JP2000231194A5 - - Google Patents
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- Publication number
- JP2000231194A5 JP2000231194A5 JP1999240600A JP24060099A JP2000231194A5 JP 2000231194 A5 JP2000231194 A5 JP 2000231194A5 JP 1999240600 A JP1999240600 A JP 1999240600A JP 24060099 A JP24060099 A JP 24060099A JP 2000231194 A5 JP2000231194 A5 JP 2000231194A5
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- photoresist composition
- positive photoresist
- alkyl group
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24060099A JP3995369B2 (ja) | 1998-12-07 | 1999-08-26 | ポジ型フォトレジスト組成物 |
| KR1019990055067A KR100610165B1 (ko) | 1998-12-07 | 1999-12-06 | 포지티브 포토레지스트 조성물 |
| US09/456,827 US6576392B1 (en) | 1996-12-07 | 1999-12-06 | Positive photoresist composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-347193 | 1998-12-07 | ||
| JP34719398 | 1998-12-07 | ||
| JP24060099A JP3995369B2 (ja) | 1998-12-07 | 1999-08-26 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000231194A JP2000231194A (ja) | 2000-08-22 |
| JP2000231194A5 true JP2000231194A5 (fr) | 2005-07-07 |
| JP3995369B2 JP3995369B2 (ja) | 2007-10-24 |
Family
ID=26534811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24060099A Expired - Fee Related JP3995369B2 (ja) | 1996-12-07 | 1999-08-26 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3995369B2 (fr) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| JP4438218B2 (ja) * | 2000-11-16 | 2010-03-24 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4186497B2 (ja) * | 2001-04-12 | 2008-11-26 | 東レ株式会社 | ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法 |
| JP4007581B2 (ja) * | 2002-04-19 | 2007-11-14 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| KR100955006B1 (ko) * | 2002-04-26 | 2010-04-27 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 |
| KR100467698B1 (ko) * | 2002-09-05 | 2005-01-24 | 삼성에스디아이 주식회사 | 원통형 리튬이차전지와 이의 제조방법 |
| JP4996060B2 (ja) * | 2004-05-12 | 2012-08-08 | キヤノン株式会社 | スルホン酸エステル基と、アミド基を有するポリマーを含む荷電制御剤、それを用いた静電荷像現像用トナー、画像形成方法および画像形成装置 |
| CN1965002B (zh) | 2004-05-12 | 2010-05-05 | 佳能株式会社 | 具有磺酸基或磺酸酯基和酰胺基的聚合物和生产它的方法 |
| US7537879B2 (en) * | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| JP5331624B2 (ja) * | 2009-09-04 | 2013-10-30 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法 |
| WO2011040175A1 (fr) | 2009-09-30 | 2011-04-07 | Jsr株式会社 | Polymère, composition sensible aux rayonnements, monomère et procédé de fabrication correspondant |
| KR20140033027A (ko) * | 2011-04-01 | 2014-03-17 | 더 리서치 파운데이션 오브 스테이트 유니버시티 오브 뉴욕 | 안정화된 산 증폭제 |
| US9772558B2 (en) * | 2013-09-24 | 2017-09-26 | International Business Machines Corporation | Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists |
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1999
- 1999-08-26 JP JP24060099A patent/JP3995369B2/ja not_active Expired - Fee Related