JP2001195987A - Member for plasma display and method of manufacturing the same, and plasma display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a member for plasma display and method of manufacturing the same which has a good coating property of a phosphor material to top parts of assistant barrier ribs and which prevents the stripping, the breaking of wire, the deformation of a shape after sintering in case that the assistant barrier ribs are larger than a width between barrier ribs. SOLUTION: In this member for plasma display, an address electrode and barrier ribs are formed on a substrate, and assistant barrier ribs are formed perpendicularly to the barrier ribs, and also stripe shapes of notches are formed at top parts of the assistant barrier ribs in parallel direction to the assistant barrier ribs.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a member for a plasma display used for a wall-mounted television or a large monitor and a method for manufacturing the member for a plasma display, and more particularly to improving the brightness of a plasma display panel and improving the display quality of the panel. The present invention relates to a plasma display member, a method of manufacturing the same, and a plasma display.

[0002]

2. Description of the Related Art A plasma display panel (hereinafter referred to as PD) is used as a display which can be used for a thin and large-sized television.
P). In a PDP, for example, a plurality of pairs of sustain electrodes are formed of a material such as silver, chromium, aluminum, or nickel on a glass substrate on a front plate side serving as a display surface. Further, a dielectric layer mainly composed of glass is formed in a thickness of 20 to 50 μm to cover the sustain electrode, and an MgO layer is formed to cover the dielectric layer. On the other hand, a plurality of address electrodes are formed in a stripe shape on the glass substrate on the back plate side, and a dielectric layer mainly composed of glass is formed so as to cover the address electrodes. A partition for dividing discharge cells is formed on the dielectric layer, and a phosphor layer is formed in a discharge space formed by the partition and the dielectric layer. In a PDP capable of full-color display, the phosphor layer is formed of a material that emits light of each color of RGB. The front plate and the back plate are sealed so that the sustain electrodes of the glass plate on the front plate and the address electrodes on the back plate are orthogonal to each other, and are formed of helium, neon, xenon, etc. in the gap between those substrates. A rare gas is sealed to form PDP. Since the pixel cell is formed around the intersection of the scan electrode and the address electrode, PD
P has a plurality of pixel cells and can display an image.

When a display is performed on a PDP, when a voltage higher than a discharge starting voltage is applied between a sustain electrode and an address electrode in a selected pixel cell from a state where no light is emitted, cations and electrons generated by ionization are removed. Since the pixel cell is a capacitive load, it moves in the discharge space toward the electrode of the opposite polarity and is charged on the inner wall of the MgO layer, and the charge on the inner wall is not attenuated due to the high resistance of the MgO layer. It remains as wall charges.

Next, a sustaining voltage is applied between the scan electrode and the sustain electrode. Where there is a wall charge,
It is possible to discharge even at a voltage lower than the discharge starting voltage.
The xenon gas in the discharge space is excited by the discharge,
Ultraviolet light of 7 nm is generated, and the ultraviolet light excites the fluorescent substance, thereby enabling light emission display.

[0005] In such a PDP, it is important to increase the luminance when the fluorescent screen is illuminated. As means for increasing the luminance, Japanese Patent Application Laid-Open No. H10-321
No. 148, an auxiliary partition is provided in addition to the partition, and a fluorescent screen is also formed on the surface of the auxiliary partition to increase a light emitting area of the fluorescent screen, thereby allowing ultraviolet rays to efficiently act on the fluorescent screen.
It has been proposed to increase the brightness.

[0006]

When a phosphor layer is formed on such an auxiliary partition wall, it is important to apply a desired amount of phosphor on the top of the auxiliary partition wall.

However, when a phosphor paste is printed or applied to a conventional plasma display member having an auxiliary partition formed thereon, the phosphor paste printed or applied on the top of the auxiliary partition tends to be dripped, and a desired amount of phosphor layer is formed. Becomes difficult. In addition, if there is a large difference between the width of the partition and the width of the auxiliary partition, there is a problem that the partition is deformed or broken due to a difference in firing shrinkage between the two.

[0008]

SUMMARY OF THE INVENTION Therefore, the present invention provides a structure in which the phosphor paste is applied to the top of the auxiliary partition wall and the width of the partition wall is different from that of the auxiliary partition wall. An object of the present invention is to provide a method of manufacturing a member for a plasma display, which does not cause peeling, disconnection, or shape change after firing even when the thickness is large, and a plasma display member.

[0009]

That is, the present invention relates to a plasma display member having an address electrode and a partition formed on a substrate, wherein an auxiliary partition is formed in a direction perpendicular to the partition, and an auxiliary partition is formed on the top of the auxiliary partition. A gist of the present invention is a member for a plasma display, in which a stripe-shaped cut is formed in a direction parallel to a partition wall.

The present invention also relates to a method for manufacturing a member for a plasma display, comprising a step of applying a photosensitive paste on a substrate and exposing through a photomask, wherein the photomask has at least a stripe-shaped translucent pattern. A gist of the method for manufacturing a member for a plasma display, wherein a photomask A having one light-shielding line and a photomask B having a linear stripe pattern are combined.

The present invention also provides a plasma display using the above-described plasma display member or the obtained plasma display member as a back plate.

[0012]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in accordance with a PDP manufacturing procedure. As the substrate used for the back plate as the member for PDP of the present invention, in addition to soda glass, PDP
"PD200" manufactured by Asahi Glass Co., Ltd. or "PP8" manufactured by Nippon Electric Glass Co., Ltd., which is a heat-resistant glass for use.

An address electrode is formed on a glass substrate by using a metal such as silver, aluminum, chromium or nickel. As a method of forming, a method of pattern-printing a metal paste containing these metal powders and an organic binder as main components by screen printing, or after applying a photosensitive metal paste using a photosensitive organic component as an organic binder, A photosensitive paste method in which pattern exposure is performed using a photomask, unnecessary portions are dissolved and removed in a developing step, and further, heating and baking at 400 to 600 ° C. to form a metal pattern can be used. In addition, an etching method in which a metal such as chromium or aluminum is sputtered on a glass substrate, a resist is applied, and the resist is subjected to pattern exposure / development, followed by etching to remove an unnecessary portion of the metal by etching. Electrode thickness is 1-10μ
m is preferable, and 2 to 5 μm is more preferable. If the electrode thickness is too thin, the resistance value tends to be large and accurate driving tends to be difficult. If the electrode thickness is too thick, a large amount of material is required, which tends to be disadvantageous in cost. The width of the address electrode is preferably 20 to 200 μm, more preferably 30 to 100 μm. If the width of the address electrode is too small, the resistance value tends to be high and accurate driving tends to be difficult. If the address electrode is too thick, the distance between adjacent electrodes is small, and short-circuit defects tend to occur. Further, the address electrodes are formed at a pitch corresponding to the display cell (the area where each RGB of a pixel is formed). 100-500 μm for normal PDP, high-definition P
DP is preferably formed at a pitch of 100 to 400 μm.

Next, a dielectric layer is preferably formed. The dielectric layer is formed by applying a glass paste containing glass powder and an organic binder as main components so as to cover the address electrodes.
It can be formed by firing at 00 to 600 ° C. As the glass paste used for the dielectric layer, a glass powder containing at least one kind of lead oxide, bismuth oxide, zinc oxide, and phosphorus oxide, and a total of 10 to 80% by weight of these can be preferably used. When the content is 10% by weight or more, baking at 600 ° C. or less is facilitated, and when the content is 80% by weight or less, crystallization is prevented and a decrease in transmittance is prevented. A paste can be prepared by kneading these glass powders with an organic binder. As the organic binder to be used, cellulose compounds such as ethyl cellulose and methyl cellulose, and acrylic compounds such as methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, methyl acrylate, ethyl acrylate, and isobutyl acrylate can be used. Further, additives such as a solvent and a plasticizer may be added to the glass paste. As the solvent, general-purpose solvents such as terpineol, butyrolactone, toluene, and methylcellosolve can be used. Further, dibutyl phthalate, diethyl phthalate, or the like can be used as the plasticizer.
By adding filler components other than glass powder,
A PDP with high reflectance and high luminance can be obtained.
As the filler, titanium oxide, aluminum oxide, zirconium oxide and the like are preferable, and the particle diameter is 0.05 to 3 μm.
It is particularly preferable to use titanium oxide. The content of the filler is glass powder: filler ratio of 1: 1 to 10:
1 is preferred. By setting the content of the filler to one-tenth or more of the glass powder, it is possible to obtain the effect of improving the luminance. In addition, the sinterability can be maintained by setting the equivalent amount of the glass powder or less. Further, by adding the conductive fine particles, a PDP with high reliability at the time of driving can be manufactured. The conductive fine particles are preferably metal powders such as nickel and chromium, and the particle diameter is preferably 1 to 10 μm.
A sufficient effect can be exhibited by setting the thickness to 1 μm or more,
By setting it to m or less, irregularities on the dielectric can be suppressed to facilitate the formation of the partition walls. The content of these conductive fine particles in the dielectric layer is preferably 0.1 to 10% by weight. Effectiveness can be obtained by adjusting the content to 0.1% by weight or more, and short-circuiting between adjacent address electrodes can be prevented by setting the content to 10% by weight or less. The thickness of the dielectric layer is preferably 3 to 30 μm, more preferably 3 to 1 μm.
5 μm. If the thickness of the dielectric layer is too small, the number of pinholes tends to increase. If the thickness is too large, the discharge voltage tends to increase and the power consumption tends to increase.

The member for a plasma display of the present invention comprises:
On the substrate or the dielectric layer, partition walls for partitioning the discharge cells and auxiliary partition walls perpendicular to the partition walls (or address electrodes) are formed. FIG. 1 is a perspective view showing an example of the shape of a partition and an auxiliary partition formed in the present invention. In FIG. 1, reference numerals 1A, 1B and 1C denote partition walls, 2A, 2B and 2C, auxiliary partition walls, 3 a dielectric layer, 4 an address electrode, and 5 a glass substrate. The partition walls 1A, 1B, and 1C are formed in a direction parallel to the address electrodes.

The cross-sectional shape of the partition can be trapezoidal or rectangular. The height of the partition wall is preferably 80 μm to 200 μm. When the thickness is 80 μm or more, it is possible to prevent the phosphor and the scan electrode from coming too close to each other, and to prevent the phosphor from being deteriorated due to discharge. When the thickness is 200 μm or less, the distance between the discharge at the scan electrode and the phosphor can be reduced, and sufficient luminance can be obtained. The pitch (P) is 1
Those having a size of 00 μm ≦ P ≦ 500 μm are often used. In the high definition plasma display, the pitch (P) of the partition walls is 100 μm ≦ P ≦ 250 μm. 10
When the thickness is 0 μm or more, a sufficient discharge space can be obtained and sufficient luminance can be obtained. When the thickness is 500 μm or less, fine and clear images with fine pixels can be displayed. By setting the thickness to 250 μm or less, a beautiful video at an HDTV (high definition) level can be displayed.

By forming the auxiliary partition, the phosphor layer can also be formed on the wall surface of the auxiliary partition, and the light emitting area can be increased. Therefore, since the ultraviolet rays efficiently act on the fluorescent screen, the luminance can be increased. In addition, the presence of the auxiliary partition increases the bonding area of the entire partition, thereby obtaining structural strength of the member. As a result, the width of the partition and the auxiliary partition can be reduced, the discharge volume in the display cell portion can be increased, and the discharge efficiency can be further improved.

The auxiliary partition may be selectively formed for each cell forming the phosphor layer of each color of RGB. In other words, the plasma display has a relatively strong red color development of RGB and a relatively weak blue color development.
For example, it is also preferable to form an auxiliary partition only between partitions corresponding to GB or only between partitions corresponding to B.

The height of the auxiliary partition is 1/10 to 1/10 of the height of the partition.
The ratio is preferably 1/1, more preferably 2/10 to 9/10, further preferably 2/10 to 8/10. By setting the height of the auxiliary partition walls to 1/10 or more of the height of the partition walls, an effect of improving luminance by increasing the light emitting area can be obtained. Also, in consideration of the color mixture at the time of forming the phosphor layer and the occurrence of crosstalk between other colors at the time of displaying on the plasma display, the height of the auxiliary partition is 1/1 of the height of the partition.
It is preferably set to 1 or less.

The positions and pitches of the auxiliary partition walls are preferably formed at positions that separate pixels when a plasma display is combined with the front panel, from the viewpoints of gas discharge and emission efficiency of the phosphor layer.

The line width of the auxiliary partition is 30 μm to
700 μm, more preferably 40 to 600 μm. By setting the top width of the auxiliary partition wall to 30 μm or more, it is possible to obtain strength enough to withstand the auxiliary partition wall forming step and subsequent steps.
When the thickness is 300 μm or less, uniform and strong firing can be performed. In addition, the width of the bottom of the auxiliary partition is set to 105 to 2.0 times the width of the top of the auxiliary partition, and further, 1.06 to 1.8.
It is preferable that the ratio is set to 1.0 times, and more preferably 1.06 times to 1.6 times, in order to prevent the auxiliary partition walls from jumping up due to firing shrinkage.

The member for a plasma display of the present invention comprises:
At the top of the auxiliary partition, it is necessary to form a stripe-shaped cut in the direction parallel to the auxiliary partition. In FIG. 1, reference numeral 6 denotes a stripe-shaped cut formed at the top of the auxiliary partition, and this cut has at least one cut at the top of the auxiliary partition.
It is preferable to form at least two, preferably at least two, and more preferably at least three. By having such cuts, even when the phosphor paste is linearly applied between the partition walls by the dispenser method or the screen printing method, the application of the phosphor paste to the top of the auxiliary partition wall is improved. Here, as shown in FIG. 2, the cross-sectional shape of the stripe-shaped cut is preferably a shape whose width is attenuated from the top to the depth direction, and such a shape includes, for example, an inverted taper shape.

In the present invention, the maximum depth of the cut formed at the top of the auxiliary partition is preferably at least 1/10 of the height of the auxiliary partition. By making the maximum depth of the cut formed on the top of the auxiliary partition wall 1/10 or more, the coating property of the phosphor paste on the top of the auxiliary partition wall is improved. The upper limit of the maximum depth of the cut is not particularly limited, but is preferably 9/10 or less, more preferably 8/10 or less, for the reason that the auxiliary partition walls are formed uniformly after firing. The maximum width of the cut at the top of the auxiliary partition is 1/50 to 1/1 of the width of the top of the auxiliary partition.
It is preferably two or more. Within this range, the coating properties of the phosphor paste can be easily improved.

It is also preferable to form a joining auxiliary wall in addition to the partition and the auxiliary partition. The joining auxiliary wall is formed outside the both sides of the parallel pattern of the auxiliary partition walls and at a position that is an end of the partition wall, in a direction perpendicular to the partition wall, thereby preventing peeling of the partition wall end portion. . It is preferable that the length of the end portion where the partition wall protrudes from the joining auxiliary wall be 0.5 mm or less in order to obtain the effect of preventing peeling.

Next, a method for forming the partition and the auxiliary partition in the present invention will be described. The bulkhead and the auxiliary bulkhead are
A paste consisting of an insulating inorganic component and an organic component is formed on a substrate by a known technique such as a screen printing method, a sand blast method, a photosensitive paste method (photolithography method), a mold transfer method, and a lift-off method. It is formed by forming and baking, but for reasons such as groove shape control and uniformity, among other things, apply a photosensitive paste on the substrate, dry it, form a photosensitive paste film, and expose it through a photomask. A so-called photosensitive paste method (photolithography method) of developing is preferably applied in the present invention.

Hereinafter, the photosensitive paste method applied in the present invention will be described in detail. The photosensitive paste used in the present invention contains inorganic fine particles and a photosensitive organic component as main components.

As the inorganic fine particles of the photosensitive paste, glass, ceramic (alumina, cordierite, etc.) and the like can be used. In particular, glass and ceramics containing silicon oxide, boron oxide, or aluminum oxide as an essential component are preferable.

The particle size of the inorganic fine particles is selected in consideration of the shape of the pattern to be produced. The volume average particle size (D50) is preferably from 1 to 10 μm, more preferably from 1 to 5 μm. It is. By setting D50 to 10 μm or less, it is possible to prevent the occurrence of surface irregularities. When the thickness is 1 μm or more, the viscosity of the paste can be easily adjusted. Furthermore, specific surface area 0.2
It is particularly preferable to use glass fine particles of up to 3 m ² / g in pattern formation.

Since the partition walls and the auxiliary partition walls are preferably patterned on a glass substrate having a low thermal softening point, inorganic fine particles containing glass fine particles having a thermal softening temperature of 350 ° C. to 600 ° C. in an amount of 60% by weight or more as inorganic fine particles. It is preferable to use Further, by adding glass fine particles or ceramic fine particles having a heat softening temperature of 600 ° C. or more, the shrinkage rate during firing can be suppressed, but the amount is 4%.
It is preferably 0% by weight or less. As the glass powder used,
In order to prevent the glass substrate from warping during firing, the coefficient of linear expansion should be 50 × 10 ^{−7 to} 90 × 10 ⁻⁷ , and more preferably 60 × 10 ⁻⁷ .
It is preferable to use glass particles of 10 ^{−7 to} 90 × 10 ⁻⁷ .

As a material for forming the partition, a glass material containing an oxide of silicon and / or boron is preferably used.

The silicon oxide is preferably blended in the range of 3 to 60% by weight. By setting the content to 3% by weight or more, the denseness, strength and stability of the glass layer are improved, and
The coefficient of thermal expansion can be set within a desired range, and mismatch with the glass substrate can be prevented. Further, by setting the content to 60% by weight or less, there is an advantage that the heat softening point is lowered and baking on a glass substrate becomes possible.

By mixing boron oxide in the range of 5 to 50% by weight, electrical insulation, strength, coefficient of thermal expansion,
Electrical, mechanical, and thermal properties such as the denseness of the insulating layer can be improved. When the content is 50% by weight or less, the stability of the glass can be maintained.

Further, by containing at least one of bismuth oxide, lead oxide and zinc oxide in a total amount of 5 to 50% by weight, a glass paste having a temperature characteristic suitable for pattern processing on a glass substrate can be obtained. Obtainable. In particular, when glass particles containing 5 to 50% by weight of bismuth oxide are used, advantages such as long pot life of the paste can be obtained. As the bismuth-based glass fine particles, it is preferable to use a glass powder having the following composition. Bismuth oxide: 10 to 40 parts by weight Silicon oxide: 3 to 50 parts by weight Boron oxide: 10 to 40 parts by weight Barium oxide: 8 to 20 parts by weight Aluminum oxide: 10 to 30 parts by weight

Further, at least one of lithium oxide, sodium oxide and potassium oxide is 3 to 20% by weight.
Glass fine particles may be used. The addition amount of the alkali metal oxide is 20% by weight or less, preferably 15% by weight.
By doing so, the stability of the paste can be improved. Among the above three kinds of alkali metal oxides, lithium oxide is particularly preferable in view of the stability of the paste.
As the lithium-based glass fine particles, for example, it is preferable to use a glass powder having the following composition. Lithium oxide: 2 to 15 parts by weight Silicon oxide: 15 to 50 parts by weight Boron oxide: 15 to 40 parts by weight Barium oxide: 2 to 15 parts by weight Aluminum oxide: 6 to 25 parts by weight.

If glass fine particles containing both a metal oxide such as lead oxide, bismuth oxide and zinc oxide and an alkali metal oxide such as lithium oxide, sodium oxide and potassium oxide are used, a lower alkali content is obtained. The amount can easily control the thermal softening temperature and the coefficient of linear expansion.

The workability can be improved by adding aluminum oxide, barium oxide, calcium oxide, magnesium oxide, titanium oxide, zinc oxide, zirconium oxide, etc., particularly, aluminum oxide, barium oxide, and zinc oxide to the glass fine particles. However, from the viewpoint of the thermal softening point and the coefficient of thermal expansion, the content is preferably 40% by weight or less, more preferably 25% by weight or less.

It is preferable that the photosensitive organic component contains a photosensitive component selected from at least one of a photosensitive monomer, a photosensitive oligomer, and a photosensitive polymer. An initiator, a light absorber, a sensitizer, an organic solvent, a sensitization aid, and a polymerization inhibitor are added.

The photosensitive monomer is a compound containing a carbon-carbon unsaturated bond, and specific examples thereof include monofunctional and polyfunctional (meth) acrylates, vinyl compounds and allyl compounds. Etc. can be used. These can be used alone or in combination of two or more.

As the photosensitive oligomer and photosensitive polymer, oligomers and polymers obtained by polymerizing at least one compound having a carbon-carbon double bond can be used. At the time of polymerization, these monomers can be copolymerized with other photosensitive monomers such that the content of these monomers is at least 10% by weight, more preferably at least 35% by weight. By copolymerizing the polymer or oligomer with an unsaturated acid such as an unsaturated carboxylic acid, the developability after exposure can be improved. Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid,
Alternatively, these acid anhydrides and the like can be mentioned. The acid value (AV) of the polymer or oligomer having an acidic group such as a carboxyl group in the side chain thus obtained is 50 to 50.
A range of 180 is preferable, and a range of 70 to 140 is more preferable. By adding a photoreactive group to the side chain or molecular terminal of the polymer or oligomer shown above, it can be used as a photosensitive polymer or photosensitive oligomer having photosensitivity. Preferred photoreactive groups are those having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, an allyl group, an acryl group, and a methacryl group.

Specific examples of the photopolymerization initiator include benzophenone, methyl O-benzoylbenzoate, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, and 4,4-dichlorobenzophenone. , 4-benzoyl-4-methylphenyl ketone, dibenzyl ketone, fluorenone, 2,3-diethoxyacetophenone, 2,2-dimethoxy-2-phenyl-2-phenylacetophenone and the like. One or more of these can be used. The photopolymerization initiator is preferably added in the range of 0.05 to 10% by weight, more preferably in the range of 0.1 to 5% by weight, based on the photosensitive component. If the amount of the polymerization initiator is too small, the photosensitivity tends to decrease, and if the amount of the photopolymerization initiator is too large, the residual ratio of the exposed portion tends to be too small.

It is also effective to add a light absorber. By adding a compound having a high effect of absorbing ultraviolet light or visible light, a high aspect ratio, high definition, and high resolution can be obtained. As the light absorber, those composed of organic dyes are preferably used.Specifically, azo dyes, aminoketone dyes, xanthene dyes, quinoline dyes, anthraquinone dyes, benzophenone dyes, diphenyl cyanoacrylate dyes Dyes, triazine dyes, p-aminobenzoic acid dyes and the like can be used. Since the organic dye does not remain in the insulating film after firing, deterioration of the insulating film characteristics due to the light absorber can be reduced, which is preferable. Among these, azo dyes and benzophenone dyes are preferred.
The addition amount of the organic dye is preferably 0.05 to 5% by weight,
More preferably, it is 0.05 to 1% by weight. If the amount is too small, the effect of adding the light absorber tends to decrease, and if it is too large, the properties of the insulating film after firing tend to deteriorate.

A sensitizer is added to improve the sensitivity. Specific examples of the sensitizer include 2,4-diethylthioxanthone, isopropylthioxanthone, 2,3-bis (4-diethylaminobenzal) cyclopentanone,
2,6-bis (4-dimethylaminobenzal) cyclohexanone and the like. One or more of these can be used. When a sensitizer is added to the photosensitive paste, the amount is usually 0.05 to 10% by weight, more preferably 0.1 to 10% by weight, based on the photosensitive component. If the amount of the sensitizer is too small, the effect of improving the photosensitivity tends not to be exhibited, and if the amount of the sensitizer is too large, the residual ratio of the exposed portion tends to decrease.

Examples of the organic solvent include methyl cellosolve, ethyl cellosolve, butyl cellosolve, propylene glycol monomethyl ether acetate, methyl ethyl ketone, dioxane, acetone, cyclohexanone, cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, dimethyl sulfoxide, γ -Butyllactone, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, bromobenzene, chlorobenzene, dibromobenzene, dichlorobenzene, bromobenzoic acid, chlorobenzoic acid, and one or more of these An organic solvent mixture containing is used.

The photosensitive paste is usually prepared by mixing the above-mentioned inorganic fine particles and organic components so as to have a predetermined composition.
It is manufactured by mixing and dispersing homogeneously with this roller or kneader.

Next, a photosensitive paste is applied, dried, exposed, developed, and the like. Before describing a series of these steps, in the photosensitive paste method applied in the present invention, a photomask used for exposure includes a stripe. A having at least one light-shielding line in a light-transmitting pattern
And a photomask B having a linear stripe pattern is preferably used in combination. Straight refers to an intermittent or continuous slit having a finite length and width. Usually, a partition having a flat top can be obtained from a linear slit extending continuously.However, the present inventors provide a light-shielding line in a stripe-shaped light-transmitting pattern, so that It has been found that a stripe-shaped cut can be formed in a direction parallel to the auxiliary partition.

That is, in the photolithography, the exposure light does not completely go straight in the vertical direction after the photomask, and the exposure light slightly wraps around the shaded portion of the photomask. Therefore, when using a photo-curable photosensitive paste and adjusting the width of the light-shielding line and the exposure conditions,
Immediately below the light-shielding portion is not cured, but is hardened by the sneak of the exposure light at a portion that proceeds in the depth direction of the coating film. Thus, a cut of desired dimensions can be formed.

The various dimensions (depth, width, etc.) of the cut are the size of the light-shielding portion, the parallelism of the exposure light source, the exposure amount, the distance (gap amount) between the photomask and the surface of the photosensitive paste coating film, etc. Can be set by adjusting. For example, the maximum width of the cut can be increased by increasing the size of the light-shielding portion, and conversely, the maximum width of the cut can be reduced by decreasing the size of the light-shielding portion. Also, by increasing the parallelism of the exposure light source or reducing the amount of exposure, the maximum depth of the cut can be increased,
Conversely, the maximum depth of the cut can be reduced by lowering the parallelism of the exposure light source or increasing the amount of exposure. Further, the depth of the cut can be reduced by increasing the gap amount, and the depth of the cut can be reduced by reducing the gap amount.

Hereinafter, a series of two types of forming steps from application to exposure, which are preferably applied according to the height relationship between the partition and the auxiliary partition, will be described.

The first forming step is preferably applied when the height of the auxiliary partition is lower than the height of the partition formed in the direction parallel to the address electrodes. First, a photosensitive paste having a thickness corresponding to the height of the auxiliary partition wall in consideration of the amount of shrinkage due to drying and baking is applied and dried, and a photomask A having at least one light-shielding line in a stripe-shaped light-transmitting pattern is formed on the light-shielding line. Is arranged between the partition and the adjacent partition.

The stripe-shaped light-transmitting pattern on which the light-shielding lines are formed may be continuous straight lines. However, in the second exposure for forming the partition described later, the light exposure of the partition From the meaning of matching, a portion corresponding to a stripe pattern for forming a partition wall, which is shielded from light, may be used as a broken line.

Next, a photosensitive paste is applied onto the film on which the auxiliary partition wall pattern has been exposed so as to have a thickness corresponding to the height of the remaining partition wall in consideration of the amount of shrinkage due to drying and baking, followed by drying, followed by straightening. A photomask having a stripe pattern is arranged in parallel with the address electrodes and exposed again.

The second forming step is preferably applied when the height of the auxiliary partition and that of the partition are the same. First, a photosensitive paste having a thickness corresponding to the height of the partition wall and the auxiliary partition wall in consideration of the shrinkage is applied and dried, and a photomask B having a pattern in which a stripe having at least one light-shielding line and a linear stripe are orthogonal to each other. Are exposed such that the linear stripes are orthogonal to the address electrodes.

In these series of forming steps, the method of applying the photosensitive paste includes screen printing,
A bar coater, a roll coater, a die coater, a blade coater and the like can be used. The coating thickness can be adjusted by selecting the number of coatings, the screen mesh, and the viscosity of the paste.

For drying after coating, a ventilation oven, a hot plate, an IR furnace or the like can be used.

The active light source used in the exposure includes, for example, visible light, near ultraviolet light, ultraviolet light, electron beam, X-ray, laser light and the like. Of these, ultraviolet rays are most preferred,
As the light source, for example, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a halogen lamp, a germicidal lamp, and the like can be used. Among these, an ultra-high pressure mercury lamp is preferred. Exposure conditions vary depending on the coating thickness, but 1 to 100 mW /
Exposure is performed for 0.1 to 10 minutes using an ultra-high pressure mercury lamp having an output of cm ² .

Here, the distance between the photomask and the surface of the coating film of the photosensitive paste, that is, the gap amount is 50 to 50.
It is preferable to adjust the thickness to 0 μm, more preferably 70 to 400 μm. When the gap amount is 50 μm or more, and more preferably 70 μm or more, contact between the photosensitive paste coating film and the photomask can be prevented, and destruction and contamination of both can be prevented. By setting the thickness to 500 μm or less, or 400 μm or less, moderately sharp patterning becomes possible.

The development is performed by utilizing the difference in solubility between the exposed part and the non-exposed part in the developing solution. The development can be performed by an immersion method, a spray method, a brush method, or the like.

As the developing solution, a solution in which the organic component to be dissolved in the photosensitive paste can be dissolved is used. When a compound having an acidic group such as a carboxyl group is present in the photosensitive paste, development can be performed with an aqueous alkali solution. As the aqueous alkali solution, sodium hydroxide, sodium carbonate, an aqueous sodium carbonate solution, an aqueous calcium hydroxide solution, or the like can be used. However, it is preferable to use an organic alkali aqueous solution because the alkaline component can be easily removed during firing. As the organic alkali, a general amine compound can be used. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, diethanolamine and the like. The concentration of the aqueous alkali solution is usually 0.01
10 to 10% by weight, more preferably 0.1 to 5% by weight. If the alkali concentration is too low, the soluble portion tends not to be removed, while if the alkali concentration is too high, the pattern portion tends to peel off or corrode the non-soluble portion. The development temperature during development is preferably from 20 to 50 ° C. from the viewpoint of process control.

Next, the pattern of the partition walls and auxiliary partition walls obtained by the development is fired in a firing furnace. The firing atmosphere and temperature vary depending on the type of paste and substrate, but in air,
It is fired in an atmosphere such as nitrogen or hydrogen. As the firing furnace, a batch type firing furnace or a roller hearth type continuous firing furnace can be used. The firing temperature is 400-800
It is good to carry out at ° C. When partition walls are formed directly on a glass substrate, firing is preferably performed at a temperature of 450 to 620 ° C. for 10 to 60 minutes.

When the width of the partition and the auxiliary partition is extremely different during firing, specifically, when the width of the auxiliary partition is extremely larger than the width of the partition, the firing shrinkage behavior of the partition and the auxiliary partition causes a difference between the two. The partition walls are disconnected at the interface, or the auxiliary partition walls are cracked.

To solve this problem, by forming a stripe-shaped cut at the top of the auxiliary partition as in the present invention,
The firing shrinkage of the auxiliary partition can be reduced, and disconnection of the partition at the interface between the auxiliary partition and the partition can be suppressed.

Next, phosphor layers that emit R (red), G (green), and B (blue) colors are formed between the partition walls formed in a direction parallel to the predetermined address electrodes. The phosphor layer includes phosphor powder,
It can be formed by applying a phosphor paste containing an organic binder and an organic solvent as main components between predetermined partition walls, drying, and firing as necessary.

As a method of applying the phosphor paste between the predetermined partition walls, a screen printing method in which a pattern is printed using a screen printing plate, a dispenser method in which the phosphor paste is ejected from the tip of an ejection nozzle, or a dispenser method,
The phosphor paste of each color can be applied to a predetermined place by the photosensitive paste method using the above-described photosensitive organic component as an organic binder of the phosphor paste. However, for cost reasons, a screen printing method and a dispenser are used. The method is preferably applied in the present invention.

When the thickness of the R phosphor layer is Tr, the thickness of the G phosphor layer is Tg, and the thickness of the B phosphor layer is Tb, preferably 10 μm ≦ Tr ≦ Tb ≦ 50 μm 10 μm ≦ Tg ≦ Tb By having a relationship of ≦ 50 μm, the effects of the present invention can be more exhibited. In other words, by making the thickness of blue light having a low emission luminance larger than that of green or red, a plasma display having more excellent color balance (higher color temperature) can be manufactured. Sufficient luminance can be obtained by setting the thickness of the phosphor layer to 10 μm or more. Also, 50 μm
By setting it as follows, it is possible to widen the discharge space and obtain high luminance. In this case, the thickness of the phosphor layer is measured as a thickness formed at an intermediate point between adjacent partition walls. That is, it is measured as the thickness of the phosphor layer formed at the bottom of the discharge space (in the cell).

In the present invention, the stripe-shaped cuts are formed in the auxiliary partition walls, so that the phosphor paste can be easily applied to the tops of the auxiliary partition walls.

The amount of the phosphor paste applied to the top of the auxiliary partition depends on the height of the partition and the auxiliary partition, but the relationship between the partition height A, the auxiliary partition B, and the thickness C of the top of the auxiliary partition after firing of the phosphor is A. It is preferable to adjust so as to satisfy −B−10 ≧ C ≧ A−B−50 from the viewpoints of securing the luminance in the case of a PDP and improving the luminous efficiency as an auxiliary partition.

The member for a plasma display of the present invention can be manufactured by firing the phosphor layer coated as described above at 400 to 550 ° C. as necessary.

Using this plasma display member as a back plate, after sealing with the front plate, a discharge gas composed of helium, neon, xenon, or the like is filled in a space formed between the front and rear substrates, and A plasma display can be manufactured by installing a drive circuit. The front plate is a member in which a transparent electrode, a bus electrode, a dielectric, and a protective film (MgO) are formed in a predetermined pattern on a substrate. A color filter layer may be formed at a portion corresponding to the RGB phosphor layers formed on the back plate. Further, a black stripe may be formed to improve the contrast.

[0069]

The present invention will be specifically described below with reference to examples. However, the present invention is not limited to this. The concentration (%) in the examples and comparative examples is% by weight. (Example 1) First, a front plate was manufactured.

On a glass substrate “PD200” manufactured by Asahi Glass Co., Ltd., a pitch of 360 μm and a line width of 150 μm were formed using ITO.
m scan electrodes were formed. Further, after applying a photosensitive silver paste on the substrate, a mask exposure through a photomask, a development using a 0.3% sodium carbonate aqueous solution, a baking process at 580 ° C. for 15 minutes, and a line width of 50 μm were performed.
A bus electrode having a thickness of m and a thickness of 3 μm was formed. Next, a glass paste obtained by kneading 70% of powder of low melting point glass containing 75% by weight of lead oxide, 20% of ethylcellulose and 10% of terpineol is screen-printed so as to cover the bus electrode at the display portion. Was applied at a thickness of 50 μm, and baked at 570 ° C. for 15 minutes to form a dielectric. A 0.5 μm-thick magnesium oxide layer was formed as a protective film on the substrate on which the dielectric was formed by electron beam evaporation to produce a front plate.

Next, a back plate was manufactured. Glass substrate PD
An address electrode was formed on 200 using a photosensitive silver paste. After applying a photosensitive silver paste, drying, exposing, developing, and baking steps, the line width is 50 μm, the thickness is 3 μm, and the pitch is 36.
An address electrode of 0 μm was formed. Next, a glass obtained by kneading 60% of a low melting point glass powder containing 75% by weight of bismuth oxide, 10% by weight of a titanium oxide powder having an average particle diameter of 0.3 μm, 15% of ethyl cellulose, and 15% of terpineol. The paste was applied by screen printing to a thickness of 20 μm so as to cover the bus electrode at the display portion, and then baked at 570 ° C. for 15 minutes to form a dielectric layer.

The first layer of photosensitive paste was applied on the dielectric layer. The photosensitive paste is composed of a glass powder and an organic component including a photosensitive component. The glass powder includes lithium oxide 10% by weight, silicon oxide 25% by weight, boron oxide 3
Glass powder having an average particle diameter of 2 μm was used by pulverizing glass having a composition of 0% by weight, 15% by weight of zinc oxide, 5% by weight of aluminum oxide, and 15% by weight of calcium oxide. As the organic components including the photosensitive component, 30% by weight of an acrylic polymer having a carboxyl group, 30% by weight of trimethylolpropane triacrylate, 10% by weight of a photopolymerization initiator “Irgacure 369” (manufactured by Ciba Geigy), γ -Butyrolactone consisting of 30% by weight was used.

The photosensitive paste was prepared by mixing the glass powder and the organic component including the photosensitive component at a weight ratio of 70:30, and kneading the mixture with a roll mill.
Next, this photosensitive paste was applied to a thickness of 170 μm after drying using a die coater. Drying was performed in a clean oven (manufactured by Yamato Kagaku). After drying, the pitch is 1.08 mm, the total line width of the light-transmitting portion is 200 μm, and three light-shielding lines having a width of 30 μm are arranged at equal intervals in the light-transmitting portion. The exposure was performed in the direction perpendicular to the address electrodes using a photomask having a stripe pattern. At this time, the gap amount was set to 150 μm, and the exposure amount was set to 5
00 mJ / cm ² . After exposure, the photosensitive paste was further applied on the exposed film, and the total thickness was 200 μm.
Was obtained.

Next, using a photomask having a stripe pattern with a pitch of 360 μm and a line width of 60 μm, exposure was performed in a direction parallel to the address electrodes. At this time, the gap amount was 150 μm and the exposure amount was 600 mJ / cm ² . After exposure, development was carried out in a 0.5% by weight aqueous solution of ethanolamine, followed by baking at 560 ° C. for 15 minutes to form partition walls and auxiliary partition walls having the structures shown in Table 1.

Next, a phosphor was applied between adjacent partition walls. The phosphor was applied in 256 holes (130 μm in diameter).
m) was formed by a dispenser method in which a phosphor paste was discharged from the tip of the nozzle formed. The phosphor has a thickness of 25 μm after firing on the side wall of the partition and a thickness of 25 μm after firing on the dielectric.
m, and baked at 500 ° C. for 10 minutes. Further, the thickness of the phosphor layer formed on the top of the auxiliary partition was measured by a laser mutation meter. Thus P
A back plate was produced as a DP member. At this time, there was no mixing of adjacent phosphors, that is, no color mixing.

Further, the prepared front substrate and rear substrate were sealed with a sealing glass, and a Ne gas containing 5% of Xe was sealed so as to have an internal gas pressure of 66500 Pa. Further, a driving circuit was mounted to produce a PDP. A voltage was applied to the scan electrode of the PDP to emit light. When the luminance was measured using the luminance meter, the luminance was 250 cd / m ² , and high luminance display characteristics could be obtained. Also, there was no reduction in contrast due to color mixing, and no generation of color streaks or extra points.

(Examples 2 to 4) In Example 1, the width of the light-shielding lines arranged in the translucent portion of the photomask used for the first exposure was changed to (40, 50, 60 μm). A partition wall and an auxiliary partition wall having the structure shown in Table 1 were obtained by the same method. Further, a phosphor layer was formed in the same manner as in Example 1, and the thickness of the phosphor layer formed on the top of the auxiliary partition was measured with a laser displacement meter. The results are shown in Table 1. In addition, a PDP was manufactured, the luminance was measured, and the results are shown in Table 1. The PDP thus obtained had high brightness as shown in Table 1.

Example 5 In Example 1, the line width of the photomask used for the first exposure was changed to 80 μm, the number of light-shielding lines was changed to 2, and the exposure amount was set to 250 mJ / cm ^2.
The partition and auxiliary partition shown in Table 1 and FIG. Further, a phosphor layer was formed in the same manner as in Example 1, and the thickness of the phosphor layer formed on the top of the auxiliary partition was measured with a laser displacement meter. The results are shown in Table 1. In addition, a PDP was manufactured, the luminance was measured, and the results are shown in Table 1. Table 1 shows the PDP thus obtained.
As shown in FIG.

COMPARATIVE EXAMPLE 1 In Example 1, the photomask used for the first exposure was a photomask having a stripe pattern with a pitch of 1.08 mm and a line width of 300 μm. An auxiliary partition was formed. Table 1 shows the structures of the obtained partition walls and auxiliary partition walls. Further, a phosphor layer was formed in the same manner as in Example 1, and the thickness of the phosphor layer at the top of the auxiliary partition wall after firing was measured with a laser mutameter. The results are shown in Table 1. Also, as in the first embodiment, the PDP
Was formed and emitted light to measure the luminance.
m ² was lower than that of Example 1.

[0080]

[Table 1]

[0081]

According to the present invention, the phosphor paste can be easily applied to the top of the auxiliary partition wall, and the partition wall and the auxiliary partition wall have different widths, specifically, when the auxiliary partition wall is wider than the partition wall width. Even if it does, it is possible to provide a method for manufacturing a plasma display member and a plasma display member which do not cause peeling, disconnection, or shape change after firing.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view showing an example of a partition and an auxiliary partition in a plasma display member of the present invention.

FIG. 2 is a schematic sectional view of another example of the auxiliary partition in the plasma display member of the present invention.

FIG. 3 is a schematic sectional view of an auxiliary partition obtained in Example 5 of the present invention.

[Explanation of symbols]

 1A, 1B, 1C Partition 2A, 2B, 2C Auxiliary partition 3 Dielectric layer 4 Address electrode 5 Glass substrate 6 Notch

Continued on the front page F term (reference) 5C027 AA09 5C040 FA01 FA04 GB03 GB14 GF02 GF12 GF19 JA15 JA32 MA03 MA23 5C094 AA05 AA10 AA36 AA43 BA31 CA19 DA13 EA04 EB02 EC10 FA01 FA02 FB01 FB02 FB15 GB10 JA01

Claims (9)

[Claims] 1. A plasma display member comprising an address electrode and a partition formed on a substrate, wherein an auxiliary partition is formed in a direction perpendicular to the partition, and a stripe-shaped cut is formed at the top of the auxiliary partition in a direction parallel to the auxiliary partition. A member for a plasma display, comprising: 2. The plasma display member according to claim 1, wherein the depth of the stripe-shaped cut at the top of the auxiliary partition is at least 1/10 of the height of the auxiliary partition. 3. The height of the auxiliary partition is 1/1 of the height of the partition.
3. The member for a plasma display according to claim 1, wherein the ratio is 0 to 1/1. 4. The member for a plasma display according to claim 1, wherein a cross-sectional shape of the stripe-shaped cut at the top of the auxiliary partition wall has a shape whose width is attenuated in a depth direction. . 5. The member for a plasma display according to claim 4, wherein the maximum width of the stripe-shaped cut at the top of the auxiliary partition is 1/50 to 1/2 of the width of the top of the auxiliary partition. 6. The auxiliary partition wall bottom width is 1.0 width of the auxiliary partition top width.
The member for a plasma display according to any one of claims 1 to 5, wherein the ratio is 5 to 2.0 times. 7. A method for manufacturing a member for a plasma display, comprising a step of applying a photosensitive paste on a substrate and exposing through a photomask, wherein the photomask has at least one striped light-transmitting pattern. A method for manufacturing a member for a plasma display, comprising: manufacturing a plasma display member according to claim 1 by combining a photomask A having a light-shielding line and a photomask B having a linear stripe pattern. 8. A photosensitive partition wall paste coating film applied and dried in an amount necessary to form an auxiliary partition wall on a substrate is exposed through a photomask A in a direction perpendicular to an address electrode.
Next, apply only the amount necessary to form partitions on it.
8. The method for manufacturing a member for a plasma display according to claim 7, wherein the dried photosensitive paste coating film is exposed through a photomask B in a direction parallel to an address electrode and is collectively developed. 9. A plasma display using the plasma display member according to claim 1 as a back plate.