JP2000338676A5 - - Google Patents
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- Publication number
- JP2000338676A5 JP2000338676A5 JP1999150215A JP15021599A JP2000338676A5 JP 2000338676 A5 JP2000338676 A5 JP 2000338676A5 JP 1999150215 A JP1999150215 A JP 1999150215A JP 15021599 A JP15021599 A JP 15021599A JP 2000338676 A5 JP2000338676 A5 JP 2000338676A5
- Authority
- JP
- Japan
- Prior art keywords
- positive photoresist
- photoresist composition
- ultraviolet exposure
- diazabicyclo
- deep ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 claims 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N DABCO Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- -1 nitrogen containing basic compound Chemical class 0.000 claims 2
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-Diazabicyclo(4.3.0)non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 claims 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 claims 1
- OVABIFHEPZPSCK-UHFFFAOYSA-N 5,5-dimethyl-1,4-dihydroimidazole Chemical compound CC1(C)CN=CN1 OVABIFHEPZPSCK-UHFFFAOYSA-N 0.000 claims 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N Hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims 1
- 229960004011 Methenamine Drugs 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 claims 1
- 239000004312 hexamethylene tetramine Substances 0.000 claims 1
- 150000002460 imidazoles Chemical class 0.000 claims 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims 1
- 125000003386 piperidinyl group Chemical group 0.000 claims 1
- 150000003217 pyrazoles Chemical class 0.000 claims 1
- 150000004892 pyridazines Chemical class 0.000 claims 1
- 150000003230 pyrimidines Chemical class 0.000 claims 1
- 150000003233 pyrroles Chemical class 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15021599A JP3890380B2 (ja) | 1999-05-28 | 1999-05-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US09/577,884 US6479211B1 (en) | 1999-05-26 | 2000-05-25 | Positive photoresist composition for far ultraviolet exposure |
| KR1020000028523A KR100684155B1 (ko) | 1999-05-26 | 2000-05-26 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15021599A JP3890380B2 (ja) | 1999-05-28 | 1999-05-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000338676A JP2000338676A (ja) | 2000-12-08 |
| JP2000338676A5 true JP2000338676A5 (fr) | 2005-07-07 |
| JP3890380B2 JP3890380B2 (ja) | 2007-03-07 |
Family
ID=15492062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15021599A Expired - Fee Related JP3890380B2 (ja) | 1999-05-26 | 1999-05-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3890380B2 (fr) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4453138B2 (ja) * | 1999-12-22 | 2010-04-21 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| JP2001215704A (ja) * | 2000-01-31 | 2001-08-10 | Sumitomo Chem Co Ltd | 化学増幅型ポジ型レジスト組成物 |
| JP2002193895A (ja) * | 2000-12-27 | 2002-07-10 | Daicel Chem Ind Ltd | 環式骨格を有する３−アクリロイルオキシプロピオン酸エステル誘導体、及びアクリル酸エステル混合物 |
| DE60238029D1 (de) * | 2001-12-27 | 2010-12-02 | Shinetsu Chemical Co | Resistzusammensetzung und Musterübertragungsverfahren |
| JP4222850B2 (ja) | 2003-02-10 | 2009-02-12 | Ｓｐａｎｓｉｏｎ Ｊａｐａｎ株式会社 | 感放射線性樹脂組成物、その製造法並びにそれを用いた半導体装置の製造方法 |
| JP4448767B2 (ja) * | 2004-10-08 | 2010-04-14 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| EP1720072B1 (fr) | 2005-05-01 | 2019-06-05 | Rohm and Haas Electronic Materials, L.L.C. | Compositions et procédés pour lithographie en immersion |
| JP4691442B2 (ja) | 2005-12-09 | 2011-06-01 | 富士フイルム株式会社 | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| EP2420891B1 (fr) | 2006-10-30 | 2021-06-23 | Rohm and Haas Electronic Materials LLC | Procédé pour lithographie en immersion |
| JP2009199058A (ja) | 2007-11-05 | 2009-09-03 | Rohm & Haas Electronic Materials Llc | 液浸リソグラフィーのための組成物および方法 |
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1999
- 1999-05-28 JP JP15021599A patent/JP3890380B2/ja not_active Expired - Fee Related