unit LPD and subjected to a drying process, and then discharged from the apparatus. Further, when the processing of the substrate W is interrupted in the multi-function tank ONB1 (or the multi-function tank ONB2), the processing is interrupted in the same multi-function tank where the processing is interrupted regardless of the processing history of the substrate W. After performing a water washing treatment with pure water for a predetermined time, it is transported to the drying unit LPD and dried, and then discharged from the apparatus. Further, when the processing of the substrate W is interrupted in the drying unit LPD, the substrate W is once washed with pure water in the drying unit LPD, then lifted and dried, and then discharged from the apparatus. .
[0026]
Specifically, the “water-washing / drying-out mode” is performed by describing a procedure dedicated to processing interruption at the end of the recipe for each substrate W and causing the control unit 30 to execute the procedure. FIG. 4 is a diagram conceptually showing the structure of the recipe. Recipes are created for each substrate W to be processed (here, strictly, for each lot). For example, in FIG. 4, five recipes 1 to 5 are stored in the magnetic disk 34 of the control unit 30. Has been. Each recipe first describes what process is to be performed in which processing tank, and further describes detailed procedures and conditions for each process. For example, paying attention to the recipe 1 in FIG. 4, the recipe 1 is first subjected to a chemical treatment in the chemical bath CHB 1, then washed with pure water in the multifunctional tank ONB 1, and then to the drying unit LPD. It is described that the drying process is performed. The detailed procedure and conditions of the chemical processing performed in the chemical bath CHB1 are described as Step 1 to Step 5. For example, the substrate is lowered into the liquid at a certain speed, and at a predetermined temperature and time. It describes that an immersion process is performed and the substrate is lifted and removed from the liquid at a predetermined speed. In FIG. 4, a plurality of processes are described similarly for processes other than the chemical liquid process, and the same description as recipe 1 is also applied to recipes 2 to 5.
[0027]
In the present embodiment, as shown in FIG. 4, “washing and drying out” is described at the end of the recipe for each substrate W as a dedicated procedure at the time of processing interruption, and the detailed procedure and conditions are “10 minutes”. Describe "washing", "drying", "dispensing", etc. When the input restart command is the “washing / drying / dispensing mode”, in step S7, the control unit 30 executes the above-described procedure dedicated to the interruption of processing described at the end of the recipe for the substrate W whose processing has been interrupted. Thereby, the substrate W whose processing has been interrupted is discharged from the apparatus after being dried after being washed with pure water.
[0028]
By executing the “washing / drying / dispensing mode” in this way, for example, for the substrate W that remains in the chemical bath CHB1 (or the chemical bath CHB2) and becomes unusable when the process is interrupted, the chemical solution attached to the substrate W is used. Is washed out with pure water and dried, so that it is automatically dispensed to the outside of the apparatus in a safe state (in a state where no dangerous chemical solution such as hydrofluoric acid is attached).
[0029]
In addition, for a substrate W that is still usable after the processing is interrupted during the washing process, the substrate W is further washed and then dried, and then automatically discharged to the outside of the apparatus in a usable state. Will be.
[0030]
The above-mentioned “water-washing / drying / dispensing mode” can be said to be an interruption-only mode for causing the substrate W on which the processing is interrupted to perform fixed processing dedicated to the interruption of washing, drying, and dispensing.
[0031]
Next, when the input restart command is not the “washing / drying / dispensing mode” and the control unit 30 determines in step S4 that the substrate W whose processing has been interrupted remains in the drying unit LPD, The process proceeds to step S8 and is treated as NG, and the process returns to step S2 without executing the restart process. On the other hand, in step S4, it is determined that the substrate W whose processing has been interrupted does not remain in the drying unit LPD as in the case where the substrate W remains in any one of the chemical tanks CHB1 and CHB2 or the multifunctional tanks ONB1 and ONB2. If so, the process proceeds to step S5. If it is determined in this step S5 that the “arbitrary process continuation mode” is selected, the control unit 30 requests processing resumption in the “arbitrary process continuation mode” and proceeds to step S7. “Mode” is activated to execute the restart process. The “arbitrary process continuation mode” is a mode that is executed only when the substrate W whose processing has been interrupted remains in either the chemical tank CHB1, CHB2 or the multi-function tank ONB1, ONB2. That is, whether or not the substrate W for which processing has been interrupted remains in the drying unit LPD is determined by the control unit 30 in step S4, and if it remains in the drying unit LPD, the process proceeds to step S8 as described above. NG, and the process returns to step S2 without executing the restart process. This is because in the drying unit LPD, if processing can be resumed from an arbitrary step, processing inconvenience occurs.
[0032]
The “arbitrary process continuation mode” is a mode in which processing on the substrate W can be continued from an arbitrary process in the processing procedure described in the recipe for the substrate W whose processing has been interrupted. For example, assuming that the recipe for a certain substrate W is Recipe 1 in FIG. 4 and the process is interrupted while performing the process 2 of the chemical process in the chemical tank CHB1, the process from the next process 3 The processing of the substrate W can be continued.
[0033]
Specifically, in step S2 of FIG. 3, the operator designates “arbitrary process continuation mode” as a resume command, and the process number from which process in the recipe for the substrate W for which processing has been suspended is to be continued. Specify and input with. The control unit 30 that recognizes that the input restart command is “arbitrary process continuation mode” and that the process number to continue processing corresponds to the process number corresponding to the process number on the recipe for the substrate W whose process has been interrupted. To continue the process (step S7 in FIG. 3). After the process is resumed, the subsequent processes are continued according to the recipe for the substrate W.
[0034]
By executing the “arbitrary process continuation mode” in this way, it is possible to resume the processing for the substrate W from an arbitrary process desired by the operator.
[0035]
Finally, when the input restart command is neither “washing / drying / dispensing mode” nor “arbitrary step continuation mode” and it is determined in step S6 that it is “processing tank continuation mode”, the control unit 30 performs “processing”. The process is requested to be resumed in the “tank continuation mode”, and the process proceeds to step S7. The control unit 30 activates the “treatment tank continuation mode” and executes the resumption process. The “processing tank continuation mode” is also a mode that is executed only when the substrate W whose processing has been interrupted remains in either the chemical tank CHB1, CHB2 or the multi-function tank ONB1, ONB2.
[0036]
The “processing tank continuation mode” is a mode in which the processing on the substrate W can be continued from the processing related to the processing tank next to the processing tank in which the processing in the processing procedure described in the recipe for the substrate W whose processing has been interrupted is interrupted. is there. For example, assuming that the recipe for a certain substrate W is recipe 1 in FIG. The processing for the substrate W can be continued from the processing related to the multifunctional tank ONB1 which is the next processing tank.
[0037]
Specifically, in step S2 of FIG. 3, the operator designates and inputs “processing tank continuation mode” as a restart command. The control unit 30 recognizing that the input restart command is the “processing tank continuation mode”, the processing unit next to the processing tank in which the processing in the processing procedure described in the recipe is interrupted for the substrate W whose processing has been interrupted. The processing is resumed from the processing relating to the processing tank (step S7 in FIG. 3). After the process is resumed, the subsequent processes are continued according to the recipe for the substrate W.
[0038]
Such “treatment tank continuation mode” is performed when, for example, the process is interrupted when the immersion process is being performed in the chemical tank CHB1, and when the interruption time substantially matches the planned immersion time, This is convenient when it is desired to restart the processing for the substrate W from the water washing processing in the multifunctional tank ONB1.
[0039]
The “arbitrary process continuation mode” and the “processing tank continuation mode” are both processes for causing a substrate W whose processing has been interrupted to continue processing according to the processing procedure described in the recipe for the substrate W. It can be said that it is a continuation mode.
[0040]
As described above, in any mode, the restart process is automatically executed for the substrate W whose processing has been interrupted simply by the operator performing simple designation / input via the display 38 and the keyboard 39. Therefore, it is no longer necessary to manually dispense the substrate W from the apparatus or create a new recipe by manual operation when the process is resumed as in the prior art, and the process resumed in the stopped apparatus can be efficiently performed in a short time. .
[0041]
Further, not only the substrate W whose processing has been interrupted is simply paid out from the apparatus, but the processing according to the scheduled processing procedure described in the recipe can be continued for the substrates W that can be used even after the processing is interrupted. The same processing as that performed in the normal processing procedure can be performed for the substrate W whose processing has been interrupted. That is, it is possible to reduce the number of substrates W that cannot be used due to processing interruption.
[0042]
<4. Modification>
While the embodiments of the present invention have been described above, the present invention is not limited to the above examples. For example, in the above-described embodiment, the drying unit LPD is a processing tank that performs a vacuum drying process by lifting from pure water. However, the drying part LPD may be a processing tank that performs swing-off drying by rotating the substrate W. In this case, when the “water-washing drying / dispensing mode” is designated and the processing of the substrate W is interrupted in the drying unit, the substrate W is not subjected to the water-washing processing, and only the swing-off drying processing by rotation is performed, and then the apparatus To pay out.
[0043]
In the above embodiment, the substrate W remaining in the drying unit LPD is determined to be in the “arbitrary process continuation mode” by determining whether the substrate W whose processing has been interrupted in step S4 remains in the drying unit LPD. The processing is not resumed in the above-described process, and the process is not resumed in the “treatment tank continuation mode”. For example, the substrate W remaining in the drying unit LPD is “optional process”. If there is no problem in restarting the process in the “continuation mode”, step S4 may be changed between step S5 and step S6. Furthermore, step S4 may not be provided if there is no problem with the substrate W remaining in the drying unit LPD being restarted in the “processing tank continuation mode”.
[0044]
In addition, the technique according to the present invention can be applied even when a washing tank that performs only a washing process with pure water is used instead of the multi-function tank that performs a chemical treatment and a washing process in a single tank. .
[0045]
Further, in the above embodiment, when there is a situation to be interrupted, the processing is immediately interrupted, and the substrate W being processed in a certain processing tank is left as it is in the processing tank. For other interruption modes, for example, for the substrate W being processed in the chemical baths CHB1 and CHB2, the processing is interrupted after being temporarily saved in one of the multifunctional tanks ONB1 and ONB2. The technology according to the present invention can be applied even in the interruption mode.
[0046]
The substrate processing apparatus 100 described above is a so-called batch type apparatus that processes a plurality of substrates W as a set of lots. However, the substrate processing apparatus 100 may be a so-called single wafer type apparatus that processes the substrates W one by one. The technology according to the present invention can be applied.
[0047]
【The invention's effect】
As described above, according to the first aspect of the present invention, the processing is resumed in the exclusive mode at the time of interruption or the processing is resumed in the processing continuation mode for the substrate on which the processing is suspended based on the designation by the designation means. The process is automatically restarted only with a simple designation, and the process restart in the stopped apparatus can be efficiently performed.
[0048]
  In addition, the dedicated mode for interruptionIn this mode, the substrate is discharged from the apparatus after being washed with water and dried, so that the substrate can be discharged from the apparatus in a safe state.
[0049]
  Also,Claim 2According to the invention, since the processing continuation mode is a mode in which the processing on the substrate can be continued from an arbitrary step in the processing procedure, the processing can be resumed from a desired step of the processing procedure for the substrate on which the processing has been interrupted.
[0050]
  Also,Claim 3According to the invention, since the processing continuation mode is a mode in which the processing on the substrate can be continued from the processing related to the processing bath next to the processing bath in which the processing in the processing procedure is interrupted, the next processing of the processing bath in which the processing is interrupted. Processing can be resumed from processing related to the tank.
[0051]
  Also,Claim 4According to the present invention, the processing continuation mode allows the processing on the substrate from the processing related to the processing tank next to the processing tank in which the processing in the processing procedure interrupted in the arbitrary process continuation mode in which the processing in the processing procedure is interrupted. Since the processing tank continuation mode that can be continued is included, the effect of the invention of claim 2 or claim 3 can be obtained.
[0052]
  Also,Claim 5According to the invention of the present invention, since the processing is resumed in the interruption-only mode, the processing is resumed in the arbitrary process continuation mode, or the processing tank continuation mode is resumed based on the designation in the designation means. The process is automatically restarted only by designation, and the process restart in the stopped apparatus can be efficiently performed.
Furthermore, since the interruption-only mode is a mode in which the substrate is discharged from the apparatus after the substrate is washed with water and dried, the substrate can be discharged from the apparatus in a safe state.
[Brief description of the drawings]
FIG. 1 is a schematic front view showing an example of a substrate processing apparatus according to the present invention.
2 is a functional block diagram for explaining a control mechanism of the substrate processing apparatus of FIG. 1; FIG.
FIG. 3 is a diagram illustrating an example of a restart process procedure after the process is interrupted.
FIG. 4 is a diagram conceptually showing the structure of a recipe.
[Explanation of symbols]
30 Control unit
38 display
39 keyboard
100 Substrate processing equipment
CHB1, CHB2 chemical tank
LPD drying section
ONB1, ONB2 Multifunctional tank
W substrate

Claims (5)

A substrate processing apparatus that interrupts the processing due to predetermined circumstances when processing the substrate according to a predetermined processing procedure for each substrate,
An interruption only mode activating means for activating an interruption only mode for performing a fixed process only for interruption on a substrate for which processing has been interrupted;
A process continuation mode activating means for activating a process continuation mode for continuing the process according to the process procedure on the substrate in which the process is interrupted;
A designation means for designating resumption of processing in either the suspension-only mode or the processing continuation mode after the processing on the substrate is suspended;
Based on the designation in the designating means, processing resumption in the suspension-only mode or processing resume in the processing-continuation mode for the substrate in which processing has been suspended is designated as the suspension-only mode activation means or the processing-continuation mode activation means. A process resumption request means for requesting each;
Equipped with a,
The interruption-only mode is
A substrate processing apparatus, which is a mode in which a substrate is washed out after being washed and then dried out from the apparatus. The substrate processing apparatus according to claim 1,
  The processing continuation mode is
  The substrate processing apparatus is in a mode in which processing on a substrate can be continued from an arbitrary step in the processing procedure. The substrate processing apparatus according to claim 1,
  The substrate processing apparatus performs processing according to the processing procedure on the substrate by circulating and transporting the substrate to a plurality of processing tanks,
  The processing continuation mode is
  The substrate processing apparatus is a mode in which processing for a substrate can be continued from processing related to a processing bath next to a processing bath in which processing in the processing procedure is interrupted. The substrate processing apparatus according to claim 1,
  The substrate processing apparatus performs processing according to the processing procedure on the substrate by circulating and transporting the substrate to a plurality of processing tanks,
  The processing continuation mode is
  Including an arbitrary process continuation mode in which processing on the substrate can be continued from an arbitrary step in the processing procedure and a processing tank continuation mode in which processing on the substrate can be continued from processing related to the processing tank next to the processing tank in which processing in the processing procedure is interrupted. ,
  The substrate processing apparatus, wherein the resumption of processing in either the arbitrary process continuation mode or the processing bath continuation mode can be designated by the designation means. A plurality of processing tanks are provided, and when the substrate is processed by circulating and transporting the substrate to the plurality of processing tanks according to a predetermined processing procedure for each substrate, the processing is performed according to predetermined circumstances. A substrate processing apparatus for interrupting
  An interruption-only mode activation means for activating an interruption-only mode for causing a fixed process dedicated to the interruption to be performed on a substrate in which the process is interrupted;
  Optional process continuation mode activating means for activating an arbitrary process continuation mode in which processing can be continued from an arbitrary process in the processing procedure for a substrate in which processing is interrupted;
  A processing tank continuation mode activating means for activating a processing tank continuation mode in which processing can be continued from processing related to a processing tank next to the processing tank in which processing in the processing procedure has been interrupted for the substrate in which processing has been interrupted;
  After the processing for the substrate is interrupted, designation means for designating the processing resumption in any of the interruption-only mode, the optional process continuation mode, or the processing tank continuation mode;
  Based on the designation in the designation means, the process is for the interrupted substrate only for the interruption. Process resumption by mode, process resumption by the arbitrary process continuation mode or process resumption by the process tank continuation mode is performed in the interruption-only mode activation means, the arbitrary process continuation mode activation means or the treatment tank continuation mode activation means. A process resumption request means for requesting each;
With
  The interruption-only mode is
  A substrate processing apparatus, wherein the substrate is discharged from the apparatus after being washed with water and then dried.

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