JP2001035276A5 - - Google Patents

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Publication number
JP2001035276A5
JP2001035276A5 JP2000144729A JP2000144729A JP2001035276A5 JP 2001035276 A5 JP2001035276 A5 JP 2001035276A5 JP 2000144729 A JP2000144729 A JP 2000144729A JP 2000144729 A JP2000144729 A JP 2000144729A JP 2001035276 A5 JP2001035276 A5 JP 2001035276A5
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JP
Japan
Prior art keywords
group
printing
conductive polymer
alkyl
layer
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Application number
JP2000144729A
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English (en)
Japanese (ja)
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JP2001035276A (ja
JP4553448B2 (ja
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Publication date
Priority claimed from EP99201645A external-priority patent/EP1054414B1/en
Application filed filed Critical
Publication of JP2001035276A publication Critical patent/JP2001035276A/ja
Publication of JP2001035276A5 publication Critical patent/JP2001035276A5/ja
Application granted granted Critical
Publication of JP4553448B2 publication Critical patent/JP4553448B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000144729A 1999-05-20 2000-05-17 導電性ポリマーの層のパターン化方法 Expired - Lifetime JP4553448B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99201645A EP1054414B1 (en) 1999-05-20 1999-05-20 Method for patterning a layer of conductive polymer
EP99201645.1 1999-05-20

Publications (3)

Publication Number Publication Date
JP2001035276A JP2001035276A (ja) 2001-02-09
JP2001035276A5 true JP2001035276A5 (https=) 2007-03-22
JP4553448B2 JP4553448B2 (ja) 2010-09-29

Family

ID=8240230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000144729A Expired - Lifetime JP4553448B2 (ja) 1999-05-20 2000-05-17 導電性ポリマーの層のパターン化方法

Country Status (6)

Country Link
EP (1) EP1054414B1 (https=)
JP (1) JP4553448B2 (https=)
KR (1) KR100623237B1 (https=)
CN (1) CN1274869A (https=)
DE (1) DE69905860T2 (https=)
TW (1) TW552591B (https=)

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SE0103047D0 (sv) * 2001-09-14 2001-09-14 Acreo Ab Process relating to polymers
US6887556B2 (en) 2001-12-11 2005-05-03 Agfa-Gevaert Material for making a conductive pattern
EP1326260A1 (en) * 2001-12-11 2003-07-09 Agfa-Gevaert Material for making a conductive pattern
JP2003234473A (ja) 2002-02-06 2003-08-22 Canon Inc 有機半導体素子の製造方法
JP3850747B2 (ja) * 2002-03-27 2006-11-29 株式会社東芝 正孔注入層用インク、el表示装置、及びこれらの製造方法
JP3940625B2 (ja) * 2002-03-29 2007-07-04 株式会社東芝 有機el正孔注入層用インクおよびその製造方法、有機el表示装置の製造方法、ならびに有機el表示装置
US6773614B2 (en) * 2002-04-16 2004-08-10 Hewlett-Packard Development Company, L.P. Method of patterning conductive films
WO2004029128A2 (en) * 2002-09-24 2004-04-08 E.I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
CN100497439C (zh) * 2002-09-24 2009-06-10 E.I.内穆尔杜邦公司 用聚合物酸胶体制备的可水分散的聚噻吩
CA2499364A1 (en) 2002-09-24 2004-04-08 E. I. Du Pont De Nemours And Company Water dispersible polyanilines made with polymeric acid colloids for electronics applications
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US7390438B2 (en) 2003-04-22 2008-06-24 E.I. Du Pont De Nemours And Company Water dispersible substituted polydioxythiophenes made with fluorinated polymeric sulfonic acid colloids
CN1777648B (zh) * 2003-04-22 2011-06-08 E.I.内穆尔杜邦公司 由聚合物酸性胶体制备的水分散性聚噻吩
US7163734B2 (en) * 2003-08-26 2007-01-16 Eastman Kodak Company Patterning of electrically conductive layers by ink printing methods
US6893790B2 (en) 2003-08-26 2005-05-17 Eastman Kodak Company Photopatterning of conductive electrode layers containing electrically-conductive polymer particles
US7033713B2 (en) * 2003-08-26 2006-04-25 Eastman Kodak Electrographic patterning of conductive electrode layers containing electrically-conductive polymeric materials
US7351358B2 (en) 2004-03-17 2008-04-01 E.I. Du Pont De Nemours And Company Water dispersible polypyrroles made with polymeric acid colloids for electronics applications
JP2006028214A (ja) * 2004-07-12 2006-02-02 Nagase Chemtex Corp ポリ(3,4−ジアルコキシチオフェン)とポリ陰イオンとの複合体の水分散体の製造方法
US7427441B2 (en) 2004-09-17 2008-09-23 Eastman Kodak Co Transparent polymeric coated conductor
US7781047B2 (en) 2004-10-21 2010-08-24 Eastman Kodak Company Polymeric conductor donor and transfer method
US7675123B2 (en) 2004-10-29 2010-03-09 Agfa-Gevaert Nv Printable non-volatile passive memory element and method of making thereof
US7414313B2 (en) 2004-12-22 2008-08-19 Eastman Kodak Company Polymeric conductor donor and transfer method
US7438832B2 (en) 2005-03-29 2008-10-21 Eastman Kodak Company Ionic liquid and electronically conductive polymer mixtures
US7645497B2 (en) 2005-06-02 2010-01-12 Eastman Kodak Company Multi-layer conductor with carbon nanotubes
EP1897096A4 (en) 2005-06-28 2009-08-12 Du Pont TRANSPARENT LADDER WITH HIGH WORKING FUNCTION
DE102005043828A1 (de) 2005-09-13 2007-03-22 H.C. Starck Gmbh Verfahren zur Herstellung von Elektrolytkondensatoren
US7410825B2 (en) 2005-09-15 2008-08-12 Eastman Kodak Company Metal and electronically conductive polymer transfer
US7706165B2 (en) 2005-12-20 2010-04-27 Agfa-Gevaert Nv Ferroelectric passive memory cell, device and method of manufacture thereof
US8062553B2 (en) 2006-12-28 2011-11-22 E. I. Du Pont De Nemours And Company Compositions of polyaniline made with perfuoropolymeric acid which are heat-enhanced and electronic devices made therewith
US8153029B2 (en) 2006-12-28 2012-04-10 E.I. Du Pont De Nemours And Company Laser (230NM) ablatable compositions of electrically conducting polymers made with a perfluoropolymeric acid applications thereof
US20080191172A1 (en) 2006-12-29 2008-08-14 Che-Hsiung Hsu High work-function and high conductivity compositions of electrically conducting polymers
EP2014463B1 (en) 2007-06-22 2015-07-29 Agfa-Gevaert N.V. Smart information carrier and production process therefor.
JP5913777B2 (ja) * 2009-08-31 2016-04-27 富士通株式会社 導電パターン形成方法及び導電パターン形成装置
JP2010090397A (ja) * 2010-01-29 2010-04-22 Nagase Chemtex Corp ポリ(3,4−ジアルコキシチオフェン)とポリ陰イオンとの複合体の水分散体の製造方法
WO2011125603A1 (ja) 2010-04-09 2011-10-13 鶴見曹達株式会社 導電性高分子エッチング用インク及び導電性高分子のパターニング方法
DE102010050507A1 (de) 2010-11-08 2012-05-24 H.C. Starck Clevios Gmbh Verfahren zur Herstellung von Schichtkörpern durch Behandlung mit organischen Ätzmitteln und daraus erhältliche Schichtkörper
WO2013007362A1 (en) 2011-07-08 2013-01-17 Heraeus Precious Metals Gmbh & Co. Kg Process for the production of a layered body and layered bodies obtainable therefrom
KR20140057262A (ko) 2011-07-08 2014-05-12 헤레우스 프레셔스 메탈스 게엠베하 운트 코. 카게 적층체의 제조 공정 및 이로부터 얻을 수 있는 마스킹이 없는 적층체
KR20130030494A (ko) * 2011-09-19 2013-03-27 삼성전기주식회사 도금패턴 및 그 제조방법
JP5943195B2 (ja) * 2012-05-25 2016-06-29 東亞合成株式会社 導電性高分子のエッチング液、およびエッチング液を用いた導電性高分子パターンの形成方法。
JP5517271B2 (ja) * 2012-08-06 2014-06-11 株式会社麗光 透明導電フイルム、及びその製造方法
TWI534247B (zh) * 2013-01-31 2016-05-21 An etch paste for etching an indium tin oxide conductive film
US8709194B1 (en) 2013-02-25 2014-04-29 Eastman Kodak Company Assembling an electrode device
US9017927B2 (en) 2013-02-25 2015-04-28 Eastman Kodak Company Patterning of transparent conductive coatings
CN104103757A (zh) * 2013-04-03 2014-10-15 中国科学院微电子研究所 一种有机电极的制备方法
CN104461103A (zh) * 2013-09-25 2015-03-25 远东新世纪股份有限公司 共轭高分子导电膜图案化的方法及降低图案色差用组成物
TWI528877B (zh) 2013-11-08 2016-04-01 長興材料工業股份有限公司 鈍化組合物及其應用
TW201730292A (zh) * 2015-11-20 2017-09-01 Toagosei Co Ltd 導電性高分子用隱形蝕刻墨水及導電性高分子之圖案化方法
CN108922656B (zh) * 2018-06-19 2020-07-07 北京玉宇澄清科技有限公司 一种导电聚合物薄膜及其图案化制作方法和应用

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DE3843412A1 (de) * 1988-04-22 1990-06-28 Bayer Ag Neue polythiophene, verfahren zu ihrer herstellung und ihre verwendung
JPH05226238A (ja) * 1991-10-31 1993-09-03 Internatl Business Mach Corp <Ibm> E−ビームレジスト用の塩基現像可能な放電トップ層
EP0615256B1 (en) * 1993-03-09 1998-09-23 Koninklijke Philips Electronics N.V. Method of manufacturing a pattern of an electrically conductive polymer on a substrate surface and method of metallizing such a pattern
EP1007349B1 (en) * 1995-11-22 2004-09-29 THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY OF THE NAVY Patterned conducting polymer surfaces and process for preparing the same and devices containing the same

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