JP2001097975A5 - - Google Patents
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- Publication number
- JP2001097975A5 JP2001097975A5 JP2000288313A JP2000288313A JP2001097975A5 JP 2001097975 A5 JP2001097975 A5 JP 2001097975A5 JP 2000288313 A JP2000288313 A JP 2000288313A JP 2000288313 A JP2000288313 A JP 2000288313A JP 2001097975 A5 JP2001097975 A5 JP 2001097975A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- formula
- phenyl
- independently
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000000217 alkyl group Chemical group 0.000 claims description 27
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- -1 tetramethylene, pentamethylene Chemical group 0.000 claims description 8
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 229940100198 alkylating agent Drugs 0.000 claims description 6
- 239000002168 alkylating agent Substances 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 6
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 claims description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000002585 base Substances 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 125000006413 ring segment Chemical group 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 claims description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 239000011541 reaction mixture Substances 0.000 claims description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 3
- 125000006179 2-methyl benzyl group Chemical group [H]C1=C([H])C(=C(C([H])=C1[H])C([H])([H])*)C([H])([H])[H] 0.000 claims description 2
- 125000006188 2-phenyl benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C(C([H])=C([H])C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000006497 3-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C(OC([H])([H])[H])=C1[H])C([H])([H])* 0.000 claims description 2
- 125000006180 3-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C(=C1[H])C([H])([H])[H])C([H])([H])* 0.000 claims description 2
- 125000006506 3-phenyl benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C([H])C([H])=C([H])C(=C1[H])C([H])([H])* 0.000 claims description 2
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 claims description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 150000001721 carbon Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- 150000004678 hydrides Chemical class 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 2
- 125000001302 tertiary amino group Chemical group 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000011368 organic material Substances 0.000 claims 2
- 239000000654 additive Substances 0.000 claims 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 claims 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 125000006186 3,5-dimethyl benzyl group Chemical group [H]C1=C(C([H])=C(C([H])=C1C([H])([H])[H])C([H])([H])*)C([H])([H])[H] 0.000 description 1
- 125000006189 4-phenyl benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99810867.4 | 1999-09-27 | ||
| EP99810867 | 1999-09-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001097975A JP2001097975A (ja) | 2001-04-10 |
| JP2001097975A5 true JP2001097975A5 (https=) | 2006-07-27 |
Family
ID=8243047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000288313A Pending JP2001097975A (ja) | 1999-09-27 | 2000-09-22 | 蛍光ジケトピロロピロール |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US6603020B1 (https=) |
| JP (1) | JP2001097975A (https=) |
| KR (1) | KR100753348B1 (https=) |
| DE (1) | DE60008472T2 (https=) |
| TW (1) | TWI261064B (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW503255B (en) * | 1999-09-27 | 2002-09-21 | Ciba Sc Holding Ag | Electroluminescent devices comprising diketopyrrolopyrroles |
| KR100889247B1 (ko) * | 2001-06-29 | 2009-03-19 | 시바 홀딩 인크 | 형광성 디케토피롤로피롤 |
| WO2003014255A1 (en) * | 2001-08-10 | 2003-02-20 | Ciba Specialty Chemicals Holding Inc. | Fluorescent diketopyrrolopyrrole analogues |
| CN1259388C (zh) * | 2001-12-03 | 2006-06-14 | 东洋油墨制造株式会社 | 有机电致发光器件用组合物和使用该组合物的有机电致发光器件 |
| JP2005526152A (ja) * | 2002-02-01 | 2005-09-02 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | ジケトピロロピロールを含む蛍光組成物 |
| CN1771298B (zh) * | 2003-04-10 | 2013-07-17 | 西巴特殊化学品控股有限公司 | 荧光二酮基吡咯并吡咯 |
| AU2004277378A1 (en) * | 2003-08-01 | 2005-04-14 | Glotell Products, Inc. | Dye solution and method for detecting anhydrous ammonia |
| US20090057613A1 (en) * | 2004-06-29 | 2009-03-05 | Ciba Specialty Chemicals Holding Inc. | Fluorescent quinacridones |
| DE602005024569D1 (de) * | 2004-08-23 | 2010-12-16 | Basf Se | Kosmetische zusammensetzungen mit fluoreszenten farbstoffen für natürliche hautfarbe |
| EP1817392B1 (en) * | 2004-12-09 | 2009-01-07 | Ciba Holding Inc. | Fluorescent diketopyrrolopyrroles |
| KR101057546B1 (ko) * | 2007-06-05 | 2011-08-17 | 주식회사 엘지화학 | 광학 이방성 화합물 및 이를 포함하는 수지 조성물 |
| KR101546985B1 (ko) | 2007-10-09 | 2015-08-24 | 바스프 에스이 | 피롤로피롤 유도체, 그의 제조 및 용도 |
| KR101685612B1 (ko) | 2010-06-10 | 2016-12-13 | 삼성디스플레이 주식회사 | 표시 장치 |
| GB201200184D0 (en) * | 2012-01-06 | 2012-02-22 | Johnson Matthey Plc | Tracers and method of marking liquids |
| KR102189603B1 (ko) * | 2013-03-06 | 2020-12-14 | 주식회사 클랩 | 신규한 헤테로시클릭 형광 염료 및 그의 제조 방법 |
| CN112566985A (zh) * | 2018-08-22 | 2021-03-26 | 富士胶片株式会社 | 着色组合物、固化膜、图案形成方法、滤色器、固体摄像元件及图像显示装置 |
| CN110818936B (zh) * | 2019-11-14 | 2022-04-05 | 陕西理工大学 | 一种有机玻璃及其制备方法和应用 |
| JP2023127878A (ja) * | 2022-03-02 | 2023-09-14 | 東洋インキＳｃホールディングス株式会社 | ジケトピロロピロール顔料、顔料組成物、着色組成物、カラーフィルタおよびセンサ |
| CN116969952A (zh) * | 2023-07-31 | 2023-10-31 | 山东凯瑞尔光电科技有限公司 | 一种二苯基吡咯并吡咯二酮衍生物及其颜料组合物 |
| CN116969953A (zh) * | 2023-07-31 | 2023-10-31 | 山东凯瑞尔光电科技有限公司 | 一种二苯基吡咯并吡咯二酮衍生物及颜料组合物和其应用 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3262270D1 (en) * | 1981-03-20 | 1985-03-28 | Ciba Geigy Ag | Process for colouring highly molecular organic material and polycyclic pigments |
| AU568298B2 (en) * | 1982-05-17 | 1987-12-24 | Ciba Specialty Chemicals Holding Inc. | Synthesis of pyrrol0 (3,4-c) pyrrole pigments |
| US4585878A (en) | 1983-06-29 | 1986-04-29 | Ciba-Geigy Corporation | N-substituted 1,4-diketopyrrolo-[3,4-c]-pyrroles |
| DE58907880D1 (de) | 1988-07-20 | 1994-07-21 | Ciba Geigy | Verfahren zur Herstellung aminierter Diketodi(het)aryl-pyrrolopyrrole und Verwendung derselben als photoleitfähige Substanzen. |
| EP0426717B1 (de) * | 1988-07-29 | 1996-04-24 | Riedel-De Haen Aktiengesellschaft | Optische datenspeicher |
| JPH02296891A (ja) * | 1989-05-10 | 1990-12-07 | Ricoh Co Ltd | 電界発光素子 |
| US5476886A (en) * | 1994-07-18 | 1995-12-19 | Ciba-Geigy Corporation | Polyamides mass coloured with diketopyrrolopyrrole pigments |
| GB9418499D0 (en) | 1994-09-14 | 1994-11-02 | Ciba Geigy Ag | Process for producing n-methylated organic pigments |
| JP3704748B2 (ja) * | 1995-06-23 | 2005-10-12 | 東洋インキ製造株式会社 | 有機エレクトロルミネッセンス素子用電子輸送材料およびそれを用いた有機エレクトロルミネッセンス素子 |
| EP0811625B1 (en) | 1996-06-05 | 2002-04-17 | Ciba SC Holding AG | Process for preparing diketopyrrolopyrrole derivatives |
| DE69704084T2 (de) | 1996-12-10 | 2001-06-07 | Ciba Specialty Chemicals Holding Inc., Basel | Flüssigkristalline diketopyrrolopyrrole |
| AU6210998A (en) | 1997-01-27 | 1998-08-18 | Ciba Specialty Chemicals Holding Inc. | Soluble chromophores having improved solubilising groups |
| CN1251606A (zh) | 1997-02-03 | 2000-04-26 | 西巴特殊化学品控股有限公司 | 与有机载体材料共价连接的荧光发色团 |
-
2000
- 2000-09-06 TW TW089118230A patent/TWI261064B/zh not_active IP Right Cessation
- 2000-09-07 US US09/735,080 patent/US6603020B1/en not_active Expired - Fee Related
- 2000-09-19 DE DE60008472T patent/DE60008472T2/de not_active Expired - Lifetime
- 2000-09-22 JP JP2000288313A patent/JP2001097975A/ja active Pending
- 2000-09-27 KR KR1020000056659A patent/KR100753348B1/ko not_active Expired - Fee Related
-
2003
- 2003-01-30 US US10/354,602 patent/US20030187106A1/en not_active Abandoned
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