JP2001110351A - 走査電子顕微鏡 - Google Patents

走査電子顕微鏡

Info

Publication number
JP2001110351A
JP2001110351A JP28488399A JP28488399A JP2001110351A JP 2001110351 A JP2001110351 A JP 2001110351A JP 28488399 A JP28488399 A JP 28488399A JP 28488399 A JP28488399 A JP 28488399A JP 2001110351 A JP2001110351 A JP 2001110351A
Authority
JP
Japan
Prior art keywords
sample
detector
electron microscope
scanning electron
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28488399A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001110351A5 (enExample
Inventor
Naomasa Suzuki
直正 鈴木
Toshiro Kubo
俊郎 久保
Noriaki Arai
紀明 荒井
Mitsugi Sato
佐藤　　貢
Hideo Todokoro
秀男 戸所
Yoichi Ose
洋一 小瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP28488399A priority Critical patent/JP2001110351A/ja
Priority to US09/679,006 priority patent/US6555819B1/en
Publication of JP2001110351A publication Critical patent/JP2001110351A/ja
Priority to US10/368,440 priority patent/US20030122074A1/en
Priority to US10/730,106 priority patent/US6979821B2/en
Publication of JP2001110351A5 publication Critical patent/JP2001110351A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H01J2237/04753—Changing particle velocity decelerating with magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H01J2237/04756—Changing particle velocity decelerating with electrostatic means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP28488399A 1999-10-05 1999-10-05 走査電子顕微鏡 Pending JP2001110351A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP28488399A JP2001110351A (ja) 1999-10-05 1999-10-05 走査電子顕微鏡
US09/679,006 US6555819B1 (en) 1999-10-05 2000-10-04 Scanning electron microscope
US10/368,440 US20030122074A1 (en) 1999-10-05 2003-02-20 Scanning electron microscope
US10/730,106 US6979821B2 (en) 1999-10-05 2003-12-09 Scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28488399A JP2001110351A (ja) 1999-10-05 1999-10-05 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
JP2001110351A true JP2001110351A (ja) 2001-04-20
JP2001110351A5 JP2001110351A5 (enExample) 2005-01-06

Family

ID=17684280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28488399A Pending JP2001110351A (ja) 1999-10-05 1999-10-05 走査電子顕微鏡

Country Status (2)

Country Link
US (3) US6555819B1 (enExample)
JP (1) JP2001110351A (enExample)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006004855A (ja) * 2004-06-21 2006-01-05 Topcon Corp 走査電子顕微鏡および類似装置
KR100688974B1 (ko) 2006-03-09 2007-03-08 삼성전자주식회사 진공챔버 내 하전입자빔 검사장치
JP2007521461A (ja) * 2003-07-30 2007-08-02 アプライド マテリアルズ イスラエル リミテッド 複数の検出器を有する走査電子顕微鏡および複数の検出器ベースのイメージング方法
JP2007200718A (ja) * 2006-01-26 2007-08-09 Hitachi High-Technologies Corp 走査型電子顕微鏡
JP2007220399A (ja) * 2006-02-15 2007-08-30 Hitachi High-Technologies Corp 走査型電子顕微鏡及び欠陥検出装置
JP2007242605A (ja) * 2006-02-09 2007-09-20 Hitachi High-Technologies Corp 走査型電子顕微鏡
KR100932893B1 (ko) * 2008-03-05 2009-12-21 (주)코셈 전자 현미경
JP2011108667A (ja) * 2011-03-07 2011-06-02 Hitachi High-Technologies Corp 走査型電子顕微鏡
JP2012177654A (ja) * 2011-02-28 2012-09-13 Advantest Corp パターン高さ測定装置及びパターン高さ測定方法
DE102013113476A1 (de) 2012-12-14 2014-06-18 Advantest Corporation Elektromagnetische Linse für ein Elektronenstrahl-Belichtungsgerät
JP2015035500A (ja) * 2013-08-09 2015-02-19 株式会社日立ハイテクノロジーズ パターン測長装置及びパターン測長方法
CN105551921A (zh) * 2014-10-28 2016-05-04 Fei公司 带电粒子显微镜中的复合扫描路径
JP2017199606A (ja) * 2016-04-28 2017-11-02 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112017006802T5 (de) 2017-03-24 2019-10-10 Hitachi High-Technologies Corporation Ladungsteilchenstrahl-vorrichtung

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001110351A (ja) * 1999-10-05 2001-04-20 Hitachi Ltd 走査電子顕微鏡
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
US7842933B2 (en) * 2003-10-22 2010-11-30 Applied Materials Israel, Ltd. System and method for measuring overlay errors
JP5241168B2 (ja) * 2007-08-09 2013-07-17 株式会社日立ハイテクノロジーズ 電子顕微鏡
US9046475B2 (en) 2011-05-19 2015-06-02 Applied Materials Israel, Ltd. High electron energy based overlay error measurement methods and systems
JP5814741B2 (ja) * 2011-10-20 2015-11-17 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
CN117990019A (zh) * 2022-10-28 2024-05-07 长鑫存储技术有限公司 扫描电子显微镜的扫描方法及扫描电子显微镜

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0643885B2 (ja) * 1984-05-25 1994-06-08 株式会社日立製作所 荷電粒子マイクロプロ−ブ装置
JPH0864163A (ja) * 1994-08-19 1996-03-08 Jeol Ltd 荷電粒子ビーム装置
JPH08138611A (ja) * 1994-11-04 1996-05-31 Nikon Corp 荷電粒子線装置
JPH08273569A (ja) * 1994-12-19 1996-10-18 Opal Technol Ltd 粒子ビーム・コラム
JPH09171791A (ja) * 1995-10-19 1997-06-30 Hitachi Ltd 走査形電子顕微鏡

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4670662A (en) 1986-02-24 1987-06-02 Gt-Devices Pulse synthesizing network and method
DE69231213T2 (de) * 1991-11-27 2001-03-01 Hitachi Science Systems Ltd., Hitachinaka Elektronenstrahlgerät
JPH0823755B2 (ja) 1993-04-16 1996-03-06 日立プラント建設株式会社 電子消音システム
US5659172A (en) 1995-06-21 1997-08-19 Opal Technologies Ltd. Reliable defect detection using multiple perspective scanning electron microscope images
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
US6066849A (en) * 1997-01-16 2000-05-23 Kla Tencor Scanning electron beam microscope
JP3434165B2 (ja) * 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
US5973323A (en) * 1997-11-05 1999-10-26 Kla-Tencor Corporation Apparatus and method for secondary electron emission microscope
JP2001110351A (ja) * 1999-10-05 2001-04-20 Hitachi Ltd 走査電子顕微鏡

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0643885B2 (ja) * 1984-05-25 1994-06-08 株式会社日立製作所 荷電粒子マイクロプロ−ブ装置
JPH0864163A (ja) * 1994-08-19 1996-03-08 Jeol Ltd 荷電粒子ビーム装置
JPH08138611A (ja) * 1994-11-04 1996-05-31 Nikon Corp 荷電粒子線装置
JPH08273569A (ja) * 1994-12-19 1996-10-18 Opal Technol Ltd 粒子ビーム・コラム
JPH09171791A (ja) * 1995-10-19 1997-06-30 Hitachi Ltd 走査形電子顕微鏡

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007521461A (ja) * 2003-07-30 2007-08-02 アプライド マテリアルズ イスラエル リミテッド 複数の検出器を有する走査電子顕微鏡および複数の検出器ベースのイメージング方法
JP2006004855A (ja) * 2004-06-21 2006-01-05 Topcon Corp 走査電子顕微鏡および類似装置
JP2007200718A (ja) * 2006-01-26 2007-08-09 Hitachi High-Technologies Corp 走査型電子顕微鏡
JP2007242605A (ja) * 2006-02-09 2007-09-20 Hitachi High-Technologies Corp 走査型電子顕微鏡
JP2007220399A (ja) * 2006-02-15 2007-08-30 Hitachi High-Technologies Corp 走査型電子顕微鏡及び欠陥検出装置
US7504626B2 (en) 2006-02-15 2009-03-17 Hitachi High-Technologies Corporation Scanning electron microscope and apparatus for detecting defect
KR100688974B1 (ko) 2006-03-09 2007-03-08 삼성전자주식회사 진공챔버 내 하전입자빔 검사장치
KR100932893B1 (ko) * 2008-03-05 2009-12-21 (주)코셈 전자 현미경
JP2012177654A (ja) * 2011-02-28 2012-09-13 Advantest Corp パターン高さ測定装置及びパターン高さ測定方法
JP2011108667A (ja) * 2011-03-07 2011-06-02 Hitachi High-Technologies Corp 走査型電子顕微鏡
DE102013113476A1 (de) 2012-12-14 2014-06-18 Advantest Corporation Elektromagnetische Linse für ein Elektronenstrahl-Belichtungsgerät
US8957389B2 (en) 2012-12-14 2015-02-17 Advantest Corp. Electromagnetic lens for electron beam exposure apparatus
JP2015035500A (ja) * 2013-08-09 2015-02-19 株式会社日立ハイテクノロジーズ パターン測長装置及びパターン測長方法
US9520266B2 (en) 2013-08-09 2016-12-13 Hitachi High-Technologies Corporation Pattern critical dimension measurement equipment and method for measuring pattern critical dimension
CN105551921A (zh) * 2014-10-28 2016-05-04 Fei公司 带电粒子显微镜中的复合扫描路径
CN105551921B (zh) * 2014-10-28 2019-08-23 Fei 公司 带电粒子显微镜中的复合扫描路径
JP2017199606A (ja) * 2016-04-28 2017-11-02 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US10121632B2 (en) 2016-04-28 2018-11-06 Hitachi High-Technologies Corporation Charged particle beam apparatus
DE112017006802T5 (de) 2017-03-24 2019-10-10 Hitachi High-Technologies Corporation Ladungsteilchenstrahl-vorrichtung
US11139144B2 (en) 2017-03-24 2021-10-05 Hitachi High-Tech Corporation Charged particle beam apparatus
US11749497B2 (en) 2017-03-24 2023-09-05 Hitachi High-Tech Corporation Charged particle beam apparatus

Also Published As

Publication number Publication date
US6979821B2 (en) 2005-12-27
US6555819B1 (en) 2003-04-29
US20030122074A1 (en) 2003-07-03
US20040113074A1 (en) 2004-06-17

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