JP2000503136A5 - - Google Patents

Download PDF

Info

Publication number
JP2000503136A5
JP2000503136A5 JP1997524976A JP52497697A JP2000503136A5 JP 2000503136 A5 JP2000503136 A5 JP 2000503136A5 JP 1997524976 A JP1997524976 A JP 1997524976A JP 52497697 A JP52497697 A JP 52497697A JP 2000503136 A5 JP2000503136 A5 JP 2000503136A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997524976A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000503136A (ja
JP3965213B2 (ja
Filing date
Publication date
Priority claimed from GBGB9600469.2A external-priority patent/GB9600469D0/en
Application filed filed Critical
Publication of JP2000503136A publication Critical patent/JP2000503136A/ja
Publication of JP2000503136A5 publication Critical patent/JP2000503136A5/ja
Application granted granted Critical
Publication of JP3965213B2 publication Critical patent/JP3965213B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP52497697A 1996-01-10 1997-01-09 三次元エッチングプロセス Expired - Fee Related JP3965213B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9600469.2A GB9600469D0 (en) 1996-01-10 1996-01-10 Three dimensional etching process
GB9600469.2 1996-01-10
PCT/GB1997/000043 WO1997025653A1 (en) 1996-01-10 1997-01-09 Three-dimensional etching process

Publications (3)

Publication Number Publication Date
JP2000503136A JP2000503136A (ja) 2000-03-14
JP2000503136A5 true JP2000503136A5 (enExample) 2004-11-11
JP3965213B2 JP3965213B2 (ja) 2007-08-29

Family

ID=10786847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52497697A Expired - Fee Related JP3965213B2 (ja) 1996-01-10 1997-01-09 三次元エッチングプロセス

Country Status (12)

Country Link
US (1) US6682657B2 (enExample)
EP (1) EP0873542B1 (enExample)
JP (1) JP3965213B2 (enExample)
KR (1) KR19990077120A (enExample)
CN (1) CN1135438C (enExample)
AT (1) ATE507496T1 (enExample)
AU (1) AU1388497A (enExample)
CA (1) CA2242634C (enExample)
DE (1) DE69740180D1 (enExample)
GB (2) GB9600469D0 (enExample)
PL (1) PL194893B1 (enExample)
WO (1) WO1997025653A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19904307C2 (de) * 1999-01-28 2001-09-20 Bosch Gmbh Robert Verfahren zur Herstellung von dreidimensionalen Strukturen mittels eines Ätzprozesses
DE10135872A1 (de) * 2001-07-24 2003-02-27 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer Linse
JP4012156B2 (ja) * 2004-02-02 2007-11-21 独立行政法人科学技術振興機構 圧電素子の製造方法
TW200625699A (en) * 2004-11-24 2006-07-16 Sumitomo Chemical Co Semiconductor substrate, method for manufacture thereof, and light emitting element
TWI415288B (zh) * 2005-03-22 2013-11-11 住友化學股份有限公司 獨立基板、其製造方法,以及半導體發光元件
JP2007019318A (ja) * 2005-07-08 2007-01-25 Sumitomo Chemical Co Ltd 半導体発光素子、半導体発光素子用基板の製造方法及び半導体発光素子の製造方法
US8691674B2 (en) * 2005-09-29 2014-04-08 Sumitomo Chemical Company, Limited Method for producing group 3-5 nitride semiconductor and method for producing light-emitting device
KR100998017B1 (ko) * 2009-02-23 2010-12-03 삼성엘이디 주식회사 발광소자 패키지용 렌즈 및 이를 구비하는 발광소자 패키지
JP5650388B2 (ja) * 2009-10-05 2015-01-07 三菱電機株式会社 有機elパネル、パネル接合型発光装置、有機elパネルの製造方法
JP2019121750A (ja) * 2018-01-11 2019-07-22 東京エレクトロン株式会社 エッチング方法およびエッチング装置
CN110824590A (zh) 2019-11-25 2020-02-21 京东方科技集团股份有限公司 微透镜阵列的制备方法、显示装置的制备方法及显示装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4357704A (en) * 1980-09-15 1982-11-02 Science Applications, Inc. Disc or slab laser apparatus employing compound parabolic concentrator
US4514252A (en) 1982-11-18 1985-04-30 Hewlett-Packard Company Technique of producing tapered features in integrated circuits
CA1237824A (en) * 1984-04-17 1988-06-07 Takashi Mimura Resonant tunneling semiconductor device
JPS6144627A (ja) 1984-08-09 1986-03-04 Pioneer Electronic Corp マイクロフレネルレンズの製造方法
EP0199497B1 (en) * 1985-04-10 1992-01-02 Fujitsu Limited Process for fabricating a self-aligned bipolar transistor
WO1987002179A1 (en) 1985-09-27 1987-04-09 Burroughs Corporation Method of fabricating a tapered via hole in polyimide
FR2590409B1 (fr) * 1985-11-15 1987-12-11 Commissariat Energie Atomique Procede de fabrication d'un transistor en couches minces a grille auto-alignee par rapport au drain et a la source de celui-ci et transistor obtenu par le procede
US4698128A (en) * 1986-11-17 1987-10-06 Motorola, Inc. Sloped contact etch process
GB8715211D0 (en) 1987-06-29 1987-08-05 Secr Defence Lensed photo detector
US5161059A (en) 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US4902377A (en) * 1989-05-23 1990-02-20 Motorola, Inc. Sloped contact etch process
US5227915A (en) 1990-02-13 1993-07-13 Holo-Or Ltd. Diffractive optical element
US5073007A (en) 1990-06-11 1991-12-17 Holo-Or Ltd. Diffractive optical element
US5316640A (en) * 1991-06-19 1994-05-31 Matsushita Electric Industrial Co., Ltd. Fabricating method of micro lens
US5286338A (en) * 1993-03-01 1994-02-15 At&T Bell Laboratories Methods for making microlens arrays
JP2795126B2 (ja) * 1993-04-16 1998-09-10 株式会社デンソー 曲面加工方法及びその装置
US5853960A (en) * 1998-03-18 1998-12-29 Trw Inc. Method for producing a micro optical semiconductor lens

Similar Documents

Publication Publication Date Title
JP2000502280A5 (enExample)
JP2000501771A5 (enExample)
JP2000501599A5 (enExample)
JP2000503005A5 (enExample)
JP2000501018A5 (enExample)
JP2000500076A5 (enExample)
JP2000501324A5 (enExample)
JP2000500055A5 (enExample)
JP2000502472A5 (enExample)
JP2000501825A5 (enExample)
JP2000501338A5 (enExample)
JP2000500874A5 (enExample)
JP2000502425A5 (enExample)
JP2000502485A5 (enExample)
JP2000502568A5 (enExample)
JP2000501774A5 (enExample)
JP2000500912A5 (enExample)
JP2000502570A5 (enExample)
JP2000501876A5 (enExample)
JP2000501744A5 (enExample)
JP2000501229A5 (enExample)
JP2000502316A5 (enExample)
JP2000500857A5 (enExample)
JP2000502714A5 (enExample)
JP2000500184A5 (enExample)