JP2003177537A5 - - Google Patents
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- Publication number
- JP2003177537A5 JP2003177537A5 JP2002060583A JP2002060583A JP2003177537A5 JP 2003177537 A5 JP2003177537 A5 JP 2003177537A5 JP 2002060583 A JP2002060583 A JP 2002060583A JP 2002060583 A JP2002060583 A JP 2002060583A JP 2003177537 A5 JP2003177537 A5 JP 2003177537A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- carbon atoms
- acid
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atoms Chemical group C* 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002060583A JP4004820B2 (ja) | 2001-10-01 | 2002-03-06 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-305364 | 2001-10-01 | ||
| JP2001305364 | 2001-10-01 | ||
| JP2002060583A JP4004820B2 (ja) | 2001-10-01 | 2002-03-06 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003177537A JP2003177537A (ja) | 2003-06-27 |
| JP2003177537A5 true JP2003177537A5 (fr) | 2005-04-07 |
| JP4004820B2 JP4004820B2 (ja) | 2007-11-07 |
Family
ID=26623540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002060583A Expired - Lifetime JP4004820B2 (ja) | 2001-10-01 | 2002-03-06 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4004820B2 (fr) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4429620B2 (ja) * | 2002-10-15 | 2010-03-10 | 出光興産株式会社 | 感放射線性有機化合物 |
| KR100758870B1 (ko) * | 2003-09-25 | 2007-09-14 | 도오꾜오까고오교 가부시끼가이샤 | 저가속 전자선용 포지티브형 레지스트 조성물, 레지스트적층체 및 패턴 형성 방법 |
| JP4418659B2 (ja) * | 2003-09-26 | 2010-02-17 | 富士フイルム株式会社 | ポジ型電子線、ｘ線又はｅｕｖ光用レジスト組成物及びそれを用いたパターン形成方法 |
| JP4347110B2 (ja) | 2003-10-22 | 2009-10-21 | 東京応化工業株式会社 | 電子線又はｅｕｖ用ポジ型レジスト組成物 |
| JP4347205B2 (ja) * | 2004-01-23 | 2009-10-21 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US7250246B2 (en) | 2004-01-26 | 2007-07-31 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
| JP2006078760A (ja) | 2004-09-09 | 2006-03-23 | Tokyo Ohka Kogyo Co Ltd | 電子線またはｅｕｖ（極端紫外光）用レジスト組成物及びレジストパターン形成方法 |
| JP5844613B2 (ja) * | 2010-11-17 | 2016-01-20 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 感光性コポリマーおよびフォトレジスト組成物 |
| JP5531034B2 (ja) * | 2012-01-31 | 2014-06-25 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置及び液晶表示装置 |
| JP6894364B2 (ja) * | 2017-12-26 | 2021-06-30 | 信越化学工業株式会社 | 有機膜形成用組成物、半導体装置製造用基板、有機膜の形成方法、及びパターン形成方法 |
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2002
- 2002-03-06 JP JP2002060583A patent/JP4004820B2/ja not_active Expired - Lifetime