JP2000347409A5 - - Google Patents
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- Publication number
- JP2000347409A5 JP2000347409A5 JP1999158695A JP15869599A JP2000347409A5 JP 2000347409 A5 JP2000347409 A5 JP 2000347409A5 JP 1999158695 A JP1999158695 A JP 1999158695A JP 15869599 A JP15869599 A JP 15869599A JP 2000347409 A5 JP2000347409 A5 JP 2000347409A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- optionally substituted
- positive photoresist
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000001424 substituent group Chemical group 0.000 claims 18
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 125000002252 acyl group Chemical group 0.000 claims 3
- 125000004423 acyloxy group Chemical group 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 125000004432 carbon atoms Chemical group C* 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- 125000005346 substituted cycloalkyl group Chemical group 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15869599A JP3992882B2 (ja) | 1999-06-04 | 1999-06-04 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US09/577,884 US6479211B1 (en) | 1999-05-26 | 2000-05-25 | Positive photoresist composition for far ultraviolet exposure |
| KR1020000028523A KR100684155B1 (ko) | 1999-05-26 | 2000-05-26 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15869599A JP3992882B2 (ja) | 1999-06-04 | 1999-06-04 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000347409A JP2000347409A (ja) | 2000-12-15 |
| JP2000347409A5 true JP2000347409A5 (fr) | 2005-07-07 |
| JP3992882B2 JP3992882B2 (ja) | 2007-10-17 |
Family
ID=15677347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15869599A Expired - Lifetime JP3992882B2 (ja) | 1999-05-26 | 1999-06-04 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3992882B2 (fr) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002193895A (ja) * | 2000-12-27 | 2002-07-10 | Daicel Chem Ind Ltd | 環式骨格を有する３−アクリロイルオキシプロピオン酸エステル誘導体、及びアクリル酸エステル混合物 |
| JP4225699B2 (ja) | 2001-03-12 | 2009-02-18 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP4137406B2 (ja) * | 2001-05-18 | 2008-08-20 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP2003186197A (ja) * | 2001-12-19 | 2003-07-03 | Sony Corp | レジスト材料及び露光方法 |
| JP4040536B2 (ja) * | 2003-06-11 | 2008-01-30 | 東京応化工業株式会社 | ネガ型レジスト組成物、及びそれを用いたレジストパターン形成方法 |
| JP2011046713A (ja) * | 2004-04-23 | 2011-03-10 | Sumitomo Chemical Co Ltd | 化学増幅型ポジ型レジスト組成物及び（メタ）アクリル酸誘導体とその製法 |
| JP6531723B2 (ja) * | 2016-06-29 | 2019-06-19 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
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1999
- 1999-06-04 JP JP15869599A patent/JP3992882B2/ja not_active Expired - Lifetime