JP3377657B2 - Cleaning processing apparatus and screen processing method of processing apparatus - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus for processing an object to be processed such as a semiconductor wafer and a screen processing method for a cleaning processing apparatus.

[0002]

2. Description of the Related Art A cleaning process in a manufacturing process of a semiconductor device such as an LSI will be described as an example. Conventionally, in order to remove contamination such as particles, organic contaminants and metal impurities on the surface of a semiconductor wafer, Cleaning treatment equipment is used. Among them, the wet type cleaning treatment equipment can remove particles effectively and can perform batch treatment,
Widely used.

In this type of cleaning processing apparatus, a carrier, which stores a predetermined number of semiconductor wafers, for example, 25 semiconductor wafers, is carried into a loader section of the processing apparatus by a transfer robot to perform orientation flat alignment. After that, in the wafer holding unit, the housed semiconductor wafer is taken out of the carrier by the holding tool and placed in a transfer standby state. Then, the semiconductor wafer in the transfer standby state is
A transfer device having a gripping device called a wafer chuck transfers the wafer to a cleaning processing unit where various cleaning processes are performed, and a predetermined cleaning process is performed in the cleaning processing unit.

The cleaning processing section is equipped with SC1 cleaning, SC2 cleaning,
One or more cleaning units for cleaning various chemicals such as HF cleaning and SPM cleaning are sequentially arranged,
Each cleaning unit is composed of a chemical tank for chemical cleaning and a water cleaning tank for pure water cleaning. The processing object transferred to a certain cleaning unit by the transfer device is
First, the chemical solution is washed in the chemical solution tank, and then transferred to a water washing tank disposed downstream of the chemical solution tank. Then, in the water washing tank, the chemical liquid adhering to the surface of the semiconductor wafer is washed away with pure water and then transferred to a cleaning unit using another type of chemical liquid. In this way, the semiconductor wafer that has undergone a series of cleaning processes is finally cleaned with pure water, dried, and carried out of the processing apparatus via the unloader unit.

[0005]

By the way, the cleaning process in the cleaning device as described above is usually performed by an operator according to a control screen displayed on a display device of a controller composed of a personal computer, a workstation or the like. Is executed by advancing the operation. Then, normally, after the power is input, a predetermined starting operation is manually performed, then the mode is shifted to the automatic mode, and a desired cleaning process is performed according to a process recipe preset in the controller. If the engineer leaves the seat during the processing for some reason while the engineer is setting / correcting the processing recipe, etc., a third party can freely operate the terminal being processed. There was a possibility that it became a security problem for the system.

Conventionally, a control screen of a processing apparatus such as a cleaning processing apparatus includes an apparatus information screen for displaying various kinds of information about the apparatus, and an operator can refer to the apparatus information screen as needed. It is possible to check the status of the cleaning processing device. However, there are various types of information about the device, and if all information is displayed every time the operator refers to the device information, the status confirmation work becomes very complicated, so more flexible information display. A method was sought.

The present invention has been made in view of the above-mentioned problems of the processing apparatus such as the conventional cleaning processing apparatus, and the purpose thereof is that the operator is absent during the screen operation. Even in such a case, it is an object of the present invention to provide a new and improved image processing method capable of maintaining the system. Still another object of the present invention is to provide a new and improved image processing method capable of optimally displaying various information regarding the apparatus.

[0008]

In order to solve the above-mentioned problems , according to the present invention, a loader section for carrying in an object to be processed into the apparatus and an unloader section for carrying out the object to be processed outside the apparatus. And a plurality of treatment tanks including at least one or more chemical solution tanks for cleaning the object to be treated with a chemical solution, and one or more water washing tanks for cleaning the object to be purified water, and a drying treatment for the object to be treated. The present invention relates to an operator screen processing method for controlling a cleaning processing device in which a dryer is sequentially arranged between the loader unit and the unloader unit, and relates to a control screen and a device that can be operated by a general operator. The steady screen setting process of pre-selecting the steady screen from the device information screen that displays various information, and returning to the pre-selected steady screen when no key input occurs for a predetermined time in the manual mode Characterized in that it consists of a degree,
A screen processing method for a cleaning processing apparatus is provided. Also,
According to Ming, the loader part in which the object to be processed is loaded into the apparatus is
One or more chemical solution tanks equipped with and cleaning the object to be treated with chemical solution
And one or more washing tanks for washing the object with pure water
Multiple processing tanks containing at least
To control the cleaning equipment, which consists of an array of dryers
Screen processing method for operators to
Control screen and device that can be operated by the controller
From the device information screen that displays various information, the normal screen is
Routine screen setting process to be selected for
If there is no key input for a predetermined time, it will be selected in advance.
And a process of returning to the selected steady screen.
A screen processing method for a cleaning processing device is provided. Well
Further, according to the present invention, the object to be processed is carried out of the apparatus.
1 or 2 for cleaning an object to be treated with a chemical solution by using a loader unit
1 or 2 or more for cleaning the above chemical solution tank and the object to be treated with pure water
A plurality of treatment tanks including at least the above washing tank, and the treatment target
A cleaning process consisting of a series of dryers for drying the body
It is a screen processing method for the operator to control the device.
Control screen that can be operated by a general operator and
A variety of information about the device from the table Shimesuru system information screen
The routine screen setting process of selecting the routine screen in advance and the manual
If no key is input in the
In this case, the process returns to the preselected steady screen.
Provided is a screen processing method for a cleaning processing device, which is characterized in that
To be done.

In this case, the control screen operable by the operator is at least a cleaning process flow start instruction screen for instructing the start of the cleaning process flow, a device initialization screen for instructing initialization of each device, and each process. It is preferable to include a processing standby screen for instructing the tank to be in a state where the object can be received and a processing end screen for instructing the end of processing. In addition, the device information screen that displays various types of information regarding the device includes fixed information that is fixedly displayed by the processing device, and user information that includes items preselected by the user from the itemized information that the processing device has. It is preferable to be composed of

The stationary screens configured as described above are preferably displayed in one screen. However, when two or more screens are displayed, the stationary screens are sequentially switched at a predetermined time period. Is preferably displayed.

Further , according to the present invention, there is provided a loader section for carrying in the object to be processed into the apparatus and an unloader section for carrying out the object to be processed outside the apparatus, and 1 or 2 for cleaning the object to be treated with a chemical solution. A plurality of processing tanks including at least the above chemical solution tank and one or more water cleaning tanks for cleaning the object with pure water;
A dryer for drying the object to be processed is an operator screen processing method for controlling a cleaning processing apparatus that is sequentially arranged between the loader section and the unloader section,
As the operator screen, a device information screen that displays at least various types of information about the device is displayed. Further, as the device information screen, fixed information that is fixedly displayed by the cleaning processing device and items classified by the cleaning processing device are displayed. There is provided a screen processing method for a cleaning processing apparatus, which is characterized by displaying user information including items preselected by the user from among the information. Further, according to the present invention,
An object to be processed is provided with a loader section for loading the object to be loaded into the apparatus.
One or more chemical baths for cleaning the
At least one or more washing tanks for washing with pure water are included.
Multiple processing tanks and a dryer for drying the object to be processed are in order.
An operator for controlling a cleaning treatment device that is arranged next
Screen processing method for the operator,
And display at least various information about the device
Display the information screen, and as the device information screen,
The fixed information that is fixedly displayed by the cleaning processor and the cleaning information
The user can pre-select from the itemized information that the purification device has.
Display user information consisting of selected items for
A screen processing method for a cleaning processing device is provided.
It Further, according to the present invention, the object to be processed is carried out of the apparatus.
Equipped with an unloader part for cleaning the object to be treated with a chemical solution.
Or two or more chemical baths, and wash the object with pure water.
Is a plurality of treatment tanks including at least two water washing tanks,
A washing system in which dryers for drying the object are arranged in sequence.
Screen processing method for operator for controlling cleaning device
However, as a screen for the operator, at least
Display the device information screen that displays various information about
Furthermore, as the device information screen,
Fixed information displayed in solid Joteki, cleaning apparatus has
Is the item preselected by the user from the itemized information?
Cleaning, characterized by displaying user information consisting of
A screen processing method of a processing device is provided.

The apparatus information screen configured as described above is preferably displayed in one screen, but when two or more screens are displayed, each stationary screen is sequentially switched at a predetermined time cycle. Is preferably displayed.

Further, the present invention is not limited to the above-mentioned cleaning processing apparatus, and performs predetermined processing such as etching and film formation on an object to be processed such as a semiconductor wafer or LCD substrate according to a preset processing flow. The present invention can be applied to many possible processing apparatuses, and according to still another aspect of the present invention, an application of the above configuration to such processing apparatus in general is disclosed.

As described above, in a processing apparatus such as a cleaning processing apparatus, for example, setting / correction of a processing recipe is performed.
It is preferable that only a specialized operator who has specialized knowledge can access it, and a general operator who is only responsible for driving the device according to the processing recipe created by the specialized operator can access the setting / correction screen of the processing recipe. It is preferable to reduce it as much as possible. In this respect, according to the present invention, for example, even if a specialized operator leaves his / her seat during the process recipe creation, if a key input by the specialized operator does not occur for a predetermined time, a control screen operable by a general operator And since it automatically returns to the pre-selected regular screen from the device information screen that displays various information about the device, general operators other than specialized operators are less likely to access screens that are not permitted to access. It becomes possible to suppress it.

Further, the steady screen is, for example, a cleaning process flow start instruction screen for instructing the start of the cleaning process flow, a device initialization screen for instructing the initialization of each device, and each processing tank being in a state in which the object can be received. Such as a process standby screen that instructs you to
By setting a screen that is frequently used or a screen that has a low risk of being accessed by a third party, it is possible to improve operability or system maintainability.

Further, by adopting a device information screen for displaying various kinds of information regarding the device as the operator screen, the operator can appropriately confirm the status of the device. In that case, the device information is displayed. To
By including fixed information that is fixedly displayed by the processing device and user information that includes items preselected by the user from the itemized information that the processing device has, it is possible to flexibly adapt to the processing environment or the operator. A device information screen can be constructed. And by adopting such a device information screen as the regular screen,
It is possible to improve the operability because the system can be maintained and the status of the device can be appropriately grasped.

By displaying the general operator screen, especially the device information screen on one screen, visual recognition is facilitated and operability can be improved. However, even if these steady screens extend over two or more screens, by configuring each screen to be sequentially switched at a predetermined cycle, visual recognition becomes easy,
The operability can be improved.

Furthermore, the present invention is not limited to the cleaning processing apparatus, and various processing apparatuses, for example, various processing apparatuses for performing a predetermined processing on an object to be processed such as a semiconductor wafer and an LCD substrate according to a preset processing flow. It is also effective for protecting the screens for specialized operators such as etching devices and film forming devices and improving operability.

[0019]

BEST MODE FOR CARRYING OUT THE INVENTION An embodiment in which the present invention is applied to a cleaning processing apparatus will be described in detail below with reference to the accompanying drawings.

First, the overall configuration of the cleaning processing apparatus 1 to which the present invention can be applied will be described with reference to FIGS. As shown in FIG. 1, the cleaning apparatus 1 as a whole includes a loader section 100 for accommodating an object to be processed before cleaning, for example, a semiconductor wafer in carrier units, a cleaning section 200 for cleaning the wafer, and a cleaning section. It is composed of three zones, namely, an unloader unit 300 for carrying the processed wafer out of the apparatus in carrier units.

The loader section 100 includes a mounting section 110 for loading and mounting a carrier C containing a predetermined number, for example, 25 unwashed wafers, and a mounted carrier C.
Is mainly composed of a transfer device 120 for transferring the wafer to the holding parts 133 and 135 shown in an enlarged scale in FIG. 2 and a relay part 130 for taking out the wafer from the carrier C and transferring it to the wafer transfer device 140. . This placing part 110
As shown in FIG. 2, a plurality of stations 112a, 112b, ..., 1 each of which has a hollow mounting table 111 and has an opening on the upper surface through which the lower part of the carrier C can be inserted.
12n are arranged in two rows. In addition, in the vicinity of each corner of each station 112, the carrier C
Locking portions 113 that can lock the upper edge corners are respectively provided.

Further, the loader section 100 includes a moving mechanism 11
5, the moving mechanism 115 can be freely driven in the vertical and horizontal directions by a driving mechanism (not shown), and the carrier C held by the clamp member 116 is moved to desired stations 112a, 112b, ..., 112n. It is possible to move up to. This moving mechanism 1
15 also includes an aligning device 117 for aligning the orientation flats of the wafers W stored in the carrier C, so that the orientation flats of the wafers W stored in the carrier C can be aligned.

Further, as shown in FIG. 2, the transfer device 120 is provided behind the loader section 100. The transfer device 120 includes a pair of arms 121 a and 121 b configured to be movable toward and away from each other and the arms 1 a and 121 b.
21a and 121b are horizontally directed, a Z base 123 for moving the lifter in the vertical direction (Z direction), and the Z base 123 itself is moved in the longitudinal direction (X direction) of the cleaning processing apparatus. And an X base 124 for moving the arms 121a, 1
21b with the upper side edges of the carrier C placed on the arms 121a, 121b.
It is configured so that it can be pinched and transferred to the relay section 140 shown in FIG.

The relay section 130, as shown in FIG.
The holding unit 1 fixed on the top plate 132 via the columns 131
33, and a holding portion 135 supported by a movable column 134 that is movable in the Y direction with respect to the top plate 132, respectively, connected in the Y direction. Each of these holding portions 13
Reference numerals 3 and 135 have a shape that allows them to pass through the lower opening of the carrier C. Further, a part of the peripheral edge of the wafer W is inserted into the upper surfaces of the holding portions 133 and 135, respectively, and they are erected substantially vertically. As described above, a predetermined number of arc-shaped holding grooves 136 are formed, for example, 25 corresponding to the number of wafers of the carrier C stored. And the above-mentioned support pillar 1
31 and four locking members 137 for locking the corners of the lower end of the carrier C are provided on the top plate 132 near the bases of the movable column 134.

Then, the wafer transfer device 140 for holding the wafers W held by the holding parts 133 and 135 collectively and transferring the wafers W to the cleaning processing part 200.
Are configured as shown in FIG. That is, the wafer transfer device 140 includes, for example, a pair of left and right gripping members 141a and 141 for collectively gripping 50 wafers.
The wafer chuck 142 configured by b, the support body 143 that supports the wafer chuck 142, and the support body 143 are moved up and down in the vertical direction (Z direction).
A drive mechanism 144 that moves in the front-back direction (Y direction),
This drive mechanism 144 is connected to the longitudinal direction (X
And a transfer base 145 (see FIG. 2) for moving along the direction.

The gripping members 141a and 141b of the wafer chuck 142 are symmetrical with each other.
The rotation shafts 146a and 146b are rotatably supported by the support body 143, and can be opened and closed.
Further, the upper ends of the aluminum gripping members 141a and 141b are fixed to the rotating shafts 146a and 146b, and between the lower ends of the gripping members 141a and 141b, upper and lower quartz grips are provided. Bars 147a, 147b, 1
48a and 148b are passed in parallel. On the surface of each of the gripping rods 147a, 147b, 148a, 148b,
For example, 50 holding grooves 149 into which the peripheral portion of the wafer W is inserted are formed. Then, each gripping member 141a,
By rotating the rotary shafts 146a and 146b, the 141b has gripping bars 147a, 147b, 148a,
The wafer W is gripped at 148b and can be transferred to a desired position in the vertical direction (Z direction) and the longitudinal direction (X direction).

The transport device 140 includes cleaning units 201a, 201b, ..., 201n, which will be described later.
Is installed corresponding to the above, and by moving the transfer base 145, a lot consisting of a predetermined number of wafers can be transferred.
For example, the wafer transfer device 140a is used to load the loader unit 100.
And the primary cleaning unit 201a of the cleaning processing unit 200
, Between the primary cleaning unit 201a and the secondary cleaning unit 201b, or between the primary cleaning unit and the secondary cleaning unit by the wafer transfer device 104b, or by the wafer transfer device 140n. Wafers can be transferred in lot units between the cleaning tanks 140n and between the nth cleaning unit 201n and the unloader unit 300. Then, via a secondary washing tank (interface tank) 204 described later,
Wafers are transferred between the adjacent cleaning units 140, and a predetermined chemical solution tank 202 or water cleaning tank 2 is used.
Wafer holders 21 to be described later, which are provided in 04 and 205.
2 (see FIG. 4) so that the wafer can be transferred.

Next, the cleaning processing section 200 will be described. In the cleaning processing section 200, as shown in FIG. 1, a plurality of cleaning units 201a, 201b, ..., 201n are sequentially arranged from a primary cleaning unit to an n-th cleaning unit. Is configured. Each cleaning unit 201 is composed of, for example, a chemical solution tank 202, a primary water cleaning tank 203, and a secondary water cleaning tank 204. After chemical solution cleaning in the chemical solution tank 202, pure water is applied to the wafer W in the primary water cleaning tank 203 and the secondary water cleaning tank 204. After cleaning the attached chemical liquid, the wafer transfer device 140 described above can transfer the chemical liquid to a cleaning unit further downstream. Further, at the most downstream side of the cleaning processing section 200, a final water washing tank 205 for performing final cleaning with pure water and a drying processing tank 206 for vapor-drying the cleaned wafer with, for example, IPA (isopropyl alcohol). Are sequentially arranged so that a series of cleaning processes can be performed.

In each chemical solution tank 201, a predetermined chemical solution is introduced and a chemical solution cleaning process is performed according to the type of contamination adhering to the wafer surface, such as organic impurities and metal impurities. For example, so-called SC1 cleaning can be performed with a mixed solution of ammonia water and hydrogen peroxide water with respect to organic matter contamination. In addition, the so-called H
It is possible to remove the natural oxide film and metal impurities by F cleaning. Further, by performing so-called SC2 cleaning with a mixed solution of hydrochloric acid and hydrogen peroxide, it is possible to grow a clean natural oxide film while removing metal impurities attached to bare silicon. And a typical cleaning method based on hydrogen peroxide, so-called RC
Speaking of A cleaning, SC1 cleaning → HF cleaning → SC2
It is possible to wash the wafer by sequentially performing the washing by the corresponding washing unit.

Next, with reference to FIGS. 4 and 5, the structure of a typical processing tank that can be used in the cleaning apparatus constructed according to the present invention will be described by taking the SC1 cleaning tank 210 as an example. To do. The basic structures of other types of chemical liquid tanks and water washing tanks are the same as those of the SC1 cleaning tank described here, and detailed description thereof will be omitted.

As shown in the figure, the processing bath 210 is a box-shaped processing bath 211 for containing a SC1 cleaning chemical solution composed of a mixture of ammonia water and hydrogen peroxide solution heated to a high temperature, and the inside of this processing bath 211. And the wafer W is placed on, for example, 50
And a wafer holder 212 for holding the wafer vertically.
Further, a cleaning chemical supply port 214 is opened in the bottom portion 213 of the processing bath 211, and the cleaning liquid introduced into the bath through the supply port 214 is used for holding the holder 212 and the bottom portion 2.
It is uniformly supplied to the periphery of the wafer W via the rectifying means 220 interposed between the wafer W and the wafer 13 without generating a turbulent flow.

That is, the rectifying means 220 is composed of a rectifying plate 221 arranged horizontally so as to divide the processing tank 211 into upper and lower parts, and a disc-shaped diffusing plate 222 arranged above the supply port 214. It is configured. A large number of small holes 223 are bored in the rectifying plate 221, and the chemical liquid introduced from the supply port 214 first collides with the back surface of the diffusing plate 222, and the rectifying plate 221 moves from the periphery of the diffusing plate 222. The wafer W is diffused over the entire back surface, then passes through the small holes 223 of the rectifying plate 221, and is supplied to the periphery of the wafer W held by the wafer holder 212, so that the wafer W is uniformly flown without causing turbulence. Is configured so that the entire wafer W can be uniformly cleaned.

Further, the processing bath 210 receives an inner bath 215 in which the wafer holder 212 is housed and the wafer W can be immersed in the processing liquid, and a processing liquid overflowing from the upper end of the inner bath 215. A chemical solution circulation path 218 is connected between the supply port 214 provided at the bottom 213 of the inner tank 215 and the discharge port 217 provided at the bottom of the outer tank 216. It
A circulation pump P, a filter F, and a waste liquid valve V are provided in the chemical liquid circulation path 218, and the outer tank 21 is provided.
The chemical liquid overflowing from No. 6 is cleaned and circulated and supplied to the inner tank 215 again, and the waste liquid valve V can be opened to perform waste liquid if necessary. Further, a chemical liquid / pure water supply pipe line 219 is connected to the circulation pump P, so that a new chemical liquid or pure water can be supplied to the processing tank 210 as needed.

Then, the inner tank 21 of the processing tank 210
5 and above the exhaust port 2 as shown in FIGS.
30 is provided, and the chemical liquid evaporated and vaporized in the processing tank 210 can be appropriately exhausted by an exhaust means 231 such as a vacuum pump.

Further, an openable lid 240 is inserted in the upper opening of the processing bath 210.
By closing 0, it is possible to prevent vaporization and diffusion of the processing liquid during processing, and also to prevent contaminants and dust from mixing into the processing tank 210 from the outside. As shown in FIGS. 5 and 6, the lid 240 is fixed to a pair of fixed open / close arms 242 projecting from two rotary shafts 241 pivotally mounted on the side wall of the processing bath 210. It is composed of a lid body 243, and the pair of lid bodies 243 can be opened and closed by rotating the rotary shaft 241 with a predetermined time delay by a drive motor (not shown).

The cleaning processing unit 200 is configured as described above, and further downstream of the cleaning processing unit 200, the unloader unit 300 that returns the wafer W, which has been cleaned, to the carrier C and carries it out of the apparatus. The unloader unit 300 has the same basic configuration as the loader unit 100, and the processed wafer W is carried out of the apparatus by reversing the steps performed in the loader unit 100. It is possible. Therefore, detailed description is omitted here.

The cleaning processing apparatus 1 to which this embodiment is applied is
A series of operations for cleaning a certain lot, which is configured as described above, will be described. First, the carriers C1 and C2, which store 25 unprocessed wafers W each, are placed on the loading position of the station 112 of the placing unit 110 of the loader unit 100 by a transfer robot (not shown).

Then, the carrier C is moved by the moving mechanism 115.
While sequentially clamping C1 and C2 and aligning the orientation flat,
The station 112 is sequentially moved to the transfer position. The transfer device 12 is placed at the transfer position.
The arms 121a and 121b of the carrier C1 and C
The Z base 123 is moved in the X direction to the relay section 130 while holding the two simultaneously, and the holding section 13 of the relay section 130 is held.
3, 135 is moved upward in the Z direction, and carriers C1 and C
The wafer W in 2 is transferred onto the holders 133 and 135.
After that, the transferred wafers W are aligned by the orientation flat portion provided with the alignment device 116, and a predetermined number of wafers W, for example, a row of 50 wafers W, is set as one lot, and the subsequent cleaning process is awaited.

Subsequently, the primary wafer transfer device 1 shown in FIG.
40a moves to the relay unit 130, holds the wafers W aligned by the wafer chuck 142 shown in FIG. 3 in lot units, and conveys them to the SC1 cleaning tank 202a of the primary cleaning unit 201a. Processing tank 21 shown in
The treatment liquid in 0 is placed on a holding unit 212 provided in advance in lot units. Then, after introducing a predetermined chemical solution into the processing bath 210 and performing a predetermined SC1 cleaning on the wafer W, the wafer W is taken out again by the wafer chuck 142 and transferred to the primary water washing bath 203a, where It is transferred to the holding part 212 provided in the cleaning tank 203, and primary cleaning with pure water is performed. Then, by the same method, the wafer W after cleaning with pure water is sent to the secondary water cleaning tank 204a (FIG. 1), and secondary cleaning with pure water is performed to completely clean the chemical liquid adhering to the wafer W. The secondary washing tank 204a is also referred to as an interface tank, and is located between adjacent cleaning units where cleaning is performed with another type of chemical solution, and has a function as a buffer for preventing mixing of both chemical solutions. According to the embodiment shown in the drawings, the wafer W that has undergone SC1 cleaning in the chemical solution tank 201a has undergone the primary water rinsing and then the subsequent secondary cleaning in the secondary water rinsing tank 204a which is the interface tank. Wait for HF cleaning in the unit 201b.

Then, the wafer W is taken out from the secondary water washing tank 203a of the primary cleaning unit 201b by the secondary wafer transfer device 140b which is in charge of the secondary cleaning unit 201b, and the HF of the secondary cleaning unit 201b for HF cleaning is taken out.
It is transported to the chemical liquid tank 202b. After the predetermined chemical solution treatment, primary cleaning is performed in the primary water washing tank 203b, and further, in the secondary water washing tank 204b which is the interface tank, the emptying of the cleaning process of the subsequent process is waited. Hereinafter, similar steps are repeated to perform SC2 cleaning and other necessary cleaning processing. Next, the wafer W is sent to the final washing tank 205 by the n-th wafer transfer device 140n, where it is subjected to the final washing treatment with pure water, and then to the drying treatment tank 206, where it is subjected to vapor drying treatment with IPA. After that, it is carried out of the apparatus via the unloader unit 300.

The above is the flow of the cleaning processing for a certain lot by the cleaning processing apparatus 1 to which the present invention can be applied. In general, the processing flow as described above is performed by the controller 26.
It is performed according to the processing recipe preset and input to 0.
As shown in FIG. 1, the controller 260 includes an operator screen 261 and input means 2 such as a keyboard and a mouse.
It is composed of a personal computer or a workstation equipped with 62, and the operator operates the cleaning device in the manual mode or the automatic mode by inputting a predetermined command according to the operation screen as shown below. It is possible.

7 to 9 are hierarchical system diagrams of the screen control system to which the present invention can be applied. As shown in the figure, the operator screen that can be shown in the main menu is divided into a general operator menu and a menu for specialized operators such as engineers. Then, in the general operator menu, as shown in FIG. 8, a wafer flow start menu, an apparatus information menu, a standby processing menu, a mechanicalize menu,
The processing end menu and the payout processing menu can be selected respectively. Also in FIG.
As shown in, the engineer menu (specialized operator menu) includes a recipe creation menu, a maintenance menu, and a service menu. And in the recipe creation menu, wafer flow recipe menu, equipment parameter menu, fixed parameter menu, tank parameter menu can be selected, and in the maintenance menu, teaching control menu, sensor status menu, alarm logging menu can be selected, Further, the service menu is configured so that a steady screen menu, a password setting menu, and a time setting menu can be selected.

Next, a case where a general operator executes a general cleaning process based on the screen control system configured as described above will be described. When a general operator inputs a power source, a wafer flow start menu, an apparatus information menu, a standby processing menu, a mechanicalization menu, and a processing end menu which can be accessed by a general operator who does not have specialized knowledge as shown in FIG. A main menu screen including a payout processing menu is displayed. Then, on the main menu screen, the general operator first selects the mechanicalize menu as shown in FIG. 10, confirms whether or not there is a wafer in the apparatus, and after confirmation, carries the apparatus, for example, a loader. The transfer device 120 of the unit 100, the transfer device 140 of each cleaning unit 201, and the like are returned to the initial positions, and a new lot can be accepted.

Then, as shown in FIG. 11, the standby menu is selected, and based on the table as shown in FIG. 12, a predetermined chemical solution or pure water is injected / exchanged into each processing tank and the temperature is raised to a predetermined temperature. The temperature of the washing machine is set to standby so that the treatment can be started at any time.

As described above, in the present embodiment, the wafer flow start menu can be selected for the first time as shown in FIG. 13 by executing the mainizing process and the standby process. In the present embodiment, the wafer flow start menu is identified by identifying whether or not the mainizing process and the standby process have been executed by the “*” mark, and deleting the “*” mark by executing each process. Is configured to accept input regarding. In this way, select the wafer flow start menu,
After confirming the lot ID of the wafer and each processing recipe on the screen shown in FIG. 14, by pressing the lot start key, the general cleaning processing as described above is started in the auto mode, and a series of cleaning is performed. After the process is finished
The processed lot is automatically carried out of the unloader unit 300 by the transfer robot.

Then, when stopping the apparatus, as shown in FIG.
In step 5, the treatment end menu is selected, and if necessary, after performing the waste liquid / drainage treatment of the chemical liquid or pure water in each treatment tank, the cleaning treatment device is stopped.

Of the general operator menu,
As shown in FIG. 16, the device information menu is a screen for displaying information related to each device constituting the cleaning device such as a chemical bath or a washing tank, a processing recipe, and lot information on the screen, and confirming the information. is there. The apparatus information menu can be composed of fixed information that is fixedly displayed by the cleaning processing apparatus and user information that the user can select from the itemized information that the cleaning processing apparatus has.

The above-mentioned fixed information includes, for example, "total time" indicating the time after the power is turned on, "production time" indicating the time of the wafer flow, and ratio of performing the wafer flow after the power is turned on. "Productivity" showing (production time / total time) "Device name" showing the name of the device "Display mode" showing the display mode of the device information screen "Showing the current position of the arm and wafer presence / absence information""Arminformation"-"Unitname" that indicates the name of each unit that constitutes the cleaning processing equipment such as the processing tank- "Processing information" that indicates the processing currently being performed by the unit, such as cleaning and rinsing-In the unit A “wafer flow number” indicating a wafer flow number of a certain lot, and a “lot ID” indicating an ID of a lot in the unit can be configured.

As the user information, for example, "processing time" for displaying the remaining time of processing such as cleaning, dipping, and drying, and "processing setting" for displaying the time set for processing such as cleaning, dipping, and drying. "Time" -Displays the measured temperature of the treatment tank for the chemical bath or the measured resistivity value for the washing bath. "Temperature / Low measured value" -Displays the set temperature of the treatment bath for the chemical bath or the set resistivity value for the washing bath. "Low set value" -Displays the DIW tank measurement temperature of the chemical liquid "Tank temperature measurement value" -Displays the DIW tank set temperature of the chemical liquid "Tank temperature set value" -Displays the replacement interval time of the chemical liquid or IPA "Replacement time""Replacementtime" to display the replacement interval time of chemicals and IPA "Replacement time" to display the number of replacement intervals of chemicals and IPA "Chemicals""Replacement setting count" that displays the IPA replacement interval setting time- "Elapsed time" that displays the elapsed time after the replacement of the drug solution or IPA "Elapsed time number" that displays the elapsed time after the replacement of the drug solution or IPA “Wait time” that displays the waiting time until the lot is put in after replacement • “Medication supplement time” that displays the chemical replenishment interval time • “Medication supplement setting time” that displays the chemical replenishment interval setting time Display "Medication Supplement Count" -Display the number of times the chemical replenishment interval is set "Medication Supplement Time" -Display the hydrogen peroxide solution replenishment interval time "Over supplement time" -Display the hydrogen peroxide solution replenishment interval time "Over-compensation setting time" -Displays the number of hydrogen peroxide replenishment intervals "Over-compensation" -Displays the number of hydrogen peroxide replenishment interval settings "Over-completion setting times"-"Pure supplement time" to display pure water replenishment interval time "Pure supplement setting time" to display pure water replenishment interval setting time "Pure supplement number" to display pure water replenishment interval time -It can be configured from "Pure supplement setting number" that displays the set number of pure water replenishment interval.

A typical device information screen is shown in FIGS. 17 and 18. As shown, fixed information and user information are displayed on the device information screen constructed according to the present invention. That is, above the center of the screen, a chart consisting of total time, production time, production availability, device name, character string of display mode, arm information, unit name, processing information, wafer flow number, and lot ID. The fixed information composed of the list table and the fixed list is displayed.
This fixed information is always displayed when the device information screen is displayed, as shown in FIGS. 17 and 18, regardless of the display mode or the display screen.

Below the central portion of the screen, in the screen shown in FIG. 17, user information including process time, process set time, exchange time, exchange set time, number of exchanges, and number of exchange set times, and FIG. In 18 is displayed user information including elapsed time and elapsed time. Such user information is displayed on the user information selection screen shown in FIG.
According to the present invention, items selected to be displayed on the device information screen, and in the illustrated example, items to be displayed on the first screen are processing time, processing setting time, replacement time, replacement setting time, and number of replacements. , The number of times of exchange setting is selected, and the elapsed time and the number of elapsed times are selected as items to be displayed on the second screen. As a result, desired items can be displayed on the screen shown in FIG. 17 corresponding to the first screen and the screen shown in FIG. 18 corresponding to the second screen.

As described above, according to the present invention, in addition to the fixed information, the user information can be displayed by the user's arbitrary selection. Therefore, it is optimal according to the processing condition, the processing environment and the operator type. It is possible to build various device information screens and improve operability.

Further, as shown in FIGS. 17 and 18,
If the selected user information spans two or more screens,
For example, by selecting real-time display as the display mode, each screen can be sequentially displayed at a predetermined cycle, for example, every 30 seconds, and the operator's attention can be called. Alternatively, by selecting fixed display as the display mode, it is possible to always display the information that needs confirmation with priority and to display the information that needs confirmation secondarily by the screen switching key. And according to the present invention,
Since the fixed information that requires the minimum confirmation is displayed on any of the screens, the operator can always confirm the minimum required information.

As a general operator menu, a payout processing menu shown in FIG. 20 is prepared.
This payout processing menu is a menu required when a trouble occurs in any of the processing tanks of the apparatus during processing, and the wafer from the processing tank in which the trouble has occurred is moved to the downstream side thereof according to the screen as shown in FIG. Forcibly delivered to the washing tank of
Alternatively, it is for issuing a command to forcibly carry out the device after the drying process.

The above is a schematic description of the general operator menu for performing the cleaning process according to the preset process flow. The process flow preset in the cleaning processing apparatus is newly set or modified. If the user wishes to do so, after inputting the password in the main menu displayed after the power is input and displaying the password input screen as shown in FIG. 22, the password setting screen shown in FIG. By inputting a password set in advance, it is possible to display a wafer flow recipe menu as shown in FIG. 24, for example.

As described above, in this embodiment, since the password is required to access the menu screen which requires specialized knowledge for operation, a specialized operator (engineer) having specialized knowledge for the menu.
Parameters that differentiate the menu from general operators who do not have specialized knowledge of the menu, prevent unnecessary, inadvertent, or intentional access to the menu, and have a significant impact on system operation. Are configured so that they cannot be modified or tampered with.

Now, the wafer flow recipe menu shown in FIG. 24, which is accessible in this way, is the processing flow necessary for performing the processing by the wafer flow start menu in the general operator menu, that is, the processing flow. This is a menu for creating a file in which a recipe is recorded, and in this embodiment, 40 files can be managed.

On the screen shown in FIG. 24, by designating a file and selecting "1. New creation, edit", a table showing a list of processes corresponding to the respective processing units as shown in FIG. Can be displayed. Then, if the processing conditions are set in advance in each parameter menu to be described later and detailed instructions according to the processing recipe are not necessary, the table is displayed by simply inputting the processing time on the screen shown in FIG. When completed and detailed instructions according to the processing recipe are required, the processing recipe number is input and the table is completed.

When it is necessary to create / correct a processing recipe for each processing unit entered in the above table, the "recipe edit" key is pressed to display a list of registered processing recipes as shown in FIG. Is displayed, and by selecting the processing recipe to be created / modified,
It is possible to display a recipe edit screen as shown in FIG. In the following description, the method of processing the recipe editing screen will be described by taking the recipe editing for the primary cleaning tank with pure water as an example.

As shown in the figure, on this screen, the information relating to the primary washing tank is tabulated along the processing flow, so that the operator can easily handle the mistakes and minimize input errors. Parameters can be set / corrected. Then, as described above, by executing the desired cleaning process by selecting the process recipe edited on the time-series charted screen from the wafer flow start menu on the general operator screen described above. Is possible.

Returning to FIGS. 7 to 9, the recipe creation menu will be described. In the apparatus parameter menu, parameters such as the temperature of each processing tank, the temperature of the deionized water tank, and the warning temperature for issuing an alarm are set. Is possible. Further, in the fixed parameter menu, it is possible to set parameters such as liquid exchange in each tank, tank cleaning conditions, and overflow time. In the tank parameter menu, it is possible to set parameters such as waste liquid conditions and supply conditions for each processing tank. in this way,
Optimal cleaning processing is performed based on the parameters set in these parameter menus and the processing recipe set in the wafer flow recipe menu described above.

Next, the maintenance menu shown in FIGS. 7 to 9 will be described. This menu includes a teaching control menu, a sensor status menu, and an alarm logging menu. Among these, in the teaching control menu, the transport device 140,
Loader unit 100, unloader unit 300, transfer device 120
This is a screen for adjusting the position of the transport system such as, and is displayed when fine adjustment is required regarding the initial position and operation of the apparatus. In addition, the sensor status menu displays the status of the sensors installed in each part of the cleaning equipment,
This is a screen necessary for adjusting the state of the sensor if necessary. Incidentally, in the cleaning processing apparatus according to the present embodiment,
Information such as time, code, and status of all alarms generated in the device is recorded, and such information can be displayed in the alarm logging menu and is referred to during maintenance.

Next, the service menu shown in FIGS. 7 to 9 will be described. This menu includes a steady screen setting menu, a password setting menu, and a time setting menu. The cleaning apparatus according to the present embodiment has a function of automatically displaying the designated screen when the key operation is not performed for a certain period of time. In the steady screen setting menu, the steady screen shown in FIG. 28 is displayed. It is possible to set the item to be displayed and the time required for switching. Further, according to the present invention, the engineer menu screen and the recipe creation screen are protected by a password from a careless operator. However, when it is necessary to change these passwords, as shown in FIG.
It is possible to carry out the change work on the password setting menu screen shown in FIG. Further, the service menu is provided with a time setting menu screen, and the time of the clock built in the cleaning processing apparatus can be changed if necessary.

By the way, the menu for specialized operators, that is, the menu for recipe creation, the menu for maintenance, and the menu for services are generally operated manually by a specialized operator having specialized knowledge. However, for some reason, if a specialized operator sits in the middle of a room, the menu, which should not be accessible to humans other than the specialized operator, would be exposed to a third party unprotected. Is
The processing recipe may be modified or tampered with. Therefore, the present invention provides a regular screen as described above, that is, for a general operator who is permitted to access even a person other than a specialized operator in the regular screen setting menu shown in FIG. 28. By selecting a menu such as wafer flow start, device information, standby processing, mechanical initialization, and processing end beforehand as stationary screens, a steady operation is automatically performed when there is no key input for a predetermined time, for example, 50 seconds in the specialized operator menu. It is possible to return to the screen. As a result, it is possible to minimize the possibility that a third party other than the specialized operator can access the specialized operator menu, and maintain the system.

As described above, the interface between the control system for driving the cleaning processing apparatus 1 and the operator is configured, and the operator screen 26 of the controller 260 is configured.
The operator can drive in various modes by instructing a predetermined processing flow based on various menus displayed in 1. In this case, according to the present invention, the menu for the specialized operator is protected by the normal screen return mode, and it is configured so that it is difficult for the general operator to access, so the system is maintained.
Further, since the device information screen can be optimally configured by the user's selection, operability is improved.

In the above embodiment, the cleaning processing apparatus in which the cleaning unit composed of one chemical liquid tank and two water cleaning tanks is combined has been described, but the present invention is not limited to this example, and for example, chemical liquids of the same kind can be used. The present invention can be applied to a cleaning device that combines various processing tanks, such as a cleaning unit including a plurality of chemical liquid tanks for performing the treatment according to (1) or a cleaning unit including only one water cleaning tank.

In the above description, one embodiment of the present invention has been described by taking the cleaning processing apparatus for semiconductor wafers as an example. However, the present invention is not limited to this and, for example, LCD substrates and other parts and members. Of course, it can be applied to a cleaning processing device for cleaning the. Furthermore, the present invention is not limited to the cleaning processing apparatus, and various processing apparatuses for performing a predetermined processing on an object to be processed such as a semiconductor wafer and an LCD substrate according to a preset processing flow, for example, an etching apparatus. It is also possible to apply it to the operator screen for controlling the film forming apparatus and the film forming apparatus. Even in that case, the system maintenance can be achieved by differentiating the operator with specialized knowledge from the general operator. It is possible.

[0068]

As described above, according to the present invention,
For example, even when a specialized operator leaves his / her seat while creating a processing recipe, a device for displaying a control screen that can be operated by a general operator and various kinds of information regarding the device when a key input by the specialized operator does not occur for a predetermined time. Since the normal screen automatically selected from the information screen is automatically returned, it is possible to minimize the possibility that a general operator other than the specialized operator will access a screen other than the permitted screen.

Further, the stationary screen is, for example, a cleaning process flow start instruction screen for instructing the start of the cleaning process flow, a device initialization screen for instructing the initialization of each device, and each processing tank is set in a state in which the object can be received. Such as a process standby screen that instructs you to
By setting a screen that is frequently used or a screen that has a low risk of being accessed by a third party, it is possible to improve operability or system maintainability.

Further, by adopting a device information screen for displaying various information about the device as the operator screen, the operator can appropriately confirm the status of the device. In that case, the device information is displayed. To
By including fixed information that is fixedly displayed by the processing device and user information that includes items preselected by the user from the itemized information that the processing device has, it is possible to flexibly adapt to the processing environment or the operator. A device information screen can be constructed. And by adopting such a device information screen as the regular screen,
It is possible to improve the operability because the system can be maintained and the status of the device can be appropriately grasped.

By displaying the general operator screen, especially the device information screen on one screen, visual recognition is facilitated and operability can be improved. However, even if these steady screens extend over two or more screens, by configuring each screen to be sequentially switched at a predetermined cycle, visual recognition becomes easy,
The operability can be improved.

[Brief description of drawings]

FIG. 1 is a schematic perspective view showing an embodiment of a cleaning processing apparatus configured according to the present invention.

FIG. 2 is an enlarged perspective view showing an example of a loader section of the cleaning processing apparatus shown in FIG.

FIG. 3 is an enlarged perspective view showing an example of a wafer transfer device of the cleaning processing apparatus shown in FIG.

FIG. 4 is a perspective view schematically showing an example of a part of the cleaning processing tank of the cleaning processing apparatus shown in FIG.

5 is a schematic cross-sectional view showing a state of the cleaning treatment tank shown in FIG.

FIG. 6 is a perspective view schematically showing a state in which the lid of the cleaning treatment tank shown in FIG. 4 is closed.

FIG. 7 is a first hierarchical system diagram showing a hierarchical structure of an operator screen adopted according to the present invention.

FIG. 8 is a second hierarchical system diagram showing a hierarchical structure of an operator screen adopted according to the present invention.

FIG. 9 is a third hierarchical system diagram showing a hierarchical structure of an operator screen adopted according to the present invention.

FIG. 10 is an explanatory diagram showing an example of a main menu menu screen for selecting a main menu, which is one of operator screens adopted according to the present invention.

FIG. 11 is an explanatory diagram showing an example of a standby processing menu selection screen of a main menu among operator screens adopted according to the present invention.

FIG. 12 is an explanatory diagram showing an example of a standby processing menu screen among the operator screens adopted according to the present invention.

FIG. 13 is an explanatory diagram showing an example of a wafer flow start menu selection screen of a main menu among operator screens adopted according to the present invention.

FIG. 14 is an explanatory diagram showing an example of a wafer flow start menu screen among operator screens adopted according to the present invention.

FIG. 15 is an explanatory diagram showing an example of a processing end menu selection screen of a main menu among operator screens adopted according to the present invention.

FIG. 16 is an explanatory diagram showing an example of the device information menu selection screen of the main menu among the operator screens adopted according to the present invention.

FIG. 17 is an explanatory diagram showing an example of a first device information screen of the operator screens adopted based on the present invention.

FIG. 18 is an explanatory diagram showing an example of a second device information screen of the operator screen adopted according to the present invention.

FIG. 19 is an explanatory diagram showing an example of a user information selection screen displayed in the device information of the operator screen adopted according to the present invention.

FIG. 20 is an explanatory diagram showing an embodiment of a main menu start / stop process menu selection screen of operator screens adopted according to the present invention.

FIG. 21 is an explanatory diagram showing an example of a payout menu screen among operator screens adopted according to the present invention.

FIG. 22 is an explanatory diagram showing a password setting screen displayed after the password is input in the main menu of the operator screen adopted according to the present invention.

FIG. 23 is an explanatory diagram showing a password setting screen of a service menu among operator screens adopted according to the present invention.

FIG. 24 is an explanatory diagram showing an example of a wafer flow recipe screen among operator screens adopted according to the present invention.

FIG. 25 is an explanatory diagram showing an example of a wafer flow edit screen among operator screens adopted according to the present invention.

FIG. 26 is an explanatory diagram showing an example of a file selection menu selection screen for the primary washing recipe of the main menu among the operator screens adopted according to the present invention.

FIG. 27 is an explanatory diagram showing an example of the primary water washing recipe menu selection screen of the main menu among the operator screens adopted according to the present invention.

FIG. 28 is an explanatory diagram showing an example of a steady screen setting menu of the operator screen adopted according to the present invention.

[Explanation of symbols]

1 Cleaning equipment 100 loader section 110 Placement section 130 Relay unit 140 Wafer transfer device 200 Cleaning unit 201 cleaning unit 202 chemical tank 203 Primary washing tank 204 Secondary washing tank (interface tank) 260 controller 261 Operator screen 262 keyboard 300 Unloader section

Claims (18)

(57) [Claims] 1. A one or more chemical liquid tank for cleaning a target object with a loader section for carrying the target object into the apparatus and an unloader section for carrying the target object out of the apparatus. A plurality of processing tanks including at least one or two or more water washing tanks for cleaning the object to be purified water, and a dryer for drying the object to be processed are sequentially arranged between the loader section and the unloader section. A screen processing method for an operator for controlling a cleaning processing apparatus comprising: a control screen operable by a general operator and a device information screen displaying various information related to the device. A screen processing method for a cleaning processing apparatus, comprising: a screen setting step; and a step of returning to a preselected steady screen when a predetermined time has elapsed without any key input. 2. A loader unit in which an object to be processed is carried into the apparatus.
Equipped with One or more chemical solution tanks for cleaning the object to be treated with the chemical solution;
Fewer one or more washing tanks for washing the treated body with pure water
A plurality of treatment tanks including at least one, and a drying treatment for drying the object to be treated.
It controls the cleaning processing equipment that consists of a dryer and a sequential arrangement.
Screen processing method for operators for Control screens and devices that can be operated by general operators
From the device information screen that displays various information related to
A steady screen setting process of selecting a screen in advance, If there is no key input for a predetermined time, it will be selected in advance.
The process of returning to the selected steady screen, Screen processing method of cleaning processing device, characterized by comprising
Law. 3. An unloading device for carrying out an object to be processed out of the apparatus.
Equipped with da part, One or more chemical solution tanks for cleaning the object to be treated with the chemical solution;
Fewer one or more washing tanks for washing the treated body with pure water
A plurality of treatment tanks including at least one, and a drying treatment for drying the object to be treated.
It controls the cleaning processing equipment that consists of a dryer and a sequential arrangement.
Screen processing method for operators for Control screens and devices that can be operated by general operators
From the device information screen that displays various information related to
A steady screen setting process of selecting a screen in advance, If there is no key input for a predetermined time, it will be selected in advance.
The process of returning to the selected steady screen, Screen processing method of cleaning processing device, characterized by comprising
Law. 4. The control screen operable by the general operator is at least a cleaning process flow start instruction screen for instructing the start of a cleaning process flow, a device initialization screen for instructing initialization of each device, and each processing tank. 4. The cleaning processing apparatus according to claim 1 , further comprising: a processing standby screen for instructing the processing target to be in an object accepting state, and a processing end screen for instructing termination of the processing. Screen processing method. 5. An apparatus information screen for displaying various kinds of information about the apparatus includes fixed information fixedly displayed by the processing apparatus and items preselected by the user from itemized information held by the processing apparatus. 4. The user information according to claim 1, 2 or 3 , characterized in that
A screen processing method for the cleaning processing apparatus described in any one thereof . 6. The screen processing method for a cleaning processing apparatus according to claim 1 , wherein the stationary screen is displayed within one screen. 7. The stationary screen is displayed over two or more screens, and each stationary screen is sequentially switched at a predetermined time period, according to any one of claims 1 to 5. Screen processing method of the on-board cleaning processing device. 8. A one or two or more chemical solution tanks, each of which comprises a loader section for loading an object to be processed into the apparatus and an unloader section for unloading the object to be processed out of the apparatus. A plurality of processing tanks including at least one or two or more water washing tanks for cleaning the object to be purified water, and a dryer for drying the object to be processed are sequentially arranged between the loader section and the unloader section. A method for processing an operator screen for controlling a cleaning processing device comprising: a device information screen displaying at least various information about the device as the operator screen; and further, a cleaning process as the device information screen. Fixed information that is fixedly displayed by the processing device, and user information that includes items preselected by the user from among the itemized information that the cleaning processing device has, Screen processing method of purification processing equipment. 9. A loader unit in which an object to be processed is carried into the apparatus.
Equipped with One or more chemical solution tanks for cleaning the object to be treated with the chemical solution;
Fewer one or more washing tanks for washing the treated body with pure water
A plurality of treatment tanks including at least one, and a drying treatment for drying the object to be treated.
It controls the cleaning processing equipment that consists of a dryer and a sequential arrangement.
Screen processing method for operators for As the operator screen, at least regarding the device
Display the device information screen that displays various information, and then
The equipment information screen for the
Fixed information shown and itemized information held by the cleaning device
Of the items preselected by the user from the
Of the cleaning processing device, which is characterized by displaying the information and
Screen processing method. 10. An unloader for transporting an object to be processed out of the apparatus.
Equipped with a feeder section, One or more chemical solution tanks for cleaning the object to be treated with the chemical solution;
Fewer one or more washing tanks for washing the treated body with pure water
A plurality of treatment tanks including at least one, and a drying treatment for drying the object to be treated.
It controls the cleaning processing equipment that consists of a dryer and a sequential arrangement.
Screen processing method for operators for As the operator screen, at least regarding the device
Display the device information screen that displays various information, and then
The equipment information screen for the
Fixed information shown and itemized information held by the cleaning device
Of the items preselected by the user from the
Of the cleaning processing device, which is characterized by displaying the information and
Screen processing method. 11. The device information screen is displayed in one screen, as claimed in claim 8, 9, or 10.
A screen processing method of the cleaning processing apparatus according to any one of the above. 12. The apparatus information screen is displayed over two or more screens, each device information screen, characterized in that the sequentially switched at a predetermined time period, also claim 8,9
Is a screen processing method of the cleaning processing apparatus according to any one of 10 . 13. A method of displaying an operator screen for controlling a processing apparatus for processing an object to be processed according to a preset processing flow, wherein a control screen operable by an operator and various kinds of information regarding the apparatus are displayed. The constant screen setting step of preselecting a normal screen from the device information screens to be performed, and the step of returning to the preselected normal screen when a state without key input has elapsed for a predetermined time. , A screen processing method of a processing device. 14. The screen processing method of the processing apparatus according to claim 13 , wherein the stationary screen is displayed within one screen. 15. The screen processing method according to claim 13 , wherein the stationary screen is displayed over two or more screens, and each stationary screen is sequentially switched at a predetermined time cycle. 16. A method for displaying an operator screen for controlling a processing device that processes an object to be processed according to a preset processing flow, wherein the operator screen displays at least various information about the device. The information screen includes an information screen, and the device information screen is composed of fixed information that is fixedly displayed by the processing device and user information that includes items preselected by the user from the itemized information that the processing device has. A screen processing method for a processing device, comprising: 17. The screen processing method for a processing device according to claim 16 , wherein the device information screen is displayed within one screen. 18. The screen processing method of a processing device according to claim 16 , wherein the device information screen is displayed over two or more screens, and each device information screen is sequentially switched at a predetermined time cycle. .