JP2002323768A5 - - Google Patents
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- Publication number
- JP2002323768A5 JP2002323768A5 JP2002043492A JP2002043492A JP2002323768A5 JP 2002323768 A5 JP2002323768 A5 JP 2002323768A5 JP 2002043492 A JP2002043492 A JP 2002043492A JP 2002043492 A JP2002043492 A JP 2002043492A JP 2002323768 A5 JP2002323768 A5 JP 2002323768A5
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- JP
- Japan
- Prior art keywords
- group
- substituent
- general formula
- hydrogen atom
- acid
- Prior art date
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- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002043492A JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-45214 | 2001-02-21 | ||
| JP2001045214 | 2001-02-21 | ||
| JP2002043492A JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002323768A JP2002323768A (ja) | 2002-11-08 |
| JP2002323768A5 true JP2002323768A5 (fr) | 2005-04-07 |
| JP3992993B2 JP3992993B2 (ja) | 2007-10-17 |
Family
ID=26609825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002043492A Expired - Lifetime JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3992993B2 (fr) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004059392A1 (fr) | 2002-12-26 | 2004-07-15 | Tokyo Ohka Kogyo Co., Ltd. | Composition de reserve positive et procede de formation d'un motif de reserve |
| JP4121396B2 (ja) | 2003-03-05 | 2008-07-23 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4115322B2 (ja) | 2003-03-31 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US7232640B1 (en) | 2003-03-31 | 2007-06-19 | Fujifilm Corporation | Positive resist composition |
| JP4149306B2 (ja) * | 2003-04-30 | 2008-09-10 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP2004333548A (ja) | 2003-04-30 | 2004-11-25 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物およびレジストパターン形成方法 |
| JP3981830B2 (ja) | 2003-05-26 | 2007-09-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| US7250246B2 (en) | 2004-01-26 | 2007-07-31 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
| EP1566694B1 (fr) | 2004-02-20 | 2014-04-02 | FUJIFILM Corporation | Composition pour réserve de type positif et procédé de formation de motifs employant ladite composition |
| US7504193B2 (en) | 2004-09-02 | 2009-03-17 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
| JP4368282B2 (ja) | 2004-09-24 | 2009-11-18 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| KR20080026066A (ko) | 2006-09-19 | 2008-03-24 | 후지필름 가부시키가이샤 | 감광성 조성물, 감광성 조성물에 사용하는 화합물 및감광성 조성물을 사용한 패턴형성방법 |
| KR101524571B1 (ko) | 2007-08-10 | 2015-06-01 | 후지필름 가부시키가이샤 | 포지티브형 레지스트 조성물, 그 조성물을 사용한 패턴 형성 방법 및 그 조성물에 사용되는 화합물 |
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2002
- 2002-02-20 JP JP2002043492A patent/JP3992993B2/ja not_active Expired - Lifetime