JP2001052947A - コイル、電磁石および製造方法 - Google Patents

コイル、電磁石および製造方法

Info

Publication number
JP2001052947A
JP2001052947A JP11225733A JP22573399A JP2001052947A JP 2001052947 A JP2001052947 A JP 2001052947A JP 11225733 A JP11225733 A JP 11225733A JP 22573399 A JP22573399 A JP 22573399A JP 2001052947 A JP2001052947 A JP 2001052947A
Authority
JP
Japan
Prior art keywords
forming
coil
depression
resist
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11225733A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001052947A5 (enExample
Inventor
Masateru Hara
昌輝 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP11225733A priority Critical patent/JP2001052947A/ja
Publication of JP2001052947A publication Critical patent/JP2001052947A/ja
Publication of JP2001052947A5 publication Critical patent/JP2001052947A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Coils Or Transformers For Communication (AREA)
  • Electromagnets (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
JP11225733A 1999-08-09 1999-08-09 コイル、電磁石および製造方法 Pending JP2001052947A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11225733A JP2001052947A (ja) 1999-08-09 1999-08-09 コイル、電磁石および製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11225733A JP2001052947A (ja) 1999-08-09 1999-08-09 コイル、電磁石および製造方法

Publications (2)

Publication Number Publication Date
JP2001052947A true JP2001052947A (ja) 2001-02-23
JP2001052947A5 JP2001052947A5 (enExample) 2006-04-13

Family

ID=16833985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11225733A Pending JP2001052947A (ja) 1999-08-09 1999-08-09 コイル、電磁石および製造方法

Country Status (1)

Country Link
JP (1) JP2001052947A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296519A (ja) * 2001-03-29 2002-10-09 Ricoh Co Ltd 光変調装置及びその光変調装置の製造方法並びにその光変調装置を具備する画像形成装置及びその光変調装置を具備する画像投影表示装置
JP6302613B1 (ja) * 2017-03-01 2018-03-28 ナノコイル株式会社 ナノコイル型ｇｓｒセンサ素子の製造方法
WO2018225454A1 (ja) * 2017-06-05 2018-12-13 朝日インテック株式会社 Ｇｓｒセンサ素子
CN111276314A (zh) * 2020-03-02 2020-06-12 厦门圣德斯贵电子科技有限公司 新型电磁铁、新型电磁铁的制备方法及扬声器的磁性结构

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296519A (ja) * 2001-03-29 2002-10-09 Ricoh Co Ltd 光変調装置及びその光変調装置の製造方法並びにその光変調装置を具備する画像形成装置及びその光変調装置を具備する画像投影表示装置
JP6302613B1 (ja) * 2017-03-01 2018-03-28 ナノコイル株式会社 ナノコイル型ｇｓｒセンサ素子の製造方法
JP2018148189A (ja) * 2017-03-01 2018-09-20 ナノコイル株式会社 ナノコイル型ｇｓｒセンサ素子の製造方法
WO2018225454A1 (ja) * 2017-06-05 2018-12-13 朝日インテック株式会社 Ｇｓｒセンサ素子
JP2018205102A (ja) * 2017-06-05 2018-12-27 朝日インテック株式会社 Ｇｓｒセンサ素子
US11156676B2 (en) 2017-06-05 2021-10-26 Asahi Intecc Co., Ltd. GSR sensor element
CN111276314A (zh) * 2020-03-02 2020-06-12 厦门圣德斯贵电子科技有限公司 新型电磁铁、新型电磁铁的制备方法及扬声器的磁性结构

Similar Documents

Publication Publication Date Title
JP4299543B2 (ja) Ｉｃデバイス用の集積トロイダル・コイル・インダクタ
TW201001618A (en) Semiconductor structure and method for manufacturing the same
KR102061711B1 (ko) 반도체 구조 및 방법
CN106898556A (zh) 半导体结构及其制造方法
US20060216921A1 (en) Through conductor and its manufacturing method
JPH10209273A (ja) 半導体装置の製造方法
JP2001052947A (ja) コイル、電磁石および製造方法
TW201838128A (zh) 具有重佈線路層的晶片結構
CN112736054A (zh) 半导体元件及其制备方法
KR102656751B1 (ko) 중공 mems 구조체의 제조 방법
JPH0629285A (ja) 半導体装置
CN101150087A (zh) 具有镀通结构的装置及其制造方法
CN116190356B (zh) 三维电感器的制备方法
US6579790B1 (en) Dual damascene manufacturing process
JP7666482B2 (ja) インダクタ部品
KR20040003269A (ko) 이종 감광막을 이용한 듀얼 다마신 방법
US20070148960A1 (en) Semiconductor device and method for manufacturing the same
EP4235774A1 (en) Shaped metal edge for galvanic isolator
US20240312693A1 (en) Inductor and manufacturing method thereof, filter and electronic device
KR100800934B1 (ko) 반도체 소자 및 그 제조방법
KR100664808B1 (ko) 다층 구조의 반도체 소자와 그 제조 방법
JPH06326198A (ja) 接続孔の形成方法
CN117438179A (zh) 电感器部件及其制造方法
JP3191769B2 (ja) 半導体装置の製造方法
KR0184955B1 (ko) 반도체 소자의 금속배선 제조방법

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060227

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060227

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080821

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080902

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20090106