JP2000505916A - マイクロリソグラフィ用投影露光装置のrema対物レンズ - Google Patents
マイクロリソグラフィ用投影露光装置のrema対物レンズInfo
- Publication number
- JP2000505916A JP2000505916A JP10528293A JP52829398A JP2000505916A JP 2000505916 A JP2000505916 A JP 2000505916A JP 10528293 A JP10528293 A JP 10528293A JP 52829398 A JP52829398 A JP 52829398A JP 2000505916 A JP2000505916 A JP 2000505916A
- Authority
- JP
- Japan
- Prior art keywords
- objective
- lens
- rema
- plane
- rema objective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 241000022563 Rema Species 0.000 title claims abstract 25
- 238000001393 microlithography Methods 0.000 title claims description 10
- 239000011521 glass Substances 0.000 claims abstract description 13
- 210000001747 pupil Anatomy 0.000 claims description 16
- 230000000873 masking effect Effects 0.000 claims description 10
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000003384 imaging method Methods 0.000 claims description 5
- 238000005286 illumination Methods 0.000 claims description 3
- 230000007704 transition Effects 0.000 claims description 3
- 206010010071 Coma Diseases 0.000 claims 1
- 238000012937 correction Methods 0.000 abstract description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 230000006978 adaptation Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 208000001644 thecoma Diseases 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 倍率が3倍から8倍であり、光伝導値は10mmより大きく、物体平面(1 )からレチクル平面(19)への明暗カントは、5%及び95%の輝度値が像視 野直径の2%未満、好ましくは0.5%未満だけ離れているようなカント推移を 示すREMA対物レンズにおいて、10個以下のレンズが設けられ、そのうち、 1個から5個、好ましくは3個から4個は非球面(7,11,17)であること を特徴とするREMA対物レンズ。 2. 有限の距離に位置する物休平面(1)をレチクル平而(19)に結像し、 −前方部分対物レンズとして構成され、像平面は無限遠に位置し、絞りはRE MA対物レンズ全休の物体平面(1)に位置する集光レンズ部(100)と 、 −中間レンズ部(200)と、 −視野レンズ部(300)とから構成されるREMA対物レンズにおいて、 集光レンズ部(100)、中間レンズ部(200)及び視野レンズ部(300) はそれぞれ1つから2つの非球面レンズ面(7,11,17)を含み、合わせて 5つ以下、好ましくは4つ以下の非球面(7,11,17)が設けられ、レンズ の総数は最大で10個であることを特徴とするREMA対物レンズ。 3. レンズ中のガラス経路は物体平面(1)とレチクル平面(19)との距離 の最大で30%、好ましくは最大で25%であることを特徴とする請求項1又は 2記載のREMA対物レンズ。 4. 空気中の縁部ビームの面垂線に対して入射角の正弦の最大値(| sin(iRa nd )|)が物体側開口数(NAO)の0.6倍、好ましくは0.8倍より大きい 光学面が少なくとも1つ設けられていることを特徴とする請求項1,2又は3記 載のREMA対物レンズ。 5.コマに関して補正された瞳平面(14)を形成する部分対物レンズ(10 0)を含むことを特徴とする請求項1から4の少なくとも1項に記載のREMA 対物レンズ。 6.部分対物レンズ(100)は物休平面(1)に対して湾曲した凹面(4) を少なくとも1つ有し、その凹面の曲率半径とレンズ直径との開度比は0.65 より小さいことを特徴とする請求項5記載のREMA対物レンズ。 7. レチクルマスキング部(90)をガラス棒(80)の射出側に配置して、 マイクロリソグラフィ用投影露光装置で使用されることを特徴とする請求項1か ら6の少なくとも1項に記載のREMA対物レンズ。 8. 投影対物レンズ(400)を縮小カタヂオプトリック対物レンズとして、 マイクロリソグラフィ用投影露光装置で使用されることを特徴とする請求項1か ら7の少なくとも1項に記載のREMA対物レンズ。 9. 前方部分対物レンズとして形成され、像平面が無限遠に位置し、絞りはR EMA対物レンズ全体の物体平面(1)に位置する集光レンズ部(100)と、 中間レンズ部(200)と、視野レンズ部(300)とから構成されていること を特徴とする請求項1記載のREMA対物レンズ。 10.3倍から8倍の倍率を有することを特徴とする請求項2記載のREMA 対物レンズ。 11.80mmより大きい像視野直径を有することを特徴とする請求項2記載の REMA対物レンズ。 12.0.10を越える像側開口数を有することを特徴とする請求項2記載の REMA対物レンズ。 13.10mmより大きい光伝導値を有することを特徴とする請求項2記載のR EMA対物レンズ。 14.物体平面(1)からレチクル平面(19)への明暗カントの結像は、5 %と95%の輝度値が像視野直径の2%未満、好ましくは0.5%未満だけ離れ ているようなカント推移を示すことを特徴とする請求項2記載のREMA対物レ ンズ。 15.偏差が±1mrad以下、特に±0.3mrad以下の±10mradの範囲にある sin(i)の値を有する所定の瞳関数を再現することを特徴とする請求項1から14 の少なくとも1項に記載のREMA対物レンズ。 16.拡大REMA対物レンズ(123)を含む照明手段と、縮小投影対物レ ンズ(400)とを有し、REMA対物レンズ(123)の瞳平面(12)が投 影対物レンズ(400)の瞳平面(410)に結像され、レチクル平面(330 )の各々の点で、REMA対物レンズ(123)の入射主ビームは投影対物レン ズ (400)の主ビームから3mrad未満、好ましくは0.3mrad未満しか外れてい ないマイクロリソグラフィ用投影照明装置において、REMA対物レンズ(12 3)は最大で5つ、好ましくは4つの非球而を含む最大で10個のレンズを有す ることを特徴とするマイクロリソグラフィ用投影照明装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19653983A DE19653983A1 (de) | 1996-12-21 | 1996-12-21 | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
DE19653983.8 | 1996-12-21 | ||
PCT/EP1997/006760 WO1998028644A1 (de) | 1996-12-21 | 1997-12-03 | Rema-objektiv für mikrolithographie-projektionsbelichtungsanlagen |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000505916A true JP2000505916A (ja) | 2000-05-16 |
JP2000505916A5 JP2000505916A5 (ja) | 2005-08-11 |
JP4044146B2 JP4044146B2 (ja) | 2008-02-06 |
Family
ID=7815984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52829398A Expired - Fee Related JP4044146B2 (ja) | 1996-12-21 | 1997-12-03 | マイクロリソグラフィ用投影露光装置のrema対物レンズ |
Country Status (7)
Country | Link |
---|---|
US (1) | US6366410B1 (ja) |
EP (1) | EP0888570A1 (ja) |
JP (1) | JP4044146B2 (ja) |
KR (1) | KR100524662B1 (ja) |
DE (1) | DE19653983A1 (ja) |
TW (1) | TW388798B (ja) |
WO (1) | WO1998028644A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012103724A (ja) * | 2005-04-26 | 2012-05-31 | Carl Zeiss Smt Gmbh | マイクロリソグラフィ露光装置のための照明システム |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6680803B2 (en) * | 1996-12-21 | 2004-01-20 | Carl-Zeiss Smt Ag | Partial objective in an illuminating systems |
US7130129B2 (en) | 1996-12-21 | 2006-10-31 | Carl Zeiss Smt Ag | Reticle-masking objective with aspherical lenses |
DE19829612A1 (de) * | 1998-07-02 | 2000-01-05 | Zeiss Carl Fa | Beleuchtungssystem der Mikrolithographie mit Depolarisator |
JP2002531878A (ja) * | 1998-11-30 | 2002-09-24 | カール−ツアイス−スチフツング | 最少絞り収差を有する大開口数の投影レンズ |
DE19855108A1 (de) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
DE19855157A1 (de) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projektionsobjektiv |
DE19942281A1 (de) * | 1999-05-14 | 2000-11-16 | Zeiss Carl Fa | Projektionsobjektiv |
US6867922B1 (en) | 1999-06-14 | 2005-03-15 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus using the same |
EP1134606B1 (de) * | 2000-01-18 | 2002-04-10 | Isco-Optic Gmbh | Projektionsobjektiv |
DE10016176A1 (de) * | 2000-03-31 | 2001-10-04 | Zeiss Carl | Mikrolithographisches Beleuchtungssystem und Mikrolithographische Projektionsbelichtungsanlage damit |
JP2002055277A (ja) * | 2000-08-11 | 2002-02-20 | Nikon Corp | リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置 |
TWI241458B (en) * | 2001-02-23 | 2005-10-11 | Zeiss Carl Smt Ag | Illumination system with reduced energy loading |
DE10113612A1 (de) * | 2001-02-23 | 2002-09-05 | Zeiss Carl | Teilobjektiv in einem Beleuchtungssystem |
US6683728B2 (en) | 2001-03-20 | 2004-01-27 | Carl-Zeiss-Stiftung | Illumination system with reduced energy loading |
DE10138847A1 (de) * | 2001-08-15 | 2003-02-27 | Zeiss Carl | Blende für eine Integratoreinheit |
US7289277B2 (en) * | 2002-07-09 | 2007-10-30 | Asml Holding N.V. | Relay lens used in an illumination system of a lithography system |
DE10329793A1 (de) * | 2003-07-01 | 2005-01-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage |
WO2005033800A1 (de) | 2003-09-09 | 2005-04-14 | Carl Zeiss Smt Ag | Lithographie-objektiv und projektionsbelichtungsanlage mit mindestens einem solchen lithographie-objektiv |
WO2006029796A2 (en) * | 2004-09-13 | 2006-03-23 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
US20070285644A1 (en) * | 2004-09-13 | 2007-12-13 | Carl Zeiss Smt Ag | Microlithographic Projection Exposure Apparatus |
KR101235492B1 (ko) | 2006-07-03 | 2013-02-20 | 칼 짜이스 에스엠테 게엠베하 | 리소그래피 투사 대물렌즈 교정/수리 방법 |
EP1927890A1 (en) | 2006-11-30 | 2008-06-04 | Carl Zeiss SMT AG | Method of manufacturing a projection objective and projection objective manufactured by that method |
KR101408483B1 (ko) * | 2006-11-30 | 2014-06-17 | 칼 짜이스 에스엠티 게엠베하 | 투영 대물렌즈를 제조하는 방법 및 상기 방법으로 제조된 투영 대물렌즈 |
EP2097789B1 (en) | 2006-12-01 | 2012-08-01 | Carl Zeiss SMT GmbH | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
DE102007009867A1 (de) * | 2007-02-28 | 2008-09-11 | Carl Zeiss Smt Ag | Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu |
WO2008113605A2 (de) | 2007-03-20 | 2008-09-25 | Carl Zeiss Smt Ag | Verfahren zum verbessern von abbildungseigenschaften eines optischen systems sowie derartiges optisches system |
DE102013202757B4 (de) * | 2013-02-20 | 2014-11-20 | Carl Zeiss Smt Gmbh | Lithographiebeleuchtungssysteme mit hohem Lichtleitwert und Faltspiegel |
KR101704580B1 (ko) * | 2015-08-31 | 2017-02-08 | 포항공과대학교 산학협력단 | 집광렌즈 및 이를 이용한 리소그래피 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62266513A (ja) * | 1986-05-14 | 1987-11-19 | Canon Inc | 投影露光光学系 |
JP3278896B2 (ja) * | 1992-03-31 | 2002-04-30 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
DE4417489A1 (de) * | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
DE19548805A1 (de) * | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
-
1996
- 1996-12-21 DE DE19653983A patent/DE19653983A1/de not_active Ceased
-
1997
- 1997-12-03 US US09/125,621 patent/US6366410B1/en not_active Expired - Lifetime
- 1997-12-03 JP JP52829398A patent/JP4044146B2/ja not_active Expired - Fee Related
- 1997-12-03 EP EP97952867A patent/EP0888570A1/de not_active Withdrawn
- 1997-12-03 WO PCT/EP1997/006760 patent/WO1998028644A1/de not_active Application Discontinuation
- 1997-12-03 KR KR1019980706495A patent/KR100524662B1/ko not_active IP Right Cessation
- 1997-12-19 TW TW086119289A patent/TW388798B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012103724A (ja) * | 2005-04-26 | 2012-05-31 | Carl Zeiss Smt Gmbh | マイクロリソグラフィ露光装置のための照明システム |
Also Published As
Publication number | Publication date |
---|---|
TW388798B (en) | 2000-05-01 |
DE19653983A1 (de) | 1998-06-25 |
JP4044146B2 (ja) | 2008-02-06 |
KR19990087107A (ko) | 1999-12-15 |
US6366410B1 (en) | 2002-04-02 |
WO1998028644A1 (de) | 1998-07-02 |
EP0888570A1 (de) | 1999-01-07 |
KR100524662B1 (ko) | 2006-01-12 |
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