JP2001056485A5 - - Google Patents

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Publication number
JP2001056485A5
JP2001056485A5 JP1999207354A JP20735499A JP2001056485A5 JP 2001056485 A5 JP2001056485 A5 JP 2001056485A5 JP 1999207354 A JP1999207354 A JP 1999207354A JP 20735499 A JP20735499 A JP 20735499A JP 2001056485 A5 JP2001056485 A5 JP 2001056485A5
Authority
JP
Japan
Prior art keywords
insulating film
transparent conductive
conductive film
interlayer insulating
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999207354A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001056485A (ja
JP3788707B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP20735499A priority Critical patent/JP3788707B2/ja
Priority claimed from JP20735499A external-priority patent/JP3788707B2/ja
Publication of JP2001056485A publication Critical patent/JP2001056485A/ja
Publication of JP2001056485A5 publication Critical patent/JP2001056485A5/ja
Application granted granted Critical
Publication of JP3788707B2 publication Critical patent/JP3788707B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP20735499A 1998-08-06 1999-07-22 半導体装置およびその作製方法 Expired - Fee Related JP3788707B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20735499A JP3788707B2 (ja) 1998-08-06 1999-07-22 半導体装置およびその作製方法

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP23496198 1998-08-06
JP10-234961 1998-08-06
JP10-254097 1998-09-08
JP25409798 1998-09-08
JP11-160460 1999-06-08
JP16046099 1999-06-08
JP20735499A JP3788707B2 (ja) 1998-08-06 1999-07-22 半導体装置およびその作製方法

Publications (3)

Publication Number Publication Date
JP2001056485A JP2001056485A (ja) 2001-02-27
JP2001056485A5 true JP2001056485A5 (enExample) 2004-11-11
JP3788707B2 JP3788707B2 (ja) 2006-06-21

Family

ID=27473674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20735499A Expired - Fee Related JP3788707B2 (ja) 1998-08-06 1999-07-22 半導体装置およびその作製方法

Country Status (1)

Country Link
JP (1) JP3788707B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6614083B1 (en) 1999-03-17 2003-09-02 Semiconductor Energy Laboratory Co., Ltd. Wiring material and a semiconductor device having wiring using the material, and the manufacturing method
JP4865142B2 (ja) * 2001-04-04 2012-02-01 セイコーインスツル株式会社 液晶表示素子及びその製造方法
US8305507B2 (en) 2005-02-25 2012-11-06 Samsung Display Co., Ltd. Thin film transistor array panel having improved storage capacitance and manufacturing method thereof
JP2007212499A (ja) 2006-02-07 2007-08-23 Seiko Epson Corp 液晶装置及びプロジェクタ
JP4818839B2 (ja) * 2006-07-19 2011-11-16 株式会社 日立ディスプレイズ 液晶表示装置及びその製造方法
JP5589359B2 (ja) 2009-01-05 2014-09-17 セイコーエプソン株式会社 電気光学装置及び電子機器
JP5182116B2 (ja) * 2009-01-23 2013-04-10 セイコーエプソン株式会社 電気光学装置及び電子機器
JP5352333B2 (ja) 2009-04-23 2013-11-27 株式会社ジャパンディスプレイ アクティブマトリクス型表示装置
US8866982B2 (en) * 2009-08-20 2014-10-21 Innolux Corporation Display device
JP5987197B2 (ja) * 2012-03-12 2016-09-07 東京瓦斯株式会社 水素分離膜及び水素分離方法
JP2013200574A (ja) * 2013-06-05 2013-10-03 Semiconductor Energy Lab Co Ltd 半導体装置
JP5685633B2 (ja) * 2013-10-08 2015-03-18 株式会社半導体エネルギー研究所 表示装置
JP6457879B2 (ja) * 2015-04-22 2019-01-23 株式会社ジャパンディスプレイ 表示装置及びその製造方法

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